公开(公告)号：US20180052119A1

公开(公告)日：2018-02-22

申请号：US15523896

申请日：2015-11-02

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Boris LEVANT ,  Yanir HAINICK ,  Vladimir MACHAVARIANI ,  Roy KORET ,  Gilad BARAK

IPC: G01N21/956 ,  G01N21/95 ,  G01B11/02

CPC classification number: G01N21/956 ,  G01B11/02 ,  G01B2210/56 ,  G01N21/9501 ,  G01N2201/12

Abstract: A data analysis method and system are presented for use in determining one or more parameters of a patterned structure located on top of an underneath layered structure. According to this technique, input data is provided which includes first measured data PMD being a function ƒ of spectral intensity Iλ and phase φ, PMD=ƒ(Iλ;φ), corresponding to a complex spectral response of the underneath layered structure, and second measured data Smeas indicative of specular reflection spectral response of a sample formed by the patterned structure and the underneath layered structure. Also provided is a general function F describing a relation between a theoretical optical response Stheor of the sample and a modeled optical response Smodel of the patterned structure and the complex spectral response PMD of the underneath layered structure, such that Stheor=F(Smodel; PMD). The general function is then utilized for comparing the second measured data Smeas and the theoretical optical response Stheor, and determining parameter(s) of interest of the top structure.

公开(公告)号：US20210364451A1

公开(公告)日：2021-11-25

申请号：US17303723

申请日：2021-06-06

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Gilad BARAK ,  Danny GROSSMAN ,  Dror SHAFIR ,  Yoav BERLATZKY ,  Yanir HAINICK

IPC: G01N21/956 ,  G01B9/02 ,  G01B11/06 ,  G01N21/88

Abstract: A measurement system for use in measuring parameters of a patterned sample, the system including a broadband light source, an optical system configured as an interferometric system, a detection unit, and a control unit, where the interferometric system defines illumination and detection channels having a sample arm and a reference arm having a reference reflector, and is configured for inducing an optical path difference between the sample and reference arms, the detection unit for detecting a combined light beam formed by a light beam reflected from the reflector and a light beam propagating from a sample's support, and generating measured data indicative of spectral interference pattern formed by spectral interference signatures, and the control unit for receiving the measured data and applying a model-based processing to the spectral interference pattern for determining one or more parameters of the pattern in the sample.

公开(公告)号：US20190033236A1

公开(公告)日：2019-01-31

申请号：US16037161

申请日：2018-07-17

Applicant: Nova Measuring Instruments Ltd.

Inventor： Gilad BARAK

IPC: G01N23/2055 ,  H01L21/66 ,  G06T7/00

Abstract: A method and system are presented for use in X-ray based measurements on patterned structures. The method comprises: processing data indicative of measured signals corresponding to detected radiation response of a patterned structure to incident X-ray radiation, and subtracting from said data an effective measured signals substantially free of background noise, said effective measured signals being formed of radiation components of reflected diffraction orders such that model based interpretation of the effective measured signals enables determination of one or more parameters of the patterned structure, wherein said processing comprises: analyzing the measured signals and extracting therefrom a background signal corresponding to the background noise; and applying a filtering procedure to the measured signals to subtract therefrom signal corresponding to the background signal, resulting in the effective measured signal.

公开(公告)号：US20170146465A1

公开(公告)日：2017-05-25

申请号：US15319830

申请日：2015-06-18

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Gilad BARAK ,  Oded COHEN ,  Igor TUROVETS

IPC: G01N21/956 ,  G01N21/88 ,  H01L21/66 ,  G01N21/95

CPC classification number: G01N21/95607 ,  G01B2210/56 ,  G01N21/8806 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/8848 ,  H01L22/30

Abstract: A test structure is presented for use in metrology measurements of a sample pattern formed by periodicity of unit cells, each formed of pattern features arranged in a spaced-apart relationship along a pattern axis. The test structure comprises a test pattern, which is formed by a main pattern which includes main pattern features of one or more of the unit cells and has a symmetry plane, and a predetermined auxiliary pattern including at least two spaced apart auxiliary features located within at least some features of the main pattern, parameters of which are to be controlled during metrology measurements.

公开(公告)号：US20180328837A1

公开(公告)日：2018-11-15

申请号：US16042448

申请日：2018-07-23

Applicant: Nova Measuring Instruments Ltd.

Inventor： Dror SHAFIR ,  Gilad BARAK ,  Shay WOLFLING ,  Michal Haim YACHINI ,  Matthew SENDELBACH ,  Cornel BOZDOG

IPC: G01N21/21 ,  G01N21/47

CPC classification number: G01N21/21 ,  G01N2021/4792 ,  G01N2201/061 ,  G01N2201/0683

Abstract: A method and system are presented for use in measuring on patterned samples, aimed at determining asymmetry in the pattern. A set of at least first and second measurements on a patterned region of a sample is performed, where each of the measurements comprises: directing illuminating light onto the patterned region along an illumination channel and collecting light reflected from the illuminated region propagating along a collection channel to be detected, such that detected light from the same patterned region has different polarization states which are different from polarization of the illuminating light, and generating a measured data piece indicative of the light detected in the measurement. Thus, at least first and second measured data pieces are generated for the at least first and second measurements on the same patterned region. The at least first and second measured data pieces are analyzed and output data is generated being indicative of a condition of asymmetry in the patterned region.

公开(公告)号：US20170363970A1

公开(公告)日：2017-12-21

申请号：US15534187

申请日：2015-12-10

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Oded COHEN ,  Gilad BARAK ,  Igor TUROVETS

IPC: G03F7/20 ,  H01L21/66

CPC classification number: G03F7/70625 ,  G03F7/70466 ,  G03F7/70683 ,  H01L22/30 ,  H01L22/34

Abstract: A test structure and method of its manufacture are presented for use in metrology measurements of a sample pattern. The test structure comprises a test pattern comprising a portion of the sample pattern including at least one selected feature and a blocking layer at least partially covering regions of the test structure adjacent to the at least one selected region

公开(公告)号：US20160139065A1

公开(公告)日：2016-05-19

申请号：US14903629

申请日：2014-07-08

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Gilad BARAK ,  Shay WOLFLING ,  Cornel BOZDOG ,  Matthew SENDELBACH

IPC: G01N23/20

CPC classification number: G01N23/20 ,  G01N2223/607 ,  G01N2223/611

Abstract: A control system is presented for use in measuring one or more parameters of a sample. The control system comprises an input utility and a processor utility. The input utility is configured for receiving input data including first data comprising X-ray Diffraction or High-Resolution X-ray Diffraction (XRD) response data of the sample indicative of a material distribution in the sample, and second data comprising optical response data of the sample to incident light indicative of at least a geometry of the sample. The processor utility is configured and operable for processing and analyzing one of the first and second data for optimizing the other one of the first and second data, and utilizing the optimized data for determining said one or more parameters of the sample including a strain distribution in the sample.

Abstract translation: 呈现用于测量样品的一个或多个参数的控制系统。 控制系统包括输入实用程序和处理器实用程序。 输入实用程序被配置用于接收包括第一数据的输入数据，所述第一数据包括指示样本中的材料分布的样本的X射线衍射或高分辨率X射线衍射（XRD）响应数据，第二数据包括光学响应数据 样品至入射光，指示样品的至少几何形状。 处理器实用程序被配置和操作用于处理和分析第一和第二数据之一以优化第一和第二数据中的另一个数据，并且利用优化数据来确定样本的所述一个或多个参数，包括应变分布 例子。

公开(公告)号：US20230044886A1

公开(公告)日：2023-02-09

申请号：US17759031

申请日：2020-11-24

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Elad Schleifer ,  Yonatan Oren ,  Amir Shayari ,  Eyal Hollander ,  Valery Deich ,  Shimon YALOV ,  Gilad BARAK

IPC: G01J3/44 ,  G01J3/02

Abstract: A method, a system, and a non-transitory computer readable medium for accurate Raman spectroscopy. The method may include executing at least one iteration of the steps of: (i) performing, by an optical measurement system, a calibration process that comprises (a) finding a misalignment between a region of interest defined by a spatial filter, and an impinging beam of radiation that is emitted from an illuminated area of a sample, the impinging beam impinges on the spatial filter; and (b) determining a compensating path of propagation of the impinging beam that compensates the misalignment; and (ii) performing a measurement process, while the optical measurement system is configured to provide the compensating path of propagation of the impinging beam, to provide one or more Raman spectra.

公开(公告)号：US20170227474A1

公开(公告)日：2017-08-10

申请号：US15502329

申请日：2015-08-06

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Gilad BARAK ,  Oded COHEN

IPC: G01N21/956 ,  G01R31/309 ,  H01L23/544 ,  G01B11/14 ,  H01L21/66

CPC classification number: G01N21/956 ,  G01B11/14 ,  G01B2210/56 ,  G01R31/309 ,  H01L22/30 ,  H01L23/544

Abstract: A test structure is presented for use in metrology measurements of a sample pattern. The test structure comprises a main pattern, and one or more auxiliary patterns. The main pattern is formed by a plurality of main features extending along a first longitudinal axis and being spaced from one another along a second lateral axis. The one or more auxiliary patterns are formed by a plurality of auxiliary features associated with at least some of the main features such that a dimension of the auxiliary feature is in a predetermined relation with a dimension of the respective main feature. This provides that a change in a dimension of the auxiliary feature from a nominal value affects a change in non-zero order diffraction response from the test structure in a predetermined optical measurement scheme, and this change is indicative of a deviation in one or more parameters of the main pattern from nominal value thereof.

公开(公告)号：US20170061066A1

公开(公告)日：2017-03-02

申请号：US15119306

申请日：2015-02-16

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Gilad BARAK ,  Tal VERDENE ,  Michal YACHINI ,  Dror SHAFIR ,  Changman MOON ,  Shay WOLFLING

IPC: G06F17/50

CPC classification number: G06F17/5081 ,  G03F7/70633 ,  G03F7/70683 ,  G06F17/5072

Abstract: A sample comprising an overlay target is presented. The overlay target comprises at least one pair of patterned structures, the patterned structures of the pair being accommodated in respectively bottom and top layers of the sample with a certain vertical distance h between them, wherein a pattern in at least one of the patterned structures has at least one pattern parameter optimized for a predetermined optical overlay measurement scheme with a predetermined wavelength range.

Abstract translation: 呈现包括覆盖目标的样本。 所述覆盖目标包括至少一对图案化结构，所述对的图案化结构在样品的分别底部和顶层中以它们之间的一定垂直距离h容纳在其中，其中至少一个所述图案化结构中的图案具有 对于具有预定波长范围的预定光学覆盖测量方案优化的至少一个图案参数。