公开(公告)号：US20060012761A1

公开(公告)日：2006-01-19

申请号：US10890404

申请日：2004-07-14

申请人： Levinus Bakker ,  Vadim Banine ,  Cornelis Petrus Luijkx ,  Frank Schuurmans

发明人： Levinus Bakker ,  Vadim Banine ,  Cornelis Petrus Luijkx ,  Frank Schuurmans

IPC分类号： G03B27/52

CPC分类号： G03F7/70908 ,  G03F7/70916 ,  G03F7/70933

摘要： A lithographic apparatus includes a radiation system that includes a source for producing a radiation beam, a contaminant trap arranged in a path of the radiation beam, and an illumination system configured to condition the radiation beam produced by the source, and a support for supporting a patterning device. The patterning device serves to impart the conditioned radiation beam with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, and a projection system for projecting the patterned radiation beam onto a target portion of the substrate. The contaminant trap includes a plurality of foils that define channels that are arranged substantially parallel to the direction of propagation of the radiation beam. The trap is provided with a gas supply system that is arranged to inject gas into at least one of the channels of the trap.

摘要翻译： 光刻设备包括辐射系统，其包括用于产生辐射束的源，布置在辐射束的路径中的污染物阱，以及被配置为调节由源产生的辐射束的照明系统，以及用于支撑 图案形成装置。 图案形成装置用于使经调节的辐射束在其横截面上具有图案。 该装置还包括用于保持基板的基板台和用于将图案化的辐射束投影到基板的目标部分上的投影系统。 污染物捕集器包括限定基本上平行于辐射束的传播方向布置的通道的多个箔片。 陷阱设置有气体供应系统，其被布置成将气体注入到阱的至少一个通道中。

公开(公告)号：US20060219950A1

公开(公告)日：2006-10-05

申请号：US11094490

申请日：2005-03-31

申请人： Levinus Bakker ,  Vadim Banine ,  Vladimir Ivanov ,  Konstantin Koshelev ,  Bastiaan Mertens ,  Johannes Moors ,  Frank Schuurmans ,  Givi Zukavishvili ,  Bastiaan Wolschrijn ,  Marc Van Der Velden

发明人： Levinus Bakker ,  Vadim Banine ,  Vladimir Ivanov ,  Konstantin Koshelev ,  Bastiaan Mertens ,  Johannes Moors ,  Frank Schuurmans ,  Givi Zukavishvili ,  Bastiaan Wolschrijn ,  Marc Van Der Velden

IPC分类号： G03F7/20 ,  G21K5/00

CPC分类号： G03F7/70933 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70916

摘要： A lithographic apparatus is arranged to project a beam from a radiation source onto a substrate. The apparatus includes an optical element in a path of the beam, a gas inlet for introducing a gas into the path of the beam so that the gas will be ionized by the beam to create electric fields toward the optical element, and a gas source coupled to the gas inlet for supplying the gas. The gas has a threshold of kinetic energy for sputtering the optical element that is greater than the kinetic energy developed by ions of the gas in the electric fields.

摘要翻译： 光刻设备被布置成将来自辐射源的光束投影到基底上。 该装置包括在光束的路径中的光学元件，用于将气体引入光束的路径中的气体入口，使得气体将被光束离子化以产生朝向光学元件的电场，并且气体源耦合 到用于供应气体的气体入口。 气体具有用于溅射光学元件的动能阈值，其大于由电场中的气体的离子产生的动能。

公开(公告)号：US20050098741A1

公开(公告)日：2005-05-12

申请号：US11000381

申请日：2004-12-01

申请人： Levinus Bakker ,  Frank Schuurmans ,  Vadim Banine

发明人： Levinus Bakker ,  Frank Schuurmans ,  Vadim Banine

IPC分类号： G03F7/20 ,  H01L21/027 ,  H01L21/425

CPC分类号： G03F7/70166 ,  G03F7/70058 ,  G03F7/708 ,  G03F7/70825 ,  G03F7/70916 ,  G03F7/70983

摘要： A lithographic projection apparatus for EUV lithography includes a foil trap, or channel barrier. The foil trap forms an open structure after the source to let the radiation pass unhindered. The foil trap is configured to be rotatable around an optical axis. By rotating the foil trap, an impulse transverse to the direction of propagation of the radiation can be transferred on debris present in the beam. This debris will not pass the foil trap. In this way, the amount of debris on the optical components downstream of the foil trap is reduced. The foil trap may be alternately rotated around the optical axis in a first direction and a second direction opposite the first direction.

摘要翻译： 用于EUV光刻的光刻投影装置包括箔陷阱或通道屏障。 箔夹在源之后形成开放结构，以使辐射不受阻碍地通过。 箔捕获器被配置为围绕光轴可旋转。 通过旋转箔捕获器，横向于辐射传播方向的脉冲可以转移到光束中存在的碎片上。 这个碎片不会通过箔片陷阱。 以这种方式，箔陷阱下游的光学部件上的碎屑的量减少。 箔捕获器可以在与第一方向相反的第一方向和第二方向上围绕光轴交替旋转。

公开(公告)号：US20050077483A1

公开(公告)日：2005-04-14

申请号：US10873646

申请日：2004-06-23

申请人： Levinus Bakker ,  Vadim Banine ,  Ralph Kurt ,  Frank Schuurmans ,  Yurii Sidelnikov

发明人： Levinus Bakker ,  Vadim Banine ,  Ralph Kurt ,  Frank Schuurmans ,  Yurii Sidelnikov

IPC分类号： G21K1/00 ,  G03F7/20 ,  G21K1/06 ,  G21K5/02 ,  H01L21/027 ,  H05H1/24 ,  G21G5/00

CPC分类号： G03F7/70916

摘要： A radiation system includes a contamination barrier, e.g., a foil trap, between a collector, for example a normal incidence collector, and a radiation source, such that radiation coming from the source passes the foil trap twice. The radiation passes the contamination barrier once before hitting the collector and a second time after reflection by the collector. The foil trap includes lamellas that are parallel to both the radiation coming from the light source, and to the radiation reflected by the collector. The radiation is thus not obstructed by the foil trap. In this way, a normal incidence collector, which is used with a plasma produced source, can be protected from debris coming from a EUV source.

摘要翻译： 辐射系统包括在收集器例如正入射收集器和辐射源之间的污染屏障，例如箔阱，使得来自源的辐射通过箔阱两次。 辐射在撞击收集器之前通过污染屏障一次，并在收集器反射之后经过第二次。 箔捕获器包括平行于来自光源的辐射和由收集器反射的辐射的片层。 因此辐射不被箔陷阱阻挡。 以这种方式，可以保护与等离子体产生的源一起使用的正常入射收集器免受来自EUV源的碎片。

公开(公告)号：US20050140957A1

公开(公告)日：2005-06-30

申请号：US10748849

申请日：2003-12-31

申请人： Cornelis Petrus Luijkx ,  Vadim Banine ,  Hako Botma ,  Martinus Van Duijnhoven ,  Markus Eurlings ,  Heine Mulder ,  Johannes Hendrik Everhardus Muijderman ,  Cornelis Van Duijn ,  Jan Krikke

发明人： Cornelis Petrus Luijkx ,  Vadim Banine ,  Hako Botma ,  Martinus Van Duijnhoven ,  Markus Eurlings ,  Heine Mulder ,  Johannes Hendrik Everhardus Muijderman ,  Cornelis Van Duijn ,  Jan Krikke

IPC分类号： G02B26/02 ,  G03F7/20 ,  G03B27/72

CPC分类号： G03F7/70191 ,  G03F7/70066 ,  G03F7/70116 ,  G03F7/70558

摘要： An optical attenuator device operates to remove a part of a beam of radiation having a higher than average intensity using at least one optical attenuator element. The device has application in a radiation system, and/or a lithographic apparatus, in particular a scanning lithographic apparatus, wherein the optical attenuator element(s) are provided in a central part of the beam, for example perpendicularly to a scanning direction.

摘要翻译： 光衰减器装置使用至少一个光衰减器元件来操作以去除具有高于平均强度的辐射束的一部分。 该装置具有应用于辐射系统和/或光刻设备，特别是扫描光刻设备中，其中光学衰减器元件设置在光束的中心部分，例如垂直于扫描方向。

公开(公告)号：US20060175558A1

公开(公告)日：2006-08-10

申请号：US11051477

申请日：2005-02-07

申请人： Levinus Bakker ,  Vadim Banine ,  Johannes Josephina Moors ,  Carolus Ida Maria Spee ,  Johannes Leonardus Franken ,  Arnoud Wassink ,  Paul Antonius Brom

发明人： Levinus Bakker ,  Vadim Banine ,  Johannes Josephina Moors ,  Carolus Ida Maria Spee ,  Johannes Leonardus Franken ,  Arnoud Wassink ,  Paul Antonius Brom

IPC分类号： G03B7/20

CPC分类号： G03F7/70175 ,  G03F7/70916

摘要： A method for removal of deposition on a radiation collector of a lithographic apparatus includes providing a gas barrier to an end of a radiation collector, thereby providing a radiation collector enclosure volume; providing a gas to the enclosure volume, the gas selected from a halogen containing gas and a hydrogen containing gas; and removing at least part of the deposition from the radiation collector. A lithographic apparatus includes a radiation collector; a circumferential hull enclosing the radiation collector; a gas barrier at an end of the radiation collector, thereby providing a radiation collector enclosure volume. The radiation collector is enclosed by the circumferential hull and the gas barrier. An inlet provides a gas to the radiation collector enclosure volume and an outlet removes a gas from the radiation collector enclosure volume.

摘要翻译： 用于去除光刻设备的辐射收集器上的沉积的方法包括向辐射收集器的端部提供气体阻挡层，从而提供辐射收集器外壳体积; 向封闭体积提供气体，所述气体选自含卤素气体和含氢气体; 以及从所述辐射收集器去除所述沉积物的至少一部分。 光刻设备包括辐射收集器; 围绕辐射收集器的周向船体; 在辐射收集器的端部处的气体屏障，从而提供辐射收集器外壳体积。 辐射收集器被周向壳体和气体屏障包围。 入口为辐射收集器外壳体积提供气体，出口从辐射收集器外壳体积中除去气体。

公开(公告)号：US20050133727A1

公开(公告)日：2005-06-23

申请号：US10740829

申请日：2003-12-22

申请人： Vadim Banine ,  Levinus Bakker ,  Johannes Hubertus Moors ,  Lucas Henricus Johannes Stevens ,  Yurii Sidelnikov ,  Marcel Mathijs Dierichs ,  Marius Ravensbergen

发明人： Vadim Banine ,  Levinus Bakker ,  Johannes Hubertus Moors ,  Lucas Henricus Johannes Stevens ,  Yurii Sidelnikov ,  Marcel Mathijs Dierichs ,  Marius Ravensbergen

IPC分类号： G03F7/20 ,  H01J3/14

CPC分类号： G03F7/70916 ,  G03F7/7085

摘要： An assembly for detection of at least one of radiation flux and contamination on an optical component includes a detector configured to receive at least one of the radiation flux and contamination, and when the assembly is in use, to generate a detector signal correlated to at least one of the radiation flux and contamination on the component. A meter is configured to measure the detector signal. The detector includes at least one wire.

摘要翻译： 用于检测光学部件上的辐射通量和污染物中的至少一种的组件包括被配置为接收辐射通量和污染物中的至少一种的检测器，并且当使用该组件时，生成与至少相关的检测器信号 辐射通量和部件污染之一。 仪表被配置为测量检测器信号。 检测器包括至少一根线。

公开(公告)号：US20050122491A1

公开(公告)日：2005-06-09

申请号：US10985037

申请日：2004-11-10

申请人： Levinus Bakker ,  Vadim Banine ,  Vladimir Ivanov ,  Konstantin Koshelev ,  Vladimir Krivtsun

发明人： Levinus Bakker ,  Vadim Banine ,  Vladimir Ivanov ,  Konstantin Koshelev ,  Vladimir Krivtsun

IPC分类号： G03F7/20 ,  H01L21/027 ,  G03B27/52

CPC分类号： B82Y10/00 ,  G03F7/70166 ,  G03F7/70908 ,  G03F7/70916

摘要： A lithographic projection apparatus is provided. The apparatus includes a radiation system for providing a beam of radiation, and a support for supporting a patterning device. The patterning device serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam of radiation onto a target portion of the substrate, and a particle supply unit for supplying getter particles into the beam of radiation in order to act as a getter for contamination particles in the beam of radiation. The getter particles have a diameter of at least about 1 nm.

摘要翻译： 提供光刻投影装置。 该装置包括用于提供辐射束的辐射系统和用于支撑图案形成装置的支撑件。 图案形成装置用于根据期望的图案对辐射束进行图案化。 该装置还包括用于保持基板的基板台，用于将图案化的辐射束投影到基板的目标部分上的投影系统，以及用于将吸气剂颗粒供应到辐射束中的颗粒供应单元，以用作 吸收剂用于辐射束中的污染颗粒。 吸气剂颗粒具有至少约1nm的直径。

公开(公告)号：US20070146659A1

公开(公告)日：2007-06-28

申请号：US11319190

申请日：2005-12-28

申请人： Derk Jan Klunder ,  Levinus Bakker ,  Vadim Banine ,  Frank Jeroen Schuurmans ,  Dominik Vaudrevange ,  Maarten Marinus Wilhelmus Van Herpen

发明人： Derk Jan Klunder ,  Levinus Bakker ,  Vadim Banine ,  Frank Jeroen Schuurmans ,  Dominik Vaudrevange ,  Maarten Marinus Wilhelmus Van Herpen

IPC分类号： G03B27/52

CPC分类号： G03F7/70916 ,  B82Y10/00 ,  G03F7/70166

摘要： A lithographic apparatus includes a radiation system for providing a beam of radiation. The radiation system includes at least one of a contaminant trap for trapping material emanating from the radiation source and a collector for collecting the beam of radiation. The at least one of the contaminant trap and the collector includes an element arranged in the path of the radiation beam on which the material emanating from the radiation source can deposit during propagation of the radiation beam in the radiation system. At least a part of the element disposed in the path of the radiation beam has a surface that has a highly specular grazing incidence reflectivity to reduce the absorption of the radiation beam in a direction of propagation of the radiation beam substantially non-parallel to the surface of the element, so that a thermal load experienced by the element is reduced.

摘要翻译： 光刻设备包括用于提供辐射束的辐射系统。 辐射系统包括用于捕获从辐射源发出的材料的污染物阱和用于收集辐射束的收集器中的至少一个。 污染物捕集阱和收集器中的至少一个包括布置在辐射束的路径中的元件，在辐射束的辐射束在辐射系统中的传播期间，从辐射源发出的材料可以沉积。 设置在辐射束的路径中的元件的至少一部分具有表面，该表面具有高镜面的掠入射反射率，以减少辐射束在基本上不平行于表面的辐射束的传播方向上的吸收 的元件，使得元件经历的热负荷降低。

公开(公告)号：US20070140910A1

公开(公告)日：2007-06-21

申请号：US11311623

申请日：2005-12-20

申请人： Vadim Banine ,  Levinus Bakker ,  Ralph Kurt ,  Johannes Moors ,  Lucas Stevens ,  Peter Zalm

发明人： Vadim Banine ,  Levinus Bakker ,  Ralph Kurt ,  Johannes Moors ,  Lucas Stevens ,  Peter Zalm

IPC分类号： G01N33/00

CPC分类号： G01N25/142 ,  G01N25/68 ,  Y10T436/25875

摘要： A system for detecting at least one contamination species in an interior space of a lithographic apparatus, including: at least one monitoring surface configured to be in contact with the interior space, a thermal controller configured to control the temperature of the monitoring surface to at least one detection temperature, and at least one detector configured to detect condensation of the at least one contamination species onto the monitoring surface.

摘要翻译： 一种用于检测光刻设备的内部空间中的至少一种污染物质的系统，包括：被配置为与所述内部空间接触的至少一个监测表面;被配置为将所述监测表面的温度控制在至少 一个检测温度，以及至少一个检测器，被配置为检测所述至少一种污染物质到所述监测表面上的冷凝。