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公开(公告)号：US20180328837A1
公开(公告)日：2018-11-15
申请号：US16042448
申请日：2018-07-23
Applicant: Nova Measuring Instruments Ltd.
Inventor： Dror SHAFIR , Gilad BARAK , Shay WOLFLING , Michal Haim YACHINI , Matthew SENDELBACH , Cornel BOZDOG
CPC classification number: G01N21/21 , G01N2021/4792 , G01N2201/061 , G01N2201/0683
Abstract: A method and system are presented for use in measuring on patterned samples, aimed at determining asymmetry in the pattern. A set of at least first and second measurements on a patterned region of a sample is performed, where each of the measurements comprises: directing illuminating light onto the patterned region along an illumination channel and collecting light reflected from the illuminated region propagating along a collection channel to be detected, such that detected light from the same patterned region has different polarization states which are different from polarization of the illuminating light, and generating a measured data piece indicative of the light detected in the measurement. Thus, at least first and second measured data pieces are generated for the at least first and second measurements on the same patterned region. The at least first and second measured data pieces are analyzed and output data is generated being indicative of a condition of asymmetry in the patterned region.
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公开(公告)号：US20210364451A1
公开(公告)日：2021-11-25
申请号：US17303723
申请日：2021-06-06
Applicant: NOVA MEASURING INSTRUMENTS LTD.
Inventor： Gilad BARAK , Danny GROSSMAN , Dror SHAFIR , Yoav BERLATZKY , Yanir HAINICK
IPC: G01N21/956 , G01B9/02 , G01B11/06 , G01N21/88
Abstract: A measurement system for use in measuring parameters of a patterned sample, the system including a broadband light source, an optical system configured as an interferometric system, a detection unit, and a control unit, where the interferometric system defines illumination and detection channels having a sample arm and a reference arm having a reference reflector, and is configured for inducing an optical path difference between the sample and reference arms, the detection unit for detecting a combined light beam formed by a light beam reflected from the reflector and a light beam propagating from a sample's support, and generating measured data indicative of spectral interference pattern formed by spectral interference signatures, and the control unit for receiving the measured data and applying a model-based processing to the spectral interference pattern for determining one or more parameters of the pattern in the sample.
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公开(公告)号：US20190128823A1
公开(公告)日：2019-05-02
申请号：US16094547
申请日：2016-04-21
Applicant: NOVA MEASURING INSTRUMENTS LTD.
Inventor： Yoav BERLATZKY , Valery DEICH , Dror SHAFIR , Danny GROSSMAN
IPC: G01N21/956 , G01N21/95 , G01N21/88 , G01B9/02
CPC classification number: G01N21/956 , G01B9/02007 , G01B9/02022 , G01B2210/56 , G01N21/8806 , G01N21/9501
Abstract: A measurement system is presented for use in metrology measurements on patterned samples. The system comprises: at least one light source device configured to generate broadband light, at least one detection device configured to provide spectral information of detected light, and an optical system. The optical system comprises at least an oblique channel system for directing incident light generated by the light source(s) along an oblique illumination channel onto a measurement plane, on which a sample is to be located, and directing broadband light specularly reflected from the sample along a collection channel to the detection device(s). The optical system further comprises an interferometric unit comprising a beam splitting/combining device and a reference reflector device. The beam splitting/combining device is accommodated in the illumination and collection channels and divides light propagating in the illumination channel into sample and reference light beams propagating in sample and reference paths, and combines reflected
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公开(公告)号：US20210116359A1
公开(公告)日：2021-04-22
申请号：US17135924
申请日：2020-12-28
Applicant: NOVA MEASURING INSTRUMENTS LTD.
Inventor： Dror SHAFIR , Gilad Barak , Shay WOLFLING , Michal Haim YACHINI , Matthew SENDELBACH , Cornel BOZDOG
IPC: G01N21/21
Abstract: A method and system are presented for use in measuring on patterned samples, aimed at determining asymmetry in the pattern. A set of at least first and second measurements on a patterned region of a sample is performed, where each of the measurements comprises: directing illuminating light onto the patterned region along an illumination channel and collecting light reflected from the illuminated region propagating along a collection channel to be detected, such that detected light from the same patterned region has different polarization states which are different from polarization of the illuminating light, and generating a measured data piece indicative of the light detected in the measurement. Thus, at least first and second measured data pieces are generated for the at least first and second measurements on the same patterned region. The at least first and second measured data pieces are analyzed and output data is generated being indicative of a condition of asymmetry in the patterned region.
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公开(公告)号：US20170061066A1
公开(公告)日：2017-03-02
申请号：US15119306
申请日：2015-02-16
Applicant: NOVA MEASURING INSTRUMENTS LTD.
Inventor： Gilad BARAK , Tal VERDENE , Michal YACHINI , Dror SHAFIR , Changman MOON , Shay WOLFLING
IPC: G06F17/50
CPC classification number: G06F17/5081 , G03F7/70633 , G03F7/70683 , G06F17/5072
Abstract: A sample comprising an overlay target is presented. The overlay target comprises at least one pair of patterned structures, the patterned structures of the pair being accommodated in respectively bottom and top layers of the sample with a certain vertical distance h between them, wherein a pattern in at least one of the patterned structures has at least one pattern parameter optimized for a predetermined optical overlay measurement scheme with a predetermined wavelength range.
Abstract translation: 呈现包括覆盖目标的样本。 所述覆盖目标包括至少一对图案化结构，所述对的图案化结构在样品的分别底部和顶层中以它们之间的一定垂直距离h容纳在其中，其中至少一个所述图案化结构中的图案具有 对于具有预定波长范围的预定光学覆盖测量方案优化的至少一个图案参数。
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Patent Agency Ranking
公开(公告)号：US20170016835A1
公开(公告)日：2017-01-19
申请号：US15300768
申请日：2015-04-12
Applicant: Nova Measuring Instruments Ltd.
Inventor： Gilad BARAK , Danny GROSSMAN , Dror SHAFIR , Yoav BERLATZKY , Yanir HAINICK
IPC: G01N21/956 , G01B9/02 , G01B11/06 , G01N21/88
CPC classification number: G01N21/956 , G01B9/02007 , G01B9/02032 , G01B9/02072 , G01B9/0209 , G01B11/0675 , G01B2210/56 , G01B2290/70 , G01N21/8806 , G01N2021/8848
Abstract: A measurement system for use in measuring parameters of a patterned sample is presented. The system comprises: a broadband light source; an optical system configured as an interferometric system; a detection unit; and a control unit. The interferometric system defines illumination and detection channels having a sample arm and a reference arm comprising a reference reflector, and is configured for inducing an optical path difference between the sample and reference arms; the detection unit comprises a configured and operable for detecting a combined light beam formed by a light beam reflected from said reflector and a light beam propagating from a sample's support, and generating measured data indicative of spectral interference pattern formed by at least two spectral interference signatures. The control unit is configured and operable for receiving the measured data and applying a model-based processing to the spectral interference pattern for determining one or more parameters of the pattern in the sample.
Abstract translation: 提出了一种用于测量图案样品参数的测量系统。 该系统包括：宽带光源; 配置为干涉系统的光学系统; 检测单元; 和控制单元。 所述干涉仪系统定义具有采样臂和参考臂的照明和检测通道，所述参考臂包括参考反射器，并且被配置为用于诱导所述样本和参考臂之间的光程差; 检测单元包括被配置和可操作以检测由从所述反射器反射的光束形成的组合光束和从样本支架传播的光束，并且生成指示由至少两个光谱干涉特征形成的光谱干涉图案的测量数据 。 控制单元被配置和操作用于接收测量数据，并将基于模型的处理应用于频谱干涉图案，以确定样本中的图案的一个或多个参数。
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公开(公告)号：US20150377799A1
公开(公告)日：2015-12-31
申请号：US14769170
申请日：2014-02-20
Applicant: NOVA MEASURING INSTRUMENTS LTD.
Inventor： Gilad BARAK , Dror SHAFIR , Yanir HAINICK , Shahar GOV
IPC: G01N21/956 , G01N21/95
CPC classification number: G01N21/956 , G01B2210/56 , G01N21/9501 , G03F7/70625
Abstract: A method and system are presented for use in optical measurements on patterned structures. The method comprises performing a number of optical measurements on a structure with a measurement spot configured to provide detection of light reflected from an illuminating spot at least partially covering at least two different regions of the structure. The measurements include detection of light reflected from said at least part of the at least two different regions comprising interference of at least two complex electric fields reflected from said at least part of the at least two different regions, and being therefore indicative of a phase response of the structure, carrying information about properties of the structure.
Abstract translation: 提出了一种用于图案化结构的光学测量的方法和系统。 该方法包括对具有测量点的结构执行多个光学测量，所述测量点被配置为提供对从至少部分地覆盖结构的至少两个不同区域的照明点反射的光的检测。 所述测量包括从所述至少两个不同区域的所述至少一部分反射的光的检测，包括从所述至少两个不同区域的所述至少一部分反射的至少两个复电场的干涉，并因此指示相位响应 的结构，携带关于结构的属性的信息。
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公开(公告)号：US20190063999A1
公开(公告)日：2019-02-28
申请号：US16053210
申请日：2018-08-02
Applicant: NOVA MEASURING INSTRUMENTS LTD.
Inventor： Gilad BARAK , Dror SHAFIR , Danny GROSSMAN
CPC classification number: G01J9/00 , G01B11/02 , G01B2210/56 , G01J9/02 , G01N21/21 , G01N21/9501 , G01N21/956 , G01N2201/12
Abstract: A metrology system is presented for measuring parameters of a structure. The system comprises: an optical system and a control unit. The optical system is configured for detecting light reflection of incident radiation from the structure and generating measured data indicative of angular phase of the detected light components corresponding to reflections of illuminating light components having different angles of incidence. The control unit is configured for receiving and processing the measured data and generating a corresponding phase map indicative of the phase variation along at least two dimensions, and analyzing the phase map using modeled data for determining one or more parameters of the structure.
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公开(公告)号：US20180128753A1
公开(公告)日：2018-05-10
申请号：US15866768
申请日：2018-01-10
Applicant: NOVA MEASURING INSTRUMENTS LTD.
Inventor： Gilad BARAK , Dror SHAFIR , Yanir HAINICK , Shahar GOV
IPC: G01N21/956 , G01N21/95 , G03F7/20
CPC classification number: G01N21/956 , G01B2210/56 , G01N21/9501 , G03F7/70616 , G03F7/70625
Abstract: A method and system are presented for use in optical measurements on patterned structures. The method comprises performing a number of optical measurements on a structure with a measurement spot configured to provide detection of light reflected from an illuminating spot at least partially covering at least two different regions of the structure. The measurements include detection of light reflected from said at least part of the at least two different regions comprising interference of at least two complex electric fields reflected from said at least part of the at least two different regions, and being therefore indicative of a phase response of the structure, carrying information about properties of the structure.
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公开(公告)号：US20160363484A1
公开(公告)日：2016-12-15
申请号：US15120847
申请日：2015-02-23
Applicant: NOVA MEASURING INSTRUMENTS LTD.
Inventor： Gilad BARAK , Dror SHAFIR , Danny GROSSMAN
CPC classification number: G01J9/00 , G01B11/02 , G01B2210/56 , G01J9/02 , G01N21/21 , G01N21/9501 , G01N21/956 , G01N2201/12
Abstract: A metrology system is presented for measuring parameters of a structure. The system comprises: an optical system and a control unit. The optical system is configured for detecting light reflection of incident radiation from the structure and generating measured data indicative of angular phase of the detected light components corresponding to reflections of illuminating light components having different angles of incidence. The control unit is configured for receiving and processing the measured data and generating a corresponding phase map indicative of the phase variation along at least two dimensions, and analyzing the phase map using modeled data for determining one or more parameters of the structure.
Abstract translation: 提出了一种用于测量结构参数的计量系统。 该系统包括：光学系统和控制单元。 光学系统被配置用于检测来自结构的入射辐射的光反射，并产生指示与具有不同入射角的照明光分量的反射相对应的检测到的光分量的角相位的测量数据。 控制单元被配置为接收和处理测量数据并且沿着至少两个维度生成指示相位变化的对应相位图，并且使用用于确定结构的一个或多个参数的建模数据来分析相位图。
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