Film Deposition System Having a Substrate Carrier and a Cooling Device
    4.
    发明申请
    Film Deposition System Having a Substrate Carrier and a Cooling Device 有权
    具有基板载体和冷却装置的膜沉积系统

    公开(公告)号:US20160318061A1

    公开(公告)日:2016-11-03

    申请号:US14702100

    申请日:2015-05-01

    Abstract: A film deposition system includes a substrate carrier, a film deposition device, a transport device and a cooling device. The substrate carrier includes a carrier body that defines an isolated space therein, and a phase transition material that is filled into the isolated space and that has a melting point ranging between 18° C. and 95° C. The phase transition material is capable of absorbing thermal energy from the carrier body as latent heat to change the phase of the phase transition material from solid to liquid. The cooling device is configured to absorb thermal energy from the substrate carrier so as to change the phase of the phase transition material from liquid to solid.

    Abstract translation: 膜沉积系统包括基板载体,成膜装置,输送装置和冷却装置。 衬底载体包括在其中限定隔离空间的载体主体和填充到隔离空间中且熔点在18℃至95℃之间的相变材料。相变材料能够 从载体吸收热能作为潜热,以将相变材料的相从固体改变为液体。 冷却装置被配置为从衬底载体吸收热能,以便将相变材料的相位从液体改变为固体。

Patent Agency Ranking