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公开(公告)号：US20210116359A1
公开(公告)日：2021-04-22
申请号：US17135924
申请日：2020-12-28
Applicant: NOVA MEASURING INSTRUMENTS LTD.
Inventor： Dror SHAFIR , Gilad Barak , Shay WOLFLING , Michal Haim YACHINI , Matthew SENDELBACH , Cornel BOZDOG
IPC: G01N21/21
Abstract: A method and system are presented for use in measuring on patterned samples, aimed at determining asymmetry in the pattern. A set of at least first and second measurements on a patterned region of a sample is performed, where each of the measurements comprises: directing illuminating light onto the patterned region along an illumination channel and collecting light reflected from the illuminated region propagating along a collection channel to be detected, such that detected light from the same patterned region has different polarization states which are different from polarization of the illuminating light, and generating a measured data piece indicative of the light detected in the measurement. Thus, at least first and second measured data pieces are generated for the at least first and second measurements on the same patterned region. The at least first and second measured data pieces are analyzed and output data is generated being indicative of a condition of asymmetry in the patterned region.
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公开(公告)号：US20160076876A1
公开(公告)日：2016-03-17
申请号：US14852897
申请日：2015-09-14
Applicant: Nova Measuring Instruments Ltd. , GLOBAL FOUNDRIES
Inventor： Gilad WAINREB , Etai LITTWIN , Alok VAID , Michael KLOTS , Cornel BOZDOG , Matthew SENDELBACH
IPC: G01B11/06
CPC classification number: G01B11/06 , G01B2210/56 , G03F7/705 , G03F7/70625
Abstract: A method and system are presented for use in model-based optical measurements in patterned structures. The method comprises: selecting an optimal optical model for interpretation of optical measured data indicative of optical response of the structure under measurements. The selection of the optimal optical model comprises: creating a complete optical model with floating parameters defining multiple configurations of said complete model including one or more model configurations describing an optical response of the structure under measurements, utilizing the complete model for predicting a reference optical response from the structure and generating corresponding virtual reference data, and using the virtual reference data for selecting the optimal optical model for interpretation of the optical measured data.
Abstract translation: 提出了一种用于图案化结构中基于模型的光学测量的方法和系统。 该方法包括：选择用于解释表示测量结构的光学响应的光学测量数据的最佳光学模型。 最佳光学模型的选择包括：创建具有定义所述完整模型的多个配置的浮动参数的完整光学模型，包括描述测量结构的光学响应的一个或多个模型配置，利用完整模型来预测参考光学响应 并从该结构生成对应的虚拟参考数据，并使用虚拟参考数据来选择用于解释光学测量数据的最佳光学模型。
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公开(公告)号：US20180196356A1
公开(公告)日：2018-07-12
申请号：US15739250
申请日：2016-06-22
Applicant: NOVA MEASURING INSTRUMENTS LTD.
Inventor： Cornel BOZDOG , Aron CEPLER , Paul ISBESTER
IPC: G03F7/20
CPC classification number: G03F7/70633 , G01N21/956 , G01N2021/213 , G03F7/70466 , G03F7/70625 , H01L21/823431 , H01L21/845 , H01L22/12 , H01L22/20
Abstract: A method and system are presented for use in controlling a multiple patterning process of n patterning stages subsequently applied to a sample to produce a target pattern thereon. The method comprises: providing intermediate measured data indicative of an optical response of the sample after being patterned by m-th patterning stage, 1≤m
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公开(公告)号：US20180195975A1
公开(公告)日：2018-07-12
申请号：US15915613
申请日：2018-03-08
Applicant: NOVA MEASURING INSTRUMENTS LTD.
Inventor： Igor TUROVETS , Cornel BOZDOG , Dario ELYASI
CPC classification number: G01N21/9501 , G01B11/06 , G01B11/24 , G01B2210/56 , G01N21/47 , G01N21/8903 , G01N2201/12
Abstract: A method and system are presented for use in controlling a process applied to a patterned structure having regions of different layered stacks. The method comprises: sequentially receiving measured data indicative of optical response of the structure being processed during a predetermined processing time, and generating a corresponding sequence of data pieces measured over time; and analyzing and processing the sequence of the data pieces and determining at least one main parameter of the structure. The analyzing and processing comprises: processing a part of said sequence of the data pieces and obtaining data indicative of one or more parameters of the structure; utilizing said data indicative of said one or more parameters of the structure and optimizing model data describing a relation between an optical response of the structure and one or more parameters of the structure; utilizing the optimized model data for processing at least a part of the sequence of the measured data pieces, and determining at least one parameters of the structure characterizing said process applied to the structure, and generating data indicative thereof.
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Patent Agency Ranking
公开(公告)号：US20170167987A1
公开(公告)日：2017-06-15
申请号：US15385495
申请日：2016-12-20
Applicant: NOVA MEASURING INSTRUMENTS LTD.
Inventor： Igor TUROVETS , Cornel BOZDOG , Dario ELYASI
CPC classification number: G01N21/9501 , G01B11/06 , G01B11/24 , G01B2210/56 , G01N21/47 , G01N21/8903 , G01N2201/12
Abstract: A method and system are presented for use in controlling a process applied to a patterned structure having regions of different layered stacks. The method comprises: sequentially receiving measured data indicative of optical response of the structure being processed during a predetermined processing time, and generating a corresponding sequence of data pieces measured over time; and analyzing and processing the sequence of the data pieces and determining at least one main parameter of the structure. The analyzing and processing comprises: processing a part of said sequence of the data pieces and obtaining data indicative of one or more parameters of the structure; utilizing said data indicative of said one or more parameters of the structure and optimizing model data describing a relation between an optical response of the structure and one or more parameters of the structure; utilizing the optimized model data for processing at least a part of the sequence of the measured data pieces, and determining at least one parameters of the structure characterizing said process applied to the structure, and generating data indicative thereof.
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公开(公告)号：US20150316468A1
公开(公告)日：2015-11-05
申请号：US14265771
申请日：2014-04-30
Applicant: Nova Measuring Instruments Ltd.
Inventor： Dror SHAFIR , Gilad BARAK , Shay WOLFLING , Michal Haim YACHINIA , Matthew SENDELBACH , Cornel BOZDOG
IPC: G01N21/21
CPC classification number: G01N21/21 , G01N2021/4792 , G01N2201/061 , G01N2201/0683
Abstract: A method and system are presented for use in measuring on patterned samples, aimed at determining asymmetry in the pattern. A set of at least first and second measurements on a patterned region of a sample is performed, where each of the measurements comprises: directing illuminating light onto the patterned region along an illumination channel and collecting light reflected from the illuminated region propagating along a collection channel to be detected, such that detected light from the same patterned region has different polarization states which are different from polarization of the illuminating light, and generating a measured data piece indicative of the light detected in the measurement. Thus, at least first and second measured data pieces are generated for the at least first and second measurements on the same patterned region. The at least first and second measured data pieces are analyzed and output data is generated being indicative of a condition of asymmetry in the patterned region.
Abstract translation: 提出了一种用于测量图案样品的方法和系统，旨在确定图案的不对称性。 执行在样本的图案化区域上的一组至少第一和第二测量，其中每个测量包括：沿着照明通道将照明光引导到图案化区域上，并收集从沿着收集通道传播的照明区域反射的光 以使得来自相同图案化区域的检测光具有不同于照明光的偏振的不同偏振态，并且产生指示在测量中检测到的光的测量数据。 因此，至少在相同图案区域上的至少第一和第二测量产生第一测量数据和第二测量数据。 分析至少第一和第二测量数据片段，并且生成指示图案化区域中的不对称条件的输出数据。
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公开(公告)号：US20180328837A1
公开(公告)日：2018-11-15
申请号：US16042448
申请日：2018-07-23
Applicant: Nova Measuring Instruments Ltd.
Inventor： Dror SHAFIR , Gilad BARAK , Shay WOLFLING , Michal Haim YACHINI , Matthew SENDELBACH , Cornel BOZDOG
CPC classification number: G01N21/21 , G01N2021/4792 , G01N2201/061 , G01N2201/0683
Abstract: A method and system are presented for use in measuring on patterned samples, aimed at determining asymmetry in the pattern. A set of at least first and second measurements on a patterned region of a sample is performed, where each of the measurements comprises: directing illuminating light onto the patterned region along an illumination channel and collecting light reflected from the illuminated region propagating along a collection channel to be detected, such that detected light from the same patterned region has different polarization states which are different from polarization of the illuminating light, and generating a measured data piece indicative of the light detected in the measurement. Thus, at least first and second measured data pieces are generated for the at least first and second measurements on the same patterned region. The at least first and second measured data pieces are analyzed and output data is generated being indicative of a condition of asymmetry in the patterned region.
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公开(公告)号：US20180172609A1
公开(公告)日：2018-06-21
申请号：US15845313
申请日：2017-12-18
Applicant: Nova Measuring Instruments Ltd. , GLOBALFOUNDRIES Inc.
Inventor： Wei Ti LEE , Heath A. POIS , Mark KLARE , Cornel BOZDOG , Alok VAID
IPC: G01N23/2208 , G01B15/02 , G01B11/06 , G01N23/2273 , G01N23/223
CPC classification number: G01N23/2273 , G01B11/06 , G01B15/02 , G01N23/2208 , G01N23/223 , G01N2223/305 , G01N2223/61 , G01N2223/633 , H01L22/12
Abstract: A monitoring system and method are provided for determining at least one property of an integrated circuit (IC) comprising a multi-layer structure formed by at least a layer on top of an underlayer. The monitoring system receives measured data comprising data indicative of optical measurements performed on the IC, data indicative of x-ray photoelectron spectroscopy (XPS) measurements performed on the IC and data indicative of x-ray fluorescence spectroscopy (XRF) measurements performed on the IC. An optical data analyzer module analyzes the data indicative of the optical measurements and generates geometrical data indicative of one or more geometrical parameters of the multi-layer structure formed by at least the layer on top of the underlayer. An XPS data analyzer module analyzes the data indicative of the XPS measurements and generates geometrical and material related data indicative of geometrical and material composition parameters for said layer and data indicative of material composition of the underlayer. An XRF data analyzer module analyzes the data indicative of the XRF measurements and generates data indicative of amount of a predetermined material composition in the multi-layer structure. A data interpretation module generates combined data received from analyzer modules and processes the combined data and determines the at least one property of at least one layer of the multi-layer structure.
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公开(公告)号：US20160139065A1
公开(公告)日：2016-05-19
申请号：US14903629
申请日：2014-07-08
Applicant: NOVA MEASURING INSTRUMENTS LTD.
Inventor： Gilad BARAK , Shay WOLFLING , Cornel BOZDOG , Matthew SENDELBACH
IPC: G01N23/20
CPC classification number: G01N23/20 , G01N2223/607 , G01N2223/611
Abstract: A control system is presented for use in measuring one or more parameters of a sample. The control system comprises an input utility and a processor utility. The input utility is configured for receiving input data including first data comprising X-ray Diffraction or High-Resolution X-ray Diffraction (XRD) response data of the sample indicative of a material distribution in the sample, and second data comprising optical response data of the sample to incident light indicative of at least a geometry of the sample. The processor utility is configured and operable for processing and analyzing one of the first and second data for optimizing the other one of the first and second data, and utilizing the optimized data for determining said one or more parameters of the sample including a strain distribution in the sample.
Abstract translation: 呈现用于测量样品的一个或多个参数的控制系统。 控制系统包括输入实用程序和处理器实用程序。 输入实用程序被配置用于接收包括第一数据的输入数据，所述第一数据包括指示样本中的材料分布的样本的X射线衍射或高分辨率X射线衍射（XRD）响应数据，第二数据包括光学响应数据 样品至入射光，指示样品的至少几何形状。 处理器实用程序被配置和操作用于处理和分析第一和第二数据之一以优化第一和第二数据中的另一个数据，并且利用优化数据来确定样本的所述一个或多个参数，包括应变分布 例子。
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