HIGH PRESSURE CHARGED PARTICLE BEAM SYSTEM
    1.
    发明申请
    HIGH PRESSURE CHARGED PARTICLE BEAM SYSTEM 有权
    高压充电粒子束系统

    公开(公告)号:US20110031394A1

    公开(公告)日:2011-02-10

    申请号:US12525908

    申请日:2008-02-06

    Abstract: The current invention includes methods and apparatuses for processing, that is, altering and imaging, a sample in a high pressure charged particle beam system. Embodiments of the invention include a cell in which the sample is positioned during high pressure charged particle beam processing. The cell reduces the amount of gas required for processing, thereby allowing rapid introduction, exhaustion, and switching between gases and between processing and imaging modes. Maintaining the processes gases within the cell protects the sample chamber and column from contact with the gases. In some embodiments, the temperature of the cell walls and the sample can be controlled.

    Abstract translation: 本发明包括用于处理的方法和装置,即改变和成像高压带电粒子束系统中的样品。 本发明的实施例包括其中样品在高压带电粒子束处理期间被定位的单元。 电池减少处理所需的气体量,从而允许气体之间以及处理和成像模式之间的快速引入,耗尽和切换。 维持过程中的气体保护样品室和色谱柱不与气体接触。 在一些实施方案中,可以控制细胞壁和样品的温度。

    High pressure charged particle beam system
    3.
    发明授权
    High pressure charged particle beam system 有权
    高压带电粒子束系统

    公开(公告)号:US08921811B2

    公开(公告)日:2014-12-30

    申请号:US12525908

    申请日:2008-02-06

    Abstract: The current invention includes methods and apparatuses for processing, that is, altering and imaging, a sample in a high pressure charged particle beam system. Embodiments of the invention include a cell in which the sample is positioned during high pressure charged particle beam processing. The cell reduces the amount of gas required for processing, thereby allowing rapid introduction, exhaustion, and switching between gases and between processing and imaging modes. Maintaining the processes gases within the cell protects the sample chamber and column from contact with the gases. In some embodiments, the temperature of the cell walls and the sample can be controlled.

    Abstract translation: 本发明包括用于处理的方法和装置,即改变和成像高压带电粒子束系统中的样品。 本发明的实施例包括其中样品在高压带电粒子束处理期间被定位的单元。 电池减少处理所需的气体量,从而允许气体之间以及处理和成像模式之间的快速引入,耗尽和切换。 维持过程中的气体保护样品室和色谱柱不与气体接触。 在一些实施方案中,可以控制细胞壁和样品的温度。

    Detector for charged particle beam instrument
    6.
    发明授权
    Detector for charged particle beam instrument 有权
    带电粒子束仪的探测器

    公开(公告)号:US07541580B2

    公开(公告)日:2009-06-02

    申请号:US11731743

    申请日:2007-03-30

    Abstract: A detector for use with a high pressure SEM, such as an ESEM® environmental SEM from FEI Company, extends the effective detection space above the PLA, thereby increasing secondary signal amplification without increasing working distance or pressure. Embodiments can therefore provide improved resolution and can operate at lower gas pressures.

    Abstract translation: 用于高压SEM的检测器,如来自FEI公司的ESEM环境SEM,扩展了PLA上方的有效检测空间,从而在不增加工作距离或压力的情况下增加了二次信号放大。 因此,实施例可以提供改进的分辨率并且可以在较低的气体压力下操作。

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