公开(公告)号：US20070205524A1

公开(公告)日：2007-09-06

申请号：US11365021

申请日：2006-03-01

申请人： Margaret Best ,  Tsai-Wei Wu

发明人： Margaret Best ,  Tsai-Wei Wu

IPC分类号： B29D11/00

CPC分类号： G11B5/82 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G11B5/743 ,  G11B5/855 ,  G11B5/865

摘要： A method and apparatus are disclosed for separating a stamper from a patterned substrate. The method includes providing a substrate having a top and a bottom with an opening therein, providing a support mechanism configured to retain the substrate, providing a stamper having a formed pattern and configured to come in contact with the top of the substrate, wherein a chamber is formed within the opening of the substrate when the stamper is in contact with the substrate, providing a channel directed toward the chamber to introduce pressurized air into the chamber, and directing pressured air through the channel to the chamber to initiate separation of the stamper from the substrate. In certain embodiments, the pressurized air may be directed toward an opening in the substrate, such as a central ID hole in a disk. The disk may be incorporated within a storage device as pattered magnetic media.

摘要翻译： 公开了用于将压模与图案化衬底分离的方法和装置。 该方法包括提供具有其中具有开口的顶部和底部的基底，提供被配置为保持基底的支撑机构，提供具有形成的图案的压模并且构造成与基底的顶部接触，其中腔室 当压模与基板接触时，形成在基板的开口内，提供引导到腔室的通道，以将加压的空气引入到腔室中，并且将加压空气通过通道引导到腔室，以将压模从 底物。 在某些实施例中，加压空气可以被引向衬底中的开口，例如盘中的中心ID孔。 盘可以作为图案化的磁性介质结合在存储装置内。

公开(公告)号：US07900497B2

公开(公告)日：2011-03-08

申请号：US11950021

申请日：2007-12-04

申请人： Qing Dai ,  Bruno Marchon ,  Tsai-Wei Wu

发明人： Qing Dai ,  Bruno Marchon ,  Tsai-Wei Wu

IPC分类号： G01B21/30

CPC分类号： G01B11/303 ,  B82Y10/00 ,  G01Q60/24

摘要： The true roughness of highly granular perpendicular media is measured by forming an inverse replica of the surface of the media. The invention enables AFM measurements of granular media valley depth to more consistently predict the corrosion performance of the media. A liquid resist is used to first replicate the media topography and form the inverse replica. The narrow valleys in the original media are precisely modeled as sharp peaks on the replica. The height of the peaks are readily measured with an AFM tip. The resulting image is a negative of the original surface.

摘要翻译： 通过形成介质表面的反向复制品来测量高度颗粒状垂直介质的真实粗糙度。 本发明使粒状介质谷深度的AFM测量能够更一致地预测介质的腐蚀性能。 使用液体抗蚀剂首先复制介质形貌并形成反向复制品。 原始介质中的窄谷精确地建模为复制品上的尖峰。 用AFM尖端容易地测量峰的高度。 所得到的图像是原始曲面的负值。

公开(公告)号：US07460321B2

公开(公告)日：2008-12-02

申请号：US11938815

申请日：2007-11-13

申请人： Zvonimir Z. Bandic ,  Tsai-Wei Wu

发明人： Zvonimir Z. Bandic ,  Tsai-Wei Wu

IPC分类号： G11B5/86

CPC分类号： B82Y10/00 ,  G11B5/59655 ,  G11B5/743 ,  G11B5/865

摘要： A solution to the problem of long, e-beam mastering times needed for patterning masters for patterned magnetic disk media is disclosed. A process for fabrication of masters takes advantage of the circular symmetry of magnetic disks and reduces the total required mastering time by an order of magnitude over prior art processes. This process relies on e-beam mastering of one small arcuate portion of the master, and then replicating that portion around a circular path on the master several times to create a full disk master. The architecture of this design also corrects for errors in head positioning on the final patterned media disk that may be introduced by the mastering process.

摘要翻译： 公开了解决用于图案化磁盘介质的图形化主体所需的长的电子束母盘制作时间问题的解决方案。 制造主机的过程利用磁盘的圆形对称性，并将总需要的母版制作时间与现有技术的工艺相比降低一个数量级。 该过程依赖于主机的一个小弧形部分的电子束控制，然后在主机周围的圆形路径周围复制该部分以创建完整磁盘主机。 该设计的架构还可以校正可能由母盘制作过程引入的最终图案化媒体盘上的头部定位中的错误。

公开(公告)号：US20070158866A1

公开(公告)日：2007-07-12

申请号：US11331367

申请日：2006-01-12

申请人： Tsai-Wei Wu

发明人： Tsai-Wei Wu

IPC分类号： B29D17/00 ,  B27N3/08 ,  A01J21/00

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  Y10S977/887

摘要： A nanoimprinting system incorporates a patterned media contact architecture to provide a uniform imprinting pressure across the target imprinting area on a disk substrate. The system leverages the unique disk substrate characteristic of an inner diameter hole by incorporating a membrane suspension, gel-pad buffering, and air cushion loading that exploits the inner diameter hole characteristics of the disk substrate. This design dramatically increases the uniformity of the pressing pressure across the target imprinting area. As a result, a simple and effective improvement of the quality of the patterns imprinted on the recording disk substrate is realized.

摘要翻译： 纳米压印系统包含图案化的介质接触结构，以在盘基底上的目标印记区域上提供均匀的压印压力。 该系统通过结合利用盘基板的内径孔特性的膜悬浮液，凝胶垫缓冲和气垫负载来利用内径孔的独特的盘基底特性。 这种设计大大增加了目标印迹区域的压制压力的均匀性。 结果，实现了刻印在记录盘基片上的图案的质量的简单且有效的改进。

公开(公告)号：US08262975B2

公开(公告)日：2012-09-11

申请号：US12268823

申请日：2008-11-11

申请人： Margaret E. Best ,  Xing-Cai Guo ,  Thomas E. Karis ,  Dan S. Kercher ,  Charles M. Mate ,  Tsai-Wei Wu

发明人： Margaret E. Best ,  Xing-Cai Guo ,  Thomas E. Karis ,  Dan S. Kercher ,  Charles M. Mate ,  Tsai-Wei Wu

IPC分类号： B27N3/08

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  C08G65/007 ,  C08G65/3322 ,  C08G2650/48 ,  C08L33/08 ,  C09D171/02 ,  C08L2666/04

摘要： Nanoimprint lithography using resist material with the addition of a surfactant is described. A template release layer is formed on a pattern of a template. A non-ionic surfactant is added to a resist material to form a mixed resist material. The resist material may comprise a hydrocarbon material having an unsaturated bond, such as an acrylate material. The surfactant may comprise polyalkylene glycol or an organically modified polysiloxane. A resist layer is then formed on a substrate from the mixed resist material. The surfactant added to the resist material forms a resist release layer on the surface of the resist layer. The template is then pressed into the resist layer, where the template release layer and the resist release layer are between the pattern of the template and the resist layer.

摘要翻译： 描述了使用加入表面活性剂的抗蚀剂材料的纳米压印光刻。 模板释放层形成在模板的图案上。 将非离子表面活性剂加入到抗蚀剂材料中以形成混合的抗蚀剂材料。 抗蚀剂材料可以包括具有不饱和键的烃材料，例如丙烯酸酯材料。 表面活性剂可以包含聚亚烷基二醇或有机改性的聚硅氧烷。 然后在混合的抗蚀剂材料的基板上形成抗蚀剂层。 添加到抗蚀剂材料中的表面活性剂在抗蚀剂层的表面上形成抗蚀剂剥离层。 然后将模板压入抗蚀剂层，其中模板释放层和抗蚀剂剥离层在模板的图案和抗蚀剂层之间。

公开(公告)号：US20100117256A1

公开(公告)日：2010-05-13

申请号：US12268823

申请日：2008-11-11

申请人： Margaret E. Best ,  Xing-Cai Guo ,  Thomas E. Karis ,  Dan S. Kercher ,  Charles M. Mate ,  Tsai-Wei Wu

发明人： Margaret E. Best ,  Xing-Cai Guo ,  Thomas E. Karis ,  Dan S. Kercher ,  Charles M. Mate ,  Tsai-Wei Wu

IPC分类号： B32B37/02 ,  C08L71/08 ,  C08L83/04

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  C08G65/007 ,  C08G65/3322 ,  C08G2650/48 ,  C08L33/08 ,  C09D171/02 ,  C08L2666/04

摘要： Nanoimprint lithography using resist material with the addition of a surfactant is described. A template release layer is formed on a pattern of a template. A non-ionic surfactant is added to a resist material to form a mixed resist material. The resist material may comprise a hydrocarbon material having an unsaturated bond, such as an acrylate material. The surfactant may comprise polyakylene glycol or an organically modified polysiloxane. A resist layer is then formed on a substrate from the mixed resist material. The surfactant added to the resist material forms a resist release layer on the surface of the resist layer. The template is then pressed into the resist layer, where the template release layer and the resist release layer are between the pattern of the template and the resist layer.

摘要翻译： 描述了使用加入表面活性剂的抗蚀剂材料的纳米压印光刻。 模板释放层形成在模板的图案上。 将非离子表面活性剂加入到抗蚀剂材料中以形成混合的抗蚀剂材料。 抗蚀剂材料可以包括具有不饱和键的烃材料，例如丙烯酸酯材料。 表面活性剂可以包括聚亚烷基二醇或有机改性的聚硅氧烷。 然后在混合的抗蚀剂材料的基板上形成抗蚀剂层。 添加到抗蚀剂材料中的表面活性剂在抗蚀剂层的表面上形成抗蚀剂剥离层。 然后将模板压入抗蚀剂层，其中模板释放层和抗蚀剂剥离层在模板的图案和抗蚀剂层之间。

公开(公告)号：US07312939B2

公开(公告)日：2007-12-25

申请号：US11066665

申请日：2005-02-25

申请人： Zvonimir Z. Bandic ,  Tsai-Wei Wu

发明人： Zvonimir Z. Bandic ,  Tsai-Wei Wu

IPC分类号： G11B5/86

CPC分类号： B82Y10/00 ,  G11B5/59655 ,  G11B5/743 ,  G11B5/865

摘要： A solution to the problem of long, e-beam mastering times needed for patterning masters for patterned magnetic disk media is disclosed. A process for fabrication of masters takes advantage of the circular symmetry of magnetic disks and reduces the total required mastering time by an order of magnitude over prior art processes. This process relies on e-beam mastering of one small arcuate portion of the master, and then replicating that portion around a circular path on the master several times to create a full disk master. The architecture of this design also corrects for errors in head positioning on the final patterned media disk that may be introduced by the mastering process.

摘要翻译： 公开了解决用于图案化磁盘介质的图形化主体所需的长的电子束母盘制作时间问题的解决方案。 制造主机的过程利用磁盘的圆形对称性，并将总需要的母版制作时间与现有技术的工艺相比降低一个数量级。 该过程依赖于主机的一个小弧形部分的电子束控制，然后在主机周围的圆形路径周围复制该部分以创建完整磁盘主机。 该设计的架构还可以校正可能由母盘制作过程引入的最终图案化媒体盘上的头部定位中的错误。

公开(公告)号：US20110074062A1

公开(公告)日：2011-03-31

申请号：US12567277

申请日：2009-09-25

申请人： Clayton P. Henderson ,  Tsai-Wei Wu ,  Xing-Cai Guo ,  Thomas E. Karis ,  Jeffrey S. Lille

发明人： Clayton P. Henderson ,  Tsai-Wei Wu ,  Xing-Cai Guo ,  Thomas E. Karis ,  Jeffrey S. Lille

IPC分类号： B29C39/10 ,  B29C39/36

CPC分类号： B29C33/38 ,  B29C33/405 ,  B29C33/424 ,  B29C39/26 ,  B29C59/022 ,  B29K2071/00 ,  B29K2871/00 ,  B29K2995/0027 ,  B29K2995/0077 ,  B29L2017/003 ,  B29L2031/757 ,  G11B5/855

摘要： A system, method and apparatus for manufacturing high density magnetic media is disclosed. A flexible mold having a very low modulus of less than about 4 GPa is made on a rigid support. The mold nano-imprints a resist material on disks for hard disk drives. The flexible mold may comprise a perfluoropolyether with urethane acrylate end groups with a low surface adhesion from which the cured resist is easily released.

摘要翻译： 公开了一种用于制造高密度磁性介质的系统，方法和装置。 在刚性支撑件上制造具有小于约4GPa的非常低模量的柔性模具。 模具在硬盘驱动器的磁盘上印有抗蚀剂材料。 柔性模具可以包括具有低表面粘附性的氨基甲酸酯丙烯酸酯端基的全氟聚醚，其中固化的抗蚀剂从其中容易地释放。

公开(公告)号：US07500431B2

公开(公告)日：2009-03-10

申请号：US11331367

申请日：2006-01-12

申请人： Tsai-Wei Wu

发明人： Tsai-Wei Wu

IPC分类号： B31F1/07

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  Y10S977/887

摘要： A nanoimprinting system incorporates a patterned media contact architecture to provide a uniform imprinting pressure across the target imprinting area on a disk substrate. The system leverages the unique disk substrate characteristic of an inner diameter hole by incorporating a membrane suspension, gel-pad buffering, and air cushion loading that exploits the inner diameter hole characteristics of the disk substrate. This design dramatically increases the uniformity of the pressing pressure across the target imprinting area. As a result, a simple and effective improvement of the quality of the patterns imprinted on the recording disk substrate is realized.

公开(公告)号：US07377765B2

公开(公告)日：2008-05-27

申请号：US11353476

申请日：2006-02-14

申请人： Zvonimir Z. Bandic ,  Tsai-Wei Wu

发明人： Zvonimir Z. Bandic ,  Tsai-Wei Wu

IPC分类号： B29C59/00

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  Y10S425/81 ,  Y10S977/887

摘要： A nanoimprinting configuration includes a UV light diffuser that randomizes a collimated UV light beam so as to diffuse the shadowing effect from any defect object that resides in the UV optical path. In addition, a combination center circular pad and outer ring-shaped pad form a donut-shaped “non-contact” area between the two pad pieces. The size and shape of the two pad combination are designed to avoid direct gel pad contact above the patterned imprint zone on the disk substrate. The purpose of the gel pad, non-contact configuration is to eliminate any possible surface deformation incurred along the loading column and thereby avoid the elastic propagation of any deformations to the stamper resist surface.

摘要翻译： 纳米压印配置包括使准直的UV光束随机化的UV光漫射器，以便从位于UV光路中的任何缺陷对象扩散阴影效应。 此外，组合中心圆形垫和外环形垫在两个垫片之间形成环形“非接触”区域。 两个垫组合的尺寸和形状被设计成避免在盘基底上的图案化压印区上方的直接凝胶垫接触。 凝胶垫的非接触构造的目的是消除沿加载柱引起的任何可能的表面变形，从而避免任何变形到抗压面的弹性传播。