公开(公告)号：US06706121B2

公开(公告)日：2004-03-16

申请号：US10258559

申请日：2002-10-23

申请人： Manfred Schenkl ,  Robert Pesce ,  John Oshinowo ,  Uwe Müller

发明人： Manfred Schenkl ,  Robert Pesce ,  John Oshinowo ,  Uwe Müller

IPC分类号： C23G102

CPC分类号： H01L21/67075 ,  Y10S134/902 ,  Y10S438/906

摘要： In a method of treating substrates a treatment fluid is fed into a collection vessel after treatment, at least a portion of the treatment fluid is withdrawn from the collection vessel and returned to respective reservoir and the collection vessel is rinsed before receiving another treatment fluid.

摘要翻译： 在处理基材的方法中，将处理流体在处理之后进料到收集容器中，至少一部分处理流体从收集容器中取出并返回到相应的储存器，并且在接收另一处理流体之前冲洗收集容器。

公开(公告)号：US06240938B1

公开(公告)日：2001-06-05

申请号：US08761717

申请日：1996-12-06

申请人： John Oshinowo

发明人： John Oshinowo

IPC分类号： B08B312

CPC分类号： H01L21/02052 ,  B08B3/10 ,  B08B3/102 ,  B08B3/12 ,  H01L21/67051 ,  H01L21/67057 ,  Y10S134/902

摘要： A treatment apparatus for treating substrates includes a fluid container and a device for moving in a reciprocating manner the substrates within the fluid container during treatment to thereby make accessible areas of the substrates that would otherwise be obstructed by parts of the device.

摘要翻译： 用于处理基板的处理装置包括流体容器和用于在处理期间以往复方式移动流体容器内的基板的装置，从而使得否则将被装置的部件阻挡的可接近的基板区域。

公开(公告)号：US06352084B1

公开(公告)日：2002-03-05

申请号：US09297219

申请日：1999-04-23

申请人： John Oshinowo

发明人： John Oshinowo

IPC分类号： B08B304

CPC分类号： H01L21/67057 ,  H01L21/67051 ,  H05K3/0085 ,  Y10S134/902

摘要： A device for the treatment of substrates (2) has a container having a bottom and being filled with a treatment fluid. The treatment fluid streams in from below through the bottom of the container. At least two inlet tubes are provided for the treatment fluid underneath the container bottom. Each of the at least two inlet tubes is provided with projecting comb-like distribution channels. The at least two inlet tubes and the distribution channels are arranged in a common plane. The distribution channels of one of the at least two inlet tubes are respectively positioned between two of the distribution channels of the other one of the two inlet tubes.

摘要翻译： 用于处理基材（2）的装置具有底部的容器，并且填充有处理流体。 处理流体从下方流入容器的底部。 为容器底部下方的处理流体提供至少两个入口管。 所述至少两个入口管中的每一个设置有突出的梳状分布通道。 至少两个入口管和分配通道布置在公共平面中。 所述至少两个入口管中的一个的分配通道分别位于两个入口管中另一个的两个分配通道之间。

公开(公告)号：US06257255B1

公开(公告)日：2001-07-10

申请号：US09297218

申请日：1999-04-23

申请人： John Oshinowo

发明人： John Oshinowo

IPC分类号： B08B310

CPC分类号： H01L21/67057 ,  H01L21/67326 ,  H01L21/67757 ,  Y10S134/902

摘要： A device for the treatment of substrates has a container having walls and being filled with a treatment fluid. At least one substrate carrier is mounted in the container so as to move the substrates vertically in a reciprocating manner without a substrate support. Substrate side walls are provided between the substrates and the container walls. These substrate side walls extend parallel to the substrates and are vertically movable in a reciprocating manner with the substrates.

摘要翻译： 用于处理基材的装置具有容器，其具有壁并填充有处理流体。 至少一个基板载体安装在容器中，以便以不间断的基板支撑的方式以往复方式垂直移动基板。 基板侧壁设置在基板和容器壁之间。 这些基板侧壁平行于基板延伸并且可与基板以往复方式垂直移动。

公开(公告)号：US06607604B1

公开(公告)日：2003-08-19

申请号：US09600084

申请日：2000-06-30

申请人： John Oshinowo

发明人： John Oshinowo

IPC分类号： B08B312

CPC分类号： H01L21/67057 ,  B01J19/10 ,  B08B3/12 ,  Y10S134/902

摘要： A method and apparatus for treating substrates in a fluid container with at least one fluid and ultrasound provided. Each of two oppositely disposed walls of the fluid container are provided with at least two ultrasound radiation areas that can be respectively individually activated. The ultrasound radiation areas of one of the container walls is activated in a chronological relationship to the ultrasound radiation areas of the other container wall in such a way that oppositely disposed ultrasound radiation areas of the container walls are not activated simultaneously.

摘要翻译： 一种用至少一种流体和超声波处理流体容器中的基底的方法和装置。 流体容器的两个相对设置的壁中的每一个设置有至少两个可以分别单独激活的超声辐射区域。 其中一个容器壁的超声波辐射区域以与另一容器壁的超声辐射区域的时间关系激活，使得容器壁的相对设置的超声辐射区域不被同时激活。

公开(公告)号：US06189552B1

公开(公告)日：2001-02-20

申请号：US09308850

申请日：1999-05-24

申请人： John Oshinowo

发明人： John Oshinowo

IPC分类号： B08B312

CPC分类号： H01L21/67028 ,  Y10S134/902

摘要： An apparatus for processing substrates is provided. The apparatus includes a receptacle for containing processing fluid, and at least one substrate support. Components of the receptacle and/or substrate support that come into contact with processing fluid have a protective layer. Guide or support members for the substrates are fused to the protective layer.

摘要翻译： 提供了一种用于处理衬底的设备。 该装置包括用于容纳处理流体的容器和至少一个基板支撑件。 与处理流体接触的容器和/或衬底支撑件的部件具有保护层。 衬底的导向或支撑构件与保护层融合。

公开(公告)号：US5992431A

公开(公告)日：1999-11-30

申请号：US56586

申请日：1998-04-07

申请人： Martin Weber ,  John Oshinowo

发明人： Martin Weber ,  John Oshinowo

IPC分类号： B08B3/02 ,  B01J19/26 ,  B08B3/10 ,  H01L21/00 ,  H01L21/304 ,  H01L21/306

CPC分类号： H01L21/02052 ,  B01J19/26 ,  B08B3/102 ,  H01L21/67051 ,  H01L21/67057 ,  H01L21/6708 ,  B01J2219/00051 ,  Y10S134/902

摘要： A device for treating substrates includes a fluid container in which the substrates are contained during treatment. A nozzle system is connected to the sidewalls and/or bottom of the fluid container and includes a plurality of nozzles for introducing a fluid into the fluid container.

公开(公告)号：US5921257A

公开(公告)日：1999-07-13

申请号：US762199

申请日：1996-12-06

申请人： Martin Weber ,  John Oshinowo

发明人： Martin Weber ,  John Oshinowo

IPC分类号： B08B3/02 ,  B01J19/26 ,  B08B3/10 ,  H01L21/00 ,  H01L21/304 ,  H01L21/306

CPC分类号： H01L21/02052 ,  B01J19/26 ,  B08B3/102 ,  H01L21/67051 ,  H01L21/67057 ,  H01L21/6708 ,  B01J2219/00051 ,  Y10S134/902

摘要： A device for treating substrates includes a fluid container in which the substrates are contained during treatment. A nozzle system is connected to the sidewalls and/or bottom of the fluid container and includes a plurality of nozzles for introducing a fluid into the fluid container.

摘要翻译： 处理基板的装置包括在处理期间容纳基板的流体容器。 喷嘴系统连接到流体容器的侧壁和/或底部，并且包括用于将流体引入流体容器的多个喷嘴。