公开(公告)号：US08387160B2

公开(公告)日：2013-02-26

申请号：US12899817

申请日：2010-10-07

申请人： Michel Despont ,  Urs T. Duerig ,  Jane E. Frommer ,  Bernd W. Gotsmann ,  James L. Hedrick ,  Craig Jon Hawker ,  Robert D. Miller

发明人： Michel Despont ,  Urs T. Duerig ,  Jane E. Frommer ,  Bernd W. Gotsmann ,  James L. Hedrick ,  Craig Jon Hawker ,  Robert D. Miller

IPC分类号： G01Q60/24

CPC分类号： G03F7/0002 ,  G01Q80/00 ,  Y10S977/849 ,  Y10S977/85 ,  Y10S977/851 ,  Y10S977/855 ,  Y10S977/857

摘要： A resist medium in which features are lithographically produced by scanning a surface of the medium with an AFM probe positioned in contact therewith. The resist medium comprises a substrate; and a polymer resist layer within which features are produced by mechanical action of the probe. The polymer contains thermally reversible crosslinkages. Also disclosed are methods that generally includes scanning a surface of the polymer resist layer with an AFM probe positioned in contact with the resist layer, wherein heating the probe and a squashing-type mechanical action of the probe produces features in the layer by thermally reversing the crosslinkages.

摘要翻译： 抗蚀剂介质，其特征是通过用与其接触的AFM探针扫描介质的表面来光刻制造。 抗蚀剂介质包括基底; 以及聚合物抗蚀剂层，其中通过探针的机械作用产生特征。 聚合物含有热可逆交联。 还公开了通常包括用定位成与抗蚀剂层接触的AFM探针扫描聚合物抗蚀剂层的表面的方法，其中加热探针和探针的挤压型机械作用通过热反转来产生该层中的特征 交联。

公开(公告)号：US20110020533A1

公开(公告)日：2011-01-27

申请号：US12899817

申请日：2010-10-07

申请人： Michel Despont ,  Urs T. Duerig ,  Jane E. Frommer ,  Bernd W. Gotsmann ,  James L. Hedrick ,  Craig Jon Hawker ,  Robert D. Miller

发明人： Michel Despont ,  Urs T. Duerig ,  Jane E. Frommer ,  Bernd W. Gotsmann ,  James L. Hedrick ,  Craig Jon Hawker ,  Robert D. Miller

IPC分类号： B05D3/00 ,  B29C59/00

CPC分类号： G03F7/0002 ,  G01Q80/00 ,  Y10S977/849 ,  Y10S977/85 ,  Y10S977/851 ,  Y10S977/855 ,  Y10S977/857

摘要： A resist medium in which features are lithographically produced by scanning a surface of the medium with an AFM probe positioned in contact therewith. The resist medium comprises a substrate; and a polymer resist layer within which features are produced by mechanical action of the probe. The polymer contains thermally reversible crosslinkages. Also disclosed are methods that generally includes scanning a surface of the polymer resist layer with an AFM probe positioned in contact with the resist layer, wherein heating the probe and a squashing-type mechanical action of the probe produces features in the layer by thermally reversing the crosslinkages.

摘要翻译： 抗蚀剂介质，其特征是通过用与其接触的AFM探针扫描介质的表面来光刻制造。 抗蚀剂介质包括基底; 以及聚合物抗蚀剂层，其中通过探针的机械作用产生特征。 聚合物含有热可逆交联。 还公开了通常包括用定位成与抗蚀剂层接触的AFM探针扫描聚合物抗蚀剂层的表面的方法，其中加热探针和探针的挤压型机械作用通过热反转来产生该层中的特征 交联。

公开(公告)号：US07862858B2

公开(公告)日：2011-01-04

申请号：US12336904

申请日：2008-12-17

申请人： Michel Despont ,  Urs T. Duerig ,  Jane E. Frommer ,  Bernd W. Gotsmann ,  James L. Hedrick ,  Craig Jon Hawker ,  Robert D. Miller

发明人： Michel Despont ,  Urs T. Duerig ,  Jane E. Frommer ,  Bernd W. Gotsmann ,  James L. Hedrick ,  Craig Jon Hawker ,  Robert D. Miller

IPC分类号： B05D3/06

CPC分类号： G03F7/0002 ,  G01Q80/00 ,  Y10S977/849 ,  Y10S977/85 ,  Y10S977/851 ,  Y10S977/855 ,  Y10S977/857

摘要： A resist medium in which features are lithographically produced by scanning a surface of the medium with an AFM probe positioned in contact therewith. The resist medium comprises a substrate; and a polymer resist layer within which features are produced by mechanical action of the probe. The polymer contains thermally reversible crosslinkages. Also disclosed are methods that generally includes scanning a surface of the polymer resist layer with an AFM probe positioned in contact with the resist layer, wherein heating the probe and a squashing-type mechanical action of the probe produces features in the layer by thermally reversing the crosslinkages.

摘要翻译： 抗蚀剂介质，其特征是通过用与其接触的AFM探针扫描介质的表面来光刻制造。 抗蚀剂介质包括基底; 以及聚合物抗蚀剂层，其中通过探针的机械作用产生特征。 聚合物含有热可逆交联。 还公开了通常包括用定位成与抗蚀剂层接触的AFM探针扫描聚合物抗蚀剂层的表面的方法，其中加热探针和探针的挤压型机械作用通过热反转来产生该层中的特征 交联。

公开(公告)号：US20090100553A1

公开(公告)日：2009-04-16

申请号：US12336904

申请日：2008-12-17

申请人： Michel Despont ,  Urs T. Duerig ,  Jane E. Frommer ,  Bernd W. Gotsmann ,  James L. Hedrick ,  Craig Jon Hawker ,  Robert D. Miller

发明人： Michel Despont ,  Urs T. Duerig ,  Jane E. Frommer ,  Bernd W. Gotsmann ,  James L. Hedrick ,  Craig Jon Hawker ,  Robert D. Miller

IPC分类号： G12B21/00

CPC分类号： G03F7/0002 ,  G01Q80/00 ,  Y10S977/849 ,  Y10S977/85 ,  Y10S977/851 ,  Y10S977/855 ,  Y10S977/857

摘要： A resist medium in which features are lithographically produced by scanning a surface of the medium with an AFM probe positioned in contact therewith. The resist medium comprises a substrate; and a polymer resist layer within which features are produced by mechanical action of the probe. The polymer contains thermally reversible crosslinkages. Also disclosed are methods that generally includes scanning a surface of the polymer resist layer with an AFM probe positioned in contact with the resist layer, wherein heating the probe and a squashing-type mechanical action of the probe produces features in the layer by thermally reversing the crosslinkages.

摘要翻译： 抗蚀剂介质，其特征是通过用与其接触的AFM探针扫描介质的表面来光刻制造。 抗蚀剂介质包括基底; 以及通过探针的机械作用产生特征的聚合物抗蚀剂层。 聚合物含有热可逆交联。 还公开了通常包括用定位成与抗蚀剂层接触的AFM探针扫描聚合物抗蚀剂层的表面的方法，其中加热探针和探针的挤压型机械作用通过热反转来产生该层中的特征 交联。

公开(公告)号：US07491425B2

公开(公告)日：2009-02-17

申请号：US10978028

申请日：2004-10-29

申请人： Michel Despont ,  Urs T. Duerig ,  Jane E. Frommer ,  Bernd W. Gotsmann ,  James L. Hedrick ,  Craig Jon Hawker ,  Robert D. Miller

发明人： Michel Despont ,  Urs T. Duerig ,  Jane E. Frommer ,  Bernd W. Gotsmann ,  James L. Hedrick ,  Craig Jon Hawker ,  Robert D. Miller

IPC分类号： B05D3/06

CPC分类号： G03F7/0002 ,  G01Q80/00 ,  Y10S977/849 ,  Y10S977/85 ,  Y10S977/851 ,  Y10S977/855 ,  Y10S977/857

摘要： A resist medium in which features are lithographically produced by scanning a surface of the medium with an AFM probe positioned in contact therewith. The resist medium comprises a substrate; and a polymer resist layer within which features are produced by mechanical action of the probe. The polymer contains thermally reversible crosslinkages. Also disclosed is a method that generally includes scanning a surface of the polymer resist layer with an AFM probe positioned in contact with the resist layer, wherein heating the probe and a squashing-type mechanical action of the probe produces features in the layer by thermally reversing the crosslinkages.

摘要翻译： 抗蚀剂介质，其特征是通过用与其接触的AFM探针扫描介质的表面来光刻制造。 抗蚀剂介质包括基底; 以及聚合物抗蚀剂层，其中通过探针的机械作用产生特征。 聚合物含有热可逆交联。 还公开了一种方法，其通常包括用与抗蚀剂层接触的AFM探针扫描聚合物抗蚀剂层的表面，其中加热探针和探针的挤压型机械作用通过热反转在层中产生特征 交联。

公开(公告)号：US20100316960A1

公开(公告)日：2010-12-16

申请号：US12482500

申请日：2009-06-11

申请人： Urs T. Duerig ,  Jane E. Frommer ,  Bernd W. Gotsmann ,  James L. Hedrick ,  Armin W. Knoll ,  Robert D. Miller ,  David Pires ,  Charles G. Wade

发明人： Urs T. Duerig ,  Jane E. Frommer ,  Bernd W. Gotsmann ,  James L. Hedrick ,  Armin W. Knoll ,  Robert D. Miller ,  David Pires ,  Charles G. Wade

IPC分类号： G03F7/20

CPC分类号： C08G2/06 ,  C08G2/14 ,  G01Q80/00 ,  G03F7/0002 ,  G03F7/0392 ,  G03F7/16 ,  G03F7/2049

摘要： The invention concerns a method for patterning a surface of a material. A substrate having a polymer film thereon is provided. The polymer is a selectively reactive polymer (e.g. thermodynamically unstable): it is able to unzip upon suitable stimulation. A probe is used to create patterns on the film. During the patterning, the film is locally stimulated for unzipping polymer chains. Hence, a basic idea is to provide a stimulus to the polymeric material, which in turn spontaneously decomposes e.g. into volatile constituents. For example, the film is thermally stimulated in order to break a single bond in a polymer chain, which is sufficient to trigger the decomposition of the entire polymer chain.

摘要翻译： 本发明涉及用于图案化材料表面的方法。 提供其上具有聚合物膜的基板。 聚合物是选择性反应性聚合物（例如热力学不稳定的）：它能够在合适的刺激下解压缩。 探针用于在电影上创建图案。 在图案化期间，膜被局部刺激用于解链聚合物链。 因此，基本思想是向聚合物材料提供刺激，其又自发分解，例如， 变成挥发性成分。 例如，为了破坏聚合物链中的单键，该膜被热刺激，这足以引发整个聚合物链的分解。

公开(公告)号：US08389205B2

公开(公告)日：2013-03-05

申请号：US12482500

申请日：2009-06-11

申请人： Urs T. Duerig ,  Jane E. Frommer ,  Bernd W. Gotsmann ,  James L. Hedrick ,  Armin W. Knoll ,  Robert D. Miller ,  David Pires ,  Charles G. Wade

发明人： Urs T. Duerig ,  Jane E. Frommer ,  Bernd W. Gotsmann ,  James L. Hedrick ,  Armin W. Knoll ,  Robert D. Miller ,  David Pires ,  Charles G. Wade

IPC分类号： G03F7/26

CPC分类号： C08G2/06 ,  C08G2/14 ,  G01Q80/00 ,  G03F7/0002 ,  G03F7/0392 ,  G03F7/16 ,  G03F7/2049

摘要： The invention concerns a method for patterning a surface of a material. A substrate having a polymer film thereon is provided. The polymer is a selectively reactive polymer (e.g. thermodynamically unstable): it is able to unzip upon suitable stimulation. A probe is used to create patterns on the film. During the patterning, the film is locally stimulated for unzipping polymer chains. Hence, a basic idea is to provide a stimulus to the polymeric material, which in turn spontaneously decomposes e.g. into volatile constituents. For example, the film is thermally stimulated in order to break a single bond in a polymer chain, which is sufficient to trigger the decomposition of the entire polymer chain.

摘要翻译： 本发明涉及用于图案化材料表面的方法。 提供其上具有聚合物膜的基板。 聚合物是选择性反应性聚合物（例如热力学不稳定的）：它能够在合适的刺激下解压缩。 探针用于在电影上创建图案。 在图案化期间，膜被局部刺激用于解链聚合物链。 因此，基本思想是向聚合物材料提供刺激，其又自发分解，例如， 变成挥发性成分。 例如，为了破坏聚合物链中的单键，该膜被热刺激，这足以引发整个聚合物链的分解。

公开(公告)号：US09164376B2

公开(公告)日：2015-10-20

申请号：US13570922

申请日：2012-08-09

申请人： Daniel J. Coady ,  Urs T. Duerig ,  Jane E. Frommer ,  Kazuki Fukushima ,  James L. Hedrick ,  Armin W. Knoll

发明人： Daniel J. Coady ,  Urs T. Duerig ,  Jane E. Frommer ,  Kazuki Fukushima ,  James L. Hedrick ,  Armin W. Knoll

IPC分类号： G03F7/20 ,  G03F7/00

CPC分类号： B32B3/00 ,  G03F7/0002 ,  Y10T428/24355

摘要： The invention concerns a method for patterning a surface of a material. A substrate having a polymer film thereon is provided. The polymer is a selectively reactive polymer (e.g., thermodynamically unstable): it is able to unzip upon suitable stimulation. A probe is used to create patterns on the film. During the patterning, the film is locally stimulated for unzipping polymer chains. Hence, a basic idea is to provide a stimulus to the polymeric material, which in turn spontaneously decomposes e.g., into volatile constituents. For example, the film is thermally stimulated in order to break a single bond in a polymer chain, which is sufficient to trigger the decomposition of the entire polymer chain.

摘要翻译： 本发明涉及用于图案化材料表面的方法。 提供其上具有聚合物膜的基板。 聚合物是选择性反应性聚合物（例如，热力学不稳定的）：它能够在合适的刺激下解压缩。 探针用于在电影上创建图案。 在图案化期间，膜被局部刺激用于解链聚合物链。 因此，基本思想是向聚合材料提供刺激，其又自发分解成挥发性成分。 例如，为了破坏聚合物链中的单键，该膜被热刺激，这足以引发整个聚合物链的分解。

公开(公告)号：US20120301672A1

公开(公告)日：2012-11-29

申请号：US13570921

申请日：2012-08-09

申请人： Daniel J. Coady ,  Urs T. Duerig ,  Jane E. Frommer ,  Kazuki Fukushima ,  James L. Hedrick ,  Armin W. Knoll

发明人： Daniel J. Coady ,  Urs T. Duerig ,  Jane E. Frommer ,  Kazuki Fukushima ,  James L. Hedrick ,  Armin W. Knoll

IPC分类号： B29C35/00

CPC分类号： B32B3/00 ,  G03F7/0002 ,  Y10T428/24355

摘要： The invention concerns a method for patterning a surface of a material. A substrate having a polymer film thereon is provided. The polymer is a selectively reactive polymer (e.g., thermodynamically unstable): it is able to unzip upon suitable stimulation. A probe is used to create patterns on the film. During the patterning, the film is locally stimulated for unzipping polymer chains. Hence, a basic idea is to provide a stimulus to the polymeric material, which in turn spontaneously decomposes e.g., into volatile constituents. For example, the film is thermally stimulated in order to break a single bond in a polymer chain, which is sufficient to trigger the decomposition of the entire polymer chain.

摘要翻译： 本发明涉及用于图案化材料表面的方法。 提供其上具有聚合物膜的基板。 聚合物是选择性反应性聚合物（例如，热力学不稳定的）：它能够在合适的刺激下解压缩。 探针用于在电影上创建图案。 在图案化期间，膜被局部刺激用于解链聚合物链。 因此，基本思想是向聚合材料提供刺激，其又自发分解成挥发性成分。 例如，为了破坏聚合物链中的单键，该膜被热刺激，这足以引发整个聚合物链的分解。

公开(公告)号：US08574815B2

公开(公告)日：2013-11-05

申请号：US13570921

申请日：2012-08-09

申请人： Daniel J. Coady ,  Urs T. Duerig ,  Jane E. Frommer ,  Kazuki Fukushima ,  James L. Hedrick ,  Armin W. Knoll

发明人： Daniel J. Coady ,  Urs T. Duerig ,  Jane E. Frommer ,  Kazuki Fukushima ,  James L. Hedrick ,  Armin W. Knoll

IPC分类号： G03F7/00 ,  G03F7/004

CPC分类号： B32B3/00 ,  G03F7/0002 ,  Y10T428/24355

摘要： The invention concerns a method for patterning a surface of a material. A substrate having a polymer film thereon is provided. The polymer is a selectively reactive polymer (e.g., thermodynamically unstable): it is able to unzip upon suitable stimulation. A probe is used to create patterns on the film. During the patterning, the film is locally stimulated for unzipping polymer chains. Hence, a basic idea is to provide a stimulus to the polymeric material, which in turn spontaneously decomposes e.g., into volatile constituents. For example, the film is thermally stimulated in order to break a single bond in a polymer chain, which is sufficient to trigger the decomposition of the entire polymer chain.