METHOD AND SYSTEM FOR REDUCING OVERLAY ERRORS IN SEMICONDUCTOR VOLUME PRODUCTION USING A MIXED TOOL SCENARIO
    4.
    发明申请
    METHOD AND SYSTEM FOR REDUCING OVERLAY ERRORS IN SEMICONDUCTOR VOLUME PRODUCTION USING A MIXED TOOL SCENARIO 有权
    使用混合工具场景降低半导体体积生成中的覆盖误差的方法和系统

    公开(公告)号:US20100028790A1

    公开(公告)日:2010-02-04

    申请号:US12476578

    申请日:2009-06-02

    IPC分类号: G03F7/20 G03B27/42

    摘要: By taking into consideration the combination of the substrate holders in various lithography tools used during the imaging to two subsequent device layers, enhanced alignment accuracy may be accomplished. Furthermore, restrictive tool dedications for critical lithography processes may be significantly relaxed by providing specific overlay correction data for each possible process flow, wherein, in some illustrative embodiments, a restriction of the number of possible process flows may be accomplished by implementing a rule for selecting a predefined substrate holder when starting the processing of an associated group of substrates.

    摘要翻译: 通过考虑到在成像期间使用的各种光刻工具中的衬底保持器与两个后续器件层的组合,可以实现增强的对准精度。 此外,通过为每个可能的处理流程提供特定的覆盖校正数据,可以显着地减轻关键光刻工艺的限制性工具,其中在一些说明性实施例中,可以通过实施用于选择的规则来实现对可能的工艺流程的限制 当开始相关联的基片组的处理时,预定义的衬底保持器。

    Method and system for advanced process control including tool dependent machine constants
    5.
    发明授权
    Method and system for advanced process control including tool dependent machine constants 有权
    用于高级过程控制的方法和系统,包括与工具相关的机器常数

    公开(公告)号:US07403832B2

    公开(公告)日:2008-07-22

    申请号:US11379092

    申请日:2006-04-18

    IPC分类号: G06F19/00

    CPC分类号: G05B13/048

    摘要: A controller and a method of controlling a process tool is provided, in which machine constants used for calibrating manipulated variables of the control algorithm are explicitly introduced into the process model, thereby providing an enhanced controller behavior immediately after the introduction of new measurement values of the machine constants.

    摘要翻译: 提供了一种控制器和控制处理工具的方法,其中用于校准控制算法的操纵变量的机器常数被明确地引入到过程模型中,从而在引入新的测量值之后立即提供增强的控制器行为 机器常数。

    Method for repairing and/or modifying component parts of a gas turbine
    6.
    发明授权
    Method for repairing and/or modifying component parts of a gas turbine 有权
    修理和/或修改燃气轮机部件的方法

    公开(公告)号:US07810237B2

    公开(公告)日:2010-10-12

    申请号:US10555111

    申请日:2004-04-01

    IPC分类号: B23P6/00

    摘要: A method is for repairing and/or modifying component parts of a gas turbine. First, at least one, particularly damaged section of the component part that is to be repaired is cut out of the component part. In addition, if it does not exist, a data record is generated for a replacement part that is to be produced. The replacement part is subsequently produced with the aid of a rapid manufacturing process. Subsequently, the replacement part produced is integrated into the component part that is to be repaired.

    摘要翻译: 一种用于修理和/或修改燃气轮机的部件的方法。 首先,将要修复的部件的至少一个特别受损部分从部件切出。 另外,如果不存在,则生成要生成的替换部的数据记录。 随后通过快速制造工艺生产更换部件。 随后,将所制造的替换部件集成到待修理的部件中。

    Profile for Fastening a Cover on a Vehicular Seat Headrest
    7.
    发明申请
    Profile for Fastening a Cover on a Vehicular Seat Headrest 有权
    用于紧固汽车座椅头枕上的盖子

    公开(公告)号:US20080203791A1

    公开(公告)日:2008-08-28

    申请号:US11917651

    申请日:2006-05-20

    IPC分类号: B60N2/60 B60N2/48

    CPC分类号: A47C7/386 B60N2/5883

    摘要: A profile (9) which can be connected to a cover (4) serves to fasten the cover (4) on a supporting body (2). According to the invention, it is provided that the profile has a recess (17) for receiving a connecting region, in particular a seam (6), of cover segments (5.1, 5.2) of an at least two-piece cover.

    摘要翻译: 可以连接到盖(4)的轮廓(9)用于将盖(4)紧固在支撑体(2)上。 根据本发明,轮廓具有用于容纳至少两件式盖的盖段(5.1,5.2)的连接区域,特别是接缝(6)的凹部(17)。

    METHOD AND SYSTEM FOR REDUCING OVERLAY ERRORS WITHIN EXPOSURE FIELDS BY APC CONTROL STRATEGIES
    8.
    发明申请
    METHOD AND SYSTEM FOR REDUCING OVERLAY ERRORS WITHIN EXPOSURE FIELDS BY APC CONTROL STRATEGIES 有权
    通过APC控制策略减少暴露场内的覆盖误差的方法和系统

    公开(公告)号:US20080057418A1

    公开(公告)日:2008-03-06

    申请号:US11843040

    申请日:2007-08-22

    IPC分类号: G03C5/00 G06F19/00

    CPC分类号: G03F9/7003 G03F7/70633

    摘要: By taking into consideration tool-specific distortion signatures and reticle-specific placement characteristics in an alignment control system, the control quality of sophisticated APC strategies may be significantly enhanced. Respective correction data may be established on the basis of any combinations of tool/reticles and layers to be aligned to each other, which may modify the respective target values of alignment parameters used for controlling the alignment process on the basis of standard overlay measurement data obtained from dedicated overlay marks.

    摘要翻译: 通过考虑到对准控制系统中的特定于工具的失真特征和掩模版特定放置特性,可以显着增强复杂APC策略的控制质量。 可以基于要彼此对准的工具/掩模版和层的任何组合来建立各自的校正数据,这可以基于获得的标准覆盖测量数据来修改用于控制对准过程的对准参数的各个目标值 从专用的重叠标记。

    TIME WEIGHTED MOVING AVERAGE FILTER
    9.
    发明申请
    TIME WEIGHTED MOVING AVERAGE FILTER 有权
    时间称重移动平均过滤器

    公开(公告)号:US20070239285A1

    公开(公告)日:2007-10-11

    申请号:US11278840

    申请日:2006-04-06

    IPC分类号: G05B15/00

    摘要: A method for estimating a state associated with a process includes receiving a state observation associated with the process. The state observation has an associated process time. A weighting factor to discount the state observation is generated based on the process time. A state estimate is generated based on the discounted state observation. A system includes a process tool, a metrology tool, and a process controller. The process tool is operable to perform a process in accordance with an operating recipe. The metrology tool is operable to generate a state observation associated with the process. The process controller is operable to receive the state observation, the state observation having an associated process time, generate a weighting factor to discount the state observation based on the process time, generate a state estimate based on the discounted state observation, and determine at least one parameter of the operating recipe based on the state estimate.

    摘要翻译: 用于估计与过程相关联的状态的方法包括接收与该过程相关联的状态观察。 状态观察具有相关的处理时间。 基于处理时间生成打折状态观察的权重因子。 基于贴现状态观察来生成状态估计。 系统包括处理工具,计量工具和过程控制器。 处理工具可操作以根据操作配方执行处理。 计量工具可操作以产生与该过程相关联的状态观察。 过程控制器可操作以接收状态观察,具有相关联的处理时间的状态观察,基于处理时间生成加权因子以折扣状态观察,基于打折状态观察生成状态估计,并且至少确定 基于状态估计的操作配方的一个参数。