MICROSCOPE
    1.
    发明申请
    MICROSCOPE 审中-公开
    显微镜

    公开(公告)号:US20130141562A1

    公开(公告)日:2013-06-06

    申请号:US13817121

    申请日:2011-08-05

    IPC分类号: H04N7/18

    摘要: A microscope according to the present invention includes an imaging unit including a first illuminating unit, an imaging element, and a projection optical system, the first illuminating unit including a light source that illuminates a first object, the imaging element performing imaging of the first object, the projection optical system projecting an image of the first object onto the imaging element; a measuring unit configured to measure a second object for setting an imaging condition used when performing imaging of the second object at the imaging unit; and a controller configured to concurrently perform the imaging of the first object at the imaging unit and the measurement of the second object at the measuring unit.

    摘要翻译: 根据本发明的显微镜包括:成像单元,包括第一照明单元,成像元件和投影光学系统,所述第一照明单元包括照亮第一物体的光源,所述成像元件执行所述第一物体的成像 投影光学系统将第一物体的图像投影到成像元件上; 测量单元,被配置为测量第二物体,用于设置在所述成像单元处执行所述第二物体的成像时所使用的成像条件; 以及控制器,其被配置为在所述成像单元处同时执行所述第一对象的成像以及所述测量单元处的所述第二对象的测量。

    IMAGING APPARATUS AND CONTROL METHOD THEREFOR
    2.
    发明申请
    IMAGING APPARATUS AND CONTROL METHOD THEREFOR 审中-公开
    成像装置及其控制方法

    公开(公告)号:US20120314050A1

    公开(公告)日:2012-12-13

    申请号:US13476215

    申请日:2012-05-21

    IPC分类号: H04N7/18

    摘要: An imaging apparatus comprises: a holding unit that holds a subject; a surface profile measuring unit that measures a surface profile of the subject; an imaging unit that adjusts an imaging plane according to the surface profile measured by the surface profile measuring unit and performs imaging of the subject; and a specifying unit that specifies a presence region in which an imaging object is present from an entire region of the subject. The surface profile measuring unit measures only the surface profile of the presence region specified by the specifying unit.

    摘要翻译: 一种成像装置,包括:保持对象的保持单元; 表面轮廓测量单元,其测量所述被摄体的表面轮廓; 成像单元,其根据由所述表面轮廓测量单元测量的表面轮廓来调整成像平面并执行所述被摄体的成像; 以及指定单元,其从对象的整个区域指定存在成像对象的存在区域。 表面轮廓测量单元仅测量由指定单元指定的存在区域的表面轮廓。

    EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
    3.
    发明申请
    EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 有权
    曝光装置和装置制造方法

    公开(公告)号:US20080084547A1

    公开(公告)日:2008-04-10

    申请号:US11866686

    申请日:2007-10-03

    申请人: Yukio Tokuda

    发明人: Yukio Tokuda

    IPC分类号: G03B27/42

    摘要: An exposure apparatus is disclosed. The exposure apparatus has a projection optical system, aligns a reticle and a substrate and projects a pattern of the reticle to the substrate via the projection optical system to expose the substrate to light. The apparatus comprises a measuring device configured to perform measurement for the alignment, a first support configured to support the measuring device; and a second support configured to support the projection optical system. The first support and the second support are isolated from each other.

    摘要翻译: 公开了一种曝光装置。 曝光装置具有投影光学系统,将掩模版和基板对准,并通过投影光学系统将掩模版的图案投影到基板,以将基板曝光。 该装置包括被配置为执行对准的测量的测量装置,被配置为支撑测量装置的第一支撑件; 以及构造成支撑所述投影光学系统的第二支撑件。 第一个支持和第二个支持是相互隔离的。

    Projection exposure apparatus containing an enclosed hollow structure
    4.
    发明授权
    Projection exposure apparatus containing an enclosed hollow structure 失效
    投影曝光装置包含封闭的中空结构

    公开(公告)号:US5691806A

    公开(公告)日:1997-11-25

    申请号:US531344

    申请日:1995-09-20

    CPC分类号: G03F7/708 G03B27/58

    摘要: A projection lens, a reticle stage and a light source optical system are supported by a cast frame above a wafer stage for holding a wafer thereon. A top portion of the cast frame has an enclosed hollow structure in which strengthening ribs are built, thereby substantially increasing the rigidity of the top portion. Since the ribs are built in the top portion of the cast frame, the surface area exposed to the wafer stage is reduced. As a result, there is little chance that the wafer is contaminated by any adherents to the cast frame.

    摘要翻译: 投影透镜,标线片台和光源光学系统由用于保持晶片的晶片台上方的铸造框架支撑。 铸造框架的顶部具有封闭的中空结构,其中构建加强肋,从而显着增加顶部的刚度。 由于肋构建在铸造框架的顶部,所以暴露于晶片台的表面积减小。 结果,晶片被铸造框架的任何附着物污染几乎没有机会。

    Exposure apparatus and device manufacturing method
    5.
    发明授权
    Exposure apparatus and device manufacturing method 有权
    曝光装置和装置制造方法

    公开(公告)号:US07463334B2

    公开(公告)日:2008-12-09

    申请号:US11866686

    申请日:2007-10-03

    申请人: Yukio Tokuda

    发明人: Yukio Tokuda

    IPC分类号: G03B27/42 G03B27/58 G03B27/62

    摘要: An exposure apparatus is disclosed. The exposure apparatus has a projection optical system, aligns a reticle and a substrate and projects a pattern of the reticle to the substrate via the projection optical system to expose the substrate to light. The apparatus comprises a measuring device configured to perform measurement for the alignment, a first support configured to support the measuring device; and a second support configured to support the projection optical system. The first support and the second support are isolated from each other.

    摘要翻译: 公开了一种曝光装置。 曝光装置具有投影光学系统,将掩模版和基板对准,并通过投影光学系统将掩模版的图案投影到基板,以将基板曝光。 该装置包括被配置为执行对准的测量的测量装置,被配置为支撑测量装置的第一支撑件; 以及构造成支撑所述投影光学系统的第二支撑件。 第一个支持和第二个支持是相互隔离的。

    Stage system for exposure apparatus
    6.
    发明授权
    Stage system for exposure apparatus 有权
    曝光装置舞台系统

    公开(公告)号:US06320649B1

    公开(公告)日:2001-11-20

    申请号:US09240848

    申请日:1999-02-01

    IPC分类号: G03B2758

    摘要: A stage system includes a movable stage having a static bearing and a magnet preloading mechanism, and a base having a guiding surface for guiding the movable stage. The base has an accumulated structure including a first layer of a magnetic material provided at the guiding surface, and a second layer of a non-magnetic material.

    摘要翻译: 舞台系统包括具有静态轴承和磁体预加载机构的可移动平台,以及具有用于引导可移动平台的引导表面的底座。 基部具有累积结构,其包括设置在引导表面处的磁性材料的第一层和非磁性材料的第二层。

    Stage system and exposure apparatus, and device manufacturing method using the same
    7.
    发明授权
    Stage system and exposure apparatus, and device manufacturing method using the same 有权
    舞台系统和曝光装置以及使用其的装置制造方法

    公开(公告)号:US06320645B1

    公开(公告)日:2001-11-20

    申请号:US09324652

    申请日:1999-06-03

    IPC分类号: G03B2742

    摘要: A stage system includes a movable stage, a guide mechanism for guiding the stage with respect to a predetermined direction, and a preloading mechanism for producing a magnetic attraction force with which the rigidity of the guide mechanism can be increased, wherein a portion to be attracted by the magnetic attraction force is made of a material having a product of a residual magnetic flux density Br and a holding force Hc in a hysteresis curve, not greater than 100 J/m3, this being very effective to reduce the hysteresis force, which is resistance due to the residual magnetic force, as compared with the preloading attraction force, whereby high precision positioning of the stage is accomplished.

    摘要翻译: 舞台系统包括可动台,用于相对于预定方向引导舞台的引导机构,以及用于产生引力机构的刚性的磁吸引力的预加载机构,其中吸引的部分 通过磁吸引力由具有残余磁通密度Br和滞后曲线中的保持力Hc的乘积的材料制成,不大于100J / m 3,这对减小滞后力是非常有效的,这是非常有效的 与预载吸引力相比,由于剩余磁力产生的阻力,从而实现了台的高精度定位。

    Mask storing mechanism
    8.
    发明授权
    Mask storing mechanism 失效
    面具存储机制

    公开(公告)号:US4757355A

    公开(公告)日:1988-07-12

    申请号:US923856

    申请日:1986-10-28

    IPC分类号: G03B23/00 G03F7/20 G03B27/62

    摘要: A device for supplying masks to be used in a chamber having a wall, comprises an opening formed in the wall of the chamber, and a rotatable shelf disposed in the opening and for carrying thereon the masks. The rotatable shelf is coupled, by way of a rotational shaft, to a portion of the wall adjacent to the opening and the rotational shelf has a mask carrying portion which is rotationally movable, about the rotational shaft, through the opening to and from the inside of the chamber and from and to the outside of the chamber.

    摘要翻译: 一种用于提供在具有壁的腔室中使用的掩模的装置,包括形成在腔室的壁中的开口以及设置在开口中并用于在其上承载掩模的可旋转搁架。 旋转架通过旋转轴连接到与开口相邻的壁的一部分,并且旋转架具有掩模承载部分,该面罩承载部分可围绕旋转轴旋转移动,穿过开口至内部 的室和从室的外部。

    IMAGE ACQUISITION APPARATUS AND IMAGE ACQUISITION SYSTEM
    9.
    发明申请
    IMAGE ACQUISITION APPARATUS AND IMAGE ACQUISITION SYSTEM 审中-公开
    图像采集设备和图像采集系统

    公开(公告)号:US20130033822A1

    公开(公告)日:2013-02-07

    申请号:US13563538

    申请日:2012-07-31

    IPC分类号: H05K7/20 H05B1/00 F25B21/02

    摘要: An image acquisition apparatus includes an imaging optical system configured to form an image of a subject, an imaging unit including an image sensor configured to capture the image of the subject formed by the imaging optical system, a cooler thermally connected to the image sensor, and a heat-transfer reduction unit with an opaque portion located between the imaging optical system and the imaging unit, wherein the opaque portion includes an aperture through which incident light to the image sensor passes.

    摘要翻译: 一种图像获取装置包括被配置为形成被摄体的图像的成像光学系统,包括图像传感器的成像单元,该图像传感器被配置为捕获由成像光学系统形成的被摄体的图像,与图像传感器热连接的冷却器,以及 具有位于成像光学系统和成像单元之间的不透明部分的热传递减少单元,其中所述不透明部分包括通过所述孔的入射光通过所述孔。

    Driving apparatus and exposure apparatus
    10.
    发明授权
    Driving apparatus and exposure apparatus 有权
    驱动装置和曝光装置

    公开(公告)号:US06493062B2

    公开(公告)日:2002-12-10

    申请号:US09286447

    申请日:1999-04-06

    IPC分类号: G03B2742

    摘要: A driving apparatus for moving an object has a stage which moves the object mounted thereon, a base member supporting the stage, a reaction force reception structure for receiving a reaction force generated upon driving the stage, a damp member for damping transmission of vibration with a predetermined frequency range from the reaction force reception structure to a floor and an actuator for generating a force between the base member and the reaction force reception structure.

    摘要翻译: 用于移动物体的驱动装置具有使安装在其上的物体移动的台阶,支撑台的基座部件,用于接收在驱动台架时产生的反作用力的反作用力接收结构,用于阻止振动传播的阻尼部件 从反作用力接收结构到地面的预定频率范围和用于在基部构件和反作用力接收结构之间产生力的致动器。