公开(公告)号：US20180328837A1

公开(公告)日：2018-11-15

申请号：US16042448

申请日：2018-07-23

Applicant: Nova Measuring Instruments Ltd.

Inventor： Dror SHAFIR ,  Gilad BARAK ,  Shay WOLFLING ,  Michal Haim YACHINI ,  Matthew SENDELBACH ,  Cornel BOZDOG

IPC: G01N21/21 ,  G01N21/47

CPC classification number: G01N21/21 ,  G01N2021/4792 ,  G01N2201/061 ,  G01N2201/0683

Abstract: A method and system are presented for use in measuring on patterned samples, aimed at determining asymmetry in the pattern. A set of at least first and second measurements on a patterned region of a sample is performed, where each of the measurements comprises: directing illuminating light onto the patterned region along an illumination channel and collecting light reflected from the illuminated region propagating along a collection channel to be detected, such that detected light from the same patterned region has different polarization states which are different from polarization of the illuminating light, and generating a measured data piece indicative of the light detected in the measurement. Thus, at least first and second measured data pieces are generated for the at least first and second measurements on the same patterned region. The at least first and second measured data pieces are analyzed and output data is generated being indicative of a condition of asymmetry in the patterned region.

公开(公告)号：US20160139065A1

公开(公告)日：2016-05-19

申请号：US14903629

申请日：2014-07-08

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Gilad BARAK ,  Shay WOLFLING ,  Cornel BOZDOG ,  Matthew SENDELBACH

IPC: G01N23/20

CPC classification number: G01N23/20 ,  G01N2223/607 ,  G01N2223/611

Abstract: A control system is presented for use in measuring one or more parameters of a sample. The control system comprises an input utility and a processor utility. The input utility is configured for receiving input data including first data comprising X-ray Diffraction or High-Resolution X-ray Diffraction (XRD) response data of the sample indicative of a material distribution in the sample, and second data comprising optical response data of the sample to incident light indicative of at least a geometry of the sample. The processor utility is configured and operable for processing and analyzing one of the first and second data for optimizing the other one of the first and second data, and utilizing the optimized data for determining said one or more parameters of the sample including a strain distribution in the sample.

Abstract translation: 呈现用于测量样品的一个或多个参数的控制系统。 控制系统包括输入实用程序和处理器实用程序。 输入实用程序被配置用于接收包括第一数据的输入数据，所述第一数据包括指示样本中的材料分布的样本的X射线衍射或高分辨率X射线衍射（XRD）响应数据，第二数据包括光学响应数据 样品至入射光，指示样品的至少几何形状。 处理器实用程序被配置和操作用于处理和分析第一和第二数据之一以优化第一和第二数据中的另一个数据，并且利用优化数据来确定样本的所述一个或多个参数，包括应变分布 例子。

公开(公告)号：US20210116359A1

公开(公告)日：2021-04-22

申请号：US17135924

申请日：2020-12-28

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Dror SHAFIR ,  Gilad Barak ,  Shay WOLFLING ,  Michal Haim YACHINI ,  Matthew SENDELBACH ,  Cornel BOZDOG

IPC: G01N21/21

Abstract: A method and system are presented for use in measuring on patterned samples, aimed at determining asymmetry in the pattern. A set of at least first and second measurements on a patterned region of a sample is performed, where each of the measurements comprises: directing illuminating light onto the patterned region along an illumination channel and collecting light reflected from the illuminated region propagating along a collection channel to be detected, such that detected light from the same patterned region has different polarization states which are different from polarization of the illuminating light, and generating a measured data piece indicative of the light detected in the measurement. Thus, at least first and second measured data pieces are generated for the at least first and second measurements on the same patterned region. The at least first and second measured data pieces are analyzed and output data is generated being indicative of a condition of asymmetry in the patterned region.

公开(公告)号：US20170061066A1

公开(公告)日：2017-03-02

申请号：US15119306

申请日：2015-02-16

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Gilad BARAK ,  Tal VERDENE ,  Michal YACHINI ,  Dror SHAFIR ,  Changman MOON ,  Shay WOLFLING

IPC: G06F17/50

CPC classification number: G06F17/5081 ,  G03F7/70633 ,  G03F7/70683 ,  G06F17/5072

Abstract: A sample comprising an overlay target is presented. The overlay target comprises at least one pair of patterned structures, the patterned structures of the pair being accommodated in respectively bottom and top layers of the sample with a certain vertical distance h between them, wherein a pattern in at least one of the patterned structures has at least one pattern parameter optimized for a predetermined optical overlay measurement scheme with a predetermined wavelength range.

Abstract translation: 呈现包括覆盖目标的样本。 所述覆盖目标包括至少一对图案化结构，所述对的图案化结构在样品的分别底部和顶层中以它们之间的一定垂直距离h容纳在其中，其中至少一个所述图案化结构中的图案具有 对于具有预定波长范围的预定光学覆盖测量方案优化的至少一个图案参数。

公开(公告)号：US20150345934A1

公开(公告)日：2015-12-03

申请号：US14655791

申请日：2013-12-26

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Dror SHAFIR ,  Gilad BARAK ,  Shay WOLFLING

IPC: G01B11/02 ,  G01N21/47

CPC classification number: G01B11/02 ,  G01B2210/56 ,  G01N21/4738 ,  G01N21/956 ,  G01N2201/06113 ,  G01N2201/12 ,  G02B21/365

Abstract: Method and system for measuring one or more parameters of a patterned structure, using light source producing an input beam of at least partially coherent light in spatial and temporal domains, a detection system comprising a position sensitive detector for receiving light and generating measured data indicative thereof, an optical system configured for focusing the input light beam onto a diffraction limited spot on a sample's surface, collecting an output light returned from the illuminated spot, and imaging the collected output light onto a light sensitive surface of the position sensitive detector, where an image being indicative of coherent summation of output light portions propagating from the structure in different directions.

Abstract translation: 用于测量图案化结构的一个或多个参数的方法和系统，使用在空间和时间域中产生至少部分相干光的输入光束的光源，包括用于接收光并且产生指示其的测量数据的位置敏感检测器的检测系统 ，配置成将输入光束聚焦到样品表面上的衍射限制光斑上的光学系统，收集从照明光点返回的输出光，并将收集的输出光成像到位置敏感检测器的光敏表面上，其中 图像表示从结构沿不同方向传播的输出光部分的相干相加。

公开(公告)号：US20150316468A1

公开(公告)日：2015-11-05

申请号：US14265771

申请日：2014-04-30

Applicant: Nova Measuring Instruments Ltd.

Inventor： Dror SHAFIR ,  Gilad BARAK ,  Shay WOLFLING ,  Michal Haim YACHINIA ,  Matthew SENDELBACH ,  Cornel BOZDOG

IPC: G01N21/21

CPC classification number: G01N21/21 ,  G01N2021/4792 ,  G01N2201/061 ,  G01N2201/0683

Abstract: A method and system are presented for use in measuring on patterned samples, aimed at determining asymmetry in the pattern. A set of at least first and second measurements on a patterned region of a sample is performed, where each of the measurements comprises: directing illuminating light onto the patterned region along an illumination channel and collecting light reflected from the illuminated region propagating along a collection channel to be detected, such that detected light from the same patterned region has different polarization states which are different from polarization of the illuminating light, and generating a measured data piece indicative of the light detected in the measurement. Thus, at least first and second measured data pieces are generated for the at least first and second measurements on the same patterned region. The at least first and second measured data pieces are analyzed and output data is generated being indicative of a condition of asymmetry in the patterned region.

Abstract translation: 提出了一种用于测量图案样品的方法和系统，旨在确定图案的不对称性。 执行在样本的图案化区域上的一组至少第一和第二测量，其中每个测量包括：沿着照明通道将照明光引导到图案化区域上，并收集从沿着收集通道传播的照明区域反射的光 以使得来自相同图案化区域的检测光具有不同于照明光的偏振的不同偏振态，并且产生指示在测量中检测到的光的测量数据。 因此，至少在相同图案区域上的至少第一和第二测量产生第一测量数据和第二测量数据。 分析至少第一和第二测量数据片段，并且生成指示图案化区域中的不对称条件的输出数据。