摘要:
An optical component mounting substrate which comprises grooves for holding optical fibers, other grooves for optical components being inserted and optical waveguides is produced with a press molding process. A mold having convex and/or concave surface profiles which are corresponding to the grooves and the optical waveguides to be formed on a surface of the optical component mounting substrate is used as a die in the press molding process. The surface profiles of the mold are precisely transferred onto the surface of a transparent glass base substrate, thereby forming the optical component mounting substrate having a desired surface configuration including the grooves and the optical waveguides. Optical fibers are aligned along the grooves and fixed by a light-curing adhesive. Since a press molding process is applied, the optical component mounting substrate can be produced easily at a low cost with mass production and also can attain many advantages such as small coupling loss, small crosstalk, high positional accuracy, excellent reproducibility and high reliability.
摘要:
A die for press-molding a glass optical element which includes a base material having a surface to press-mold glass and a tantalum(Ta)-containing alloy thin layer on the surface, the base material being heat-resistant and strong enough to withstand press-molding.
摘要:
A method of manufacturing glass optical elements such as gratings, microlenses, Fresnel lenses, optical disks with pregrooves, and the like includes heating a glass plate to a temperature higher than the softening point of the glass and then press-molding the glass using upper and lower dies. The upper die includes a base made of a hard metal and a work layer made of a noble metal alloy which has been sputtered on a press plane of the base through a mask. The mask has a fine aperture pattern such as a line and space pattern corresponding to the fine pattern of concavities and convexities which is to be formed at the surface of the glass optical element.
摘要:
A die for press-molding glass optical elements which can press-mold glass optical elements having high melting points and various shapes repeatedly, which includes a base material having high strength on which a cutting layer having heat resistance and free cutting machinability is formed. After cutting the cutting layer into the desired shape with high accuracy, the die is coated with a surface protective film.
摘要:
A die for press-molding glass optical elements which can press-mold glass optical elements having high melting points and various shapes repeatedly, which includes a base material having high strength on which a cutting layer having heat resistance and free cutting machinability is formed. After cutting the cutting layer into the desired shape with high accuracy, the die is coated with a surface protective film.
摘要:
A method of press-molding glass optical elements by press-molding glass, having a high melting point, at a temperature of 650.degree. C. and higher using a die for press-molding glass optical elements which includes a base material having a heat resistance and sufficient strength to withstand press-molding of optical glass elements, a cutting layer on the base material, and a surface protective layer on the cutting layer. The cutting layer is formed of an alloy film containing P and one metal selected from the group Ni, Co, and Fe, and one metal from the group Si, Ti, Cu, Zr, Nb, Mo, Ru, Rh, Pd, Hf, Ta, W, Re, Os, and Ir, or an alloy film containing Cu and 20 to 80 atom % of one metal selected from the group Ni, Co, Fe, Si, Ti, Zr, Nb, Mo, Ru, Rh, Pd, Hf, Ta, W, Re, Os, and Ir, or an alloy film containing Si and 20 to 80 atom % of one metal selected from the group Ni, Co, Fe, Cu, Ti, Zr, Nb, Mo, Ru, Rh, Pd, Hf, Ta, W, Re, Os, and Ir. The surface protective layer is formed of an alloy film of at least one metal selected from the group Pt, Pd, Ir, Rh, Os, Ru, Re, W, and Ta.
摘要:
A die for press-molding glass optical elements comprising (a) a base material having heat resistance and sufficient strength to withstand press-molding of optical glass elements; (b) a film on said base material comprising an alloy film containing B and one metal selected from the group consisting of Ni, Co, and Fe, and one metal selected from the group consisting of Si, Ti, Cu, Zr, Nb, Mo, Ru, Rh, Pd, Hf, Ta, W, Re, Os, and Ir, to form a cutting layer; and (c) a surface protective layer on top of said cutting layer made of an alloy film comprising at least one metal selected from the group consisting of Pt, Pd, Ir, Rh, Os, Ru, Re, W, and Ta.
摘要:
A method for press molding preforms to obtain optical articles in which each preform is prepared beforehand to have a diameter larger than that of an optically functional area of the optical article and edges of the preform to be press mold contact with molding surfaces of a pair of molds outside an area of each molding surface corresponding to the optically functional area of the optical article, thereby elongating the lifetime of molds.
摘要:
On a cemented carbide alloy disk or a cermet disk having been coated with either an iridium (Ir) alloy film or a ruthenium (Ru) alloy film is formed guide grooves by photography or ECR ion etching. The disk thus obtained is used as an optical or magnetic disk stamper. Next, a glass or aluminium disk is placed between a pair of stampers obtained as above and molded under pressure while heating thereby to make guide grooves of an optical or magnetic disk.
摘要:
A base material excellent in heat resistance and high-temperature strength is processed into a desired configuration. The processed base material is coated with a heat-resistant film having excellent strength at high temperatures and low reactivity with a glass material to be molded. A resist is applied on the heat resistant film and a desired pattern is drawn thereon by means of electron beam, ion beam, hologram exposure, or ordinary photolithography. Or if a mold having deep unevenness of the pressing surface is required, the resist is applied after an intermediate layer which permits selective etching is formed on the heat resistant film, and the required pattern is drawn thereon by means of electron beam, ion beam, hologram exposure, or ordinary photolithography. The intermediate layer is removed by wet etching or dry etching to emphasize unevenness of the mask. The resist film or the resist film and intermediate layer film are completely removed and a part of the heat-resistant film is removed to obtain a mold having the desired configuration of the molding surface.