Abstract:
An excimer or molecular fluorine laser includes a gain medium surrounded by a resonator and including a line-narrowing module preferably including a prism beam expander and one or more etalons and/or a grating or grism within the resonator. The material of transmissive portions of the line-narrowing module including the prisms and the plates of the etalons comprises a material having an absorption coefficient of less than 5null10null3/cm at 248 nm incident radiation, less than 10null10null3/cm at 193 nm incident radiation, and less than 0.1/cm at 157 nm. Preferably the material also has a thermal conductivity greater than 2.0 W/mnull C.
Abstract:
A method and apparatus is provided for stabilizing output beam parameters of a gas discharge laser by maintaining a molecular fluorine component of the laser gas mixture at a predetermined partial pressure using a gas supply unit and a processor. The molecular fluorine is provided at an initial partial pressure and is subject to depletion within the laser discharge chamber. Injections of gas including molecular fluorine are performed each to increase the partial pressure of molecular fluorine by a selected amount in the laser chamber preferably less than 0.2 mbar per injection, or 7% of an amount of F2 already within the laser chamber. A number of successive injections may be performed at selected intervals to maintain the constituent gas substantially at the initial partial pressure for maintaining stable output beam parameters. The amount per injection and/or the interval between injections may be varied based on the measured value of the driving voltage and/or a calculated amount of the molecular fluorine in the discharge chamber. The driving voltage is preferably determined to be in one of multiple driving voltage ranges that are adjusted based on the aging of the system. Within each range, gas injections and gas replacements are preferably performed based on total applied electrical energy to the discharge and/or alternatively, on time and/or pulse count.
Abstract:
A tunable laser system includes a gain medium and an optical resonator for generating a laser beam, and a spectral narrowing and tuning unit within the resonator. A detection and control unit controls a relative wavelength of the laser system. A wavelength calibration module calibrates the detection and control unit. The module contains more than one species each having an optical transition line within the tuning spectrum of the laser. A beam portion of the narrowed emission from the laser is directed through the wavelength calibration module and a beam portion is directed through the detection and control unit when the laser beam is scanned through the optical transition line of each of the species within the module. The detection and control unit is monitored and calibrated during the scanning.
Abstract:
An excimer or molecular fluorine laser system generates a laser output bandwidth of less than 0.6 pm, and preferably 0.5-0.4 pm or less. The laser resonator has a line-narrowing unit preferably including a grating, and preferably also a beam expander, and may include one or more etalons or other interferometric devices. The grating may be preferably a blazed grating having a blaze angle greater than 76null, and is preferably around 80null. The grating structure is preferably defined by the surface of the grating substrate. The substrate is preferably aluminum. The system may further include an amplifier for increasing the energy of the sub-0.6 nm output beam.
Abstract:
Method and system for providing an excimer or molecular fluorine laser including a laser tube filled with a laser gas surrounded by an optical resonator, where the laser tube has multiple electrodes including a pair of main discharge electrodes connected to a discharge circuit for exciting the laser gas to produce a laser output beam. The discharge circuit has an all solid state switch and preferably does not include a transformer. The solid state switch includes multiple solid state devices that may be capable of switching voltages in excess of 12 kV, such as 14-32 kV or more, or the voltage needed to switch the laser. The series of switches has a rise time of approximately less than 300 ns, and preferably around 100 ns or less. The switch may be capable of switching voltages of slightly more than half, but less than the entire voltage needed to produce laser pulses of desired energies, and a voltage doubling circuit may be used to produce the voltage required to produce the desired output pulse energies. An oscillator-amplifier configuration may be used, wherein an oscillator switch may be capable of switching voltages less than the entire voltage needed to produce the desired laser pulse energies, while the amplifier amplifies the pulses to the desired pulse energies.
Abstract:
A laser for an excimer or molecular fluorine laser includes an electrode chamber connected with a gas flow vessel and having a pair of main electrodes and a preionization unit each connected to a discharge circuit. A spoiler is provided within the electrode chamber and is shaped to provide a more uniform gas flow through the discharge area between the main electrodes, to shield one of the preionization units from one of the main electrodes, and to reflect acoustic waves generated in the discharge area into the gas flow vessel for absorption therein. A spoiler unit may include a pair of opposed spoiler elements on either side of the discharge area. One or both main electrodes includes a base portion and a center portion which may be a nipple protruding from the base portion. The center portion substantially carries the periodic discharge current such that the discharge width is and may be significantly less than the width of the base portion. The curvatures of both main electrodes may conform to the curvature of the gas flow through the discharge chamber to further improve aerodynamic performance. A plurality of low inductive conducting ribs are connected to the grounded main electrode and shaped to provide a more uniform flow of gases through openings defined between adjacent ribs.
Abstract:
A laser for an excimer or molecular fluorine laser includes an electrode chamber connected with a gas flow vessel and having a pair of main electrodes and a preionization unit each connected to a discharge circuit. A spoiler is provided within the electrode chamber and is shaped to provide a more uniform gas flow through the discharge area between the main electrodes, to shield one of the preionization units from one of the main electrodes, and to reflect acoustic waves generated in the discharge area into the gas flow vessel for absorption therein. A spoiler unit may include a pair of opposed spoiler elements on either side of the discharge area. One or both main electrodes includes a base portion and a center portion which may be a nipple protruding from the base portion. The center portion substantially carries the periodic discharge current such that the discharge width is and may be significantly less than the width of the base portion. The curvatures of both main electrodes may conform to the curvature of the gas flow through the discharge chamber to further improve aerodynamic performance. A plurality of low inductive conducting ribs are connected to the grounded main electrode and shaped to provide a more uniform flow of gases through openings defined between adjacent ribs.
Abstract:
A narrow band molecular fluorine laser system includes an oscillator and an amplifier, wherein the oscillator produces a 157 nm beam having a linewidth less than 1 pm and the amplifier increases the power of the beam above a predetermined amount, such as more than one or several Watts. The oscillator includes a discharge chamber filled with a laser gas including molecular fluorine and a buffer gas, electrodes within the discharge chamber connected to a discharge circuit for energizing the molecular fluorine, and a resonator including the discharge chamber for generating a laser beam having a wavelength around 157 nm. Line-narrowing optics are included intra- and/or extra-resonator for reducing the linewidth of the laser beam to less than 1 pm. The amplifier may be the same or a different discharge chamber, and optical and/or electronic delays may be used for timing pulses from the oscillator to reach the amplifier at a maximum in the discharge current of the amplifier.
Abstract:
A F2-laser includes a discharge chamber filled with a gas mixture including molecular fluorine for generating a spectral emission in a wavelength range between 157 nm and 158 nm including a primary line and a secondary line, multiple electrodes coupled with a power supply circuit for producing a pulsed discharge to energize the molecular fluorine, a resonator including the discharge chamber and an interferometric device for generating a laser beam having a bandwidth of less than 1 pm, and a wavelength monitor coupled in a feedback loop with a processor for monitoring a spectral distribution of the laser beam. The processor controls an interferometric spectrum of the interferometric device based on the monitored spectral distribution such that sidebands within the spectral distribution are substantially minimized.
Abstract:
A wavelength calibration system determines an absolute wavelength of a narrowed spectral emission band of an excimer or molecular laser system. The system includes a module including an element which optically interacts with a component of an output beam of the laser within the tunable range of the laser system around the narrowed band. An inter-level resonance is detected by monitoring changes in voltage within the module, or photo-absorption is detected by photodetecting equipment. The absolute wavelength of the narrowed band is precisely determinable when the optical transitions occur and are detected. When the system specifically includes an ArF-excimer laser chamber, the module is preferably a galvatron containing an element that photo-absorbs around 193 nm and the element is preferably a gas or vapor selected from the group consisting of arsenic, carbon, oxygen, iron, gaseous hydrocarbons, halogenized hydrocarbons, carbon-contaminated inert gases, germanium and platinum vapor. When the system specifically includes F2-laser chamber, the module is preferably a galvatron containing an element that photo-absorbs around 157 nm and the element is preferably a gas or vapor selected from the group consisting of selenium, bromine and silicon. The module is alternatively a purge chamber configurable for purging with a photo-absorbing gas.