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    Toroidal Plasma Channel with Varying Cross-Section Areas Along the Channel
    1.
    发明申请
    Toroidal Plasma Channel with Varying Cross-Section Areas Along the Channel 审中-公开
    环形等离子体通道与通道不同的横截面区域

    公开(公告)号：US20150287575A1

    公开(公告)日：2015-10-08

    申请号：US14742402

    申请日：2015-06-17

    申请人： MKS Instruments, Inc.

    发明人： Chaolin Hu ,  Xing Chen

    IPC分类号： H01J37/32

    CPC分类号： H01J37/32449 ,  C23C16/45587 ,  C23C16/45591 ,  C23C16/50 ,  F17D1/04 ,  G21B1/17 ,  H01J37/32009 ,  H01J37/321 ,  H01J37/32357 ,  H01J37/32513 ,  H01J37/32807 ,  H01J2237/006 ,  H05H1/12 ,  Y02E30/122 ,  Y02E30/126 ,  Y10T137/0318 ,  Y10T137/8376

    摘要： An assembly for adjusting gas flow patterns and gas-plasma interactions including a toroidal plasma chamber. The toroidal plasma chamber has an injection member, an output member, a first side member and a second side member that are all connected. The first side member has a first inner cross-sectional area in at least a portion of the first side member and a second inner cross-sectional area in at least another portion of the first side member, where the first inner cross-sectional area and the second inner-cross-sectional area being different. The second side member has a third inner cross-sectional area in at least a portion of the second side member and a fourth inner cross-sectional area in at least another portion of the second side member, where the third inner cross-sectional area and the fourth inner-cross-sectional area being different.

    摘要翻译： 用于调节气体流动模式和气体 - 等离子体相互作用的组件，包括环形等离子体室。 环形等离子体室具有全部连接的注入构件，输出构件，第一侧构件和第二侧构件。 第一侧构件在第一侧构件的至少一部分中具有第一内横截面面积，在第一侧构件的至少另一部分中具有第二内横截面积，其中第一内横截面积和 第二内截面积不同。 第二侧构件在第二侧构件的至少一部分中具有第三内截面面积，在第二侧构件的至少另一部分中具有第四内横截面积，其中第三内横截面积和 第四内截面面积不同。

    Toroidal plasma channel with varying cross-section areas along the channel
    3.
    发明授权
    Toroidal plasma channel with varying cross-section areas along the channel 有权

    公开(公告)号：US10930474B2

    公开(公告)日：2021-02-23

    申请号：US15646017

    申请日：2017-07-10

    申请人： MKS Instruments, Inc.

    发明人： Chaolin Hu ,  Xing Chen

    IPC分类号： H01J37/32 ,  C23C16/455 ,  G21B1/17 ,  H05H1/12 ,  C23C16/50 ,  F17D1/04

    摘要： An assembly for adjusting gas flow patterns and gas-plasma interactions including a toroidal plasma chamber. The toroidal plasma chamber has an injection member, an output member, a first side member and a second side member that are all connected. The first side member has a first inner cross-sectional area in at least a portion of the first side member and a second inner cross-sectional area in at least another portion of the first side member, where the first inner cross-sectional area and the second inner-cross-sectional area being different. The second side member has a third inner cross-sectional area in at least a portion of the second side member and a fourth inner cross-sectional area in at least another portion of the second side member, where the third inner cross-sectional area and the fourth inner-cross-sectional area being different.

    Compact microwave plasma applicator utilizing conjoining electric fields
    4.
    发明授权
    Compact microwave plasma applicator utilizing conjoining electric fields 有权

    公开(公告)号：US09831066B1

    公开(公告)日：2017-11-28

    申请号：US15166777

    申请日：2016-05-27

    申请人： MKS Instruments, Inc.

    发明人： Mohammad Kamarehi ,  Chaolin Hu ,  Olivia Keller

    IPC分类号： H01J37/32

    CPC分类号： H01J37/32229 ,  H01J37/32247 ,  H01J37/32256 ,  H01J37/32284 ,  H01J37/32467

    摘要： A plasma applicator includes a plasma discharge tube and a microwave cavity at least partially surrounding a portion of the plasma discharge tube. Microwave energy is coupled to the microwave cavity via a coupling iris. At least two orthogonal dimensions of the microwave cavity are selected such that the microwave energy in the microwave cavity propagates in a transverse electric (TE) mode. Primary electric fields generated from the microwave energy combine with an evanescent electric field generated from the coupling iris, such that a combined electric field in the microwave cavity is substantially uniform along the longitudinal axis of the plasma discharge tube. A plurality of radial microwave chokes is disposed over an exterior of the plasma discharge tube. Positions of the microwave chokes are such that microwave energy propagating in the TE mode and a transverse electric magnetic (TEM) mode is attenuated.

    COMPACT MICROWAVE PLASMA APPLICATOR UTILIZING CONJOINING ELECTRIC FIELDS
    5.
    发明申请
    COMPACT MICROWAVE PLASMA APPLICATOR UTILIZING CONJOINING ELECTRIC FIELDS 有权

    公开(公告)号：US20170345622A1

    公开(公告)日：2017-11-30

    申请号：US15166777

    申请日：2016-05-27

    申请人： MKS Instruments, Inc.

    发明人： Mohammad Kamarehi ,  Chaolin Hu ,  Olivia Keller

    IPC分类号： H01J37/32

    CPC分类号： H01J37/32229 ,  H01J37/32247 ,  H01J37/32256 ,  H01J37/32284 ,  H01J37/32467

    摘要： A plasma applicator includes a plasma discharge tube and a microwave cavity at least partially surrounding a portion of the plasma discharge tube. Microwave energy is coupled to the microwave cavity via a coupling iris. At least two orthogonal dimensions of the microwave cavity are selected such that the microwave energy in the microwave cavity propagates in a transverse electric (TE) mode. Primary electric fields generated from the microwave energy combine with an evanescent electric field generated from the coupling iris, such that a combined electric field in the microwave cavity is substantially uniform along the longitudinal axis of the plasma discharge tube. A plurality of radial microwave chokes is disposed over an exterior of the plasma discharge tube. Positions of the microwave chokes are such that microwave energy propagating in the TE mode and a transverse electric magnetic (TEM) mode is attenuated.