-
公开(公告)号：US20050020188A1
公开(公告)日：2005-01-27
申请号：US10868660
申请日：2004-06-14
申请人： Mitsuru Saito , Jun Tamura , Toshihiro Izumi , Toshihiro Kobayashi , Takuya Nagamine , Claughton Miller
发明人： Mitsuru Saito , Jun Tamura , Toshihiro Izumi , Toshihiro Kobayashi , Takuya Nagamine , Claughton Miller
摘要： A polishing pad is formed with a non-foamed member shaped as a plate having a flat surface and abrading particles affixed inside and on the surfaces of this non-foamed member. Its average surface roughness is in the range of 0.5 μm-10 μm, and its Shore D hardness is within the range of 50-85. Grooves are formed on the surface of the polishing pad for collecting debris generated during the polishing operation and serving also as flow routes of a polishing liquid for distributing it uniformly over the surface of the polishing pad.
摘要翻译： 抛光垫形成有形成为具有平坦表面的板的非发泡构件和固定在该非发泡构件的内部和表面上的研磨颗粒。 其平均表面粗糙度在0.5μm-10μm的范围内，其肖氏D硬度在50-85的范围内。 在抛光垫的表面上形成有用于收集在抛光操作期间产生的碎屑的凹槽，还用作用于在抛光垫的表面上均匀分布的抛光液的流动路径。
-
公开(公告)号：US07238097B2
公开(公告)日：2007-07-03
申请号：US11010199
申请日：2004-12-10
申请人： Hisatomo Ohno , Toshihiro Izumi , Mitsuru Saito , Takuya Nagamine , Claughton Miller , Ichiro Kodaka
发明人： Hisatomo Ohno , Toshihiro Izumi , Mitsuru Saito , Takuya Nagamine , Claughton Miller , Ichiro Kodaka
IPC分类号： B24D11/00
CPC分类号： B24B37/205
摘要： A transparent pad having a polishing surface with an average surface roughness of 5 μm or less is used as a polishing pad. An indentation is formed on the back surface of the transparent pad such that its rate of light transmission is locally changed. The transparent pad has a rate of light transmission equal to or greater than 10% or preferably 30% for light of at least one wavelength in the range of 350 nm–900 nm.
摘要翻译： 使用具有平均表面粗糙度为5μm以下的研磨面的透明垫作为研磨垫。 在透明垫的背面上形成凹陷，使得其透光率局部地变化。 对于在350nm-900nm范围内的至少一个波长的光，透明衬垫具有等于或大于10％或优选30％的透光率。
-
公开(公告)号：US20050142996A1
公开(公告)日：2005-06-30
申请号：US11010199
申请日：2004-12-10
申请人： Hisatomo Ohno , Toshihiro Izumi , Mitsuru Saito , Takuya Nagamine , Claughton Miller , Ichiro Kodaka
发明人： Hisatomo Ohno , Toshihiro Izumi , Mitsuru Saito , Takuya Nagamine , Claughton Miller , Ichiro Kodaka
IPC分类号： B24B37/00 , B24B37/04 , B24D13/14 , H01L21/304 , B24B49/00
CPC分类号： B24B37/205
摘要： A transparent pad having a polishing surface with an average surface roughness of 5 μm or less is used as a polishing pad. An indentation is formed on the back surface of the transparent pad such that its rate of light transmission is locally changed. The transparent pad has a rate of light transmission equal to or greater than 10% or preferably 30% for light of at least one wavelength in the range of 350 nm-900 nm.
摘要翻译： 使用具有平均表面粗糙度为5μm以下的研磨面的透明垫作为研磨垫。 在透明垫的背面上形成凹陷，使得其透光率局部地变化。 对于在350nm-900nm范围内的至少一个波长的光，透明衬垫具有等于或大于10％或优选30％的透光率。
-
公开(公告)号：US20070264919A1
公开(公告)日：2007-11-15
申请号：US11879413
申请日：2007-07-16
IPC分类号： B24D11/00
CPC分类号： B24B37/24
摘要： A polishing pad includes a main body having a polishing surface and a backing that is affixed to the back surface of the main body. The elasticity of the main body is within the range of 600 psi-16000 psi and preferably within the range of 1600 psi-16000 psi when a compressive pressure of 2 psi-16 psi is applied, and the thickness of the main body is within the range of 0.5 mm-3.0 mm. The elasticity of the backing is lower than that of the main body and exceeds 300 psi when a compressive pressure of 2 psi-16 psi is applied.
摘要翻译： 抛光垫包括具有抛光表面的主体和固定到主体背面的背衬。 当施加2psi-16psi的压缩压力时，主体的弹性在600psi-16000psi的范围内，优选在1600psi-16000psi的范围内，并且主体的厚度在 范围为0.5 mm-3.0 mm。 当施加2psi-16psi的压缩压力时，背衬的弹性低于主体的弹性并且超过300psi。
-
公开(公告)号：US20060229000A1
公开(公告)日：2006-10-12
申请号：US11447425
申请日：2006-06-05
申请人： Toshihiro Izumi , Jun Tamura , Takuya Nagamine , Takashi Arahata
发明人： Toshihiro Izumi , Jun Tamura , Takuya Nagamine , Takashi Arahata
CPC分类号： B24B37/24 , Y10T428/24628 , Y10T428/24669
摘要： A polishing pad for planarizing the surface of a wafer has a planar main body of a non-foamed synthetic resin, having Shore D hardness of 66.0-78.5, preferably 70.0-78.5, or more preferably 70.0-78.0, compressibility of 4% or less or preferably 2% or less, and compression recovery rate of 50% or greater or preferably 70% or greater.
摘要翻译： 用于平坦化晶片表面的抛光垫具有非发泡合成树脂的平面主体，肖氏D硬度为66.0-78.5，优选为70.0-78.5，更优选为70.0-78.0，压缩率为4％以下 或优选为2％以下，压缩恢复率为50％以上，优选为70％以上。
-
公开(公告)号：US4469862A
公开(公告)日：1984-09-04
申请号：US508197
申请日：1983-06-27
申请人： Takeshi Komai , Toshihiro Izumi , Syuji Suyama
发明人： Takeshi Komai , Toshihiro Izumi , Syuji Suyama
IPC分类号： C07C409/34 , C08F4/36 , C08G67/00
CPC分类号： C08F4/36 , C07C409/34 , C08G67/00
摘要： An industrially highly valuable novel polymeric diacyl peroxide which is used as a polymerization initiator for free radical polymerization of vinyl monomer, and which is appreciably safe in production and handling, rapidly soluble in vinyl monomer with high solubility, and has exceedingly high catalyst efficiency in the free radical polymerization of vinyl monomer.
摘要翻译： 用作乙烯基单体自由基聚合的聚合引发剂的工业上非常有价值的新型聚合二酰基过氧化物，在生产和处理中明显安全，易溶于高溶解度的乙烯基单体，并具有极高的催化剂效率 乙烯基单体的自由基聚合。
-
公开(公告)号：US5180760A
公开(公告)日：1993-01-19
申请号：US758359
申请日：1991-09-10
申请人： Yoshihiro Oshibe , Toshihiro Izumi , Hideki Doya , Hiroshi Ohmura , Yasuhiro Yamamoto , Keiji Kumazawa
发明人： Yoshihiro Oshibe , Toshihiro Izumi , Hideki Doya , Hiroshi Ohmura , Yasuhiro Yamamoto , Keiji Kumazawa
摘要： An anti-fogging resin film-forming composition, comprising a block or graft copolymer and a surfactant, each of which block and graft copolymers consists of a hydrophilic polymer segment and a hydrophobic polymer segment having specifically limited monomer compositions, is disclosed. A coating film formed on a matrix surface from the composition has a durable excellent anti-fogging property and having high adhesion to the matrix surface and high strength.
摘要翻译： 公开了一种防雾树脂成膜组合物，其包含嵌段或接枝共聚物和表面活性剂，其中嵌段和接枝共聚物由具有特别有限单体组成的亲水性聚合物链段和疏水性聚合物链段组成。 从组合物形成在基体表面上的涂膜具有耐久的优异的防雾性，并且对基体表面具有高粘附性和高强度。
-
-
-
-
-
-
搜索结果
7 条记录 (耗时 0.024 秒)
