公开(公告)号：US09194826B2

公开(公告)日：2015-11-24

申请号：US12103354

申请日：2008-04-15

申请人： Toru Kaga ,  Kenji Terao ,  Masahiro Hatakeyama ,  Kenji Watanabe ,  Yoshihiko Naito ,  Takeshi Murakami ,  Norio Kimura

发明人： Toru Kaga ,  Kenji Terao ,  Masahiro Hatakeyama ,  Kenji Watanabe ,  Yoshihiko Naito ,  Takeshi Murakami ,  Norio Kimura

IPC分类号： G21K5/04 ,  G01N23/203 ,  G01N23/225 ,  H01J37/28

CPC分类号： G01N23/203 ,  G01N23/2251 ,  G01N2223/6116 ,  H01J37/28 ,  H01J2237/004 ,  H01J2237/022 ,  H01J2237/2446 ,  H01J2237/2817

摘要： The electron beam apparatus is provided with a stage for mounting a sample thereon, a primary optical system for generating an electron beam having an irradiation area and irradiating the electron beam onto the sample, a secondary optical system for detecting electrons which have been generated through the irradiation of the electron beam onto the sample and have acquired structural information of the sample and acquiring an image of the sample about a viewing area and an irradiation area changing section for changing the position of the irradiation area with respect to the viewing area.

摘要翻译： 电子束装置设置有用于在其上安装样品的载物台，用于产生具有照射区域并将电子束照射到样品上的电子束的主光学系统，用于检测通过 将电子束照射到样品上并获取样品的结构信息并获取关于观察区域的样品的图像和用于改变照射区域相对于观察区域的位置的照射区域改变部分。

公开(公告)号：US08937283B2

公开(公告)日：2015-01-20

申请号：US12937145

申请日：2009-04-10

申请人： Masahiro Hatakeyama ,  Takeshi Murakami ,  Yoshihiko Naito ,  Kenji Terao ,  Norio Kimura ,  Kenji Watanabe

发明人： Masahiro Hatakeyama ,  Takeshi Murakami ,  Yoshihiko Naito ,  Kenji Terao ,  Norio Kimura ,  Kenji Watanabe

IPC分类号： H01J37/29 ,  H01J37/28 ,  H01J37/244 ,  H01L21/66

CPC分类号： H01J37/28 ,  H01J37/22 ,  H01J37/244 ,  H01J37/29 ,  H01J2237/24475 ,  H01J2237/24585 ,  H01J2237/24592 ,  H01J2237/2805 ,  H01J2237/2806 ,  H01J2237/2817 ,  H01L22/12

摘要： A technique capable of improving the ability to observe a specimen using an electron beam in an energy region which has not been conventionally given attention is provided. This specimen observation method comprises: irradiating the specimen with an electron beam; detecting electrons to be observed which have been generated and have obtained information on the specimen by the electron beam irradiation; and generating an image of the specimen from the detected electrons to be observed. The electron beam irradiation comprises irradiating the specimen with the electron beam with a landing energy set in a transition region between a secondary emission electron region in which secondary emission electrons are detected and a mirror electron region in which mirror electrons are detected, thereby causing the secondary emission electrons and the mirror electrons to be mixed as the electrons to be observed. The detection of the electrons to be observed comprises performing the detection in a state where the secondary emission electrons and the mirror electrons are mixed. Observation and inspection can be quickly carried out for a fine foreign material and pattern of 100 nm or less.

摘要翻译： 提供了一种技术，其能够提高在未经常被注意的能量区域中使用电子束观察样本的能力。 该样本观察方法包括：用电子束照射样本; 检测已经产生的待观察的电子，并通过电子束照射获得关于样品的信息; 以及从所检测的电子产生待观察的样本的图像。 电子束照射包括用电子束照射样本，其中在其中检测到二次发射电子的二次发射电子区域和其中检测到反射镜电子的镜电子区域之间的过渡区域中设置的着陆能量，从而使次级 发射电子和镜电子作为待观察的电子进行混合。 要观察的电子的检测包括在二次发射电子和镜电子混合的状态下进行检测。 对于100nm以下的细小异物和图案，可以快速进行观察和检查。

公开(公告)号：US20110155905A1

公开(公告)日：2011-06-30

申请号：US12937145

申请日：2009-04-10

申请人： Masahiro Hatakeyama ,  Takeshi Murakami ,  Yoshihiko Naito ,  Kenji Terao ,  Norio Kimura ,  Kenji Watanabe

发明人： Masahiro Hatakeyama ,  Takeshi Murakami ,  Yoshihiko Naito ,  Kenji Terao ,  Norio Kimura ,  Kenji Watanabe

IPC分类号： G01N23/225 ,  G01N23/00

CPC分类号： H01J37/28 ,  H01J37/22 ,  H01J37/244 ,  H01J37/29 ,  H01J2237/24475 ,  H01J2237/24585 ,  H01J2237/24592 ,  H01J2237/2805 ,  H01J2237/2806 ,  H01J2237/2817 ,  H01L22/12

摘要： A technique capable of improving the ability to observe a specimen using an electron beam in an energy region which has not been conventionally given attention is provided. This specimen observation method comprises: irradiating the specimen with an electron beam; detecting electrons to be observed which have been generated and have obtained information on the specimen by the electron beam irradiation; and generating an image of the specimen from the detected electrons to be observed. The electron beam irradiation comprises irradiating the specimen with the electron beam with a landing energy set in a transition region between a secondary emission electron region in which secondary emission electrons are detected and a mirror electron region in which mirror electrons are detected, thereby causing the secondary emission electrons and the mirror electrons to be mixed as the electrons to be observed. The detection of the electrons to be observed comprises performing the detection in a state where the secondary emission electrons and the mirror electrons are mixed. Observation and inspection can be quickly carried out for a fine foreign material and pattern of 100 nm or less.

摘要翻译： 提供了一种技术，其能够提高在未经常被注意的能量区域中使用电子束观察样本的能力。 该样本观察方法包括：用电子束照射样本; 检测已经产生的待观察的电子，并通过电子束照射获得关于样品的信息; 以及从所检测的电子产生待观察的样本的图像。 电子束照射包括用电子束照射样本，其中在其中检测到二次发射电子的二次发射电子区域和其中检测到反射镜电子的镜电子区域之间的过渡区域中设置的着陆能量，从而使次级 发射电子和镜电子作为待观察的电子进行混合。 要观察的电子的检测包括在二次发射电子和镜电子混合的状态下进行检测。 对于100nm以下的细小异物和图案，可以快速进行观察和检查。

公开(公告)号：US08624182B2

公开(公告)日：2014-01-07

申请号：US13195927

申请日：2011-08-02

申请人： Kenji Watanabe ,  Masahiro Hatakeyama ,  Yoshihiko Naito ,  Tatsuya Kohama ,  Kenji Terao ,  Takeshi Murakami ,  Takehide Hayashi ,  Kiwamu Tsukamoto ,  Hiroshi Sobukawa ,  Norio Kimura

发明人： Kenji Watanabe ,  Masahiro Hatakeyama ,  Yoshihiko Naito ,  Tatsuya Kohama ,  Kenji Terao ,  Takeshi Murakami ,  Takehide Hayashi ,  Kiwamu Tsukamoto ,  Hiroshi Sobukawa ,  Norio Kimura

IPC分类号： H01J37/244 ,  H01J37/285 ,  H01J37/29

CPC分类号： H01J37/22 ,  H01J37/265 ,  H01J37/29 ,  H01J2237/004 ,  H01J2237/022 ,  H01J2237/24495 ,  H01J2237/24564 ,  H01J2237/2817

摘要： An electro-optical inspection apparatus prevents adhesion of dust or particles to a sample surface, wherein a stage on which a sample is placed is disposed inside a vacuum chamber that can be evacuated, and a dust collecting electrode is disposed to surround a periphery of the sample. The dust collecting electrode is applied with a voltage having the same polarity as a voltage applied to the sample and an absolute value that is the same or larger than an absolute value of the voltage. Because dust or particles adhere to the dust collecting electrode, adhesion of the dust or particles to the sample surface can be reduced. Instead of using the dust collecting electrode, it is possible to form a recess on a wall of the vacuum chamber, or to dispose on the wall a metal plate having a mesh structure to which a predetermined voltage is applied.

摘要翻译： 电光检查装置防止灰尘或颗粒附着到样品表面，其中放置样品的阶段设置在可以抽真空的真空室内，并且集尘电极被设置成围绕 样品。 集尘电极施加与施加到样品的电压极性相同的电压，绝对值等于或大于电压的绝对值。 由于灰尘或颗粒附着在集尘电极上，所以可以减少灰尘或颗粒附着到样品表面。 代替使用集尘电极，可以在真空室的壁上形成凹部，或者在壁上设置具有施加了预定电压的网状结构的金属板。

公开(公告)号：US08274047B2

公开(公告)日：2012-09-25

申请号：US12537414

申请日：2009-08-07

申请人： Yoshihiko Naito ,  Norio Kimura ,  Kenji Terao ,  Masahiro Hatakeyama ,  Masamitsu Itoh

发明人： Yoshihiko Naito ,  Norio Kimura ,  Kenji Terao ,  Masahiro Hatakeyama ,  Masamitsu Itoh

IPC分类号： G01N23/00

CPC分类号： G01N23/203 ,  G01N2223/652

摘要： A substrate surface inspection method inspects for a defect on a substrate including a plurality of materials on a surface thereof. The inspection method comprises: irradiating the surface of the substrate with an electron beam, a landing energy of the electron beam set such that a contrast between at least two types of materials of the plurality of materials is within a predetermined range; detecting electrons generated by the substrate to acquire a surface image of the substrate, with a pattern formed thereon from the at least two types of materials eliminated or weakened; and detecting the defect from the acquired surface image by detecting as the defect an object image having a contrast by which the object image can be distinguished from a background image in the surface image. Defects present on the substrate surface can be detected easily and precisely by using a cell inspection.

摘要翻译： 基板表面检查方法检查在其表面上包括多种材料的基板上的缺陷。 检查方法包括：用电子束照射基板的表面，电子束的着陆能量设定为使得多种材料中的至少两种类型的材料之间的对比度在预定范围内; 检测由所述基板产生的电子以获得所述基板的表面图像，其中从所述至少两种类型的材料形成在其上的图案被消除或削弱; 并且通过将所述对象图像与所述表面图像中的背景图像区分开来的对比度检测作为缺陷来检测来自所获取的表面图像的缺陷。 通过使用细胞检查，可以容易且准确地检测出存在于基板表面上的缺陷。

公开(公告)号：US20100032566A1

公开(公告)日：2010-02-11

申请号：US12537414

申请日：2009-08-07

申请人： Yoshihiko Naito ,  Norio Kimura ,  Kenji Terao ,  Masahiro Hatakeyama ,  Masamitsu Itoh

发明人： Yoshihiko Naito ,  Norio Kimura ,  Kenji Terao ,  Masahiro Hatakeyama ,  Masamitsu Itoh

IPC分类号： G01N23/00

CPC分类号： G01N23/203 ,  G01N2223/652

摘要： A substrate surface inspection method inspects for a defect on a substrate including a plurality of materials on a surface thereof. The inspection method comprises: irradiating the surface of the substrate with an electron beam, a landing energy of the electron beam set such that a contrast between at least two types of materials of the plurality of materials is within a predetermined range; detecting electrons generated by the substrate to acquire a surface image of the substrate, with a pattern formed thereon from the at least two types of materials eliminated or weakened; and detecting the defect from the acquired surface image by detecting as the defect an object image having a contrast by which the object image can be distinguished from a background image in the surface image. Defects present on the substrate surface can be detected easily and precisely by using a cell inspection.

摘要翻译： 基板表面检查方法检查在其表面上包括多种材料的基板上的缺陷。 检查方法包括：用电子束照射基板的表面，电子束的着陆能量设定为使得多种材料中的至少两种类型的材料之间的对比度在预定范围内; 检测由所述基板产生的电子以获得所述基板的表面图像，其中从所述至少两种类型的材料形成在其上的图案被消除或削弱; 并且通过将所述对象图像与所述表面图像中的背景图像区分开来的对比度检测作为缺陷来检测来自所获取的表面图像的缺陷。 通过使用细胞检查，可以容易且准确地检测出存在于基板表面上的缺陷。

公开(公告)号：US09074994B2

公开(公告)日：2015-07-07

申请号：US12500308

申请日：2009-07-09

申请人： Masahiro Hatakeyama ,  Norio Kimura

发明人： Masahiro Hatakeyama ,  Norio Kimura

IPC分类号： G01N23/00 ,  G01N23/225

CPC分类号： G01N23/2251

摘要： A method for inspecting a glass substrate for imprint including a glass substrate with a pattern surface and a transmissive conductive film coating at least part of the pattern surface, includes an electron beam irradiation step of irradiating the pattern surface of the glass substrate for imprint disposed on a stage with an electron beam having a predetermined irradiation area; an electron detection step of simultaneously detecting electrons from the pattern surface by the electron beam irradiation by means of a detection surface with a plurality of pixels; and a defect detection step of obtaining an image of the pattern surface based on the electrons detected by the detection surface and detecting a defect of the pattern surface.

摘要翻译： 一种检查用于印刷的玻璃基板的方法，包括具有图案表面的玻璃基板和至少部分图案表面的透射导电膜涂层，包括电子束照射步骤，将玻璃基板的图案表面照射设置在 具有预定照射区域的电子束的阶段; 电子检测步骤，通过具有多个像素的检测表面通过电子束照射同时从图案表面检测电子; 以及缺陷检测步骤，基于由检测表面检测的电子获得图案表面的图像并检测图案表面的缺陷。

公开(公告)号：US20100012838A1

公开(公告)日：2010-01-21

申请号：US12500308

申请日：2009-07-09

申请人： Masahiro Hatakeyama ,  Norio Kimura

发明人： Masahiro Hatakeyama ,  Norio Kimura

IPC分类号： G01N23/00

CPC分类号： G01N23/2251

摘要： A method for inspecting a glass substrate for imprint including a glass substrate with a pattern surface and a transmissive conductive film coating at least part of the pattern surface, includes an electron beam irradiation step of irradiating the pattern surface of the glass substrate for imprint disposed on a stage with an electron beam having a predetermined irradiation area; an electron detection step of simultaneously detecting electrons from the pattern surface by the electron beam irradiation by means of a detection surface with a plurality of pixels; and a defect detection step of obtaining an image of the pattern surface based on the electrons detected by the detection surface and detecting a defect of the pattern surface.

摘要翻译： 一种检查用于印刷的玻璃基板的方法，包括具有图案表面的玻璃基板和至少部分图案表面的透射导电膜涂层，包括电子束照射步骤，将玻璃基板的图案表面照射设置在 具有预定照射区域的电子束的阶段; 电子检测步骤，通过具有多个像素的检测表面通过电子束照射同时从图案表面检测电子; 以及缺陷检测步骤，基于由检测表面检测的电子获得图案表面的图像并检测图案表面的缺陷。

公开(公告)号：US08895960B2

公开(公告)日：2014-11-25

申请号：US12515585

申请日：2007-11-21

申请人： Masaki Murata ,  Nobuhide Yoneya ,  Norio Kimura

发明人： Masaki Murata ,  Nobuhide Yoneya ,  Norio Kimura

IPC分类号： H01L29/08 ,  H01L51/00 ,  H01L51/10 ,  H01L51/05

CPC分类号： H01L51/0095 ,  H01L51/0035 ,  H01L51/0083 ,  H01L51/0541 ,  H01L51/0545 ,  H01L51/105 ,  Y10T428/31533 ,  Y10T428/31681 ,  Y10T428/31692

摘要： A semiconductor device is provided and includes a field effect transistor having a gate electrode, a gate insulating layer, a channel forming region composed of an organic semiconductor material layer and a source/drain electrode made of a metal. A portion of the source/drain electrode in contact with the organic semiconductor material layer comprising the channel forming region is covered with an electrode coating material. Because the electrode coating material is composed of organic molecules having a functional group which can be bound to a metal ion and a functional group that binds to the source/drain electrode composed of the metal, low contact resistance and high mobility can be achieved.

摘要翻译： 提供一种半导体器件，并且包括具有栅电极，栅极绝缘层，由有机半导体材料层构成的沟道形成区域和由金属制成的源极/漏极电极的场效应晶体管。 与包含沟道形成区域的有机半导体材料层接触的源极/漏极电极的一部分被电极涂覆材料覆盖。 由于电极涂层材料由具有与金属离子结合的官能团的有机分子和与由金属构成的源/漏电极结合的官能团构成，所以可以实现低接触电阻和高迁移率。

公开(公告)号：US08657135B2

公开(公告)日：2014-02-25

申请号：US13505155

申请日：2010-10-29

申请人： Daisuke Yamashita ,  Norio Kimura ,  Masakazu Yoshida ,  Mitsuo Tashiro

发明人： Daisuke Yamashita ,  Norio Kimura ,  Masakazu Yoshida ,  Mitsuo Tashiro

IPC分类号： A61J9/04 ,  A61J11/02

CPC分类号： A61J9/04 ,  A61J11/02 ,  A61J11/04

摘要： An artificial nipple can include a nipple tip section that can sufficiently reach the sucking fossa and can be appropriately squashed The artificial nipple can have a base section that widens to match an attachment object, an areola section formed contiguously to the base section and that extends while narrowing gradually, and a nipple section that extends from the areola section and that narrows more than the areola section. A flange section can be provided in the base section with a predetermined thickness. A check valve can be formed with a valve body so as to be entirely accommodated within the thickness dimension of the flange, and provided in the base section.

摘要翻译： 人造乳头可以包括可以充分到达吸吮窝并能够适当地挤压的乳头末端部分。人造乳头可以具有加宽以匹配附着对象的基部部分，与基部部分连续形成并且延伸的乳晕部分 逐渐变细，以及从乳晕部分延伸并且比乳晕部分更窄的乳头部分。 凸缘部分可以以预定厚度设置在基部部分中。 止回阀可以形成有阀体，以便完全容纳在凸缘的厚度尺寸内，并设置在基部中。