公开(公告)号：US20030214613A1

公开(公告)日：2003-11-20

申请号：US10459456

申请日：2003-06-12

Applicant: LG. PHILIPS LCD CO. , LTD.

Inventor： Byung-Chul Ahn ,  Soon-Sung Yoo ,  Yong-Wan Kim ,  Keuk-Sang Kwon

IPC: G02F001/136

CPC classification number: G02F1/1362 ,  G02F2001/136231

Abstract: The present invention discloses an array substrate for an active-matrix LCD device and a method of fabricating the same. The array substrate reduces the number of masks used in the fabrication process so that reliability is enhanced and the cost is reduced over the conventional device and method.

公开(公告)号：US20040145686A1

公开(公告)日：2004-07-29

申请号：US10753449

申请日：2004-01-09

Applicant: LG. PHILIPS LCD CO., LTD.

Inventor： Soon-Sung Yoo ,  Dong-Yeung Kwak ,  Hu-Sung Kim ,  Yu-Ho Jung ,  Yong-Wan Kim ,  Duk-Jin Park ,  Woo-Chae Lee

IPC: G02F001/136 ,  G02F001/1333

CPC classification number: G02F1/133512 ,  G02F1/136286 ,  G02F2001/136295

Abstract: A liquid crystal display device and a method of fabricating the same are disclosed in the present invention. More specifically, the method includes the steps forming a gate line on the first substrate sequentially forming a first insulating layer, an amorphous silicon layer, and a metal layer on the first substrate, patterning the metal layer to form a data line, forming a second insulating layer on the data line, patterning the second insulating layer and the amorphous silicon layer to form a passivation layer and an active layer, respectively, forming a pixel electrode at a pixel region defined by the gate and data lines, assembling the first substrate and the second substrate having a black matrix thereon, wherein the black matrix vertically overlaps at least one boundary line defined by different exposures during step-and-repeat exposure processes; and forming a liquid crystal layer between the first and second substrates.

Abstract translation: 在本发明中公开了液晶显示装置及其制造方法。 更具体地，该方法包括以下步骤：在第一衬底上顺序地形成第一绝缘层，非晶硅层和金属层上的栅极线，在第一衬底上形成图案化金属层以形成数据线，形成第二 绝缘层，图案化第二绝缘层和非晶硅层，以形成钝化层和有源层，分别在由栅极和数据线限定的像素区域处形成像素电极，组装第一衬底和 所述第二衬底在其上具有黑色矩阵，其中所述黑色矩阵垂直重叠在步进和重复曝光过程期间由不同曝光限定的至少一个边界线; 以及在所述第一和第二基板之间形成液晶层。

公开(公告)号：US20020018154A1

公开(公告)日：2002-02-14

申请号：US09923326

申请日：2001-08-08

Applicant: LG. PHILIPS LCD CO., LTD

Inventor： Soon-Sung Yoo ,  Dong-Yeung Kwak ,  Hoo-Sung Kim ,  Yu-Ho Jung ,  Yong-Wan Kim ,  Dug-Jin Park ,  Woo-Chae Lee

IPC: G02F001/1333

CPC classification number: G02F1/136204

Abstract: An electrostatic damage preventing apparatus for a thin film transistor array of a liquid crystal display includes a horizontal ground voltage line disposed at a first perimeter portion of the thin film transistor array, a vertical ground voltage line disposed at a second perimeter portion of the thin film transistor array, and a first electrostatic damage-preventing switching device group including parallel connection of at least two electrostatic damage-preventing switching devices to divide and divert an electrostatic voltage applied over the horizontal ground voltage line.

Abstract translation: 一种用于液晶显示器的薄膜晶体管阵列的静电破坏防止装置包括设置在薄膜晶体管阵列的第一周边部分处的水平地电压线，设置在薄膜的第二周边部分的垂直接地电压线 晶体管阵列以及包括至少两个静电损伤防止开关装置的并联连接的第一静电损伤防止开关装置组，以分割和转移施加在水平地电压线上的静电电压。

公开(公告)号：US20040043545A1

公开(公告)日：2004-03-04

申请号：US10653283

申请日：2003-09-03

Applicant: LG. Philips LCD Co., Ltd.

Inventor： Soon-Sung Yoo ,  Dong-Yeung Kwak ,  Hu-Sung Kim ,  Yu-Ho Jung ,  Yong-Wan Kim ,  Duk-Jin Park ,  Woo-Chae Lee

IPC: H01L031/036 ,  H01L029/04

CPC classification number: H01L29/66765 ,  G02F1/1368 ,  H01L27/12 ,  H01L27/124 ,  H01L27/1248 ,  H01L29/78669

Abstract: A TFT array substrate has a PAI pattern, and the PAI pattern has an over-etched portion of the pure amorphous silicon layer. This over-etched portion prevents a short between the pixel electrode and the pure amorphous silicon layer (i.e., the active layer). The over-etched portion also enables the aperture ratio to increase a gate line over a said substrate; a data line over the said substrate being perpendicular to the gate line; a passivation layer covering the data line, the passivation layer divided into a residual passivation layer and a etched passivation layer; a doped amorphous silicon layer formed under the data line and corresponding in size to the data line; a pure amorphous silicon layer formed under the doped amorphous silicon layer and having a over-etched portion in the peripheral portions, wherein the over-etched portion is over-etched from the edges of the residual passivation layer toward the inner side; an insulator layer under the pure amorphous silicon layer; a TFT formed near the crossing of the gate line and the data line; and a pixel electrode overlapping the data line and contacting the TFT.

Abstract translation: TFT阵列基板具有PAI图案，并且PAI图案具有纯非晶硅层的过蚀刻部分。 该过蚀刻部分防止像素电极和纯非晶硅层（即有源层）之间的短路。 过蚀刻部分还使孔径比增加了所述衬底上的栅极线; 所述衬底上的数据线垂直于所述栅极线; 覆盖数据线的钝化层，钝化层分为残留钝化层和蚀刻钝化层; 形成在数据线之下且与数据线大小对应的掺杂非晶硅层; 形成在掺杂非晶硅层下面并且在周边部分中具有过蚀刻部分的纯非晶硅层，其中过蚀刻部分从残余钝化层的边缘向内侧被过度蚀刻; 在纯非晶硅层下面的绝缘体层; 形成在栅极线和数据线的交叉点附近的TFT; 以及与数据线重叠并与TFT接触的像素电极。

公开(公告)号：US20030202131A1

公开(公告)日：2003-10-30

申请号：US10397261

申请日：2003-03-27

Applicant: LG Philips LCD Co., Ltd.

Inventor： Byung-Chul Ahn ,  Soon-Sung Yoo ,  Yong-Wan Kim

IPC: G02F001/136

CPC classification number: G02F1/13458 ,  G02F1/136213 ,  G02F1/136227

Abstract: A liquid crystal display, and a method of manufacturing thereof, includes providing a substrate; depositing sequentially a first metal layer and a first insulating layer on the substrate; patterning the first metal layer and the first insulating layer using a first mask to form a gate line and a first gate insulating layer; depositing sequentially a second gate insulating layer, a pure semiconductor layer, a doped semiconductor layer and a second metal layer over the whole substrate; patterning the second metal layer using a second mask to form a data line, source and drain electrodes, a capacitor electrode, the capacitor electrode overlapping a portion of the gae line; etching the doped semiconductor layer between the source and drain electrodes to form a channel region; depositing a third insulating layer over the whole substrate; patterning the third insulating layer using a third mask to form a passivation film, the passivation film having a smaller width than the data line and covering the source and drain electrodes and exposing a portion of the drain electrode and the capacitor electrode; depositing a transparent conductive material layer over the whole substrate; and patterning the transparent conductive material layer using a fourth mask to pixel electrode, the pixel electrode contacting the drain electrode.

Abstract translation: 液晶显示器及其制造方法包括提供基板; 在基板上依次沉积第一金属层和第一绝缘层; 使用第一掩模对第一金属层和第一绝缘层进行构图以形成栅极线和第一栅极绝缘层; 在整个衬底上依次沉积第二栅绝缘层，纯半导体层，掺杂半导体层和第二金属层; 使用第二掩模图案化第二金属层以形成数据线，源极和漏极，电容器电极，电容器电极与gae线的一部分重叠; 蚀刻源极和漏极之间的掺杂半导体层以形成沟道区; 在整个衬底上沉积第三绝缘层; 使用第三掩模对第三绝缘层进行图案化以形成钝化膜，所述钝化膜具有比所述数据线更小的宽度并且覆盖所述源电极和漏电极并暴露所述漏电极和所述电容器电极的一部分; 在整个基板上沉积透明导电材料层; 以及使用第四掩模到像素电极对所述透明导电材料层进行图案化，所述像素电极与所述漏极接触。

公开(公告)号：US20040041959A1

公开(公告)日：2004-03-04

申请号：US10652311

申请日：2003-09-02

Applicant: LG. PHILIPS LCD CO., LTD.

Inventor： Soon-Sung Yoo ,  Dong-Yeung Kwak ,  Hu-Sung Kim ,  Yu-Ho Jung ,  Yong-Wan Kim ,  Duk-Jin Park ,  Woo-Chae Lee

IPC: G02F001/136

CPC classification number: G02F1/136286 ,  G02F1/133345 ,  G02F1/136204 ,  G02F2201/50

Abstract: An array substrate for use in a liquid crystal display device is fabricated by the steps of forming a first metal layer on a substrate, patterning the first metal layer to form a gate line, a gate electrode, a gate pad, a first shorting bar, and a second shorting bar, forming a gate insulation layer, a pure amorphous silicon layer, a doped amorphous silicon layer and a second metal layer to cover the patterned first metal layer, patterning the second metal layer and the doped amorphous silicon layer to form first, second and third through-holes and first and second grooves to expose a portion of the pure amorphous silicon layer, the first and second grooves creating an isolated portions of the second metal layer, forming a passivation layer to cover the patterned second metal layer, forming a source electrode, a drain electrode, a data line, a data pad, an insulating segment, and first, second and third contact holes, and forming a pixel electrode, a first connector and a second connector of a transparent conductive material.

Abstract translation: 通过以下步骤制造用于液晶显示装置的阵列基板：在基板上形成第一金属层，图案化第一金属层以形成栅极线，栅电极，栅极焊盘，第一短路条， 以及第二短路棒，形成栅绝缘层，纯非晶硅层，掺杂非晶硅层和第二金属层以覆盖图案化的第一金属层，图案化第二金属层和掺杂的非晶硅层以形成第一 第二和第三通孔以及第一和第二凹槽以暴露纯非晶硅层的一部分，第一和第二凹槽产生第二金属层的隔离部分，形成钝化层以覆盖图案化的第二金属层， 形成源电极，漏电极，数据线，数据焊盘，绝缘段和第一，第二和第三接触孔，并形成像素电极，第一连接器和第二连接器 透明导电材料。