公开(公告)号：US06624257B2

公开(公告)日：2003-09-23

申请号：US09931769

申请日：2001-08-20

申请人： Masami Yoshida ,  Isao Yoshida ,  Satoshi Yamaguchi

发明人： Masami Yoshida ,  Isao Yoshida ,  Satoshi Yamaguchi

IPC分类号： C08F800

CPC分类号： C08F8/00 ,  C08F2800/10 ,  C08F2810/30 ,  C08F12/24

摘要： A method of quantifying the protection ratio of a hydroxyl group of a polymer compound, comprising calculating the protection ratio of a hydroxyl group of a polymer compound using a multiple regression calibration curve obtained by regression-analyzing main components of near infrared absorption spectra of a plurality of standards samples, from near infrared absorption spectra of samples containing a polymer compound composed of the following first structural unit and second structural unit: first structural unit: a structural unit of a structure having a hydroxyl group, second structural unit: a structural unit of a structure obtained by introducing a protective group into a hydroxyl group in the first structural unit. By this method, the protection ratio of a hydroxyl group of the polymer compound contained in a sample can be quantified with high precision in a short period of time without isolating the polymer compound.

摘要翻译： 一种量化高分子化合物的羟基的保护率的方法，包括使用多元回归校准曲线计算高分子化合物的羟基的保护比，该多元回归校准曲线通过回归分析多个红外线吸收光谱的主要成分 标准样品，来自包含由以下第一结构单元和第二结构单元组成的高分子化合物的样品的近红外吸收光谱：第一结构单元：具有羟基的结构的结构单元，第二结构单元： 通过在第一结构单元中将保护基引入羟基而获得的结构。 通过该方法，可以在不分离高分子化合物的情况下，在短时间内高精度地定量样品中所含的高分子化合物的羟基的保护率。

公开(公告)号：US08530135B2

公开(公告)日：2013-09-10

申请号：US12888243

申请日：2010-09-22

申请人： Satoshi Yamaguchi ,  Soon Shin Kim ,  Isao Yoshida ,  Koji Ichikawa

发明人： Satoshi Yamaguchi ,  Soon Shin Kim ,  Isao Yoshida ,  Koji Ichikawa

IPC分类号： G03F7/039 ,  G03F7/20 ,  G03F7/30 ,  G03F7/38

CPC分类号： G03F7/0045 ,  G03F7/0046 ,  G03F7/0397

摘要： The present invention provides a photoresist composition comprising a resin having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid, an acid generator and a compound represented by the formula (I): wherein Z1 represents a C7-C20 alkylene group, a C3-C20 divalent saturated cyclic group or a divalent group formed by combining at least one C1-C6 alkylene group with at least one C3-C20 divalent saturated cyclic group.

摘要翻译： 本发明提供了一种光致抗蚀剂组合物，其包含具有酸不稳定基团的树脂，并且在碱性水溶液中不溶或难溶，但是通过酸，酸产生剂和由 式（I）：其中Z1表示C7-C20亚烷基，C3-C20二价饱和环状基团或通过将至少一个C 1 -C 6亚烷基与至少一个C 3 -C 20二价饱和环状基团结合形成的二价基团 。

公开(公告)号：US20110020749A1

公开(公告)日：2011-01-27

申请号：US12844557

申请日：2010-07-27

申请人： Koji Ichikawa ,  Isao Yoshida ,  Satoshi Yamaguchi

发明人： Koji Ichikawa ,  Isao Yoshida ,  Satoshi Yamaguchi

IPC分类号： G03F7/004 ,  C07C69/757 ,  C07D307/77 ,  C07C69/78 ,  C07C69/65 ,  C07D333/46

CPC分类号： C07C381/12 ,  C07C309/17 ,  C07C2601/14 ,  C07C2603/74 ,  C07D307/77 ,  C07D333/46 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397

摘要： The object of the present invention is to provide a chemically amplified resist composition excellent in a resolution and a mask error enhancement factor.By employing the salt represented by the formulae (A1) as an acid generator of a resist composition, the above mentioned object is achieved. wherein Z+ represents an organic cation, Q1 and Q2 each independently represent a fluorine atom or a perfluoroalkyl group, Ra2 represents a divalent alicyclic hydrocarbon group pr the like, Ra2 represents an elimination group represented by the formulae (II-1) or (II-2). In the formulae (II-1) or (II-2), Ra3 and Ra4 each independently represent a hydrogen atom or an aliphatic hydrocarbon group, Ra5 represents an aliphatic hydrocarbon group, Ra6 represents a divalent aliphatic hydrocarbon group, and Ra7 represents an aliphatic hydrocarbon group.

摘要翻译： 本发明的目的是提供一种分辨率和掩模误差增强因子优异的化学放大抗蚀剂组合物。 通过使用由式（A1）表示的盐作为抗蚀剂组合物的酸产生剂，实现了上述目的。 其中Z +表示有机阳离子，Q1和Q2各自独立地表示氟原子或全氟烷基，Ra2表示二价脂环族烃基，Ra2表示由式（II-1）或（II- 2）。 在式（II-1）或（II-2）中，Ra 3和Ra 4各自独立地表示氢原子或脂肪族烃基，Ra 5表示脂肪族烃基，Ra 6表示二价脂肪族烃基，Ra 7表示脂肪族 烃基。

公开(公告)号：US07301047B2

公开(公告)日：2007-11-27

申请号：US11586640

申请日：2006-10-26

申请人： Isao Yoshida ,  Yukako Harada ,  Satoshi Yamaguchi

发明人： Isao Yoshida ,  Yukako Harada ,  Satoshi Yamaguchi

IPC分类号： C07C69/00

CPC分类号： C07C381/12 ,  C07C25/18 ,  C07C309/17 ,  C07C2601/14 ,  C07C2602/42 ,  C07D333/46 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0395 ,  G03F7/0397

摘要： The present invention provides a salt of the formula (I): wherein ring X represents monocyclic or bicyclic hydrocarbon group having 3 to 30 carbon atoms, and one or more hydrogen atom in the ring X is optionally substituted with alkyl group having 1 to 6 carbon atoms, alkenyl group having 2 to 6 carbon atoms, alkoxy group having 2 to 6 carbon atoms or perfluoroalkyl group having 1 to 4 carbon atoms; Q1 and Q2 each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; A+ represents organic counter ion; and n shows an integer of 1 to 12. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I).

摘要翻译： 本发明提供式（I）的盐：其中环X表示具有3-30个碳原子的单环或双环烃基，并且环X中的一个或多个氢原子任选被具有1至6个碳原子的烷基取代 碳原子数2〜6的烯基，碳原子数2〜6的烷氧基或碳原子数1〜4的全氟烷基; Q 1和Q 2各自独立地表示氟原子或具有1至6个碳原子的全氟烷基; A ^{+ 代表有机抗衡离子; 并且n表示1至12的整数。本发明还提供包含式（I）的盐的化学放大抗蚀剂组合物。}

公开(公告)号：US20110076617A1

公开(公告)日：2011-03-31

申请号：US12888243

申请日：2010-09-22

申请人： Satoshi Yamaguchi ,  Soon Shin Kim ,  Isao Yoshida ,  Koji Ichikawa

发明人： Satoshi Yamaguchi ,  Soon Shin Kim ,  Isao Yoshida ,  Koji Ichikawa

IPC分类号： G03F7/20 ,  G03C1/73

CPC分类号： G03F7/0045 ,  G03F7/0046 ,  G03F7/0397

摘要： The present invention provides a photoresist composition comprising a resin having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid, an acid generator and a compound represented by the formula (I): wherein Z1 represents a C7-C20 alkylene group, a C3-C20 divalent saturated cyclic group or a divalent group formed by combining at least one C1-C6 alkylene group with at least one C3-C20 divalent saturated cyclic group.

摘要翻译： 本发明提供了一种光致抗蚀剂组合物，其包含具有酸不稳定基团的树脂，并且在碱性水溶液中不溶或难溶，但是通过酸，酸产生剂和由 式（I）：其中Z1表示C7-C20亚烷基，C3-C20二价饱和环状基团或通过将至少一个C 1 -C 6亚烷基与至少一个C 3 -C 20二价饱和环状基团结合形成的二价基团 。

公开(公告)号：US20070122750A1

公开(公告)日：2007-05-31

申请号：US11600884

申请日：2006-11-17

申请人： Satoshi Yamaguchi ,  Yukako Harada ,  Isao Yoshida

发明人： Satoshi Yamaguchi ,  Yukako Harada ,  Isao Yoshida

IPC分类号： G03C5/00 ,  C07C309/12

CPC分类号： G03F7/0045 ,  C07C309/17 ,  C07C381/12 ,  C07C2601/08 ,  C07C2601/14 ,  C07C2603/74 ,  G03F7/0397

摘要： The present invention provides a salt of the formula (I): wherein ring X represents monocyclic or polycyclic hydrocarbon group having 3 to 30 carbon atoms, and one or more hydrogen atom in the monocyclic or polycyclic hydrocarbon group is optionally substituted with alkyl group having 1 to 10 carbon atom, alkoxy group having 1 to 10 carbon atom, perfluoroalkyl group having 1 to 4 carbon atoms, hydroxyalkyl group having 1 to 10 carbon atoms or cyano group; Q1 and Q2 each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; and A+ represents organic counter ion. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I).

摘要翻译： 本发明提供式（I）的盐：其中环X表示碳原子数为3〜30的单环或多环烃基，单环或多环烃基中的一个或多个氢原子任选被具有1个 10个碳原子，碳原子数1〜10的烷氧基，碳原子数1〜4的全氟烷基，碳原子数1〜10的羟基烷基或氰基。 Q 1和Q 2各自独立地表示氟原子或具有1至6个碳原子的全氟烷基; 而A +表示有机抗衡离子。 本发明还提供了包含式（I）的盐的化学放大抗蚀剂组合物。

公开(公告)号：US20070027336A1

公开(公告)日：2007-02-01

申请号：US11390319

申请日：2006-03-28

申请人： Isao Yoshida ,  Yukako Harada ,  Satoshi Yamaguchi ,  Nobuo Ando

发明人： Isao Yoshida ,  Yukako Harada ,  Satoshi Yamaguchi ,  Nobuo Ando

IPC分类号： C07C309/51

CPC分类号： C07C309/17 ,  C07C2603/74

摘要： The present invention provides a salt of the formula (L) A salt of the formula (L): wherein Q represents —CO— group or —C(OH)— group; ring X represents monocyclic or polycyclic hydrocarbon group having 3 to 30 carbon atoms in which a hydrogen atom is substituted with a hydroxyl group at Q position when Q is —C(OH)— group or in which two hydrogen atoms are substituted with ≡O group at Q position when Q is —CO— group, and at least one hydrogen atom in the monocylic or polycyclic hydrocarbon group may optionally be substituted with alkyl group having 1 to 6 carbon atom, alkoxy group having 1 to 6 carbon atom, perfluoroalkyl group having 1 to 4 carbon atoms, hydroxyalkyl group having 1 to 6 carbon atoms, hydroxyl group or cyano group; R10 and R20 each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; and A+ represents organic counter ion. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (L).

摘要翻译： 本发明提供式（L）的盐式（L）的盐：其中Q表示-CO-基或-C（OH） - 基; 环X表示当Q为-C（OH） - 基团或其中两个氢原子被≡O基团取代时，其中氢原子被Q位羟基取代的具有3-30个碳原子的单环或多环烃基 在Q为-CO-基的Q位置，单环或多环烃基中的至少一个氢原子可以任选被具有1至6个碳原子的烷基，具有1至6个碳原子的烷氧基，具有1至6个碳原子的烷氧基， 1至4个碳原子，具有1至6个碳原子的羟基烷基，羟基或氰基; R 10和R 20各自独立地表示氟原子或具有1至6个碳原子的全氟烷基; 而A +表示有机抗衡离子。 本发明还提供了包含式（L）的盐的化学放大抗蚀剂组合物。

公开(公告)号：US08288077B2

公开(公告)日：2012-10-16

申请号：US12844557

申请日：2010-07-27

申请人： Koji Ichikawa ,  Isao Yoshida ,  Satoshi Yamaguchi

发明人： Koji Ichikawa ,  Isao Yoshida ,  Satoshi Yamaguchi

IPC分类号： G03F7/004 ,  C07C309/00

CPC分类号： C07C381/12 ,  C07C309/17 ,  C07C2601/14 ,  C07C2603/74 ,  C07D307/77 ,  C07D333/46 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397

摘要： The object of the present invention is to provide a chemically amplified resist composition excellent in a resolution and a mask error enhancement factor.By employing the salt represented by the formulae (A1) as an acid generator of a resist composition, the above mentioned object is achieved. wherein Z+ represents an organic cation, Q1 and Q2 each independently represent a fluorine atom or a perfluoroalkyl group, Ra2 represents a divalent alicyclic hydrocarbon group pr the like, Ra2 represents an elimination group represented by the formulae (II-1) or (II-2). In the formulae (II-1) or (II-2), Ra3 and Ra4 each independently represent a hydrogen atom or an aliphatic hydrocarbon group, Ra5 represents an aliphatic hydrocarbon group, Ra6 represents a divalent aliphatic hydrocarbon group, and Ra7 represents an aliphatic hydrocarbon group.

摘要翻译： 本发明的目的是提供一种分辨率和掩模误差增强因子优异的化学放大抗蚀剂组合物。 通过使用由式（A1）表示的盐作为抗蚀剂组合物的酸产生剂，实现了上述目的。 其中Z +表示有机阳离子，Q1和Q2各自独立地表示氟原子或全氟烷基，Ra2表示二价脂环族烃基，Ra2表示由式（II-1）或（II- 2）。 在式（II-1）或（II-2）中，Ra 3和Ra 4各自独立地表示氢原子或脂肪族烃基，Ra 5表示脂肪族烃基，Ra 6表示二价脂肪族烃基，Ra 7表示脂肪族 烃基。

公开(公告)号：US08124803B2

公开(公告)日：2012-02-28

申请号：US11390319

申请日：2006-03-28

申请人： Isao Yoshida ,  Yukako Harada ,  Satoshi Yamaguchi ,  Nobuo Ando

发明人： Isao Yoshida ,  Yukako Harada ,  Satoshi Yamaguchi ,  Nobuo Ando

IPC分类号： C07C309/19

CPC分类号： C07C309/17 ,  C07C2603/74

摘要： The present invention provides a salt of the formula (L)A salt of the formula (L): wherein Q represents —CO— group or —C(OH)— group; ring X represents monocyclic or polycyclic hydrocarbon group having 3 to 30 carbon atoms in which a hydrogen atom is substituted with a hydroxyl group at Q position when Q is —C(OH)— group or in which two hydrogen atoms are substituted with ═O group at Q position when Q is —CO— group, and at least one hydrogen atom in the monocylic or polycyclic hydrocarbon group may optionally be substituted with alkyl group having 1 to 6 carbon atom, alkoxy group having 1 to 6 carbon atom, perfluoroalkyl group having 1 to 4 carbon atoms, hydroxyalkyl group having 1 to 6 carbon atoms, hydroxyl group or cyano group; R10 and R20 each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; and A+ represents organic counter ion. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (L).

摘要翻译： 本发明提供式（L）的盐式（L）的盐：其中Q表示-CO-基或-C（OH） - 基; 环X表示具有3〜30个碳原子的单环或多环烃基，其中当Q为-C（OH） - 基时，其中氢原子被Q位上的羟基取代，或其中两个氢原子被取代为= 在Q为-CO-基的Q位置，单环或多环烃基中的至少一个氢原子可以任选被具有1至6个碳原子的烷基，具有1至6个碳原子的烷氧基，具有1至6个碳原子的烷氧基， 1至4个碳原子，具有1至6个碳原子的羟基烷基，羟基或氰基; R 10和R 20各自独立地表示氟原子或具有1〜6个碳原子的全氟烷基; 而A +代表有机抗衡离子。 本发明还提供了包含式（L）的盐的化学放大抗蚀剂组合物。

公开(公告)号：US07527910B2

公开(公告)日：2009-05-05

申请号：US11644955

申请日：2006-12-26

申请人： Satoshi Yamaguchi ,  Isao Yoshida ,  Yukako Harada

发明人： Satoshi Yamaguchi ,  Isao Yoshida ,  Yukako Harada

IPC分类号： G03F7/004 ,  C07C69/00

CPC分类号： G03F7/0045 ,  C07C25/18 ,  C07C309/17 ,  C07C381/12 ,  C07C2603/18 ,  G03F7/0397 ,  Y10S430/122

摘要： The present invention provides a salt of the formula (I): wherein X represents alkylene group or substituted alkylene group; Q1 and Q2 each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; A+ represents organic counter ion; and n shows 0 or 1. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I), and a resin which contains a structural unit having an acid-labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid.

摘要翻译： 本发明提供式（I）的盐：其中X表示亚烷基或取代的亚烷基; Q1和Q2各自独立地表示氟原子或具有1至6个碳原子的全氟烷基; A +代表有机抗衡离子; 本发明还提供一种包含式（I）的盐的化学放大型抗蚀剂组合物和含有具有酸不稳定基团并且本身不溶或难溶的结构单元的树脂 碱性水溶液，但是通过酸的作用变得可溶于碱性水溶液。