公开(公告)号：US20180127272A1

公开(公告)日：2018-05-10

申请号：US15806938

申请日：2017-11-08

Applicant: Matheson Tri-Gas, Inc.

Inventor： Hideharu Shimizu ,  Mark Raynor ,  Daniel Tempel ,  Robin Gardiner ,  Daniel Alvarez, JR.

IPC: C01B21/16 ,  B01J20/04 ,  B01J20/26 ,  B01J20/10 ,  B01J20/08 ,  B01J20/28 ,  B01J20/282 ,  B01J20/283 ,  B01J20/284 ,  B01J20/285 ,  B01D53/26 ,  B01D53/28

CPC classification number: C01B21/16 ,  B01D53/261 ,  B01D53/263 ,  B01D53/28 ,  B01D2251/30 ,  B01D2251/302 ,  B01D2251/304 ,  B01D2251/306 ,  B01D2251/402 ,  B01D2251/404 ,  B01D2251/406 ,  B01D2251/408 ,  B01D2252/30 ,  B01D2253/104 ,  B01D2253/106 ,  B01D2253/1085 ,  B01D2253/112 ,  B01D2253/1122 ,  B01D2253/1124 ,  B01D2253/306 ,  B01D2253/311 ,  B01D2256/00 ,  B01J20/04 ,  B01J20/041 ,  B01J20/08 ,  B01J20/103 ,  B01J20/26 ,  B01J20/28061 ,  B01J20/28064 ,  B01J20/28071 ,  B01J20/28073 ,  B01J20/28076 ,  B01J20/282 ,  B01J20/283 ,  B01J20/284 ,  B01J20/285 ,  B01J2220/52 ,  C01P2006/82

Abstract: The present invention generally relates to the field of gas and liquid phase desiccation. In particular, the present invention relates to methods for removing moisture (and hence oxygen precursors) from hydrazine, thereby providing a high purity source gas suitable for use in vapor deposition processes, such as but not limited to, chemical vapor deposition (CVD) or an atomic layer deposition (ALD).