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公开(公告)号：US09023458B2
公开(公告)日：2015-05-05
申请号：US12311811
申请日：2007-10-18
申请人： Michal Lahav , Adam Winkleman , Max Narovlyansky , Raquel Perez-Castillejos , Emily A. Weiss , Leonard N. J. Rodriguez , George M. Whitesides
发明人： Michal Lahav , Adam Winkleman , Max Narovlyansky , Raquel Perez-Castillejos , Emily A. Weiss , Leonard N. J. Rodriguez , George M. Whitesides
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10T428/24479
摘要： In one aspect, methods of patterning of thin films of an ionotropic polymer (e.g., poly(acrylic acid)) are provided. These processes can create micron or sub-micron-scale patterns of ionotropic polymers such as cation crosslinked poly(acrylic acid) (CCL-PAA). In one embodiment, patterning may be performed within microfluidic channels by flowing a solution of crosslinking agent (e.g., metal cations such as Ag+, Ca2+, Pd2+, Al3+, La3+, and Ti4+) that can crosslink a portion of an ionotropic polymer in contact with the solution. In another embodiment, methods of patterning ionotropic polymers involve photolithography. Upon patterning a positive photoresist (e.g., diazonaphthoquinone-novolac resin) on a film of CCL-PAA, the exposed regions of CCL-PAA can be etched by an aqueous solution. Advantageously, the patterned, crosslinked polymer may also serve as both a reactant and a matrix for subsequent chemistry. For example, in some embodiments, the initial crosslinking cation can be exchanged for a second cation that could not be patterned photolithographically. Patterned films of CCL-PAA can also be used to host and template the reduction of metallic cations to metallic nanoparticles, and to fabricate porous, low-k dielectric substrates.
摘要翻译： 一方面，提供了离子型聚合物（例如聚（丙烯酸））的薄膜图案化方法。 这些方法可以产生离子型聚合物如阳离子交联的聚（丙烯酸）（CCL-PAA）的微米级或亚微米级的图案。 在一个实施方案中，可以在微流体通道内通过使交联剂（例如金属阳离子如Ag +，Ca 2+，Pd 2+，Al 3+，La 3+和Ti 4+）的溶液流过微流体通道，所述溶液可以将部分离子型聚合物与 解决方案。 在另一个实施方案中，构图离子型聚合物的方法涉及光刻。 在CCL-PAA膜上形成正性光致抗蚀剂（例如重氮萘酚 - 酚醛清漆树脂）之后，CCL-PAA的暴露区域可以通过水溶液进行蚀刻。 有利地，图案化的交联聚合物也可以用作反应物和用于后续化学的基质。 例如，在一些实施方案中，可以将初始交联阳离子交换为不能光刻图案化的第二阳离子。 CCL-PAA的图案化膜也可用于将金属阳离子还原为金属纳米颗粒，并制备多孔，低k电介质基底。
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公开(公告)号：US20100233434A1
公开(公告)日：2010-09-16
申请号：US12311811
申请日：2007-10-18
申请人： Michal Lahav , Adam Winkleman , Max Narovlyansky , Raquel Perez-Castillejos , Emily A. Weiss , Leonard N.J. Rodriguez , George M. Whitesides
发明人： Michal Lahav , Adam Winkleman , Max Narovlyansky , Raquel Perez-Castillejos , Emily A. Weiss , Leonard N.J. Rodriguez , George M. Whitesides
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10T428/24479
摘要： In one aspect, methods of patterning of thin films of an ionotropic polymer (e.g., poly(acrylic acid)) are provided. These processes can create micron or sub-micron-scale patterns of ionotropic polymers such as cation crosslinked poly(acrylic acid) (CCL-PAA). In one embodiment, patterning may be performed within microfluidic channels by flowing a solution of crosslinking agent (e.g., metal cations such as Ag+, Ca2+, Pd2+, Al3+, La3+, and Ti4+) that can crosslink a portion of an ionotropic polymer in contact with the solution. In another embodiment, methods of patterning ionotropic polymers involve photolithography. Upon patterning a positive photoresist (e.g., diazonaphthoquinone-novolac resin) on a film of CCL-PAA, the exposed regions of CCL-PAA can be etched by an aqueous solution. Advantageously, the patterned, crosslinked polymer may also serve as both a reactant and a matrix for subsequent chemistry. For example, in some embodiments, the initial crosslinking cation can be exchanged for a second cation that could not be patterned photolithographically. Patterned films of CCL-PAA can also be used to host and template the reduction of metallic cations to metallic nanoparticles, and to fabricate porous, low-k dielectric substrates.
摘要翻译： 一方面，提供了离子型聚合物（例如聚（丙烯酸））的薄膜图案化方法。 这些方法可以产生离子型聚合物如阳离子交联的聚（丙烯酸）（CCL-PAA）的微米级或亚微米级的图案。 在一个实施方案中，可以在微流体通道内通过使交联剂（例如金属阳离子如Ag +，Ca 2+，Pd 2+，Al 3+，La 3+和Ti 4+）的溶液流过微流体通道，所述溶液可以将部分离子型聚合物与 解决方案。 在另一个实施方案中，构图离子型聚合物的方法涉及光刻。 在CCL-PAA膜上形成正性光致抗蚀剂（例如重氮萘酚 - 酚醛清漆树脂）之后，CCL-PAA的暴露区域可以通过水溶液进行蚀刻。 有利地，图案化的交联聚合物也可以用作反应物和用于后续化学的基质。 例如，在一些实施方案中，可以将初始交联阳离子交换为不能光刻图案化的第二阳离子。 CCL-PAA的图案化膜也可用于将金属阳离子还原为金属纳米颗粒，并制备多孔，低k电介质基底。
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公开(公告)号：US20060032329A1
公开(公告)日：2006-02-16
申请号：US10542789
申请日：2004-01-22
CPC分类号： B22F1/0025 , B01D67/0032 , B01D67/0039 , B01D67/0041 , B01D67/0046 , B01D67/006 , B01D67/0069 , B01D69/10 , B01D71/022 , B01D2239/0258 , B01D2323/24 , B01D2325/26 , B01J23/48 , B01J23/52 , B01J23/8926 , B01J35/002 , B01J35/0033 , B01J35/0046 , B01J35/026 , B01J35/06 , B01J35/065 , B01J35/1061 , B01J35/1085 , B22F3/1137 , B22F7/002 , B22F2998/00 , B82Y30/00 , C23C18/1644 , C23C18/1651 , C23C18/1653 , C23C18/1657 , C23C18/1662 , C25D1/02 , C25D7/04 , B22F1/0022 , B22F2202/01 , B22F2201/02
摘要： The present invention provides a new method for the synthesis of a novel kind of high-surface-area structures. A substrate is provided having pores or channels functionalized with an agent capable of binding nanoparticles, said pores or channels having a cross-sectional size of from about several nanometers to about 100 microns. A colloid solution comprising stabilized nanoparticles and a solvent is passed through said substrate, so as to bind and form more than one layer of nanoparticles in the pores or channels, where the bound nanoparticles spontaneously coalesce to form a coherent material having a substantially hollow structure and being composed of nanoparticles, where said structure follows the shape of said pores or channels in the substrate. The structures properties can be modified by deposition of another material, to form structures coated by the other material on their surface. The structures (with or without modification) can be separated from the porous substrate to obtain a material having a desired structure, for example a tubular structure.
摘要翻译： 本发明提供了一种合成新型高表面积结构的新方法。 提供了具有孔或通过能够结合纳米颗粒的试剂官能化的通道的基底，所述孔或通道具有约几纳米至约100微米的横截面尺寸。 包含稳定的纳米颗粒和溶剂的胶体溶液通过所述底物，以便在孔或通道中结合并形成多于一层的纳米颗粒，其中结合的纳米颗粒自发聚结形成具有基本中空结构的粘附材料， 由纳米颗粒组成，其中所述结构遵循基材中所述孔或通道的形状。 可以通过沉积另一种材料来改变结构特性，以形成由其表面上的其他材料涂覆的结构。 结构（具有或不具有改性）可以与多孔基材分离以获得具有所需结构的材料，例如管状结构。
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