公开(公告)号：US08624182B2

公开(公告)日：2014-01-07

申请号：US13195927

申请日：2011-08-02

申请人： Kenji Watanabe ,  Masahiro Hatakeyama ,  Yoshihiko Naito ,  Tatsuya Kohama ,  Kenji Terao ,  Takeshi Murakami ,  Takehide Hayashi ,  Kiwamu Tsukamoto ,  Hiroshi Sobukawa ,  Norio Kimura

发明人： Kenji Watanabe ,  Masahiro Hatakeyama ,  Yoshihiko Naito ,  Tatsuya Kohama ,  Kenji Terao ,  Takeshi Murakami ,  Takehide Hayashi ,  Kiwamu Tsukamoto ,  Hiroshi Sobukawa ,  Norio Kimura

IPC分类号： H01J37/244 ,  H01J37/285 ,  H01J37/29

CPC分类号： H01J37/22 ,  H01J37/265 ,  H01J37/29 ,  H01J2237/004 ,  H01J2237/022 ,  H01J2237/24495 ,  H01J2237/24564 ,  H01J2237/2817

摘要： An electro-optical inspection apparatus prevents adhesion of dust or particles to a sample surface, wherein a stage on which a sample is placed is disposed inside a vacuum chamber that can be evacuated, and a dust collecting electrode is disposed to surround a periphery of the sample. The dust collecting electrode is applied with a voltage having the same polarity as a voltage applied to the sample and an absolute value that is the same or larger than an absolute value of the voltage. Because dust or particles adhere to the dust collecting electrode, adhesion of the dust or particles to the sample surface can be reduced. Instead of using the dust collecting electrode, it is possible to form a recess on a wall of the vacuum chamber, or to dispose on the wall a metal plate having a mesh structure to which a predetermined voltage is applied.

摘要翻译： 电光检查装置防止灰尘或颗粒附着到样品表面，其中放置样品的阶段设置在可以抽真空的真空室内，并且集尘电极被设置成围绕 样品。 集尘电极施加与施加到样品的电压极性相同的电压，绝对值等于或大于电压的绝对值。 由于灰尘或颗粒附着在集尘电极上，所以可以减少灰尘或颗粒附着到样品表面。 代替使用集尘电极，可以在真空室的壁上形成凹部，或者在壁上设置具有施加了预定电压的网状结构的金属板。

公开(公告)号：US20120235036A1

公开(公告)日：2012-09-20

申请号：US13420731

申请日：2012-03-15

申请人： Masahiro Hatakeyama ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Yoshihiko Naito ,  Yasushi Toma ,  Tsutomu Karimata ,  Takehide Hayashi ,  Kiwamu Tsukamoto ,  Tatsuya Kohama ,  Noboru Kobayashi

发明人： Masahiro Hatakeyama ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Yoshihiko Naito ,  Yasushi Toma ,  Tsutomu Karimata ,  Takehide Hayashi ,  Kiwamu Tsukamoto ,  Tatsuya Kohama ,  Noboru Kobayashi

IPC分类号： G01N23/225

CPC分类号： H01J37/073 ,  G01N23/22 ,  G01N23/223 ,  G01N23/2251 ,  G01N2223/611 ,  H01J1/34 ,  H01J37/09 ,  H01J37/10 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/265 ,  H01J37/28 ,  H01J37/29 ,  H01J2237/0048 ,  H01J2237/022 ,  H01J2237/032 ,  H01J2237/038 ,  H01J2237/045 ,  H01J2237/0458 ,  H01J2237/0473 ,  H01J2237/0492 ,  H01J2237/061 ,  H01J2237/06333 ,  H01J2237/166 ,  H01J2237/186 ,  H01J2237/2002 ,  H01J2237/2007 ,  H01J2237/2008 ,  H01J2237/2448 ,  H01J2237/2482 ,  H01J2237/2485 ,  H01J2237/2817 ,  H01J2237/2855 ,  H01J2237/2857

摘要： An inspection device for inspecting a surface of an inspection object using a beam includes a beam generator capable of generating one of either charge particles or an electromagnetic wave as a beam, a primary optical system capable of guiding and irradiating the beam to the inspection object supported within a working chamber, a secondary optical system capable of including a first movable numerical aperture and a first detector which detects secondary charge particles generated from the inspection object, the secondary charge particles passing through the first movable numerical aperture, an image processing system capable of forming an image based on the secondary charge particles detected by the first detector; and a second detector arranged between the first movable numerical aperture and the first detector and which detects a location and shape at a cross over location of the secondary charge particles generated from the inspection object.

摘要翻译： 用于使用光束检查检查对象的表面的检查装置包括能够产生电荷粒子或电磁波之一作为光束的光束发生器，能够将所述光束引导并照射到被检查对象的主光学系统 在工作室内，能够包括第一可移动数值孔径的二次光学系统和检测从检查对象产生的二次电荷粒子的第一检测器，通过第一可移动数值孔径的二次电荷粒子，能够 基于由所述第一检测器检测到的次级电荷粒子形成图像; 以及第二检测器，其布置在第一可移动数值孔径和第一检测器之间，并且检测在从检查对象生成的次级充电颗粒的交叉位置处的位置和形状。

公开(公告)号：US08497476B2

公开(公告)日：2013-07-30

申请号：US13420731

申请日：2012-03-15

申请人： Masahiro Hatakeyama ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Yoshihiko Naito ,  Yasushi Toma ,  Tsutomu Karimata ,  Takehide Hayashi ,  Kiwamu Tsukamoto ,  Tatsuya Kohama ,  Noboru Kobayashi

发明人： Masahiro Hatakeyama ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Yoshihiko Naito ,  Yasushi Toma ,  Tsutomu Karimata ,  Takehide Hayashi ,  Kiwamu Tsukamoto ,  Tatsuya Kohama ,  Noboru Kobayashi

IPC分类号： G01N23/225

CPC分类号： H01J37/073 ,  G01N23/22 ,  G01N23/223 ,  G01N23/2251 ,  G01N2223/611 ,  H01J1/34 ,  H01J37/09 ,  H01J37/10 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/265 ,  H01J37/28 ,  H01J37/29 ,  H01J2237/0048 ,  H01J2237/022 ,  H01J2237/032 ,  H01J2237/038 ,  H01J2237/045 ,  H01J2237/0458 ,  H01J2237/0473 ,  H01J2237/0492 ,  H01J2237/061 ,  H01J2237/06333 ,  H01J2237/166 ,  H01J2237/186 ,  H01J2237/2002 ,  H01J2237/2007 ,  H01J2237/2008 ,  H01J2237/2448 ,  H01J2237/2482 ,  H01J2237/2485 ,  H01J2237/2817 ,  H01J2237/2855 ,  H01J2237/2857

摘要： An inspection device for inspecting a surface of an inspection object using a beam includes a beam generator capable of generating one of either charge particles or an electromagnetic wave as a beam, a primary optical system capable of guiding and irradiating the beam to the inspection object supported within a working chamber, a secondary optical system capable of including a first movable numerical aperture and a first detector which detects secondary charge particles generated from the inspection object, the secondary charge particles passing through the first movable numerical aperture, an image processing system capable of forming an image based on the secondary charge particles detected by the first detector; and a second detector arranged between the first movable numerical aperture and the first detector and which detects a location and shape at a cross over location of the secondary charge particles generated from the inspection object.

摘要翻译： 用于使用光束检查检查对象的表面的检查装置包括能够产生电荷粒子或电磁波之一作为光束的光束发生器，能够将所述光束引导并照射到被检查对象的主光学系统 在工作室内，能够包括第一可移动数值孔径的二次光学系统和检测从检查对象产生的二次电荷粒子的第一检测器，通过第一可移动数值孔径的二次电荷粒子，能够 基于由所述第一检测器检测到的次级电荷粒子形成图像; 以及第二检测器，其布置在第一可移动数值孔径和第一检测器之间，并且检测在从检查对象生成的次级充电颗粒的交叉位置处的位置和形状。

公开(公告)号：US5935337A

公开(公告)日：1999-08-10

申请号：US634847

申请日：1996-04-19

申请人： Noriyuki Takeuchi ,  Takeshi Murakami ,  Hiroyuki Shinozaki ,  Kiwamu Tsukamoto ,  Masaru Nakaniwa ,  Naoki Matsuda

发明人： Noriyuki Takeuchi ,  Takeshi Murakami ,  Hiroyuki Shinozaki ,  Kiwamu Tsukamoto ,  Masaru Nakaniwa ,  Naoki Matsuda

IPC分类号： C23C16/44 ,  C23C16/455 ,  C23C16/52 ,  C23C16/00

CPC分类号： C23C16/4557 ,  C23C16/45565 ,  C23C16/52

摘要： A thin-film vapor deposition apparatus has a reaction casing defining a reaction chamber, a stage for supporting a substrate, the stage being disposed in the reaction chamber, and a shower head supported on the reaction casing in confronting relation to the stage for discharging a material gas toward the substrate on the stage for depositing a thin film on the substrate. A plurality of flow path systems are disposed in various regions of the shower head and the reaction casing for passage therethrough a heating medium to control the temperatures of the regions under the control of a temperature controller.

摘要翻译： 薄膜蒸镀装置具有限定反应室的反应壳体，用于支撑基板的台，设置在反应室中的台以及与用于排出反应室的台相对的支撑在反应壳体上的喷头 原料气体朝向在基板上沉积薄膜的载物台上的基板。 多个流路系统设置在淋浴喷头和反应壳体的各个区域中，用于通过加热介质以控制温度控制器控制下的区域的温度。

公开(公告)号：US5728223A

公开(公告)日：1998-03-17

申请号：US662763

申请日：1996-06-10

申请人： Takeshi Murakami ,  Noriyuki Takeuchi ,  Hiroyuki Shinozaki ,  Kiwamu Tsukamoto ,  Yukio Fukunaga ,  Akihisa Hongo

发明人： Takeshi Murakami ,  Noriyuki Takeuchi ,  Hiroyuki Shinozaki ,  Kiwamu Tsukamoto ,  Yukio Fukunaga ,  Akihisa Hongo

IPC分类号： C23C16/44 ,  C23C16/448 ,  C23C16/455 ,  C30B25/14 ,  H01L21/205 ,  H01L21/31 ,  C23C16/00

CPC分类号： C23C16/45512 ,  C23C16/455 ,  C23C16/45565 ,  C23C16/4557 ,  C30B25/14

摘要： A reactant gas ejector head in a thin-film vapor deposition apparatus includes at least two reactant gas inlet passages for introducing reactant gases, a gas mixing chamber for mixing reactant gases introduced from the reactant gas inlet passages, and a nozzle disposed downstream of the gas mixing chamber for rectifying the mixed gases from the gas mixing chamber into a uniform flow and applying the uniform flow to a substrate.

摘要翻译： 薄膜气相沉积设备中的反应气体喷射头包括至少两个用于引入反应气体的反应气体入口通道，用于混合从反应气体入口通道引入的反应气体的气体混合室和设置在气体下游的喷嘴 混合室，用于将来自气体混合室的混合气体整流成均匀的流动并将均匀的流动施加到基底。

公开(公告)号：US06176929B1

公开(公告)日：2001-01-23

申请号：US09118177

申请日：1998-07-17

申请人： Yukio Fukunaga ,  Hiroyuki Shinozaki ,  Kiwamu Tsukamoto ,  Mitsunao Shibasaki ,  Kuniaki Horie ,  Hiroyuki Ueyama ,  Takeshi Murakami

发明人： Yukio Fukunaga ,  Hiroyuki Shinozaki ,  Kiwamu Tsukamoto ,  Mitsunao Shibasaki ,  Kuniaki Horie ,  Hiroyuki Ueyama ,  Takeshi Murakami

IPC分类号： C23C1600

CPC分类号： C23C16/45565 ,  C23C16/4412 ,  C23C16/4557 ,  C23C16/45591 ,  C23C16/46

摘要： A compact thin-film deposition apparatus can promote a stable growth of a high quality thin-film product of uniform quality. The apparatus comprises a vacuum-tight deposition chamber enclosing a substrate holding device for holding a substrate. An elevator device for moving the substrate holding device and a gas showering head for flowing a film forming gas towards the substrate are provided. A transport opening and an exhaust opening are provided on a wall section of the deposition chamber at a height corresponding to the transport position and the deposition position, respectively. The deposition chamber is provided with a flow guiding member, and the flow guiding member comprises a cylindrical member to surround an elevating path of the substrate holding device and a first ring member to vertically divide a chamber space at a height between the exhaust opening and the transport opening.

摘要翻译： 紧凑的薄膜沉积装置可以促进质量均匀的高质量薄膜产品的稳定生长。 该装置包括一个真空密封的沉积室，其包围用于保持基板的基板保持装置。 提供了一种用于移动基板保持装置的电梯装置和用于使成膜气体朝向基板流动的气体淋浴头。 输送开口和排气口分别设置在沉积室的壁部分上，其高度分别对应于输送位置和沉积位置。 沉积室设置有导流构件，并且流动引导构件包括圆筒构件以包围基板保持装置的升降路径和第一环构件，以在排气口和排气口之间的高度垂直分隔腔室空间 运输开放。

公开(公告)号：US6022413A

公开(公告)日：2000-02-08

申请号：US664544

申请日：1996-06-17

申请人： Hiroyuki Shinozaki ,  Yukio Fukunaga ,  Takeshi Murakami ,  Kiwamu Tsukamoto

发明人： Hiroyuki Shinozaki ,  Yukio Fukunaga ,  Takeshi Murakami ,  Kiwamu Tsukamoto

IPC分类号： C23C16/458 ,  C23C16/46 ,  C30B25/10 ,  C30B25/12 ,  C23C14/00 ,  C23C16/00

CPC分类号： C30B25/10 ,  C23C16/4584 ,  C23C16/46 ,  C30B25/12

摘要： A thin-film vapor deposition apparatus has a reaction chamber for holding therein a substrate in an atmosphere isolated from an ambient atmosphere. For depositing a thin film on the substrate, the temperature of an inner wall of the reaction chamber is adjusted to control the temperature of the atmosphere in the reaction chamber, and the temperature of the substrate is also adjusted independently of the temperature of the atmosphere in the reaction chamber, while the substrate is being rotated at a high speed in the reaction chamber. Reactant gases required to deposit a thin film on the substrate are ejected from a reactant gas elector head toward the substrate in the reaction chamber. Remaining and excessive gases are discharged out of the reaction chamber.

摘要翻译： 薄膜蒸镀装置具有用于在与环境气氛隔离的气氛中保持基板的反应室。 为了在基板上沉积薄膜，调整反应室内壁的温度以控制反应室中的气氛的温度，并且基板的温度也独立于大气温度 反应室，同时基板在反应室中高速旋转。 在基板上沉积薄膜所需的反应物气体从反应气体选择器头向反应室内的基板喷出。 剩余的和过量的气体从反应室排出。

公开(公告)号：US5950646A

公开(公告)日：1999-09-14

申请号：US3947

申请日：1998-01-08

申请人： Kuniaki Horie ,  Hidenao Suzuki ,  Tsutomu Nakada ,  Takeshi Murakami ,  Yukio Fukunaga ,  Masahito Abe ,  Hiroyuki Shinozaki ,  Kiwamu Tsukamoto ,  Mitsunao Shibasaki ,  Yuji Araki ,  Hiroyuki Ueyama

发明人： Kuniaki Horie ,  Hidenao Suzuki ,  Tsutomu Nakada ,  Takeshi Murakami ,  Yukio Fukunaga ,  Masahito Abe ,  Hiroyuki Shinozaki ,  Kiwamu Tsukamoto ,  Mitsunao Shibasaki ,  Yuji Araki ,  Hiroyuki Ueyama

IPC分类号： B08B9/00 ,  C23C16/44 ,  C23C16/448 ,  B08B3/10

CPC分类号： C23C16/448 ,  B08B9/00 ,  C23C16/4407 ,  Y10S134/902

摘要： A vapor feed supply system including a vaporizer device and a method of cleaning a vapor flow region employing such a vaporizer device enables thorough cleaning of the system, without having to degrade the overall system vacuum in the process of cleaning the vaporizer device. The method includes defining a cleaning fluid passage having a predetermined withstand pressure by isolating a cleaning region of the vapor flow region, and flowing a cleaning fluid into the cleaning fluid passage under a pressure so as to enable the cleaning fluid to remain in a liquid state at a cleaning temperature of the cleaning region.

摘要翻译： 包括蒸发器装置和使用这种蒸发器装置的蒸汽流动区域的清洁方法的蒸汽供给系统能够彻底清洁系统，而不必在清洁蒸发器装置的过程中降低整个系统的真空度。 该方法包括通过隔离蒸汽流动区域的清洁区域来限定具有预定耐受压力的清洁流体通道，并且在压力下将清洁流体流入清洁流体通道以使清洁流体保持在液体状态 在清洁区域的清洁温度下。

公开(公告)号：US06419462B1

公开(公告)日：2002-07-16

申请号：US09627779

申请日：2000-07-28

申请人： Kuniaki Horie ,  Yukio Fukunaga ,  Akihisa Hongo ,  Kiwamu Tsukamoto ,  Kenji Kamoda ,  Hirotake Yamagishi ,  Shinya Uemura

发明人： Kuniaki Horie ,  Yukio Fukunaga ,  Akihisa Hongo ,  Kiwamu Tsukamoto ,  Kenji Kamoda ,  Hirotake Yamagishi ,  Shinya Uemura

IPC分类号： F04B4310

CPC分类号： F04B13/00 ,  F04B43/02 ,  F04B43/073 ,  F04B43/113 ,  F04B53/143 ,  F04B2205/07

摘要： A positive displacement liquid-delivery apparatus includes a positive displacement pump 110 and a differential pressure control unit 142. The positive displacement pump 110 includes a liquid-delivery chamber 128 having a watertight housing 122 with one part formed of a flexible diaphragm 124, and a diaphragm driver 136 linked to the diaphragm 124 for deforming the same to discharge fluid from the liquid-delivery chamber 128. The differential pressure control unit 142 uniformly controls the differential pressure inside and outside the diaphragm 124 during the pumping process.

摘要翻译： 正排量输送装置包括容积泵110和差压控制单元142.正排量泵110包括具有防水外壳122的液体输送室128，其中一部分由柔性膜片124形成， 膜片驱动器136连接到隔膜124，用于使其变形以从液体输送室128排出流体。差压控制单元142在泵送过程期间均匀地控制膜片124内部和外部的压差。

公开(公告)号：US20070092651A1

公开(公告)日：2007-04-26

申请号：US11614224

申请日：2006-12-21

申请人： Hiroyuki Shinozaki ,  Yasushi Kojima ,  Shunichi Aiyoshizawa ,  Kiwamu Tsukamoto

发明人： Hiroyuki Shinozaki ,  Yasushi Kojima ,  Shunichi Aiyoshizawa ,  Kiwamu Tsukamoto

IPC分类号： B05D3/00 ,  C23C16/52 ,  C23C14/00

CPC分类号： G03F7/7075 ,  G03F7/70808 ,  G03F7/70991 ,  G03F9/7003 ,  G03F9/7011 ,  H01L21/67017 ,  H01L21/67225 ,  H01L21/67248 ,  H01L21/67748 ,  H01L21/68 ,  H01L21/681

摘要： A substrate treatment apparatus that treats a substrate under treatment has an interface section, a substrate loading/unloading section, a reduced pressure atmosphere conveyance chamber, and an exposure treatment chamber. The interface section has a conveyance mechanism that can freely load and unload the substrate under treatment from another device into the apparatus or vice versa. The substrate under treatment can be loaded and unloaded into and from the substrate loading/unloading section in one direction by the conveyance mechanism of the interface section. The reduced pressure atmosphere conveyance chamber is disposed adjacent to and perpendicular to the direction of the substrate loading/unloading section and has a conveyance mechanism that conveys the substrate under treatment under a reduced pressure atmosphere. The exposure treatment chamber is disposed adjacent to and in parallel with the direction of the reduced pressure atmosphere conveyance chamber and performs an exposure treatment for the substrate under treatment.