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公开(公告)号：US20050019492A1
公开(公告)日：2005-01-27
申请号：US10921407
申请日：2004-08-18
CPC分类号： H05G2/003
摘要： Erosion-resistive coatings are provided on critical plasma-facing surfaces of an electrical gas plasma head for an EUV source. The erosion-resistive coatings comprise diamond and diamond-like materials deposited onto the critical plasma-facing surfaces. A pure diamond coating is deposited onto the plasma exposed insulator surfaces using, for example, a chemical vapor deposition processes. The diamond coating is made conductive by selective doping with p-type material, such as, but not limited to, boron and graphite.
摘要翻译： 在用于EUV电源的电气等离子体头的关键等离子体表面上提供耐腐蚀涂层。 耐腐蚀涂层包括沉积在关键的等离子体表面上的金刚石和类金刚石材料。 使用例如化学气相沉积工艺将纯金刚石涂层沉积到等离子体暴露的绝缘体表面上。 金刚石涂层通过选择性掺杂p型材料（例如但不限于硼和石墨）而导电。
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公开(公告)号：US07041993B2
公开(公告)日：2006-05-09
申请号：US10921407
申请日：2004-08-18
CPC分类号： H05G2/003
摘要： Erosion-resistive coatings are provided on critical plasma-facing surfaces of an electrical gas plasma head for an EUV source. The erosion-resistive coatings comprise diamond and diamond-like materials deposited onto the critical plasma-facing surfaces. A pure diamond coating is deposited onto the plasma exposed insulator surfaces using, for example, a chemical vapor deposition processes. The diamond coating is made conductive by selective doping with p-type material, such as, but not limited to, boron and graphite.
摘要翻译： 在用于EUV电源的电气等离子体头的关键等离子体表面上提供耐腐蚀涂层。 耐腐蚀涂层包括沉积在关键的等离子体表面上的金刚石和类金刚石材料。 使用例如化学气相沉积工艺将纯金刚石涂层沉积到等离子体暴露的绝缘体表面上。 金刚石涂层通过选择性掺杂p型材料（例如但不限于硼和石墨）而导电。
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公开(公告)号：US06809328B2
公开(公告)日：2004-10-26
申请号：US10326574
申请日：2002-12-20
IPC分类号： H05H104
CPC分类号： H05G2/003
摘要： Erosion-resistive coatings are provided on critical plasma-facing surfaces of an electrical gas plasma head for an EUV source. The erosion-resistive coatings comprise diamond and diamond-like materials deposited onto the critical plasma-facing surfaces. A pure diamond coating is deposited onto the plasma exposed insulator surfaces using, for example, a chemical vapor deposition processes. The diamond coating is made conductive by selective doping with p-type material, such as, but not limited to, boron and graphite.
摘要翻译： 在用于EUV电源的电气等离子体头的关键等离子体表面上提供耐腐蚀涂层。 耐腐蚀涂层包括沉积在关键的等离子体表面上的金刚石和类金刚石材料。 使用例如化学气相沉积工艺将纯金刚石涂层沉积到等离子体暴露的绝缘体表面上。 金刚石涂层通过选择性掺杂p型材料（例如但不限于硼和石墨）而导电。
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4.发明申请Technique to prevent tin contamination of mirrors and electrodes in an EUV lithography system 有权防止EUV光刻系统中反射镜和电极的锡污染的技术公开(公告)号：US20050244572A1
公开(公告)日：2005-11-03
申请号：US10835867
申请日：2004-04-29
申请人： Robert Bristol , Bryan Rice , Ming Fang , John Barnak , Melissa Shell
发明人： Robert Bristol , Bryan Rice , Ming Fang , John Barnak , Melissa Shell
CPC分类号： G03F7/70958 , C23C14/083 , C23C14/165 , G03F7/70175 , G03F7/70916 , G21K1/06 , G21K2201/067
摘要： Passivation coatings and gettering agents may be used in an Extreme Ultraviolet (EUV) source which uses tin (Sn) vapor as a plasma “fuel” to prevent contamination and corresponding loss of reflectivity due to tin contamination. The passivation coating may be a material to which tin does not adhere, and may be placed on reflective surfaces in the source chamber. The gettering agent may be a material that reacts strongly with tin, and may be placed outside of the collector mirrors and/or on non-reflective surfaces. A passivation coating may also be provided on the insulator between the anode and cathode of the source electrodes to prevent shorting due to tin coating the insulator surface.
摘要翻译： 钝化涂层和吸气剂可以用于使用锡（Sn）蒸气作为等离子体“燃料”的极紫外（EUV）源，以防止污染和相应的锡污染引起的反射率的损失。 钝化涂层可以是锡不粘附的材料，并且可以放置在源室中的反射表面上。 吸气剂可以是与锡强烈反应的材料，并且可以放置在集电镜和/或非反射表面之外。 也可以在源电极的阳极和阴极之间的绝缘体上提供钝化涂层，以防止由于涂覆绝缘体表面的锡而导致短路。
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5.发明授权Technique to prevent tin contamination of mirrors and electrodes in an EUV lithography system 有权防止EUV光刻系统中反射镜和电极的锡污染的技术公开(公告)号：US07567379B2
公开(公告)日：2009-07-28
申请号：US10835867
申请日：2004-04-29
申请人： Robert Bristol , Bryan J. Rice , Ming Fang , John P. Barnak , Melissa Shell
发明人： Robert Bristol , Bryan J. Rice , Ming Fang , John P. Barnak , Melissa Shell
IPC分类号： F21V9/04
CPC分类号： G03F7/70958 , C23C14/083 , C23C14/165 , G03F7/70175 , G03F7/70916 , G21K1/06 , G21K2201/067
摘要： Passivation coatings and gettering agents may be used in an Extreme Ultraviolet (EUV) source which uses tin (Sn) vapor as a plasma “fuel” to prevent contamination and corresponding loss of reflectivity due to tin contamination. The passivation coating may be a material to which tin does not adhere, and may be placed on reflective surfaces in the source chamber. The gettering agent may be a material that reacts strongly with tin, and may be placed outside of the collector mirrors and/or on non-reflective surfaces. A passivation coating may also be provided on the insulator between the anode and cathode of the source electrodes to prevent shorting due to tin coating the insulator surface.
摘要翻译： 钝化涂层和吸气剂可以用于使用锡（Sn）蒸气作为等离子体“燃料”的极紫外（EUV）源，以防止污染和相应的锡污染引起的反射率的损失。 钝化涂层可以是锡不粘附的材料，并且可以放置在源室中的反射表面上。 吸气剂可以是与锡强烈反应的材料，并且可以放置在集电镜和/或非反射表面之外。 也可以在源电极的阳极和阴极之间的绝缘体上提供钝化涂层，以防止由于涂覆绝缘体表面的锡而导致短路。
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6.发明授权公开(公告)号：US06787788B2
公开(公告)日：2004-09-07
申请号：US10349740
申请日：2003-01-21
申请人： Melissa Shell , Bryan J. Rice
发明人： Melissa Shell , Bryan J. Rice
IPC分类号： H01J3520
CPC分类号： B82Y10/00 , G03F7/70033 , H05G2/003
摘要： An insulator may be operable to electrically insulate a cathode from an anode in an extreme ultraviolet (EUV) source of an EUV lithography tool. The insulator may be made of an aluminosilicate or a SiN/SiC material. The extreme ultraviolet source may be operable to produce a plasma which emits extreme ultraviolet radiation.
摘要翻译： 绝缘体可操作以使阴极与EUV光刻工具的极紫外（EUV）源中的阳极电绝缘。 绝缘体可以由铝硅酸盐或SiN / SiC材料制成。 极紫外光源可操作以产生发射极紫外辐射的等离子体。
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