公开(公告)号：US20190267215A1

公开(公告)日：2019-08-29

申请号：US16320439

申请日：2017-07-18

Applicant: NEOCOAT SA

Inventor： David Rats ,  Medhi Naamoun ,  Christophe Provent

IPC: H01J37/32 ,  C23C16/27 ,  C23C16/511 ,  C23C16/458

Abstract: Methods and reactors are disclosed for producing synthetic material on a substrate by microwave plasma activated chemical vapor deposition. The method comprises the step of providing a microwave plasma reactor configured to provide a plasma having a toroidal shape. The reactor comprises a resonant cavity and a substrate holder arranged to hold, preferably, an annular shaped substrate or a plurality of substrates arranged in an annular configuration.

公开(公告)号：US20160032450A1

公开(公告)日：2016-02-04

申请号：US14779488

申请日：2014-02-25

Applicant: NEOCOAT SA

Inventor： David Rats ,  Christophe Provent

IPC: C23C16/27 ,  B81C1/00 ,  H01L21/02 ,  H01J37/32 ,  C01B31/06

CPC classification number: C23C16/274 ,  B81C1/00373 ,  C01B32/25 ,  C23C16/045 ,  C23C16/511 ,  H01J37/32192 ,  H01J37/32201 ,  H01J37/32293 ,  H01J37/32403 ,  H01J37/32678 ,  H01J2237/327 ,  H01J2237/3321 ,  H01J2237/3323 ,  H01L21/02115 ,  H01L21/02274

Abstract: The present invention relates to a method for depositing nanocrystalline diamond using a diamond vapor deposition facility which includes: a vacuum reactor including a reaction chamber connected to a vacuum source; a plurality of plasma sources arranged along a matrix that is at least two-dimensional in the reaction chamber; and a substrate holder arranged in the reactor, said method being characterized in that the deposition is carried out at a temperature of 100 to 500° C.

Abstract translation: 本发明涉及使用金刚石气相沉积设备沉积纳米晶金刚石的方法，该方法包括：真空反应器，包括连接到真空源的反应室; 沿反应室中至少二维的矩阵排列的多个等离子体源; 以及布置在反应器中的衬底保持器，所述方法的特征在于沉积在100-500℃的温度下进行。