公开(公告)号：US5134191A

公开(公告)日：1992-07-28

申请号：US478522

申请日：1990-02-12

申请人： Mitsuhiro Takarada ,  Kazuharu Sato ,  Kenji Yamamoto ,  Shigeru Mori

发明人： Mitsuhiro Takarada ,  Kazuharu Sato ,  Kenji Yamamoto ,  Shigeru Mori

IPC分类号： C09D183/04 ,  C09D183/06

CPC分类号： C09D183/04 ,  C09D183/06

摘要： A hard coating composition comprising an epoxy group-containing organic silicon compound and inorganic submicron particles such as silica sol is curable with a minimal amount of an antimony compound as the curing catalyst. The composition is thus stable during shelf storage and can be cured to a plastic optical article as a mar resistant hard coating film.

摘要翻译： 包含含环氧基的有机硅化合物和无机亚微米颗粒如硅溶胶的硬涂层组合物可用最少量的锑化合物作为固化催化剂固化。 因此，组合物在储存期间是稳定的，并且可以固化成塑料光学制品作为耐腐蚀性硬涂膜。

公开(公告)号：US5021091A

公开(公告)日：1991-06-04

申请号：US465978

申请日：1990-01-16

申请人： Mitsuhiko Takarada ,  Kazuharu Sato ,  Kenji Yamamoto ,  Shigeru Mori

发明人： Mitsuhiko Takarada ,  Kazuharu Sato ,  Kenji Yamamoto ,  Shigeru Mori

IPC分类号： C08J7/04 ,  C08K3/24 ,  C08L83/04 ,  C09D183/04 ,  G02B1/10

CPC分类号： G02B1/105 ,  C08J7/047 ,  C09D183/04 ,  C08J2483/00

摘要： A hard coating composition comprising an organic silicon compound and inorganic submicron particles such as silica sol and antimony oxide sol is improved in curing properties and shelf stability by blending aluminum perchlorate as the curing catalyst.

公开(公告)号：US07981811B2

公开(公告)日：2011-07-19

申请号：US12508888

申请日：2009-07-24

申请人： Shigeru Mori ,  Takahiro Korenari ,  Tadahiro Matsuzaki ,  Hiroshi Tanabe

发明人： Shigeru Mori ,  Takahiro Korenari ,  Tadahiro Matsuzaki ,  Hiroshi Tanabe

IPC分类号： H01L21/31

CPC分类号： H01L29/78621 ,  H01L29/66757

摘要： A base layer is formed on an insulating substrate, and a semiconductor layer is formed in localized fashion thereon. A gate insulating film is then formed so as to cover the semiconductor layer, and a gate electrode is formed on a portion of the gate insulating film. An impurity is then implanted into the semiconductor layer via the gate insulating film, and a source region, a drain region, and an LDD region are formed. The gate insulating film is etched with dilute hydrofluoric acid. An electrode-protecting insulating film is then formed so as to cover the gate electrode, and the entire surface of the surface layer portion of the electrode-protecting insulating film is etched away using dilute hydrofluoric acid. Carrier traps introduced into the electrode-protecting insulating film and the gate insulating film are thereby removed.

摘要翻译： 在绝缘基板上形成基底层，以局部方式形成半导体层。 然后形成栅极绝缘膜以覆盖半导体层，并且栅极电极形成在栅极绝缘膜的一部分上。 然后通过栅极绝缘膜将杂质注入到半导体层中，形成源极区，漏极区和LDD区。 用稀氢氟酸蚀刻栅极绝缘膜。 然后形成电极保护绝缘膜以覆盖栅电极，并且使用稀氢氟酸腐蚀掉电极保护绝缘膜的表面层部分的整个表面。 因此，引入到电极保护绝缘膜和栅极绝缘膜中的载流子阱被去除。

公开(公告)号：US07160572B2

公开(公告)日：2007-01-09

申请号：US10923990

申请日：2004-08-23

申请人： Junichi Fujikata ,  Tsutomu Ishi ,  Shigeru Mori

发明人： Junichi Fujikata ,  Tsutomu Ishi ,  Shigeru Mori

IPC分类号： B05D5/12

CPC分类号： H01L43/08 ,  B82Y10/00 ,  B82Y25/00 ,  G11B5/00 ,  G11B5/3903 ,  G11B5/3909 ,  H01F10/3268 ,  H01L43/12 ,  Y10T428/1114

摘要： In a spin tunnel magnetoresistive effect film in which a magnetic thin film to which an exchange bias is applied by exchange coupling via an anti-ferromagnetic thin film and a magnetic thin film that detects a magnetic field are laminated, a magnetic thin film or an anti-ferromagnetic thin film (PtMn, PdMn, NiMn) is laminated onto an underlayer (Ta, Zr, Hf), the surface roughness thereof being in the range from 0.1 to 5 Angstroms. A means used to control the surface roughness introduces into the film growing chamber oxygen, nitrogen, hydrogen, or a gas mixture thereof into a vacuum of 10−6 Torr to 10−9 Torr, reduces the substrate temperature to 0° C. or lower during film growth, or oxidizes an underlayer. The lower electrode layer material used is a film laminate of a high-permeability amorphous magnetic material and a non-magnetic metallic layer.

摘要翻译： 在通过反铁磁性薄膜进行交换耦合而施加了交换偏压的磁性薄膜和检测磁场的磁性薄膜的自旋隧道磁阻效应薄膜中，形成磁性薄膜或抗反射膜 将铁磁性薄膜（PtMn，PdMn，NiMn）层压到底层（Ta，Zr，Hf）上，其表面粗糙度在0.1〜5埃的范围内。 用于控制表面粗糙度的方法将薄膜生长室中的氧气，氮气，氢气或其气体混合物引入10 -6乇至10 -9乇的真空中 > Torr，在膜生长期间将衬底温度降低至0℃或更低，或氧化底层。 所使用的下电极层材料是高磁导率非晶磁性材料和非磁性金属层的膜层叠体。

公开(公告)号：US20060274456A1

公开(公告)日：2006-12-07

申请号：US11477402

申请日：2006-06-30

申请人： Kazuhiko Hayashi ,  Junichi Fujikata ,  Tsutomu Ishi ,  Shigeru Mori ,  Keishi Ohashi ,  Masafumi Nakada ,  Kiyokazu Nagahara ,  Kunihiko Ishihara ,  Nobuyuki Ishiwata

发明人： Kazuhiko Hayashi ,  Junichi Fujikata ,  Tsutomu Ishi ,  Shigeru Mori ,  Keishi Ohashi ,  Masafumi Nakada ,  Kiyokazu Nagahara ,  Kunihiko Ishihara ,  Nobuyuki Ishiwata

IPC分类号： G11B5/33

CPC分类号： B82Y25/00 ,  B82Y10/00 ,  G01R31/3171 ,  G01R33/093 ,  G11B5/00 ,  G11B5/39 ,  G11B5/3903 ,  G11B5/3909 ,  G11B5/3932 ,  G11B5/3967 ,  H01F10/3268

摘要： A magneto-resistance effect head is provided with a lower conductive layer which is provided with a recessed portion, and a vertical bias layer is provided in the recessed portion. A free layer is provided on the lower conductive layer. On the free layer, layered in the following order are the non-magnetic layer, the fixed layer, the fixing layer, and the upper layer so as not to be placed immediately above the vertical bias layer. The non-magnetic layer, the fixed layer, the fixing layer, and the upper layer are buried in an insulation layer. Furthermore, an upper conductive layer is provided on the upper layer and the insulation layer. In the direction of the magnetic field applied by the vertical bias layer, the free layer is made greater in length than the fixed layer and the free layer is disposed in proximity to the vertical bias layer with the distance between the fixed layer and the vertical bias layer remaining unchanged.

公开(公告)号：US20060268467A1

公开(公告)日：2006-11-30

申请号：US11477410

申请日：2006-06-30

申请人： Kazuhiko Hayashi ,  Junichi Fujikata ,  Tsutomu Ishi ,  Shigeru Mori ,  Keishi Ohashi ,  Masafumi Nakada ,  Kivokazu Nagahara ,  Kunihiko Ishihara ,  Nobuyuki Ishiwata

发明人： Kazuhiko Hayashi ,  Junichi Fujikata ,  Tsutomu Ishi ,  Shigeru Mori ,  Keishi Ohashi ,  Masafumi Nakada ,  Kivokazu Nagahara ,  Kunihiko Ishihara ,  Nobuyuki Ishiwata

IPC分类号： G11B5/33

CPC分类号： B82Y25/00 ,  B82Y10/00 ,  G01R31/3171 ,  G01R33/093 ,  G11B5/00 ,  G11B5/39 ,  G11B5/3903 ,  G11B5/3909 ,  G11B5/3932 ,  G11B5/3967 ,  H01F10/3268

摘要： A magneto-resistance effect head is provided with a lower conductive layer which is provided with a recessed portion, and a vertical bias layer is provided in the recessed portion. A free layer is provided on the lower conductive layer. On the free layer, layered in the following order are the non-magnetic layer, the fixed layer, the fixing layer, and the upper layer so as not to be placed immediately above the vertical bias layer. The non-magnetic layer, the fixed layer, the fixing layer, and the upper layer are buried in an insulation layer. Furthermore, an upper conductive layer is provided on the upper layer and the insulation layer. In the direction of the magnetic field applied by the vertical bias layer, the free layer is made greater in length than the fixed layer and the free layer is disposed in proximity to the vertical bias layer with the distance between the fixed layer and the vertical bias layer remaining unchanged.

公开(公告)号：US06680081B2

公开(公告)日：2004-01-20

申请号：US10102846

申请日：2002-03-22

申请人： Motoo Fukushima ,  Kunio Itoh ,  Shigeru Mori ,  Masaki Kasashima ,  Yoshitaka Hamada ,  Mikio Aramata

发明人： Motoo Fukushima ,  Kunio Itoh ,  Shigeru Mori ,  Masaki Kasashima ,  Yoshitaka Hamada ,  Mikio Aramata

IPC分类号： C23C1832

CPC分类号： H01B1/22 ,  H05K3/323 ,  Y10T428/2991 ,  Y10T428/2993 ,  Y10T428/2995 ,  Y10T428/2996

摘要： A conductive powder having an organic silicon polymer layer on the surface of each particle and a metal layer enclosing the silicon polymer layer possesses a stronger bond between the particle base and the metal even at elevated temperature and exhibits a high and stable conductivity and heat resistance.

摘要翻译： 在每个颗粒的表面上具有有机硅聚合物层的导电粉末和包围硅聚合物层的金属层即使在升高的温度下也具有更强的颗粒基体和金属之间的结合，并表现出高且稳定的导电性和耐热性。

公开(公告)号：US06616511B2

公开(公告)日：2003-09-09

申请号：US09873190

申请日：2001-06-05

申请人： Shigeru Mori ,  Shigetoshi Kondoh ,  Tadashi Nishino ,  Yasutsugu Yoshimura ,  Yasuharu Imagawa ,  Hiroyuki Shiraiwa

发明人： Shigeru Mori ,  Shigetoshi Kondoh ,  Tadashi Nishino ,  Yasutsugu Yoshimura ,  Yasuharu Imagawa ,  Hiroyuki Shiraiwa

IPC分类号： B24B100

CPC分类号： B24B5/363 ,  B21B13/023 ,  B21B28/04 ,  B24B5/167 ,  B24B49/16 ,  B24D9/08 ,  G05B19/4163

摘要： A grinding head unit is constituted by a grinding wheel, a drive device for rotating the grinding wheel, and a movement device for moving the grinding wheel. When vibration of a mill roll is applied to the grinding wheel, a plain wheel integral with an abrasive layer of the grinding wheel and having an elastically deforming function is deflected to absorb the vibration energy. The contact force between the abrasive layer and the mill roll is measured for determining a profile of the mill roll. The mill roll can be thereby ground into a target profile while absorbing the vibration transmitted from the mill roll and measuring the profile of the mill roll, without causing any chattering marks.

公开(公告)号：US06585558B1

公开(公告)日：2003-07-01

申请号：US09376489

申请日：1999-08-18

申请人： Shigeru Mori ,  Shigetoshi Kondoh ,  Tadashi Nishino ,  Yasutsugu Yoshimura ,  Yasuharu Imagawa ,  Hiroyuki Shiraiwa

发明人： Shigeru Mori ,  Shigetoshi Kondoh ,  Tadashi Nishino ,  Yasutsugu Yoshimura ,  Yasuharu Imagawa ,  Hiroyuki Shiraiwa

IPC分类号： B24B504

CPC分类号： B24B5/363 ,  B21B13/023 ,  B21B28/04 ,  B24B5/167 ,  B24B49/16 ,  B24D9/08 ,  G05B19/4163

摘要： A grinding head unit is constituted by a grinding wheel, a drive device for rotating the grinding wheel, and a movement device for moving the grinding wheel. When vibration of a mill roll is applied to the grinding wheel, a plain wheel integral with an abrasive layer of the grinding wheel and having an elastically deforming function is deflected to absorb the vibration energy. The contact force between the abrasive layer and the mill roll is measured for determining a profile of the mill roll. The mill roll can be thereby ground into a target profile while absorbing the vibration transmitted from the mill roll and measuring the profile of the mill roll, without causing any chattering marks.

公开(公告)号：US06431951B1

公开(公告)日：2002-08-13

申请号：US09768455

申请日：2001-01-25

申请人： Mitsuru Onose ,  Shigeru Mori

发明人： Mitsuru Onose ,  Shigeru Mori

IPC分类号： B24B504

摘要： Upper and lower working rolls 2a, 2b are ground while moving respective grindstone devices 3a, 3b in reverse directions, whereby the region of grinding for the upper working roll 2a and that for the lower working roll 2b are maintained in symmetry with respect to the center of rolls, one on the operating side and the other on the driving side. By this arrangement, it is possible to equalize the coefficients of friction on the operating side and the driving side, and to prevent meandering of the rolling stock 6 as well as drawing (squeezing) or bad product shape due to the meandering from occurring. The timings to start grinding by the grindstone devices 3a, 3b are set to be substantially the same, and the velocities of movement of the grindstone devices 3a, 3b in the axial direction of the working rolls are set to be equal, whereby the difference in frictional coefficient due to grinding in the longitudinal direction of the rolls can stably be kept small.