公开(公告)号：US20170018926A1

公开(公告)日：2017-01-19

申请号：US14797347

申请日：2015-07-13

Applicant: MKS Instruments, Inc.

Inventor： David J. COUMOU ,  Ross REINHARDT ,  Yuiry ELNER ,  Daniel M. GILL

IPC: H02J3/12

CPC classification number: H01J37/32183 ,  H01J37/32082 ,  H01J37/32174 ,  H05H2001/4682

Abstract: A radio frequency (RF) control system including a RF generator having a power amplifier that outputs a RF signal and a controller. A matching network receives the RF signal and generates a plurality of RF output signals. The matching network includes a ratio tuning element to vary a ratio of power between the plurality of RF output signals. The first controller communicates a ratio control signal to the matching network, and the matching network controls the ratio tuning element in accordance with the ratio control signal. The RF controls system operates in a continuous and pulse mode of operation. The controller can also control the rise or fall of a pulse edge or a level or duration of incremental changes in the pulse edge.

Abstract translation: 一种射频（RF）控制系统，包括具有输出RF信号的功率放大器的RF发生器和控制器。 匹配网络接收RF信号并产生多个RF输出信号。 匹配网络包括比率调谐元件以改变多个RF输出信号之间的功率比。 第一控制器将比率控制信号传送到匹配网络，并且匹配网络根据比率控制信号来控制比率调谐元件。 RF控制系统以连续和脉冲操作模式工作。 控制器还可以控制脉冲边沿的上升或下降或脉冲边沿增量变化的电平或持续时间。

公开(公告)号：US20170054418A1

公开(公告)日：2017-02-23

申请号：US14828597

申请日：2015-08-18

Applicant: MKS Instruments, Inc.

Inventor： David J. COUMOU ,  Ross REINHARDT ,  Yuiry ELNER ,  Daniel M. GILL

IPC: H03H7/38 ,  H03F1/56 ,  H03F3/19

CPC classification number: H03F1/56 ,  H03F3/195 ,  H03F3/245 ,  H03F2200/378 ,  H03F2200/387 ,  H03F2200/451

Abstract: A radio frequency (RF) control system including a RF generator having a power amplifier that outputs a RF signal and a controller. A matching network receives the RF signal and generates at least one RF output signal. In a first mode of operation, the controller enables adjustment of the frequency of the RF signal and a tune element of the matching network to achieve an impedance match and in a second mode of operation the controller enables adjustment of only the tune element of the matching network to achieve an impedance match while the frequency is adjusted to a target frequency. The RF controls system operates in a continuous and pulse mode of operation.

Abstract translation: 一种射频（RF）控制系统，包括具有输出RF信号的功率放大器的RF发生器和控制器。 匹配网络接收RF信号并产生至少一个RF输出信号。 在第一操作模式中，控制器能够调整RF信号的频率和匹配网络的调谐元件以实现阻抗匹配，并且在第二操作模式中，控制器仅允许调整匹配的调谐元件 网络实现阻抗匹配，同时将频率调整到目标频率。 RF控制系统以连续和脉冲操作模式工作。

公开(公告)号：US20170062186A1

公开(公告)日：2017-03-02

申请号：US14837512

申请日：2015-08-27

Applicant: MKS Instruments, Inc.

Inventor： David J. COUMOU ,  Ross REINHARDT ,  Yuiry ELNER ,  Daniel M. GILL ,  Richard PHAM

IPC: H01J37/32

CPC classification number: H01J37/32155 ,  H01J37/32091 ,  H01J37/321 ,  H01J37/32165 ,  H01J37/32972 ,  H01J37/3299 ,  H01J2237/334

Abstract: A system for controlling RF power supplies applying power to a load, such as a plasma chamber, includes a master power supply and a slave power supply. The master power supply provides a control signal, such as a frequency and phase signal, to the slave power supply. The slave power supply receives the frequency and phase signal and also receives signals characteristic of the spectral emissions detected from the load. The slave RF power supply varies the phase and power of its RF output signal applied to the load. Varying the power controls the width of an ion distribution function, and varying the phase controls a peak of the ion distribution. Depending upon the coupling between the RF generators and the load, different spectral emissions are detected, including first harmonics, second harmonics, and, in the case of a dual frequency drive system, intermodulation distortion.

Abstract translation: 用于控制对诸如等离子体室的负载施加电力的RF电源的系统包括主电源和从电源。 主电源向从电源提供诸如频率和相位信号的控制信号。 从电源接收频率和相位信号，并且还接收从负载检测到的频谱发射特性的信号。 从射频电源改变施加到负载的RF输出信号的相位和功率。 功率变化控制离子分布函数的宽度，改变相位控制离子分布的峰值。 根据RF发生器和负载之间的耦合，检测不同的光谱发射，包括一次谐波，二次谐波，并且在双频驱动系统的情况下，互调失真。