公开(公告)号：US20180328837A1

公开(公告)日：2018-11-15

申请号：US16042448

申请日：2018-07-23

Applicant: Nova Measuring Instruments Ltd.

Inventor： Dror SHAFIR ,  Gilad BARAK ,  Shay WOLFLING ,  Michal Haim YACHINI ,  Matthew SENDELBACH ,  Cornel BOZDOG

IPC: G01N21/21 ,  G01N21/47

CPC classification number: G01N21/21 ,  G01N2021/4792 ,  G01N2201/061 ,  G01N2201/0683

Abstract: A method and system are presented for use in measuring on patterned samples, aimed at determining asymmetry in the pattern. A set of at least first and second measurements on a patterned region of a sample is performed, where each of the measurements comprises: directing illuminating light onto the patterned region along an illumination channel and collecting light reflected from the illuminated region propagating along a collection channel to be detected, such that detected light from the same patterned region has different polarization states which are different from polarization of the illuminating light, and generating a measured data piece indicative of the light detected in the measurement. Thus, at least first and second measured data pieces are generated for the at least first and second measurements on the same patterned region. The at least first and second measured data pieces are analyzed and output data is generated being indicative of a condition of asymmetry in the patterned region.

公开(公告)号：US20160139065A1

公开(公告)日：2016-05-19

申请号：US14903629

申请日：2014-07-08

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Gilad BARAK ,  Shay WOLFLING ,  Cornel BOZDOG ,  Matthew SENDELBACH

IPC: G01N23/20

CPC classification number: G01N23/20 ,  G01N2223/607 ,  G01N2223/611

Abstract: A control system is presented for use in measuring one or more parameters of a sample. The control system comprises an input utility and a processor utility. The input utility is configured for receiving input data including first data comprising X-ray Diffraction or High-Resolution X-ray Diffraction (XRD) response data of the sample indicative of a material distribution in the sample, and second data comprising optical response data of the sample to incident light indicative of at least a geometry of the sample. The processor utility is configured and operable for processing and analyzing one of the first and second data for optimizing the other one of the first and second data, and utilizing the optimized data for determining said one or more parameters of the sample including a strain distribution in the sample.

Abstract translation: 呈现用于测量样品的一个或多个参数的控制系统。 控制系统包括输入实用程序和处理器实用程序。 输入实用程序被配置用于接收包括第一数据的输入数据，所述第一数据包括指示样本中的材料分布的样本的X射线衍射或高分辨率X射线衍射（XRD）响应数据，第二数据包括光学响应数据 样品至入射光，指示样品的至少几何形状。 处理器实用程序被配置和操作用于处理和分析第一和第二数据之一以优化第一和第二数据中的另一个数据，并且利用优化数据来确定样本的所述一个或多个参数，包括应变分布 例子。

公开(公告)号：US20210116359A1

公开(公告)日：2021-04-22

申请号：US17135924

申请日：2020-12-28

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Dror SHAFIR ,  Gilad Barak ,  Shay WOLFLING ,  Michal Haim YACHINI ,  Matthew SENDELBACH ,  Cornel BOZDOG

IPC: G01N21/21

Abstract: A method and system are presented for use in measuring on patterned samples, aimed at determining asymmetry in the pattern. A set of at least first and second measurements on a patterned region of a sample is performed, where each of the measurements comprises: directing illuminating light onto the patterned region along an illumination channel and collecting light reflected from the illuminated region propagating along a collection channel to be detected, such that detected light from the same patterned region has different polarization states which are different from polarization of the illuminating light, and generating a measured data piece indicative of the light detected in the measurement. Thus, at least first and second measured data pieces are generated for the at least first and second measurements on the same patterned region. The at least first and second measured data pieces are analyzed and output data is generated being indicative of a condition of asymmetry in the patterned region.

公开(公告)号：US20160076876A1

公开(公告)日：2016-03-17

申请号：US14852897

申请日：2015-09-14

Applicant: Nova Measuring Instruments Ltd. ,  GLOBAL FOUNDRIES

Inventor： Gilad WAINREB ,  Etai LITTWIN ,  Alok VAID ,  Michael KLOTS ,  Cornel BOZDOG ,  Matthew SENDELBACH

IPC: G01B11/06

CPC classification number: G01B11/06 ,  G01B2210/56 ,  G03F7/705 ,  G03F7/70625

Abstract: A method and system are presented for use in model-based optical measurements in patterned structures. The method comprises: selecting an optimal optical model for interpretation of optical measured data indicative of optical response of the structure under measurements. The selection of the optimal optical model comprises: creating a complete optical model with floating parameters defining multiple configurations of said complete model including one or more model configurations describing an optical response of the structure under measurements, utilizing the complete model for predicting a reference optical response from the structure and generating corresponding virtual reference data, and using the virtual reference data for selecting the optimal optical model for interpretation of the optical measured data.

Abstract translation: 提出了一种用于图案化结构中基于模型的光学测量的方法和系统。 该方法包括：选择用于解释表示测量结构的光学响应的​​光学测量数据的最佳光学模型。 最佳光学模型的选择包括：创建具有定义所述完整模型的多个配置的浮动参数的完整光学模型，包括描述测量结构的光学响应的​​一个或多个模型配置，利用完整模型来预测参考光学响应 并从该结构生成对应的虚拟参考数据，并使用虚拟参考数据来选择用于解释光学测量数据的最佳光学模型。

公开(公告)号：US20160363872A1

公开(公告)日：2016-12-15

申请号：US15121479

申请日：2015-02-26

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Matthew SENDELBACH ,  Niv SARIG ,  Charles N. ARCHIE

IPC: G03F7/20 ,  H01J37/28

CPC classification number: G03F7/70625 ,  G01B2210/56 ,  H01J37/28 ,  H04B17/309 ,  H04B17/3912

Abstract: A method for use in planning metrology measurements, the method comprising: providing inverse total measurement uncertainty (TMU) analysis equations for upper and lower confidence limits TMUUL and TMULL of the TMU being independent on prior knowledge of measurements by a tool under test (TuT) and a reference measurement system (RMS), thereby enabling estimation of input parameters for said equations prior to conducting an experiment of the TMU analysis; and determining at least one of a total number N of samples to be measured in the TMU analysis and an average number ns of measurements per sample by the RMS.

Abstract translation: 一种用于规划度量测量的方法，所述方法包括：提供用于上限和下限置信限的反向总测量不确定度（TMU）分析方程，TMUU和TMU独立于被测试工具（TuT）的现有测量知识， 和参考测量系统（RMS），从而能够在进行TMU分析的实验之前估计所述方程式的输入参数; 并且在TMU分析中确定待测量的样本的总数N中的至少一个，并且通过RMS确定每个样本的平均数ns。

公开(公告)号：US20150316468A1

公开(公告)日：2015-11-05

申请号：US14265771

申请日：2014-04-30

Applicant: Nova Measuring Instruments Ltd.

Inventor： Dror SHAFIR ,  Gilad BARAK ,  Shay WOLFLING ,  Michal Haim YACHINIA ,  Matthew SENDELBACH ,  Cornel BOZDOG

IPC: G01N21/21

CPC classification number: G01N21/21 ,  G01N2021/4792 ,  G01N2201/061 ,  G01N2201/0683

Abstract: A method and system are presented for use in measuring on patterned samples, aimed at determining asymmetry in the pattern. A set of at least first and second measurements on a patterned region of a sample is performed, where each of the measurements comprises: directing illuminating light onto the patterned region along an illumination channel and collecting light reflected from the illuminated region propagating along a collection channel to be detected, such that detected light from the same patterned region has different polarization states which are different from polarization of the illuminating light, and generating a measured data piece indicative of the light detected in the measurement. Thus, at least first and second measured data pieces are generated for the at least first and second measurements on the same patterned region. The at least first and second measured data pieces are analyzed and output data is generated being indicative of a condition of asymmetry in the patterned region.

Abstract translation: 提出了一种用于测量图案样品的方法和系统，旨在确定图案的不对称性。 执行在样本的图案化区域上的一组至少第一和第二测量，其中每个测量包括：沿着照明通道将照明光引导到图案化区域上，并收集从沿着收集通道传播的照明区域反射的光 以使得来自相同图案化区域的检测光具有不同于照明光的偏振的不同偏振态，并且产生指示在测量中检测到的光的测量数据。 因此，至少在相同图案区域上的至少第一和第二测量产生第一测量数据和第二测量数据。 分析至少第一和第二测量数据片段，并且生成指示图案化区域中的不对称条件的输出数据。