Laser ventilation system
    1.
    发明申请
    Laser ventilation system 审中-公开
    激光通风系统

    公开(公告)号:US20020159207A1

    公开(公告)日:2002-10-31

    申请号:US10174187

    申请日:2002-06-17

    CPC classification number: F24F7/00 B23K26/1435 B23K26/1438

    Abstract: A ventilation system for industrial laser systems is disclosed which can minimize the cooling air intake required during normal operation. Adequate ventilation is maintained even if the housing is opened. Various sensors monitor the condition of the cooling air and can increase the air intake if required for cooling or safety. Such a ventilation system is of particular advantage for exciter lasers in microlithography applications because the consumption of conditioned clean room air is controlled by the actual needs of the laser device.

    Abstract translation: 公开了用于工业激光系统的通风系统,其可以使正常操作期间所需的冷却空气进入最小化。 即使外壳打开,仍保持足够的通风。 各种传感器监测冷却空气的状况,如果冷却或安全需要,可以增加进气口。 这种通风系统对于微光刻应用中的激光器激光器具有特别的优点,因为经过激光装置的实际需要来控制空气净化室空气的消耗。

    Discharge unit for a high repetition rate excimer or molecular fluorine laser

    公开(公告)号:US20010050938A1

    公开(公告)日:2001-12-13

    申请号:US09826301

    申请日:2001-04-03

    CPC classification number: H01S3/036 H01S3/038 H01S3/0971 H01S3/225

    Abstract: A laser for an excimer or molecular fluorine laser includes an electrode chamber connected with a gas flow vessel and having a pair of main electrodes and a preionization unit each connected to a discharge circuit. A spoiler is provided within the electrode chamber and is shaped to provide a more uniform gas flow through the discharge area between the main electrodes, to shield one of the preionization units from one of the main electrodes, and to reflect acoustic waves generated in the discharge area into the gas flow vessel for absorption therein. A spoiler unit may include a pair of opposed spoiler elements on either side of the discharge area. One or both main electrodes includes a base portion and a center portion which may be a nipple protruding from the base portion. The center portion substantially carries the periodic discharge current such that the discharge width is and may be significantly less than the width of the base portion. The curvatures of both main electrodes may conform to the curvature of the gas flow through the discharge chamber to further improve aerodynamic performance. A plurality of low inductive conducting ribs are connected to the grounded main electrode and shaped to provide a more uniform flow of gases through openings defined between adjacent ribs.

    Method and apparatus for generating high output power gas discharge based source of extreme ultraviolet radiation and/or soft x-rays
    3.
    发明申请
    Method and apparatus for generating high output power gas discharge based source of extreme ultraviolet radiation and/or soft x-rays 有权
    用于产生高输出功率气体放电源的极紫外辐射和/或软X射线的方法和装置

    公开(公告)号:US20020168049A1

    公开(公告)日:2002-11-14

    申请号:US10109581

    申请日:2002-03-27

    Abstract: An EUV photon source includes a plasma chamber filled with a gas mixture, multiple electrodes within the plasma chamber defining a plasma region and a central axis, a power supply circuit connected to the electrodes for delivering a main pulse to the electrodes for energizing the plasma around the central axis to produce an EUV beam output along the central axis, and a preionizer for ionizing the gas mixture in preparing to form a dense plasma around the central axis upon application of the main pulse from the power supply circuit to the electrodes. The EUV source preferably includes an ionizing unit and precipitator for collecting contaminant particulates from the output beam path. A set of baffles may be disposed along the beam path outside of the pinch region to diffuse gaseous and contaminant particulate flow emanating from the pinch region and to absorb or reflect acoustic waves emanating from the pinch region away from the pinch region. A clipping aperture, preferably formed of ceramic and/or Al2O3, for at least partially defining an acceptance angle of the EUV beam. The power supply circuit may generates the main pulse and a relatively low energy prepulse for homogenizing the preionized plasma prior to the main pulse. A multi-layer EUV mirror is preferably disposed opposite a beam output side of the pinch region for reflecting radiation along the central axis for output along the beam path of the EUV beam. The EUV mirror preferably has a curved contour for substantially collimating or focusing the reflected radiation. In particular, the EUV mirror may preferably have a hyperbolic contour.

    Abstract translation: EUV光子源包括填充有气体混合物的等离子体室,等离子体室内限定等离子体区域和中心轴线的多个电极,连接到电极的电源电路,用于将主脉冲传送到电极以激励等离子体周围 沿着中心轴产生EUV射束的中心轴线,以及用于使气体混合物离子化的准分子离子化器,用于在将电脉冲从电源电路施加到电极上时在中心轴周围形成致密等离子体。 EUV源优选地包括用于从输出光束路径收集污染物微粒的电离单元和沉淀器。 可以沿着夹紧区域外的光束路径布置一组挡板以扩散从夹持区域发出的气体和污染物颗粒流,并吸收或反射从夹紧区域远离夹点区域发出的声波。 剪切孔,优选地由陶瓷和/或Al 2 O 3形成,用于至少部分地限定EUV束的接受角。 电源电路可以产生主脉冲和相对较低能量的前脉冲,用于在主脉冲之前均化预电离的等离子体。 多层EUV反射镜优选地设置成与夹持区域的光束输出侧相对,用于沿着中心轴反射辐射,以沿着EUV光束的光束路径输出。 EUV镜子优选地具有弯曲轮廓,用于基本上准直或聚焦反射的辐射。 特别地,EUV镜可以优选地具有双曲线轮廓。

    Discharge unit for a high repetition rate excimer or molecular fluorine laser
    4.
    发明申请
    Discharge unit for a high repetition rate excimer or molecular fluorine laser 有权
    用于高重复率准分子或分子氟激光的放电单元

    公开(公告)号:US20010033594A1

    公开(公告)日:2001-10-25

    申请号:US09826372

    申请日:2001-04-03

    CPC classification number: H01S3/036 H01S3/038 H01S3/0971 H01S3/225

    Abstract: A laser for an excimer or molecular fluorine laser includes an electrode chamber connected with a gas flow vessel and having a pair of main electrodes and a preionization unit each connected to a discharge circuit. A spoiler is provided within the electrode chamber and is shaped to provide a more uniform gas flow through the discharge area between the main electrodes, to shield one of the preionization units from one of the main electrodes, and to reflect acoustic waves generated in the discharge area into the gas flow vessel for absorption therein. A spoiler unit may include a pair of opposed spoiler elements on either side of the discharge area. One or both main electrodes includes a base portion and a center portion which may be a nipple protruding from the base portion. The center portion substantially carries the periodic discharge current such that the discharge width is and may be significantly less than the width of the base portion. The curvatures of both main electrodes may conform to the curvature of the gas flow through the discharge chamber to further improve aerodynamic performance. A plurality of low inductive conducting ribs are connected to the grounded main electrode and shaped to provide a more uniform flow of gases through openings defined between adjacent ribs.

    Abstract translation: 用于准分子或分子氟激光的激光器包括与气体流动容器连接并具有一对主电极和预电离单元的电极室,每个主电极连接到放电电路。 扰流器设置在电极室内,并且被成形为提供通过主电极之间的放电区域的更均匀的气流,以便将一个预电离单元与其中一个主电极隔离,并且反射在放电中产生的声波 区域进入气流容器,用于吸收。 扰流器单元可以在放电区域的任一侧上包括一对相对的扰流器元件。 一个或两个主电极包括基部和可以是从基部突出的接头的中心部分。 中心部分基本上承载周期性放电电流,使得放电宽度可以明显小于基部的宽度。 两个主电极的曲率可以符合通过放电室的气流的曲率,以进一步提高空气动力性能。 多个低感应导电肋连接到接地的主电极并成形为提供通过相邻肋之间限定的开口的更均匀的气体流。

    Discharge unit for a high repetition rate excimer or molecular fluorine laser

    公开(公告)号:US20010030986A1

    公开(公告)日:2001-10-18

    申请号:US09826296

    申请日:2001-04-03

    CPC classification number: H01S3/036 H01S3/038 H01S3/0971 H01S3/225

    Abstract: A laser for an excimer or molecular fluorine laser includes an electrode chamber connected with a gas flow vessel and having a pair of main electrodes and a preionization unit each connected to a discharge circuit. A spoiler is provided within the electrode chamber and is shaped to provide a more uniform gas flow through the discharge area between the main electrodes, to shield one of the preionization units from one of the main electrodes, and to reflect acoustic waves generated in the discharge area into the gas flow vessel for absorption therein. A spoiler unit may include a pair of opposed spoiler elements on either side of the discharge area. One or both main electrodes includes a base portion and a center portion which may be a nipple protruding from the base portion. The center portion substantially carries the periodic discharge current such that the discharge width is and may be significantly less than the width of the base portion. The curvatures of both main electrodes may conform to the curvature of the gas flow through the discharge chamber to further improve aerodynamic performance. A plurality of low inductive conducting ribs are connected to the grounded main electrode and shaped to provide a more uniform flow of gases through openings defined between adjacent ribs.

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