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公开(公告)号：US09547182B2
公开(公告)日：2017-01-17
申请号：US14598421
申请日：2015-01-16
CPC分类号： G02C7/044 , A61F2/1613 , G02C7/027 , G02C7/028 , G02C7/04 , G02C2202/22 , G02C2202/24
摘要： Lenses are designed using wavefront measurements amenable to correction factors for near and far vision as well as pupil size to slow or stop myopia progression.
摘要翻译： 镜片设计使用波前测量，适用于近视和远视的矫正因子以及瞳孔大小以减缓或停止近视进展。
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公开(公告)号：US20100328604A1
公开(公告)日：2010-12-30
申请号：US12821927
申请日：2010-06-23
CPC分类号： G02C7/047 , G02C7/024 , G02C7/028 , G02C7/04 , G02C2202/24
摘要： Lenses are designed using the corneal topography or wavefront measurements of the eye derived by subtracting the optical power of the eye after orthokeratology treatment from the optical power before orthokeratology treatment.
摘要翻译： 透镜使用角膜形貌或波前测量设计，通过从角膜曲率治疗前的光学功率减去角膜矫正治疗后眼睛的光学功率而得到。
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公开(公告)号：US08789947B2
公开(公告)日：2014-07-29
申请号：US12821927
申请日：2010-06-23
IPC分类号： G02C7/04
CPC分类号： G02C7/047 , G02C7/024 , G02C7/028 , G02C7/04 , G02C2202/24
摘要： Lenses are designed using the corneal topography or wavefront measurements of the eye derived by subtracting the optical power of the eye after orthokeratology treatment from the optical power before orthokeratology treatment.
摘要翻译： 透镜使用角膜形貌或波前测量设计，通过从角膜曲率治疗前的光学功率减去角膜矫正治疗后眼睛的光学功率而得到。
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公开(公告)号：US20100195044A1
公开(公告)日：2010-08-05
申请号：US12697931
申请日：2010-02-01
CPC分类号： G02C7/044 , A61F2/1613 , G02C7/027 , G02C7/028 , G02C7/04 , G02C2202/22 , G02C2202/24
摘要： Lenses are designed using wavefront measurements amenable to correction factors for near and far vision as well as pupil size to slow or stop myopia progression.
摘要翻译： 镜片设计使用波前测量，适用于近视和远视的矫正因子以及瞳孔大小以减缓或停止近视进展。
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公开(公告)号：US08960901B2
公开(公告)日：2015-02-24
申请号：US12697931
申请日：2010-02-01
CPC分类号： G02C7/044 , A61F2/1613 , G02C7/027 , G02C7/028 , G02C7/04 , G02C2202/22 , G02C2202/24
摘要： Lenses are designed using wavefront measurements amenable to correction factors for near and far vision as well as pupil size to slow or stop myopia progression.
摘要翻译： 镜片设计使用波前测量，适用于近视和远视的矫正因子以及瞳孔大小以减缓或停止近视进展。
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6.发明授权公开(公告)号：US07988289B2
公开(公告)日：2011-08-02
申请号：US12688522
申请日：2010-01-15
申请人： Khaled Chehab , Michael J. Collins , Jeffrey H. Roffman , Ross J. Franklin , Brett A. Davis , Xu Cheng
发明人： Khaled Chehab , Michael J. Collins , Jeffrey H. Roffman , Ross J. Franklin , Brett A. Davis , Xu Cheng
IPC分类号： A61B3/10
CPC分类号： G02C7/04 , A61B3/103 , B29D11/00028 , B29D11/00461 , G02C7/02 , G02C7/027 , G02C7/028 , G02C7/044 , G02C2202/22
摘要： The invention provides methods for designing ophthalmic lenses, and lenses produced by this method, which lenses corrects both low order and high order wavefront aberrations of the lens wearer's eyes.
摘要翻译： 本发明提供了用于设计眼科镜片的方法以及通过该方法制造的镜片，该透镜校正镜片佩戴者的眼睛的低阶和高阶波前像差。
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7.发明授权公开(公告)号：US07798640B2
公开(公告)日：2010-09-21
申请号：US11550965
申请日：2006-10-19
申请人： Khaled Chehab , Michael J. Collins , Jeffrey H. Roffman , Ross J. Franklin , Brett A. Davis , Xu Cheng
发明人： Khaled Chehab , Michael J. Collins , Jeffrey H. Roffman , Ross J. Franklin , Brett A. Davis , Xu Cheng
IPC分类号： A61B3/10
CPC分类号： G02C7/04 , A61B3/103 , B29D11/00028 , B29D11/00461 , G02C7/02 , G02C7/027 , G02C7/028 , G02C7/044 , G02C2202/22
摘要： The invention provides methods for designing ophthalmic lenses, and lenses produced by this method, which lenses corrects both low order and high order wavefront aberrations of the lens wearer's eyes.
摘要翻译： 本发明提供了用于设计眼科镜片的方法以及通过该方法制造的镜片，该透镜校正镜片佩戴者的眼睛的低阶和高阶波前像差。
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8.发明申请OPHTHALMIC LENSES USEFUL FOR THE CORRECTION OF PRESBYOPIA WHICH INCORPORATE HIGH ORDER ABERRATION CORRECTION 有权适用于矫正高血压检查的PRESBYOPIA的眼科镜片公开(公告)号：US20100118268A1
公开(公告)日：2010-05-13
申请号：US12688522
申请日：2010-01-15
申请人： Khaled Chehab , Michael J. Collins , Jeffrey H. Roffman , Ross J. Franklin , Brett A. Davis , Xu Cheng
发明人： Khaled Chehab , Michael J. Collins , Jeffrey H. Roffman , Ross J. Franklin , Brett A. Davis , Xu Cheng
CPC分类号： G02C7/04 , A61B3/103 , B29D11/00028 , B29D11/00461 , G02C7/02 , G02C7/027 , G02C7/028 , G02C7/044 , G02C2202/22
摘要： The invention provides methods for designing ophthalmic lenses, and lenses produced by this method, which lenses corrects both low order and high order wavefront aberrations of the lens wearer's eyes.
摘要翻译： 本发明提供了用于设计眼科镜片的方法以及通过该方法制造的镜片，该透镜校正镜片佩戴者的眼睛的低阶和高阶波前像差。
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公开(公告)号：US09261869B2
公开(公告)日：2016-02-16
申请号：US13372252
申请日：2012-02-13
申请人： Xu Cheng , Kirt T. Bush
发明人： Xu Cheng , Kirt T. Bush
CPC分类号： G05B17/02 , G06F17/5018
摘要： A pressure and flow calculation technique that efficiently solves for pressures and flows within a process network uses both a simultaneous and a sequential solving method. The calculation technique first determines a flow conductance for each of the process network elements, linearizes pressure and flow relationships in each flow path by determining a linearized flow conductance for each process element and then determines a composite process network having a linearized, composite process component in each flow path to produce a simplified process network. A simultaneous solving method is then used to simultaneously solve for the pressures and flows at each of a set of junction nodes of the simplified process network and thereafter a sequential solving method is applied to determine the pressures and flows at the other nodes of the process network.
摘要翻译： 压力和流量计算技术有效地解决了过程网络内的压力和流量，同时采用了顺序求解方法。 计算技术首先确定每个过程网络元件的流量电导，通过确定每个过程元件的线性化流动电导线性化每个流动路径中的压力和流量关系，然后确定具有线性化的复合过程组件的复合过程网络 每个流程都可以生成简化的流程网络。 然后使用同时求解方法来同时解决简化过程网络的一组连接节点中的每一个处的压力和流量，此后应用顺序求解方法来确定过程网络的其他节点处的压力和流量 。
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10.发明授权Methods for manufacturing superjunction semiconductor device having a dielectric termination 有权具有电介质终端的超结半导体器件的制造方法公开(公告)号：US08895369B2
公开(公告)日：2014-11-25
申请号：US13432723
申请日：2012-03-28
申请人： Xu Cheng
发明人： Xu Cheng
IPC分类号： H01L21/56 , H01L21/762 , H01L29/861 , H01L29/66 , H01L29/40 , H01L29/78 , H01L29/872 , H01L29/06 , H01L29/10
CPC分类号： H01L29/0634 , H01L21/02118 , H01L21/02123 , H01L21/02167 , H01L21/0217 , H01L29/0649 , H01L29/0653 , H01L29/0661 , H01L29/1095 , H01L29/407 , H01L29/66143 , H01L29/7811 , H01L29/861 , H01L29/872 , H01L2224/4847 , H01L2224/73265 , H01L2224/8592 , H01L2924/10155 , H01L2924/10156 , H01L2924/12032 , H01L2924/1301 , H01L2924/1305 , H01L2924/13055 , H01L2924/13091 , H01L2924/00
摘要： A superjunction semiconductor device is provided having at least one column of a first conductivity type and at least one column of a second conductivity type extending from a first main surface of a semiconductor substrate toward a second main surface of the semiconductor substrate opposed to the first main surface. The at least one column of the second conductivity type has a first sidewall surface proximate the at least one column of the first conductivity type and a second sidewall surface opposed to the first sidewall surface. A termination structure is proximate the second sidewall surface of the at least one column of the second conductivity type. The termination structure includes a layer of dielectric of an effective thickness and consumes about 0% of the surface area of the first main surface. Methods for manufacturing superjunction semiconductor devices and for preventing surface breakdown are also provided.
摘要翻译： 提供了一种超结半导体器件，其具有至少一列第一导电类型和至少一列第二导电类型的列，其从半导体衬底的第一主表面朝向与第一主体相对的半导体衬底的第二主表面延伸 表面。 第二导电类型的至少一列具有靠近第一导电类型的至少一列的第一侧壁表面和与第一侧壁表面相对的第二侧壁表面。 端接结构靠近第二导电类型的至少一列的第二侧壁表面。 端接结构包括有效厚度的电介质层，并消耗第一主表面的约0％的表面积。 还提供了制造超结半导体器件和防止表面破坏的方法。
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