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    Optical phase measurement system and method
    1.
    发明授权
    Optical phase measurement system and method 有权

    公开(公告)号：US10663408B2

    公开(公告)日：2020-05-26

    申请号：US16524296

    申请日：2019-07-29

    Applicant: NOVA MEASURING INSTRUMENTS LTD.

    Inventor： Gilad Barak ,  Dror Shafir ,  Yanir Hainick ,  Shahar Gov

    IPC: G01N21/956 ,  G03F7/20 ,  G01N21/95

    Abstract: A method for use in optical measurements on patterned structures, the method including performing a number of optical measurements on a structure with a measurement spot configured to provide detection of light reflected from an illuminating spot at least partially covering at least two different regions of the structure, the measurements including detecting light reflected from the at least part of the at least two different regions within the measurement spot, the detected light including interference of at least two complex electric fields reflected from the at least part of the at least two different regions, and being therefore indicative of a phase response of the structure, carrying information about properties of the structure.

    Method and system for optical metrology in patterned structures
    2.
    发明授权
    Method and system for optical metrology in patterned structures 有权

    公开(公告)号：US10274435B2

    公开(公告)日：2019-04-30

    申请号：US15523896

    申请日：2015-11-02

    Applicant: NOVA MEASURING INSTRUMENTS LTD.

    Inventor： Boris Levant ,  Yanir Hainick ,  Vladimir Machavariani ,  Roy Koret ,  Gilad Barak

    IPC: G01N21/956 ,  G01B11/02 ,  G01N21/95

    Abstract: A data analysis method and system are presented for use in determining one or more parameters of a patterned structure located on top of an underneath layered structure. According to this technique, input data is provided which includes first measured data PMD being a function ƒ of spectral intensity Iλ and phase φ, PMD=ƒ(Iλ;φ), corresponding to a complex spectral response of the underneath layered structure, and second measured data Smeas indicative of specular reflection spectral response of a sample formed by the patterned structure and the underneath layered structure. Also provided is a general function F describing a relation between a theoretical optical response Stheor of the sample and a modeled optical response Smodel of the patterned structure and the complex spectral response PMD of the underneath layered structure, such that Stheor=F(Smodel; PMD). The general function is then utilized for comparing the second measured data Smeas and the theoretical optical response Stheor, and determining parameter(s) of interest of the top structure.

    METHOD AND SYSTEM FOR OPTICAL CHARACTERIZATION OF PATTERNED SAMPLES
    4.
    发明申请
    METHOD AND SYSTEM FOR OPTICAL CHARACTERIZATION OF PATTERNED SAMPLES 有权

    公开(公告)号：US20210116359A1

    公开(公告)日：2021-04-22

    申请号：US17135924

    申请日：2020-12-28

    Applicant: NOVA MEASURING INSTRUMENTS LTD.

    Inventor： Dror SHAFIR ,  Gilad Barak ,  Shay WOLFLING ,  Michal Haim YACHINI ,  Matthew SENDELBACH ,  Cornel BOZDOG

    IPC: G01N21/21

    Abstract: A method and system are presented for use in measuring on patterned samples, aimed at determining asymmetry in the pattern. A set of at least first and second measurements on a patterned region of a sample is performed, where each of the measurements comprises: directing illuminating light onto the patterned region along an illumination channel and collecting light reflected from the illuminated region propagating along a collection channel to be detected, such that detected light from the same patterned region has different polarization states which are different from polarization of the illuminating light, and generating a measured data piece indicative of the light detected in the measurement. Thus, at least first and second measured data pieces are generated for the at least first and second measurements on the same patterned region. The at least first and second measured data pieces are analyzed and output data is generated being indicative of a condition of asymmetry in the patterned region.

    Optical phase measurement method and system
    5.
    发明授权
    Optical phase measurement method and system 有权

    公开(公告)号：US10365231B2

    公开(公告)日：2019-07-30

    申请号：US15866768

    申请日：2018-01-10

    Applicant: NOVA MEASURING INSTRUMENTS LTD.

    Inventor： Gilad Barak ,  Dror Shafir ,  Yanir Hainick ,  Shahar Gov

    IPC: G01N21/956 ,  G03F7/20 ,  G01N21/95

    Abstract: A method and system are presented for use in optical measurements on patterned structures. The method comprises performing a number of optical measurements on a structure with a measurement spot configured to provide detection of light reflected from an illuminating spot at least partially covering at least two different regions of the structure. The measurements include detection of light reflected from said at least part of the at least two different regions comprising interference of at least two complex electric fields reflected from said at least part of the at least two different regions, and being therefore indicative of a phase response of the structure, carrying information about properties of the structure.

    OPTICAL METHOD AND SYSTEM FOR DETECTING DEFECTS IN THREE-DIMENSIONAL STRUCTURES
    7.
    发明申请
    OPTICAL METHOD AND SYSTEM FOR DETECTING DEFECTS IN THREE-DIMENSIONAL STRUCTURES 有权
    用于检测三维结构缺陷的光学方法和系统

    公开(公告)号：US20150192527A1

    公开(公告)日：2015-07-09

    申请号：US14412479

    申请日：2013-07-02

    Applicant: NOVA MEASURING INSTRUMENTS LTD.

    Inventor： Gilad Barak ,  Elad Dotan ,  Alon Belleli

    IPC: G01N21/88 ,  G01N21/55

    CPC classification number: G01N21/8806 ,  G01N21/55 ,  G01N21/9501 ,  G01N2021/8825 ,  G01N2201/12 ,  H01L22/12

    Abstract: A method and system are presented for use in inspection of via containing structures. According to this technique, measured data indicative of a spectral response of a via-containing region of a structure under measurements is processed, and, upon identifying a change in at least one parameter of the spectral response with respect to a spectral signature of the via-containing region, output data is generated indicative of a possible defect at an inner surface of the via.

    Abstract translation: 提出了一种方法和系统，用于检查通孔容纳结构。 根据该技术，处理指示测量结构的通孔容纳区域的光谱响应的测量数据，并且在识别关于光通路的光谱特征的光谱响应的至少一个参数的变化时 产生指示通孔内表面可能存在缺陷的输出数据。

    X-ray based measurements in patterned structure
    8.
    发明授权
    X-ray based measurements in patterned structure 有权

    公开(公告)号：US11099142B2

    公开(公告)日：2021-08-24

    申请号：US16037161

    申请日：2018-07-17

    Applicant: Nova Measuring Instruments Ltd.

    Inventor： Gilad Barak

    IPC: G01N23/2055 ,  H01L21/66 ,  G06T7/00 ,  G06T5/00 ,  G01N23/201 ,  G01N23/20 ,  G01N23/207

    Abstract: A method and system are presented for use in X-ray based measurements on patterned structures. The method comprises: processing data indicative of measured signals corresponding to detected radiation response of a patterned structure to incident X-ray radiation, and subtracting from said data an effective measured signals substantially free of background noise, said effective measured signals being formed of radiation components of reflected diffraction orders such that model based interpretation of the effective measured signals enables determination of one or more parameters of the patterned structure, wherein said processing comprises: analyzing the measured signals and extracting therefrom a background signal corresponding to the background noise; and applying a filtering procedure to the measured signals to subtract therefrom signal corresponding to the background signal, resulting in the effective measured signal.

    Method and system for optical metrology in patterned structures
    9.
    发明授权
    Method and system for optical metrology in patterned structures 有权

    公开(公告)号：US10761036B2

    公开(公告)日：2020-09-01

    申请号：US16398297

    申请日：2019-04-30

    Applicant: NOVA MEASURING INSTRUMENTS LTD.

    Inventor： Boris Levant ,  Yanir Hainick ,  Vladimir Machavariani ,  Roy Koret ,  Gilad Barak

    IPC: G01N21/956 ,  G01B11/02 ,  G03F7/20 ,  G01N21/95

    Abstract: Determining parameters of a patterned structure located on top of an underneath layered structure, where input data is provided which includes first measured data PMD being a function ƒ of spectral intensity Iλ and phase ϕ, PMD=ƒ(Iλ; ϕ), corresponding to a complex spectral response of the underneath layered structure, and second measured data Smeas indicative of specular reflection spectral response of a sample formed by the patterned structure and the underneath layered structure, and where a general function F is also provided describing a relation between a theoretical optical response Stheor of the sample and a modeled optical response Smodel of the patterned structure and the complex spectral response PMD of the underneath layered structure, such that Stheor=F(Smodel; PMD), where the general function is then utilized for comparing the second measured data Smeas and the theoretical optical response Stheor, and determining parameter(s) of interest of the top structure.

    Optical critical dimension metrology
    10.
    发明授权
    Optical critical dimension metrology 有权

    公开(公告)号：US10365163B2

    公开(公告)日：2019-07-30

    申请号：US16053210

    申请日：2018-08-02

    Applicant: NOVA MEASURING INSTRUMENTS LTD.

    Inventor： Gilad Barak ,  Dror Shafir ,  Danny Grossman

    IPC: G01J9/00 ,  G01J9/02 ,  G01B11/02 ,  G01N21/956 ,  G01N21/95 ,  G01N21/21

    Abstract: A metrology system is presented for measuring parameters of a structure. The system comprises: an optical system and a control unit. The optical system is configured for detecting light reflection of incident radiation from the structure and generating measured data indicative of angular phase of the detected light components corresponding to reflections of illuminating light components having different angles of incidence. The control unit is configured for receiving and processing the measured data and generating a corresponding phase map indicative of the phase variation along at least two dimensions, and analyzing the phase map using modeled data for determining one or more parameters of the structure.

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