公开(公告)号：US20230161246A1

公开(公告)日：2023-05-25

申请号：US17795061

申请日：2021-02-22

Applicant: NISSAN CHEMICAL CORPORATION

Inventor： Hikaru TOKUNAGA ,  Yutaro KURAMOTO ,  Makoto NAKAJIMA ,  Satoshi HAMADA ,  Katsuya MIURA

IPC: G03F7/004 ,  G03F7/09 ,  G03F7/16 ,  G03F7/038 ,  G03F7/20 ,  G03F7/32 ,  G03F7/00 ,  H01L21/027

CPC classification number: G03F7/0048 ,  G03F7/091 ,  G03F7/168 ,  G03F7/0381 ,  G03F7/2004 ,  G03F7/322 ,  G03F7/0002 ,  H01L21/0274

Abstract: Provided is a novel composition for forming a resist underlayer film. This composition for forming a resist underlayer film includes a polymer (X) and a solvent, the polymer (X) containing: a plurality of structural units which are the same as or different from each other and have a methoxymethyl group and a ROCH2- group (R is a monovalent organic group, a hydrogen atom, or a mixture thereof) other than the methoxymethyl group; and a linking group that links the more than one structural unit.

公开(公告)号：US20190354018A1

公开(公告)日：2019-11-21

申请号：US16476227

申请日：2018-01-09

Applicant: NISSAN CHEMICAL CORPORATION

Inventor： Hikaru TOKUNAGA ,  Satoshi HAMADA ,  Keisuke HASHIMOTO ,  Rikimaru SAKAMOTO

IPC: G03F7/11 ,  C08G12/34 ,  G03F7/004 ,  H01L21/027 ,  H01L21/311 ,  H01L21/308

Abstract: A resist underlayer film-forming composition exhibiting high etching resistance, high heat resistance, and excellent coatability; a resist underlayer film obtained using the resist underlayer film-forming composition and a method for producing the same; a method for forming a resist pattern; and a method for producing a semiconductor device. A resist underlayer film-forming composition including a polymer and a compound represented by Formula (1) as a solvent. In Formula (1), R1, R2, and R3 in Formula (1) each independently represent a hydrogen atom or an alkyl group having 1 to 20 carbon atoms, which may be interrupted by an oxygen atom, a sulfur atom, or an amide bond, and R1, R2, and R3 may be the same or different and may bond to each other to form a ring structure.

公开(公告)号：US20240006183A1

公开(公告)日：2024-01-04

申请号：US18240787

申请日：2023-08-31

Applicant: NISSAN CHEMICAL CORPORATION

Inventor： Hikaru TOKUNAGA ,  Satoshi HAMADA ,  Keisuke HASHIMOTO ,  Rikimaru SAKAMOTO

IPC: H01L21/308 ,  H01L21/027 ,  H01L21/311

CPC classification number: H01L21/3081 ,  H01L21/0274 ,  H01L21/0277 ,  H01L21/3086 ,  H01L21/31144

Abstract: A resist underlayer film-forming composition exhibiting high etching resistance, high heat resistance, and excellent coatability; a resist underlayer film obtained using the resist underlayer film-forming composition and a method for producing the same; a method for forming a resist pattern; and a method for producing a semiconductor device. A resist underlayer film-forming composition including a polymer and a compound represented by Formula (1) as a solvent.




In Formula (1), R1, R2, and R3 in Formula (1) each independently represent a hydrogen atom or an alkyl group having 1 to 20 carbon atoms, which may be interrupted by an oxygen atom, a sulfur atom, or an amide bond, and R1, R2, and R3 may be the same or different and may bond to each other to form a ring structure.

公开(公告)号：US20220026440A1

公开(公告)日：2022-01-27

申请号：US17293996

申请日：2019-11-13

Applicant: NISSAN CHEMICAL CORPORATION

Inventor： Keiichiro OTSUKA ,  Satoshi HAMADA ,  Takeaki SHOJI ,  Kei NAGAE ,  Hiroyuki NAKAJIMA ,  Kohei SUZUKI ,  Kazutaka MATOBA

IPC: G01N33/68 ,  C08L101/02 ,  H01J49/00 ,  C12Q1/00 ,  B01L3/00

Abstract: The invention provides a container for storing a biomaterial in which adhesion of a minute amount of a biomarker(s) contained in the biomaterial to the surface of the container for storage can be suppressed, and sample loss is reduced, while enabling analysis with accuracy and highly precision. In particular, the container for storing a biomaterial for reducing sample loss of a biomarker(s) contained in the biomaterial has a coating containing a copolymer which contains a recurring unit which contains a group represented by the following formula (a), a recurring unit which contains a group represented by the following formula (b), and optionally a recurring unit which contains a group represented by the following formula (c), on at least a part of the surface of the container: (wherein, Ua1, Ua2, Ub1, Ub2 and Ub3, An− and Rc are as defined herein).