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1.发明申请Measurement Method, Measurement Apparatus, Exposure Method, and Exposure Apparatus 有权测量方法，测量装置，曝光方法和曝光装置公开(公告)号：US20080013073A1
公开(公告)日：2008-01-17
申请号：US11587099
申请日：2005-04-20
申请人： Mitsuru Kobayashi , Masahiko Yasuda
发明人： Mitsuru Kobayashi , Masahiko Yasuda
IPC分类号： G01N21/00
CPC分类号： G03F9/7046 , G03F9/7003 , G03F9/7011 , G03F9/7019 , G03F9/7084
摘要： To perform high-speed and highly accurate measurement by setting desired measuring conditions for each measuring object. In an alignment sensor of exposure apparatus, in the case of performing position measurement for a plurality of sample shots, measurement is performed by changing the measuring conditions, in response to a measuring axis direction, a mark or a layer whereupon a mark to be measured exists. At that time, for the measuring objects to be measured under the same measuring conditions, for example, a position in a Y axis direction and a position in an X axis direction, measurement is continuously performed. When the measuring condition is changed, a baseline value is remeasured. The changeable measuring conditions are wavelength of measuring light, use and selection of a retarder, NA and σ of an optical system, a light quantity of measuring light, illumination shape, signal processing algorithm, etc.
摘要翻译： 通过设置每个测量对象的所需测量条件来执行高速和高精度的测量。 在曝光装置的对准传感器中，在对多个采样拍摄进行位置测量的情况下，通过根据测量轴方向改变测量条件，进行测量的标记或层，进行测量 存在 此时，对于在相同测量条件下测量的测量对象，例如，Y轴方向的位置和X轴方向的位置，连续进行测量。 当测量条件改变时，重新测量基准值。 可变测量条件是测量光的波长，延迟器的使用和选择，光学系统的NA和西格玛，测量光的光量，照明形状，信号处理算法等。
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2.发明授权Measurement method, measurement apparatus, exposure method, and exposure apparatus 有权测量方法，测量装置，曝光方法和曝光装置公开(公告)号：US08477310B2
公开(公告)日：2013-07-02
申请号：US11587099
申请日：2005-04-20
申请人： Mitsuru Kobayashi , Masahiko Yasuda
发明人： Mitsuru Kobayashi , Masahiko Yasuda
IPC分类号： G01B11/00
CPC分类号： G03F9/7046 , G03F9/7003 , G03F9/7011 , G03F9/7019 , G03F9/7084
摘要： To perform high-speed and highly accurate measurement by setting desired measuring conditions for each measuring object. In an alignment sensor of exposure apparatus, in the case of performing position measurement for a plurality of sample shots, measurement is performed by changing the measuring conditions, in response to a measuring axis direction, a mark or a layer whereupon a mark to be measured exists. At that time, for the measuring objects to be measured under the same measuring conditions, for example, a position in a Y axis direction and a position in an X axis direction, measurement is continuously performed. When the measuring condition is changed, a baseline value is remeasured. The changeable measuring conditions are wavelength of measuring light, use and selection of a retarder, NA and σ of an optical system, a light quantity of measuring light, illumination shape, signal processing algorithm, etc.
摘要翻译： 通过设置每个测量对象的所需测量条件来执行高速和高精度的测量。 在曝光装置的对准传感器中，在对多个采样拍摄进行位置测量的情况下，通过根据测量轴方向改变测量条件，进行测量的标记或层，进行测量 存在 此时，对于在相同测量条件下测量的测量对象，例如，Y轴方向的位置和X轴方向的位置，连续进行测量。 当测量条件改变时，将重新测量基准值。 可变测量条件是测量光的波长，延迟器的使用和选择，光学系统的NA和西格玛，测量光的光量，照明形状，信号处理算法等。
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3.发明授权Measurement method, measurement apparatus, exposure method, and exposure apparatus 有权测量方法，测量装置，曝光方法和曝光装置公开(公告)号：US08947665B2
公开(公告)日：2015-02-03
申请号：US13495284
申请日：2012-06-13
申请人： Mitsuru Kobayashi , Masahiko Yasuda
发明人： Mitsuru Kobayashi , Masahiko Yasuda
CPC分类号： G03F9/7046 , G03F9/7003 , G03F9/7011 , G03F9/7019 , G03F9/7084
摘要： To perform high-speed and highly accurate measurement by setting desired measuring conditions for each measuring object. In an alignment sensor of exposure apparatus, in the case of performing position measurement for a plurality of sample shots, measurement is performed by changing the measuring conditions, in response to a measuring axis direction, a mark or a layer whereupon a mark to be measured exists. At that time, for the measuring objects to be measured under the same measuring conditions, for example, a position in a Y axis direction and a position in an X axis direction, measurement is continuously performed. When the measuring condition is changed, a baseline value is remeasured. The changeable measuring conditions are wavelength of measuring light, use and selection of a retarder, NA and σ of an optical system, a light quantity of measuring light, illumination shape, signal processing algorithm, etc.
摘要翻译： 通过设置每个测量对象的所需测量条件来执行高速和高精度的测量。 在曝光装置的对准传感器中，在对多个采样拍摄进行位置测量的情况下，通过根据测量轴方向改变测量条件，进行测量的标记或层，进行测量 存在 此时，对于在相同测量条件下测量的测量对象，例如，Y轴方向的位置和X轴方向上的位置，连续进行测量。 当测量条件改变时，重新测量基准值。 可变的测量条件是测量光的波长，减速器的使用和选择，NA和＆sgr; 的光学系统，光量测量光，照明形状，信号处理算法等。
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公开(公告)号：US06278957B1
公开(公告)日：2001-08-21
申请号：US09240599
申请日：1999-02-01
IPC分类号： G06F1500
CPC分类号： G03F9/7003
摘要： A method of aligning each of a plurality of processing areas arranged on a substrate with a predetermined transfer position in a static coordinate system XY for defining a moving position of said substrate, a pattern of a mask being transferred to each of the plurality of processing areas, the method comprising the steps of: wherein each of the plurality of processing areas has a specific point and a plurality of marks for alignment arranged by a predetermined positional relationship with respect to said specific point; measuring coordinate positions of a predetermined number of marks selected from several processing areas of the plurality of processing areas on the static coordinate system XY; calculating a plurality of parameters in a model equation expressing the regularity of arrangement of the plurality of processing areas by performing a statistic calculation by use with the measured plurality of coordinate positions, arrangement coordinate values upon the design of the specific points of the several processing areas and relative arrangement coordinate values upon the design of the selected marks of the several processing areas with respect to corresponding the specific points on the several processing areas; and determining coordinate positions of respective said specific points of the plurality of processing areas on the static coordinate system XY by using the calculated parameters.
摘要翻译： 将布置在基板上的多个处理区域中的每一个与静态坐标系XY中的预定传送位置对准的方法，用于限定所述基板的移动位置，掩模的图案被传送到多个处理区域 所述方法包括以下步骤：其中所述多个处理区域中的每一个具有针对所述特定点以预定的位置关系排列的特定点和多个用于对准的标记; 测量从静态坐标系XY上的多个处理区域的多个处理区域中选择的预定数量的标记的坐标位置; 通过使用所测量的多个坐标位置进行统计计算，在设计多个处理区域的特定点的排列坐标值时，在表示多个处理区域的规则性的模型等式中计算多个参数 以及相对于几个处理区域上的特定点对多个处理区域的选定标记进行设计的相对排列坐标值; 以及通过使用所计算的参数来确定所述静态坐标系XY上的所述多个处理区域中的各个所述特定点的坐标位置。
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公开(公告)号：US5273826A
公开(公告)日：1993-12-28
申请号：US040036
申请日：1993-03-31
CPC分类号： G11B5/7021 , C08G18/0819 , C08G18/388 , C08G18/3885 , C08G18/5084 , C08G18/58 , C08G18/587 , Y10T428/31551 , Y10T428/31609
摘要： A polyurethane resin is synthesized from a reaction mixture of at least one phosphorus compound, an epoxy compound, a polyisocyanate, a polyfunctional hydroxy compound, and optionally a chain extender. The polyurethane resin contains one phosphoric acid group or one residual group derived from phosphoric acid per 3,000 to about 200,000 number average molecular weight of the polyurethane resin. The weight average molecular weight of the polyurethane resin is from about 10,000 to about 250,000. A magnetic coating formulation is comprised of principally of magnetic particles and a binder. A magnetic recording media comprises a laminate as in the form of a magnetic layer composed principally of magnetic particles and a binder wherein at least a portion of the binder is the polyurethane resin. The substrate of the magnetic recording medium is a suitable polymer such as polyester, and the like. The utilization of the polyurethane resin containing a phosphorus compound therein results in excellent dispersion of the magnetic particles as well as exceptional durability.
摘要翻译： 由至少一种磷化合物，环氧化合物，多异氰酸酯，多官能羟基化合物和任选的扩链剂的反应混合物合成聚氨酯树脂。 聚氨酯树脂含有一种磷酸基或一个来源于磷酸的残留基，每3,000〜200,000数均分子量的聚氨酯树脂。 聚氨酯树脂的重均分子量为约10,000至约250,000。 磁性涂层制剂主要由磁性颗粒和粘合剂组成。 磁记录介质包括主要由磁性颗粒和粘合剂组成的磁性层形式的层压体，其中粘合剂的至少一部分是聚氨酯树脂。 磁记录介质的基材是合适的聚合物，例如聚酯等。 含有磷化合物的聚氨酯树脂的利用导致磁性颗粒的优异分散性以及出色的耐久性。
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公开(公告)号：US5003274A
公开(公告)日：1991-03-26
申请号：US477387
申请日：1990-02-09
摘要： An electromagnetic relay is provided with a movable contact sloped at a prescribed angle relative to an attracted face of an armature and a fixed contact sloped at a prescribed angle relative to an attracting face of a core. In this electromagnetic relay, it is possible to contact the movable and fixed contacts slidingly each other even when the armature is attached so as to be in contact with a frame.
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公开(公告)号：US08054465B2
公开(公告)日：2011-11-08
申请号：US12071254
申请日：2008-02-19
申请人： Masahiko Yasuda , Taro Sugihara
发明人： Masahiko Yasuda , Taro Sugihara
IPC分类号： G01B11/00
CPC分类号： G03F7/70341 , G03F7/70691 , G03F7/707 , G03F7/70725 , G03F7/70775 , G03F7/70975 , G03F9/7011 , G03F9/7088 , Y10T29/49002
摘要： A part of a plate of a predetermined shape detachably mounted on a moving body is detected by an alignment system while the position of the moving body is measured by a measurement unit that sets a movement coordinate system of the movement body, and based on the detection results and the measurement results of the measurement unit corresponding to the detection results, position information of an outer periphery edge of the plate is obtained. Therefore, even if there are no alignment marks on the moving body for position measurement, the position of the plate, or in other words, the position of the moving body can be controlled on the movement coordinate system set by the measurement unit, based on the position information of the outer periphery edge of the plate.
摘要翻译： 通过对准系统检测可拆卸地安装在移动体上的预定形状的板的一部分，同时通过设置移动体的移动坐标系的测量单元测量移动体的位置，并且基于检测 结果和与检测结果对应的测量单元的测量结果，获得板的外周边缘的位置信息。 因此，即使在移动体上没有对准标记来进行位置测量，也可以基于由测量单元设定的移动坐标系来控制板的位置，即移动体的位置，基于 板的外周缘的位置信息。
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公开(公告)号：US20080151214A1
公开(公告)日：2008-06-26
申请号：US12071262
申请日：2008-02-19
申请人： Masahiko Yasuda , Taro Sugihara
发明人： Masahiko Yasuda , Taro Sugihara
IPC分类号： G03B27/58
CPC分类号： G03F7/70341 , G03F7/70691 , G03F7/707 , G03F7/70725 , G03F7/70775 , G03F7/70975 , G03F9/7011 , G03F9/7088 , Y10T29/49002
摘要： A part of a plate of a predetermined shape detachably mounted on a moving body is detected by an alignment system while the position of the moving body is measured by a measurement unit that sets a movement coordinate system of the movement body, and based on the detection results and the measurement results of the measurement unit corresponding to the detection results, position information of an outer periphery edge of the plate is obtained. Therefore, even if there are no alignment marks on the moving body for position measurement, the position of the plate, or in other words, the position of the moving body can be controlled on the movement coordinate system set by the measurement unit, based on the position information of the outer periphery edge of the plate.
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公开(公告)号：US20060187432A1
公开(公告)日：2006-08-24
申请号：US11399537
申请日：2006-04-07
IPC分类号： G03B27/42
CPC分类号： G03F7/70341 , G03F7/70141 , G03F7/70716 , G03F9/7088
摘要： An exposure apparatus includes a substrate stage movable while holding a substrate, a substrate alignment system which detects an alignment mark (1) on the substrate held by the substrate stage and detects a reference mark (PFM) provided on the substrate stage, and a mask alignment system which detects, via a projection optical system, a reference mark (MFM) provided on the substrate stage. The reference mark (PFM) on the substrate stage is detected without a liquid by using the substrate alignment system, and the reference mark (MFM) on the substrate stage is detected using the mask alignment system via the projection optical system and the liquid. Then, a positional relationship between a detection reference position of the substrate alignment system and a projection position of an image of a pattern is obtained, thereby accurately performing alignment processing in the liquid immersion exposure.
摘要翻译： 一种曝光装置，包括：在保持基板的同时可移动的基板台;基板对准系统，其检测由基板台保持的基板上的对准标记（1），并检测设置在基板台上的基准标记（PFM）;以及掩模 对准系统，其经由投影光学系统检测设置在基板台上的参考标记（MFM）。 通过使用衬底对准系统，无需液体检测衬底台上的参考标记（PFM），并且通过投影光学系统和液体使用掩模对准系统检测衬底台上的参考标记（MFM）。 然后，获得基板对准系统的检测基准位置与图案的图像的投影位置之间的位置关系，从而在液浸曝光中精确地进行取向处理。
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公开(公告)号：US06549271B2
公开(公告)日：2003-04-15
申请号：US10247619
申请日：2002-09-20
申请人： Masahiko Yasuda , Masahiro Nei , Yuuki Ishii , Tetsuo Taniguchi
发明人： Masahiko Yasuda , Masahiro Nei , Yuuki Ishii , Tetsuo Taniguchi
IPC分类号： G03B2752
CPC分类号： G03F7/70691 , G03B27/52 , G03F7/70358 , G03F7/70866
摘要： A projection exposure method for exposing a substrate through a projection optical system with a predetermined pattern formed on a mask. The method includes the steps of calculating an amount of lateral variation of a pattern image in a direction perpendicular to an optical axis of the projection optical system, determining a distortion produced solely by the projection optical system, obtaining a total expected distortion by a summation of the distortion produced solely by the projection optical system and the calculated variation of the positions at which the image of the pattern of the mask is formed, and exposing the substrate while partially correcting the positions at which the image of the pattern of the mask is formed through the projection optical system based on the total expected distortion.
摘要翻译： 一种投影曝光方法，用于通过具有形成在掩模上的预定图案的投影光学系统曝光基板。 该方法包括以下步骤：计算在与投影光学系统的光轴垂直的方向上的图案图像的横向变化量，确定仅由投影光学系统产生的失真，通过总计 仅由投影光学系统产生的失真和形成掩模的图案的图像的位置的计算的变化，并且在部分地校正形成掩模的图案的图像的位置的同时曝光基板 通过投影光学系统的总预期失真。
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