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30 条记录 (耗时 0.023 秒)

    Updating process controller based upon fault detection analysis
    3.
    发明授权
    Updating process controller based upon fault detection analysis 失效
    基于故障检测分析更新过程控制器

    公开(公告)号：US06871114B1

    公开(公告)日：2005-03-22

    申请号：US10231713

    申请日：2002-08-30

    申请人： Eric O. Green ,  Matthew A. Purdy ,  Elfido Coss, Jr. ,  Christopher A. Bode ,  Robert J. Chong ,  Gregory A. Cherry

    发明人： Eric O. Green ,  Matthew A. Purdy ,  Elfido Coss, Jr. ,  Christopher A. Bode ,  Robert J. Chong ,  Gregory A. Cherry

    IPC分类号： G05B19/404 ,  G06F19/00

    CPC分类号： G05B19/404 ,  G05B2219/37252 ,  G05B2219/37345 ,  G05B2219/45031

    摘要： A method and an apparatus for adjusting a process controller based upon a fault detection analysis. A process step upon a workpiece is performed using a processing tool. Manufacturing data relating to processing of the workpiece is acquired. The manufacturing data may include metrology data relating to the processed workpiece and/or tool state data relating to the tool state of a processing tool. A metrology/tool state data integration process is performed based upon the acquired manufacturing data. The metrology/tool state data integration process includes performing an assessment of a tool health related to the processing tool and adjusting an emphasis of the metrology data based upon the assessment of the tool health.

    摘要翻译： 一种基于故障检测分析调整过程控制器的方法和装置。 使用加工工具进行工件的加工步骤。 获取与工件的加工有关的制造数据。 制造数据可以包括与处理工具有关的计量学数据和/或与加工工具的工具状态有关的刀具状态数据。 基于获取的制造数据执行计量/工具状态数据集成处理。 计量/工具状态数据集成过程包括对与处理工具相关的工具健康进行评估，并且基于对工具健康的评估来调整计量数据的重点。

    Method and apparatus for modifying process selectivities based on process state information
    4.
    发明授权
    Method and apparatus for modifying process selectivities based on process state information 有权
    基于过程状态信息来修改过程选择性的方法和装置

    公开(公告)号：US07695986B1

    公开(公告)日：2010-04-13

    申请号：US11194233

    申请日：2005-08-01

    申请人： Matthew A. Purdy ,  Matthew Ryskoski ,  Richard J. Markle

    发明人： Matthew A. Purdy ,  Matthew Ryskoski ,  Richard J. Markle

    IPC分类号： H01L21/00

    CPC分类号： H01L21/67253 ,  H01L21/67069

    摘要： The present invention provides a method and apparatus for modifying process selectivities based on process state information. The method includes accessing process state information associated with at least one material removal process, determining at least one selectivity based on the process state information, and modifying at least one process parameter of said material removal process based on said at least one determined selectivity.

    摘要翻译： 本发明提供一种基于过程状态信息来修改过程选择性的方法和装置。 该方法包括访问与至少一个材料去除过程相关联的过程状态信息，基于过程状态信息确定至少一个选择性，以及基于所述至少一个确定的选择性来修改所述材料去除过程的至少一个过程参数。

    Method and apparatus for detecting processing faults using scatterometry measurements
    5.
    发明授权
    Method and apparatus for detecting processing faults using scatterometry measurements 有权
    使用散射测量法检测处理故障的方法和装置

    公开(公告)号：US06639663B1

    公开(公告)日：2003-10-28

    申请号：US09863562

    申请日：2001-05-23

    申请人： Richard J. Markle ,  Matthew A. Purdy

    发明人： Richard J. Markle ,  Matthew A. Purdy

    IPC分类号： G01N2100

    CPC分类号： G01N21/47 ,  G01N21/9501 ,  G01N21/95607

    摘要： A method for characterizing a misprocessed wafer includes providing a wafer having a grating structure; illuminating at least a portion of the grating structure; measuring light reflected from the grating structure to generate a reflection profile; and characterizing a misprocessed condition of the wafer based on the reflection profile. A metrology tool adapted to receive a wafer having a grating structure includes a light source, a detector, and a data processing unit. The light source is adapted to illuminate at least a portion of the grating structure. The detector is adapted to measure light reflected from the grating structure to generate a reflection profile. The data processing unit is adapted to characterize a misprocessed condition of the wafer based on the reflection profile.

    摘要翻译： 用于表征未经处理的晶片的方法包括提供具有光栅结构的晶片; 照亮所述光栅结构的至少一部分; 测量从光栅结构反射的光以产生反射曲线; 并且基于反射曲线来表征晶片的错误处理状态。 适于接收具有光栅结构的晶片的计量工具包括光源，检测器和数据处理单元。 光源适于照亮光栅结构的至少一部分。 检测器适于测量从光栅结构反射的光以产生反射曲线。 数据处理单元适于基于反射曲线来表征晶片的错误处理状态。

    Method and apparatus for calibrating degradable components using process state data
    6.
    发明授权
    Method and apparatus for calibrating degradable components using process state data 有权
    使用过程状态数据校准可降解组分的方法和装置

    公开(公告)号：US07153709B1

    公开(公告)日：2006-12-26

    申请号：US10930257

    申请日：2004-08-31

    申请人： Matthew A. Purdy ,  Richard J. Markle

    发明人： Matthew A. Purdy ,  Richard J. Markle

    IPC分类号： H01L21/00

    CPC分类号： H01L21/67288 ,  G05B2219/50129

    摘要： The present invention is generally directed to various methods and systems for calibrating degradable components using process state data. In one illustrative embodiment, the method includes providing a tool comprised of at least one process chamber, providing at least one process state sensor that is adapted to obtain process state data regarding at least one characteristic of a process environment established in the chamber in performance of a process operation, operatively coupling at least one of a new or repaired degradable component to the tool, and calibrating the new or repaired degradable component based upon the process state data. In further embodiments, the method comprises processing a plurality of additional workpieces in the tool after the new or repaired degradable components have been calibrated using process state data in accordance with one aspect of the present invention.

    摘要翻译： 本发明一般涉及使用过程状态数据校准可降解组分的各种方法和系统。 在一个说明性实施例中，该方法包括提供由至少一个处理室组成的工具，提供至少一个过程状态传感器，该过程状态传感器适于获得关于室内建立的过程环境的至少一个特性的过程状态数据， 工艺操作，可操作地将新的或修复的可降解组分中的至少一种与工具结合，以及基于过程状态数据校准新的或修复的可降解组分。 在另外的实施例中，该方法包括在使用根据本发明的一个方面的过程状态数据校准新的或修复的可降解组分之后，在工具中处理多个附加工件。

    Verifying a fault detection result based on a process control state
    7.
    发明授权
    Verifying a fault detection result based on a process control state 有权
    基于过程控制状态验证故障检测结果

    公开(公告)号：US06988225B1

    公开(公告)日：2006-01-17

    申请号：US10285003

    申请日：2002-10-31

    申请人： Matthew A. Purdy ,  Richard J. Markle ,  Timothy L. Jackson

    发明人： Matthew A. Purdy ,  Richard J. Markle ,  Timothy L. Jackson

    IPC分类号： G06F11/00

    CPC分类号： G05B23/0262

    摘要： A method and an apparatus are provided for verifying a fault detection result in a system. The apparatus includes an interface and a control unit. The interface is adapted to receive data associated with a process operation and adapted to receive information provided by a process controller associated with the process operation. The control unit, which is communicatively coupled to the interface, is adapted to perform a fault detection analysis based on the data associated with the process operation and verify a result of the fault detection analysis based on the information provided by the process controller.

    摘要翻译： 提供了一种用于验证系统中的故障检测结果的方法和装置。 该装置包括接口和控制单元。 接口适于接收与过程操作相关联的数据，并且适于接收由过程操作相关联的过程控制器提供的信息。 通信地耦合到接口的控制单元适于基于与处理操作相关联的数据执行故障检测分析，并且基于由过程控制器提供的信息来验证故障检测分析的结果。

    Method and apparatus for controlling a film formation process with multiple objectives
    9.
    发明授权
    Method and apparatus for controlling a film formation process with multiple objectives 有权
    用于控制具有多个目标的成膜过程的方法和装置

    公开(公告)号：US07473566B1

    公开(公告)日：2009-01-06

    申请号：US10770682

    申请日：2004-02-03

    申请人： Matthew A. Purdy ,  Robert J. Chong

    发明人： Matthew A. Purdy ,  Robert J. Chong

    IPC分类号： H01L21/66

    CPC分类号： G05B13/024

    摘要： A method includes defining a plurality of objectives for a film formation process and employing a control equation incorporating the plurality of objectives to generate at least one operating recipe parameter for the film formation process. A system includes a film formation unit and a process control unit. The film formation unit is adapted to perform a film formation process in accordance with an operating recipe. The process control unit is adapted to define a plurality of objectives for the film formation process and employ a control equation incorporating the plurality of objectives to generate at least one operating recipe parameter for the film formation process.

    摘要翻译： 一种方法包括为成膜过程定义多个目标，并采用结合多个目标的控制方程来生成用于成膜过程的至少一个操作配方参数。 系统包括成膜单元和过程控制单元。 成膜单元适于根据操作配方进行成膜处理。 过程控制单元适于限定用于成膜过程的多个目标，并采用并入多个目标的控制方程，以生成用于成膜过程的至少一个操作配方参数。

    Method and system for dynamically adjusting metrology sampling based upon available metrology capacity
    10.
    发明授权
    Method and system for dynamically adjusting metrology sampling based upon available metrology capacity 失效
    基于可用计量能力动态调整计量抽样的方法和系统

    公开(公告)号：US07076321B2

    公开(公告)日：2006-07-11

    申请号：US10958891

    申请日：2004-10-05

    申请人： Matthew A. Purdy

    发明人： Matthew A. Purdy

    IPC分类号： G06F19/00 ,  G05B21/02

    CPC分类号： H01L22/20

    摘要： The present invention is generally directed to various methods and systems for dynamically adjusting metrology sampling based upon available metrology capacity. In one illustrative embodiment, the method comprises providing a metrology control unit that is adapted to determine a baseline metrology sampling rate for at least one metrology operation, determining available metrology capacity, and providing the determined available metrology capacity to the metrology control unit wherein the metrology control unit determines a new metrology sampling rate based upon the determined available metrology capacity.

    摘要翻译： 本发明一般涉及用于基于可用的测量能力来动态地调整计量取样的各种方法和系统。 在一个说明性实施例中，该方法包括提供一个度量控制单元，其适于确定用于至少一个测量操作的基准测量采样率，确定可用的测量能力，以及将所确定的可用测量能力提供给度量控制单元，其中计量学 控制单元基于确定的可用测量能力来确定新的测量采样率。