Abstract:
An imprint mold includes a substrate; a pattern on the substrate and having a multi-layered structure; and an etch stop layer between an upper layer and a lower layer of the pattern.
Abstract:
Disclosed are a shower head capable of improving plasma uniformity and a roll-to-roll plasma-processing apparatus including the same. The shower head includes a body including a plurality of flow channels provided therein and a front surface having a concave shape, and a plurality of spray holes formed in the front surface and having the same diameter as one another. Each of the spray holes is connected to a corresponding one of the flow channels so that reaction gas supplied through the flow channels is sprayed from the front surface through the spray holes.
Abstract:
Disclosed is a display device that includes a substrate having an active area and a dead area around the active area; an alignment mark on the inside surface of the substrate in a part of the dead area; and a light-shielding pattern on a rear surface of the substrate in the dead area, the light-shielding pattern including a mark hole for exposing the alignment mark. By providing the light-shielding pattern on a display surface in the dead area, the display device has expanded active display area and improved visual appreciation.