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公开(公告)号：US11824193B2
公开(公告)日：2023-11-21
申请号：US17613276
申请日：2021-03-23
Applicant: LG Chem, Ltd.
Inventor： Woo Ram Lee , Woo Hyun Kim , Dong Jin Kim , Hwa Seok Chae , Hyun Uk Kim
CPC classification number: H01M4/525 , C01G53/50 , H01M4/0471 , H01M4/0497 , H01M4/505 , C01P2002/60 , C01P2004/61 , C01P2006/40 , H01M2004/021 , H01M2004/028
Abstract: Provided is a method of manufacturing a positive electrode active material, which includes: (A) preparing a positive electrode active material precursor which includes a core portion including randomly aggregated primary particles and a shell portion surrounding the core portion and formed of primary particles oriented in a direction from a particle center to the outside and in which a ratio of a crystal grain size in the (100) plane to a crystal grain size in the (001) plane of the primary particles forming the shell portion is 3 or more; and (B) mixing the positive electrode active material precursor with a lithium-containing raw material and firing the mixture, wherein the lithium transition metal oxide has an average particle diameter (D50) that is 0.01% to 20% reduced as compared to an average particle diameter (D50) of the positive electrode active material precursor.
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公开(公告)号：US20220407063A1
公开(公告)日：2022-12-22
申请号：US17779244
申请日：2021-03-22
Applicant: LG Chem, Ltd.
Inventor： Hyun Uk Kim , Eung Ju Lee , Woo Hyun Kim , Sang Soon Choi , Jun Gil Kim , Gyeong Il Yoo
Abstract: A positive electrode active material precursor, a method of preparing the same, and a positive electrode active material, a positive electrode, and a lithium secondary battery prepared from the same. In some embodiments, a positive electrode active material precursor includes nickel, cobalt, and manganese, wherein the positive electrode active material precursor satisfies: Equation 1 (2.5≤C(100)/C(001)≤5.0) and Equation 2 (1.0≤C(101)/C(001)≤3.0), where C(001) is a crystalline size in a (001) plane, C(100) is a crystalline size in a (100) plane, and C(101) is a crystalline size in a (101) plane. The positive electrode active material precursor has particle growth of a (001) plane that is suppressed.
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公开(公告)号：US10710048B2
公开(公告)日：2020-07-14
申请号：US16478691
申请日：2018-12-26
Applicant: LG Chem, Ltd.
Inventor： Hyun Uk Kim , Seong Bae Kim , Chang Jun Moon , Yi Rang Lim , Kyoung Wan Park , Eun Hee Kim
Abstract: A co-precipitation reactor with a continuous filtering system mounted, wherein the co-precipitation reactor includes a main body accommodating a reactant for reaction therein, an input unit inputting the reactant into the main body, and a filter unit installed in the main body to filter a precursor of the precursor generated by reacting with the reactant in the main body and a reaction solution.
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公开(公告)号：US20200047147A1
公开(公告)日：2020-02-13
申请号：US16478691
申请日：2018-12-26
Applicant: LG Chem, Ltd.
Inventor： Hyun Uk Kim , Seong Bae Kim , Chang Jun Moon , Yi Rang Lim , Kyoung Wan Park , Eun Hee Kim
Abstract: A co-precipitation reactor with a continuous filtering system mounted, wherein the co-precipitation reactor includes a main body accommodating a reactant for reaction therein, an input unit inputting the reactant into the main body, and a filter unit installed in the main body to filter a precursor of the precursor generated by reacting with the reactant in the main body and a reaction solution.
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5.发明公开公开(公告)号：US20240243279A1
公开(公告)日：2024-07-18
申请号：US18620537
申请日：2024-03-28
Applicant: LG Chem, Ltd.
Inventor： Seong Bae Kim , Yi Rang Lim , Kyoung Wan Park , Hyun Uk Kim , Hong Kyu Park , Chang Jun Moon , Eun Hee Kim
IPC: H01M4/525 , C01G53/00 , H01M4/505 , H01M10/0525 , H01M4/02
CPC classification number: H01M4/525 , C01G53/40 , H01M4/505 , H01M10/0525 , C01P2006/11 , C01P2006/12 , C01P2006/40 , H01M2004/028 , H01M2220/20
Abstract: The present invention provides a positive electrode active material precursor having a uniform particle size distribution and a method of preparing the same, and, specifically, provides a positive electrode active material precursor represented by Formula 1, wherein a percentage of fine powder with an average particle diameter (D50) of 1 μm or less generated when the positive electrode active material precursor is rolled at 2.5 kgf/cm2 is less than 1%, and an aspect ratio is 0.93 or more, and a method of preparing the positive electrode active material precursor.
[NixCOyM1zM2w](OH)2 [Formula 1]
In Formula 1, 0.55≤x-
Patent Agency Ranking
公开(公告)号：US20230339772A1
公开(公告)日：2023-10-26
申请号：US18005274
申请日：2021-07-26
Applicant: LG Chem, Ltd.
Inventor： Na Ri Kim , Young Su Park , Woo Ram Lee , Sang Soon Choi , Hyun Ah Park , Hyun Uk Kim , Woo Hyun Kim , Hwan Young Choi
IPC: C01G53/04
CPC classification number: C01G53/04 , C01P2006/40 , C01P2004/61 , C01P2006/12 , C01P2006/11
Abstract: A positive electrode active material precursor includes: a first region formed in the center of a particle of the positive electrode active material precursor and having a composition represented by Chemical Formula 1 or 2; and a second region formed on the first region and having a composition represented by Chemical Formula 3 or 4. A method of preparing the positive electrode active material precursor is also provided.
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公开(公告)号：US11973222B2
公开(公告)日：2024-04-30
申请号：US16763697
申请日：2018-12-07
Applicant: LG Chem, Ltd.
Inventor： Seong Bae Kim , Yi Rang Lim , Kyoung Wan Park , Hyun Uk Kim , Hong Kyu Park , Chang Jun Moon , Eun Hee Kim
IPC: H01M4/525 , C01G53/00 , H01M4/02 , H01M4/505 , H01M10/0525
CPC classification number: H01M4/525 , C01G53/40 , H01M4/505 , H01M10/0525 , C01P2006/11 , C01P2006/12 , C01P2006/40 , H01M2004/028 , H01M2220/20
Abstract: A positive electrode active material precursor having a uniform particle size distribution and represented by Formula 1, wherein a percentage of fine powder with an average particle diameter (D50) of 1 μm or less is generated when the positive electrode active material precursor is rolled at 2.5 kgf/cm2 is less than 1%, and an aspect ratio is 0.93 or more, and a method of preparing the positive electrode active material precursor
[NixCoyM1zM2w](OH)2 [Formula 1]
in Formula 1, 0.5≤x-
公开(公告)号：US20210387124A1
公开(公告)日：2021-12-16
申请号：US17281754
申请日：2019-09-11
Applicant: LG Chem, Ltd.
Inventor： Hyun Uk Kim , Sang Soo Jang , Young Su Park , Seong Bae Kim , Yi Rang Lim , Kyoung Wan Park , Eun Hee Kim
Abstract: A cleaning method according to the present invention comprises mounting the metal filter on a jig that is vertically elevatable and horizontally slidable in a cleaning bath so that the opening is faced downward, descending the jig so that a first nozzle installed in the cleaning bath enters the opening, injecting a predetermined amount of water and a cleaning solution into the cleaning bath so that the metal filter is immersed, spraying compressed air through the first nozzle to discharge bubbles of the compressed air toward an inner surface of the metal filter, draining the cleaning bath, spraying water through a second nozzle to remove the cleaning solution from the metal filter, and spraying the compressed air through the first nozzle to dry the metal filter. An apparatus for cleaning a metal filter is also disclosed.
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公开(公告)号：US20240359120A1
公开(公告)日：2024-10-31
申请号：US18766057
申请日：2024-07-08
Applicant: LG Chem, Ltd.
Inventor： Hyun Uk Kim , Sang Soo Jang , Young Su Park , Seong Bae Kim , Yi Rang Lim , Kyoung Wan Park , Eun Hee Kim
CPC classification number: B01D41/04 , B01D29/15 , B01D29/68 , B01D39/10 , B01D2201/087
Abstract: An apparatus for cleaning a metal filter comprises a cleaning bath having a predetermined size and connected to a cleaning solution tank, a jig which is vertically elevatable and horizontally slidable in the cleaning bath and to which the metal filter is fixed, a nozzle mounted so that a discharge hole thereof is faced upward in the cleaning bath, and a controller which controls supply and blocking of a cleaning solution from the cleaning solution tank to the cleaning bath, controls supply and blocking of compressed air or the water to the nozzle, controls movement of the jig, and controls filling or discharging of the water into/from the cleaning bath. The controller controls the movement of the jig and selectively controls the supply and blocking of the water, the cleaning solution, and the compressed air, and the draining of the cleaning bath according to predetermined logic.
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公开(公告)号：US12064720B2
公开(公告)日：2024-08-20
申请号：US17281754
申请日：2019-09-11
Applicant: LG Chem, Ltd.
Inventor： Hyun Uk Kim , Sang Soo Jang , Young Su Park , Seong Bae Kim , Yi Rang Lim , Kyoung Wan Park , Eun Hee Kim
CPC classification number: B01D41/04 , B01D29/15 , B01D29/68 , B01D39/10 , B01D2201/087
Abstract: A cleaning method according to the present invention comprises mounting the metal filter on a jig that is vertically elevatable and horizontally slidable in a cleaning bath so that the opening is faced downward, descending the jig so that a first nozzle installed in the cleaning bath enters the opening, injecting a predetermined amount of water and a cleaning solution into the cleaning bath so that the metal filter is immersed, spraying compressed air through the first nozzle to discharge bubbles of the compressed air toward an inner surface of the metal filter, draining the cleaning bath, spraying water through a second nozzle to remove the cleaning solution from the metal filter, and spraying the compressed air through the first nozzle to dry the metal filter. An apparatus for cleaning a metal filter is also disclosed.
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