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1.发明授权Wiring substrate and gas discharge display device that includes a dry etched layer wet-etched first or second electrodes 失效布线衬底和气体放电显示装置，其包括干蚀刻层湿蚀刻的第一或第二电极公开(公告)号：US06346772B1
公开(公告)日：2002-02-12
申请号：US09903495
申请日：2001-07-13
申请人： Masashi Nishiki , Ryohei Satoh , Yuzo Taniguchi , Shigeaki Suzuki , Michifumi Kawai , Masahito Ijuin , Akira Yabushita , Makoto Fukushima , Tomohiko Murase
发明人： Masashi Nishiki , Ryohei Satoh , Yuzo Taniguchi , Shigeaki Suzuki , Michifumi Kawai , Masahito Ijuin , Akira Yabushita , Makoto Fukushima , Tomohiko Murase
IPC分类号： H01J1749
CPC分类号： H05K3/062 , H01J9/02 , H01J11/12 , H01J11/22 , H01J11/24 , H01J2211/225 , H05K3/04 , H05K3/388 , H05K2201/0175 , H05K2201/0326 , H05K2203/025 , H05K2203/107
摘要： A gas discharge display device comprising a front side substrate having a plurality of first electrodes and a back side substrate having a plurality of second electrodes, wherein at least said first electrodes or second electrodes are formed by wet etching using a resist made of an inorganic material, is excellent in the ability to suppress the breakage of wiring in electrodes.
摘要翻译： 一种气体放电显示装置，包括具有多个第一电极的前侧基板和具有多个第二电极的背面基板，其中至少所述第一电极或第二电极通过使用由无机材料制成的抗蚀剂的湿蚀刻形成 能够抑制电极中的配线断裂的能力优异。
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公开(公告)号：US06621217B2
公开(公告)日：2003-09-16
申请号：US10068939
申请日：2002-02-11
申请人： Masashi Nishiki , Ryohei Satoh , Yuzo Taniguchi , Shigeaki Suzuki , Michifumi Kawai , Masahito Ijuin , Akira Yabushita , Makoto Fukushima , Tomohiko Murase
发明人： Masashi Nishiki , Ryohei Satoh , Yuzo Taniguchi , Shigeaki Suzuki , Michifumi Kawai , Masahito Ijuin , Akira Yabushita , Makoto Fukushima , Tomohiko Murase
IPC分类号： H01J1749
CPC分类号： H05K3/062 , H01J9/02 , H01J11/12 , H01J11/22 , H01J11/24 , H01J2211/225 , H05K3/04 , H05K3/388 , H05K2201/0175 , H05K2201/0326 , H05K2203/025 , H05K2203/107
摘要： A gas discharge display device comprising a front side substrate having a plurality of first electrodes and a back side substrate having a plurality of second electrodes, wherein at least said first electrodes or second electrodes are formed by wet etching using a resist made of an inorganic material, is excellent in the ability to suppress the breakage of wiring in electrodes.
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公开(公告)号：US06261144B1
公开(公告)日：2001-07-17
申请号：US09164272
申请日：1998-10-01
申请人： Masashi Nishiki , Ryohei Satoh , Yuzo Taniguchi , Shigeaki Suzuki , Michifumi Kawai , Masahito Ijuin , Akira Yabushita , Makoto Fukushima , Tomohiko Murase
发明人： Masashi Nishiki , Ryohei Satoh , Yuzo Taniguchi , Shigeaki Suzuki , Michifumi Kawai , Masahito Ijuin , Akira Yabushita , Makoto Fukushima , Tomohiko Murase
IPC分类号： H01J900
CPC分类号： H05K3/062 , H01J9/02 , H01J11/12 , H01J11/22 , H01J11/24 , H01J2211/225 , H05K3/04 , H05K3/388 , H05K2201/0175 , H05K2201/0326 , H05K2203/025 , H05K2203/107
摘要： A gas discharge display device comprising a front side substrate having a plurality of first electrodes and a back side substrate having a plurality of second electrodes, wherein at least said first electrodes or second electrodes are formed by wet etching using a resist made of an inorganic material, is excellent in the ability to suppress the breakage of wiring in electrodes.
摘要翻译： 一种气体放电显示装置，包括具有多个第一电极的前侧基板和具有多个第二电极的背面基板，其中至少所述第一电极或第二电极通过使用由无机材料制成的抗蚀剂的湿蚀刻形成 能够抑制电极中的配线断裂的能力优异。
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公开(公告)号：USD711330S1
公开(公告)日：2014-08-19
申请号：US29384219
申请日：2011-01-28
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公开(公告)号：US20080318499A1
公开(公告)日：2008-12-25
申请号：US12222909
申请日：2008-08-19
申请人： Hozumi Yasuda , Tetsuji Togawa , Osamu Nabeya , Kenichiro Saito , Makoto Fukushima , Tomoshi Inoue
发明人： Hozumi Yasuda , Tetsuji Togawa , Osamu Nabeya , Kenichiro Saito , Makoto Fukushima , Tomoshi Inoue
IPC分类号： B24B1/00
CPC分类号： B24B37/32
摘要： A substrate holding apparatus prevents a substrate from slipping out and allows the substrate to be polished stably. The substrate holding apparatus has a top ring body for holding and pressing a substrate against a polishing surface, and a retainer ring for pressing the polishing surface, the retainer ring being disposed on an outer circumferential portion of the top ring body. The retainer ring includes a first member made of a magnetic material and a second member having a magnet disposed on a surface thereof which is held in abutment against the first member.
摘要翻译： 基板保持装置防止基板滑出并允许基板被稳定地抛光。 基板保持装置具有用于将基板保持并压靠在研磨面上的顶环体，以及用于按压研磨面的保持环，保持环设置在顶环体的外周部。 保持环包括由磁性材料制成的第一构件和具有设置在其表面上的磁体的第二构件，该磁体保持抵靠第一构件。
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公开(公告)号：US20060234609A1
公开(公告)日：2006-10-19
申请号：US11452218
申请日：2006-06-14
申请人： Tetsuji Togawa , Ikutaro Noji , Keisuke Namiki , Hozumi Yasuda , Shunichiro Kojima , Kunihiko Sakurai , Nobuyuki Takada , Osamu Nabeya , Makoto Fukushima , Hideki Takayanagi
发明人： Tetsuji Togawa , Ikutaro Noji , Keisuke Namiki , Hozumi Yasuda , Shunichiro Kojima , Kunihiko Sakurai , Nobuyuki Takada , Osamu Nabeya , Makoto Fukushima , Hideki Takayanagi
CPC分类号： B24B37/30 , B24B41/061
摘要： The present invention relates to a substrate holding apparatus for holding a substrate to be polished and pressing the substrate against a polishing surface. The substrate holding apparatus comprises a top ring body for holding a substrate, an elastic pad for being brought into contact with the substrate, and a support member for supporting the elastic pad. The substrate holding apparatus further comprises a contact member mounted on a lower surface of the support member and disposed in a space formed by the elastic pad and the support member. The contact member has an elastic membrane for being brought into contact with the elastic pad. A first pressure chamber is defined in the contact member, and a second pressure chamber is defined outside of the contact member. The substrate holding apparatus further comprises a fluid source for independently supplying a fluid into, or creating a vacuum in, the first pressure chamber and the second pressure chamber.
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公开(公告)号：US20060099892A1
公开(公告)日：2006-05-11
申请号：US11312571
申请日：2005-12-21
申请人： Tetsuji Togawa , Osamu Nabeya , Makoto Fukushima , Kunihiko Sakurai , Hiroshi Yoshida , Teruhiko Ichimura
发明人： Tetsuji Togawa , Osamu Nabeya , Makoto Fukushima , Kunihiko Sakurai , Hiroshi Yoshida , Teruhiko Ichimura
CPC分类号： B24B37/30 , B24B41/061 , B24B49/105
摘要： The present invention relates to a substrate holding apparatus for holding a substrate such as a semiconductor wafer in a polishing apparatus for polishing the substrate to a flat finish. The substrate holding apparatus according to the present invention comprises a top ring body having a receiving space therein, and a vertically movable member which is vertically movable within the receiving space in the top ring body. An abutment member having an elastic membrane is attached to a lower surface of the vertically movable member. The elastic membrane of the abutment member comprises an abutment portion, having a flange projecting outwardly, brought into direct or indirect contact with the substrate, and a connecting portion extending upwardly from a base portion of the flange of the abutment portion and being connected to the vertically movable member. The connecting portion is made of a material having a flexibility higher than that of material of the abutment portion.
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公开(公告)号：US06755587B2
公开(公告)日：2004-06-29
申请号：US10394018
申请日：2003-03-24
申请人： Makoto Fukushima
发明人： Makoto Fukushima
IPC分类号： B43K710
CPC分类号： B43K7/01 , B43K7/10 , B43K23/126
摘要： A direct-feed ballpoint writing implement includes a barrel internally provided with an ink tank, a grooved member placed in a front part of the barrel and provided with a groove for guiding air and ink, an ink feed member pressed in the grooved member, a barrel tip fixedly joined to a front end part of the grooved member, a ball holder inserted in the barrel tip and put on a front end part of the ink feed member, and a ball held in a front end part of the ball holder. A compression spring may be extended at least between the ink feed member and the ball in the ball holder.
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公开(公告)号：US5667762A
公开(公告)日：1997-09-16
申请号：US630531
申请日：1996-04-10
IPC分类号： A61G12/00 , A61J1/00 , A61K51/00 , A61K51/12 , C07D307/62
CPC分类号： A61K51/1282 , A61K2123/00 , Y10S514/917
摘要： There is disclosed an agent for preventing the adhesion of thallium 201 to a container which comprises a reducing substance as an active ingredient. There is also disclosed a radioactive diagnostic agent wherein the adhesion of thallium 201 to a container is prevented which comprises thallium 201 and a reducing substance.
摘要翻译： 公开了一种用于防止铊201粘附到包含还原物质作为活性成分的容器的试剂。 还公开了一种放射性诊断剂，其中防止铊201与容器的粘附，其包含铊201和还原物质。
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公开(公告)号：US08485866B2
公开(公告)日：2013-07-16
申请号：US13587371
申请日：2012-08-16
申请人： Hozumi Yasuda , Tetsuji Togawa , Osamu Nabeya , Kenichiro Saito , Makoto Fukushima , Tomoshi Inoue
发明人： Hozumi Yasuda , Tetsuji Togawa , Osamu Nabeya , Kenichiro Saito , Makoto Fukushima , Tomoshi Inoue
CPC分类号： B24B37/32
摘要： A substrate holding apparatus prevents a substrate from slipping out and allows the substrate to be polished stably. The substrate holding apparatus has a top ring body for holding and pressing a substrate against a polishing surface, and a retainer ring for pressing the polishing surface, the retainer ring being disposed on an outer circumferential portion of the top ring body. The retainer ring includes a first member made of a magnetic material and a second member having a magnet disposed on a surface thereof which is held in abutment against the first member.
摘要翻译： 基板保持装置防止基板滑出并允许基板被稳定地抛光。 基板保持装置具有用于将基板保持并压靠在研磨面上的顶环体，以及用于按压研磨面的保持环，保持环设置在顶环体的外周部。 保持环包括由磁性材料制成的第一构件和具有设置在其表面上的磁体的第二构件，该磁体保持抵靠第一构件。
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