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公开(公告)号：US20120013870A1
公开(公告)日：2012-01-19
申请号：US13240867
申请日：2011-09-22
申请人： Marcel Mathijs Theodore Marie DIERICHS , Sjoerd Nicolaas Lambertus DONDERS , Johannes Henricus Wilhelmus JACOBS , Hans JANSEN , Erik Roelof LOOPSTRA , Jeroen Johannes Sophia Maria MERTENS , Marco Koert STAVENGA , Bob STREEFKERK , Martinus Cornelis Maria VERHAGEN , Lejla SEUNTIENS-GRUDA
发明人： Marcel Mathijs Theodore Marie DIERICHS , Sjoerd Nicolaas Lambertus DONDERS , Johannes Henricus Wilhelmus JACOBS , Hans JANSEN , Erik Roelof LOOPSTRA , Jeroen Johannes Sophia Maria MERTENS , Marco Koert STAVENGA , Bob STREEFKERK , Martinus Cornelis Maria VERHAGEN , Lejla SEUNTIENS-GRUDA
IPC分类号： G03B27/52
CPC分类号： G03F7/70866 , B01D19/0031 , B01D61/025 , B01D61/24 , C02F1/04 , C02F1/20 , C02F1/28 , C02F1/283 , C02F1/32 , C02F1/42 , C02F1/441 , C02F2103/40 , G03F7/2041 , G03F7/70341
摘要： In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiation source, and/or a filter configured to purify the liquid. A gas content reduction device may be provided to reduce a gas content of the liquid. A chemical may be added to the liquid using an adding device to inhibit lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms may be reduced.
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公开(公告)号：US20120013874A1
公开(公告)日：2012-01-19
申请号：US13242221
申请日：2011-09-23
申请人： Marcel Mathijs Theodore Marie DIERICHS , Sjoerd Nicolaas Lambertus Donders , Johannes Henricus Wilhelmus Jacobs , Hans Jansen , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Marco Koert Stavenga , Bob Streefkerk , Martinus Cornelis Maria Verhagen , Lejla Seuntiens-Gruda
发明人： Marcel Mathijs Theodore Marie DIERICHS , Sjoerd Nicolaas Lambertus Donders , Johannes Henricus Wilhelmus Jacobs , Hans Jansen , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Marco Koert Stavenga , Bob Streefkerk , Martinus Cornelis Maria Verhagen , Lejla Seuntiens-Gruda
IPC分类号： G03B27/52
CPC分类号： G03F7/70866 , B01D19/0031 , B01D61/025 , B01D61/24 , C02F1/04 , C02F1/20 , C02F1/28 , C02F1/283 , C02F1/32 , C02F1/42 , C02F1/441 , C02F2103/40 , G03F7/2041 , G03F7/70341
摘要： In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiation source, and/or a filter configured to purify the liquid. A gas content reduction device may be provided to reduce a gas content of the liquid. A chemical may be added to the liquid using an adding device to inhibit lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms may be reduced.
摘要翻译： 在光刻投影装置中，液体供应系统将液体保持在投影系统和基板之间的空间中。 液体供应系统还可以包括去矿化单元，蒸馏单元，去烃化单元，UV辐射源和/或构造成净化液体的过滤器。 可以提供气体减少装置以减少液体的气体含量。 可以使用添加装置将化学物质添加到液体中以抑制生命形态生长，并且液体供应系统的组分可以由对可见光不透明的材料制成，使得寿命的增长可能降低。
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公开(公告)号：US20110273677A1
公开(公告)日：2011-11-10
申请号：US13186991
申请日：2011-07-20
申请人： Bob STREEFKERK , Johannes Jacobus Matheus BASELMANS , Richard Joseph BRULS , Marcel Mathijs Theodore Marie DIERICHS , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Hans JANSEN , Erick Roelof LOOPSTRA , Jeroen Johannes Sophia Maria MERTENS , Johannes Catharinus Hubertus MULKENS , Ronald Walther Jeanne SEVERIJNS , Sergei SHULEPOV , Herman BOOM , Timotheus Franciscus SENGERS
发明人： Bob STREEFKERK , Johannes Jacobus Matheus BASELMANS , Richard Joseph BRULS , Marcel Mathijs Theodore Marie DIERICHS , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Hans JANSEN , Erick Roelof LOOPSTRA , Jeroen Johannes Sophia Maria MERTENS , Johannes Catharinus Hubertus MULKENS , Ronald Walther Jeanne SEVERIJNS , Sergei SHULEPOV , Herman BOOM , Timotheus Franciscus SENGERS
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/2041 , G03F7/70908 , G03F7/70958
摘要： An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.
摘要翻译： 公开了一种浸没式光刻投影装置，其中液体设置在装置的投影系统和基板之间。 为了防止在液体中形成气泡，有助于减少与液体接触后的元件上的残留物，就可以在设备的各种元件上使用液体和液体两层。
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公开(公告)号：US20100221660A1
公开(公告)日：2010-09-02
申请号：US12781341
申请日：2010-05-17
CPC分类号： G03F7/70958 , G03F7/70341
摘要： A substrate is provided with a coating of material which is substantially transparent to the wavelength of the projection beam. The coating may be thicker than the wavelength of the projection beam and have a refractive index of the coating such that the wavelength of the projection beam is shortened as it passes through it. This allows the imaging of smaller features on the substrate. Alternatively, the coating may be used with a liquid supply system and act to keep bubbles away from a radiation sensitive layer of the substrate.
摘要翻译： 基板设置有对投影光束的波长基本透明的材料涂层。 涂层可以比投影光束的波长厚，并且具有涂层的折射率，使得投影光束的波长在其通过时被缩短。 这允许在衬底上成像较小的特征。 或者，涂层可以与液体供应系统一起使用，并且用于保持气泡远离基底的辐射敏感层。
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公开(公告)号：US20120013872A1
公开(公告)日：2012-01-19
申请号：US13241837
申请日：2011-09-23
申请人： Joannes Theodoor DE SMIT , Vadim Yevgenyevich BANINE , Theodorus Hubertus Josephus BISSCHOPS , Marcel Mathijs Theodore Marie DIERICHS , Theodorus Marinus MODDERMAN
发明人： Joannes Theodoor DE SMIT , Vadim Yevgenyevich BANINE , Theodorus Hubertus Josephus BISSCHOPS , Marcel Mathijs Theodore Marie DIERICHS , Theodorus Marinus MODDERMAN
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/708 , G03F7/70858
摘要： A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection may be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal may be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and/or phase shifting ultrasonic standing-wave node patterns.
摘要翻译： 光刻设备和设备制造方法利用被限制在投影系统和基板之间的储存器中的液体。 检测和/或去除从溶解的大气中的液体中形成的液体或从暴露于液体的装置元件排出的气泡，使得它们不会干扰曝光并导致在基板上的印刷缺陷。 可以通过测量液体中超声波衰减的频率依赖性来进行检测，并且可以通过使液体脱气和加压，使用低表面张力的液体将液体与大气隔离，从而提供连续的液体流动 成像场和/或相移超声波驻波节点图案。
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公开(公告)号：US20110122385A1
公开(公告)日：2011-05-26
申请号：US12908980
申请日：2010-10-21
CPC分类号： G03B27/54 , G02B27/0905 , G02B27/0961 , G03F7/70075
摘要： A two-stage homogenizer comprising a first homogenizer stage and a second homogenizer stage. The first homogenizer stage includes a pair of microlens arrays and associated focusing optics. The second homogenizer stage includes a second pair of microlens arrays and associated focusing optics. The second homogenizer stage is positioned to receive radiation which is output from the first homogenizer stage.
摘要翻译： 一种两级均化器，包括第一均化器级和第二均化器级。 第一均化器级包括一对微透镜阵列和相关联的聚焦光学器件。 第二均化器级包括第二对微透镜阵列和相关联的聚焦光学器件。 定位第二均化器级以接收从第一均化器级输出的辐射。
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