公开(公告)号：US20250011602A1

公开(公告)日：2025-01-09

申请号：US18706247

申请日：2022-11-02

Applicant: NISSAN CHEMICAL CORPORATION

Inventor： Yuki UEDA ,  Yoshiomi HIROI ,  Kohei SUZUKI ,  Miya HIROI ,  Hiroyuki NAKAJIMA ,  Hitoshi SASATSUKI

IPC: C09D5/16 ,  A61J1/05 ,  C08F220/28 ,  C09D133/14

Abstract: The invention provides a composition for forming a coating film which comprises (1) a polymer of a monomer mixture containing monomers represented by the following formulae (A) to (D): (wherein Ta, Tb, Tc, Td, Ua1, Ua2, Ub1, Ub2, Ub3, Qa, Qb, Qc, Ra, Rb, Rc, Rd, An−, m and n are as defined herein), where a ratio of a total of the anionic monomer represented by the above-mentioned formula (A) and the cationic monomer represented by the above-mentioned formula (B) based on total monomers contained in the monomer mixture is 40 mol % or more, and (2) a polycarbodiimide containing a structure represented by the following formula (E): —N═C═N—  (E) a coating film which is a cured product thereof and a process for producing the same, and a cured product and a process for producing the same.

公开(公告)号：US20240336891A1

公开(公告)日：2024-10-10

申请号：US18575926

申请日：2022-07-05

Applicant: NISSAN CHEMICAL CORPORATION

Inventor： Kohei SUZUKI ,  Yuki UEDA ,  Miya HIROI ,  Yoshiomi HIROI ,  Shiho ANNO

IPC: C12N5/00

CPC classification number: C12N5/0068 ,  C12N2533/30 ,  C12N2533/50 ,  C12N2533/52

Abstract: Objects of the present invention are to provide a base film for cell culture that enables mass production of homogeneous and high-quality cell aggregates even without the use of a biological serum, and to provide a base film-forming agent for forming the base film, and a substrate for producing cell aggregate. The present inventors provide a base film-forming agent for cell culture including a polymer, a cell adhesive substance, and a solvent, wherein the polymer contains a repeating unit derived from a monomer of formula (I) below:




wherein Ua1, Ua2, Ra1, and Ra2 are as described in the specification and the claims.

公开(公告)号：US20240287322A1

公开(公告)日：2024-08-29

申请号：US18567248

申请日：2022-06-06

Applicant: Nissan Chemical Corporation

Inventor： Miya HIROI ,  Yoshiomi HIROI ,  Yuki UEDA ,  Kohei SUZUKI ,  Natsuki FUKASAWA

IPC: C09D5/16 ,  C09D131/04 ,  C12M1/00

CPC classification number: C09D5/1668 ,  C09D131/04 ,  C12M23/20

Abstract: Provided is a coating film which is obtained by applying a composition for forming a coating film, the composition containing a copolymer, and which is used to suppress adhesion of a biological substance, in which the copolymer is water-insoluble, the copolymer contains a repeating unit (A) represented by the following Formula (A) and a repeating unit (B) represented by the following Formula (B), and a molar ratio (A:B) of the repeating unit (A) to the repeating unit (B) in the copolymer is 89:11 to 50:50.




(In the formula, R1 to R3 each independently represent a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, and X1 and X2 each independently represent a single bond, an ester bond, an ether bond, an amide bond, or an alkylene group having 1 to 5 carbon atoms which may be interrupted by an oxygen atom.)

公开(公告)号：US20230235141A1

公开(公告)日：2023-07-27

申请号：US18002366

申请日：2021-06-18

Applicant: NISSAN CHEMICAL CORPORATION

Inventor： Yoshiomi HIROI ,  Hiroyuki NAKAJIMA ,  Taito NISHINO ,  Miya HIROI ,  Yuki UEDA

IPC: C08J7/04 ,  C09D7/20 ,  C09D133/10 ,  C09D179/08

CPC classification number: C08J7/04 ,  C09D7/20 ,  C09D133/10 ,  C09D179/08 ,  C08J2333/10 ,  C08J2379/08

Abstract: The invention provides a composition for forming a coating film containing a phosphoric acid group-containing polymer capable of forming a film on a substrate by a simple process and capable of maintaining film properties under a solvent environment containing water, and a coating film which is a cured product of the composition. In particular, the composition for forming a coating film contains (a) a polymer (P) containing a hydroxyl group, and the hydroxyl group is derived only from a phosphoric acid group, (b) a polycarbodiimide (C) containing a structure represented by the following formula (c-1):


—N═C═N—  (c-1),

and (c) a solvent.