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    STRUCTURE FOR PROTECTING FEATAURES DURING THE REMOVAL OF SACRIFICIAL MATERIALS AND A METHOD OF MANUFACTURE THEREFOR
    3.
    发明申请
    STRUCTURE FOR PROTECTING FEATAURES DURING THE REMOVAL OF SACRIFICIAL MATERIALS AND A METHOD OF MANUFACTURE THEREFOR 失效
    在移除材料时保护材料的结构及其制造方法

    公开(公告)号：US20070292981A1

    公开(公告)日：2007-12-20

    申请号：US11425100

    申请日：2006-06-19

    申请人： Vladimir A. Aksyuk ,  Nagesh R. Basavanhally ,  Omar D. Lopez ,  Chien-Shing Pai

    发明人： Vladimir A. Aksyuk ,  Nagesh R. Basavanhally ,  Omar D. Lopez ,  Chien-Shing Pai

    IPC分类号： H01L21/00

    CPC分类号： B81C1/00476 ,  B81B2201/038 ,  B81C1/00801

    摘要： The present invention provides a process and an apparatus. The process, in one embodiment, includes providing a micro-electro-mechanical system (MEMS) device, the micro-electro-mechanical system (MEMS) device including an actuator coupled to a movable feature, sacrificial material fixing the actuator and movable feature with respect to one another, and a layer of material located over the actuator, movable feature and sacrificial material. The process may further include removing only a portion of the layer of material to expose the sacrificial material, and subjecting the exposed sacrificial material to an etchant to release the movable feature.

    摘要翻译： 本发明提供一种方法和装置。 在一个实施例中，该过程包括提供微机电系统（MEMS）装置，微机电系统（MEMS）装置包括耦合到可移动特征的致动器，将致动器和可移动特征固定的牺牲材料 相对于彼此，以及位于致动器上方的材料层，可移动特征和牺牲材料。 该方法还可以包括仅去除材料层的一部分以暴露牺牲材料，以及将暴露的牺牲材料经历蚀刻剂以释放可移动特征。

    STRUCTURE FOR PROTECTING FEATURES DURING THE REMOVAL OF SACRIFICIAL MATERIALS
    4.
    发明申请
    STRUCTURE FOR PROTECTING FEATURES DURING THE REMOVAL OF SACRIFICIAL MATERIALS 有权
    在移除材料时保护特性的结构

    公开(公告)号：US20080316563A1

    公开(公告)日：2008-12-25

    申请号：US12199236

    申请日：2008-08-27

    申请人： Vladimir A. Aksyuk ,  Nagesh R. Basavanhally ,  Omar D. Lopez ,  Chien-Shing Pai

    发明人： Vladimir A. Aksyuk ,  Nagesh R. Basavanhally ,  Omar D. Lopez ,  Chien-Shing Pai

    IPC分类号： G02B26/08

    CPC分类号： B81C1/00476 ,  B81B2201/038 ,  B81C1/00801

    摘要： The present invention provides an apparatus. The apparatus, may include an actuator located over a substrate, a movable feature located over and coupled to the actuator, and a layer of material located above the actuator and movable feature and not constituting part of a beam/spring associated with the movable feature, the layer of material configured as a reservoir having an interior capable of holding a liquid, the movable feature being exposed to the interior.

    摘要翻译： 本发明提供一种装置。 该装置可以包括位于基板上的致动器，位于致动器上方并联接到致动器的可移动特征，以及位于致动器和可移动特征上方的材料层，并且不构成与可移动特征相关联的梁/弹簧的一部分， 所述材料层被构造为具有能够保持液体的内部的储存器，所述可移动特征暴露于内部。

    Process for manufacturing an apparatus that protects features during the removal of sacrificial materials
    5.
    发明授权
    Process for manufacturing an apparatus that protects features during the removal of sacrificial materials 失效
    用于制造在去除牺牲材料期间保护特征的装置的方法

    公开(公告)号：US07452741B2

    公开(公告)日：2008-11-18

    申请号：US11425100

    申请日：2006-06-19

    申请人： Vladimir A. Aksyuk ,  Nagesh R. Basavanhally ,  Omar D. Lopez ,  Chien-Shing Pai

    发明人： Vladimir A. Aksyuk ,  Nagesh R. Basavanhally ,  Omar D. Lopez ,  Chien-Shing Pai

    IPC分类号： H01L21/00

    CPC分类号： B81C1/00476 ,  B81B2201/038 ,  B81C1/00801

    摘要： The present invention provides a process for manufacturing an apparatus. The process, in one embodiment, includes providing a micro-electro-mechanical system (MEMS) device, the micro-electro-mechanical system (MEMS) device including an actuator coupled to a movable feature, sacrificial material fixing the actuator and movable feature with respect to one another, and a layer of material located over the actuator, movable feature and sacrificial material. The process may further include removing only a portion of the layer of material to expose the sacrificial material, and subjecting the exposed sacrificial material to an etchant to release the movable feature.

    摘要翻译： 本发明提供一种制造装置的方法。 在一个实施例中，该过程包括提供微机电系统（MEMS）装置，微机电系统（MEMS）装置包括耦合到可移动特征的致动器，将致动器和可移动特征固定的牺牲材料 相对于彼此，以及位于致动器上方的材料层，可移动特征和牺牲材料。 该方法还可以包括仅去除材料层的一部分以暴露牺牲材料，以及将暴露的牺牲材料经历蚀刻剂以释放可移动特征。

    SPECKLE REDUCTION IN LASER-PROJECTOR IMAGES
    9.
    发明申请
    SPECKLE REDUCTION IN LASER-PROJECTOR IMAGES 失效
    激光投影仪图像中的光斑减少

    公开(公告)号：US20080212034A1

    公开(公告)日：2008-09-04

    申请号：US11681376

    申请日：2007-03-02

    申请人： Vladimir A. Aksyuk ,  Randy C. Giles ,  Omar D. Lopez ,  Roland Ryf

    发明人： Vladimir A. Aksyuk ,  Randy C. Giles ,  Omar D. Lopez ,  Roland Ryf

    IPC分类号： G03B21/28 ,  G03B21/14

    CPC分类号： G02B26/0833 ,  G02B27/48

    摘要： A laser projector having a configurable spatial light modulator (SLM) adapted to display various spatial modulation patterns and redirect illumination from a laser to form an image on the viewing screen. The laser projector drives the SLM to change spatial modulation patterns at a rate that causes the corresponding sequence of projected images to fuse to mitigate appearance of speckle in the resulting fused image. The SLM can be designed to redirect the illumination using either diffraction or specular reflection of light from the displayed spatial modulation pattern. In one embodiment, the SLM is a MEMS device having an array of individually addressable mirrors supported over a substrate and adapted to move (e.g., translate and/or rotate) with respect to the substrate.

    摘要翻译： 一种具有可配置空间光调制器（SLM）的激光投影仪，其适于显示各种空间调制图案，并且从激光器重定向照明以在观看屏幕上形成图像。 激光投影机驱动SLM以以使得相应的投影图像序列融合的速率来改变空间调制图案，以减轻所得融合图像中斑点的外观。 SLM可以被设计成使用来自显示的空间调制图案的光的衍射或镜面反射来重定向照明。 在一个实施例中，SLM是具有支撑在衬底上并适于相对于衬底移动（例如平移和/或旋转）的单独可寻址镜的阵列的MEMS器件。