公开(公告)号：US20080110473A1

公开(公告)日：2008-05-15

申请号：US11976267

申请日：2007-10-23

申请人： Naoaki Sakurai ,  Hiroshi Fujita

发明人： Naoaki Sakurai ,  Hiroshi Fujita

IPC分类号： B08B3/12

CPC分类号： H01L21/67259 ,  B08B3/12 ,  H01L21/67051 ,  H01L21/67253 ,  H01L21/68

摘要： An ultrasonic-wave washing unit comprising an ultrasonic-wave vibrating plate to which an ultrasonic-wave vibrator is fixed by adhesive bonding, an ultrasonic-wave transmission plate opposed to the vibrating plate, a liquid supply means which supplies a liquid to a space defined between the vibrating plate and the transmission plate, and a liquid discharge means for discharging the liquid from the space.

摘要翻译： 一种超声波洗涤装置，其特征在于，包括通过粘合剂固定超声波振动体的超声波振动板，与所述振动板相对的超声波传递板，液体供给装置，其向限定的空间 在所述振动板和所述透射板之间，以及用于从所述空间排出液体的液体排出装置。

公开(公告)号：US20050145264A1

公开(公告)日：2005-07-07

申请号：US11072326

申请日：2005-03-07

申请人： Naoaki Sakurai ,  Hiroshi Fujita

发明人： Naoaki Sakurai ,  Hiroshi Fujita

IPC分类号： B05B17/06 ,  B05D3/12 ,  B08B3/12 ,  H01L21/00 ,  H01L21/304 ,  H01L21/68 ,  B08B3/10

CPC分类号： H01L21/67259 ,  B08B3/12 ,  H01L21/67051 ,  H01L21/67253 ,  H01L21/68

摘要： An ultrasonic-wave washing unit comprising an ultrasonic-wave vibrating plate to which an ultrasonic-wave vibrator is fixed by adhesive bonding, an ultrasonic-wave transmission plate opposed to the vibrating plate, a liquid supply means which supplies a liquid to a space defined between the vibrating plate and the transmission plate, and a liquid discharge means for discharging the liquid from the space.

摘要翻译： 一种超声波洗涤装置，其特征在于，包括通过粘合剂固定超声波振动体的超声波振动板，与所述振动板相对的超声波传递板，液体供给装置，其向限定的空间 在所述振动板和所述透射板之间，以及用于从所述空间排出液体的液体排出装置。

公开(公告)号：US5980703A

公开(公告)日：1999-11-09

申请号：US53781

申请日：1998-04-02

申请人： Kuniaki Yamada ,  Seiichi Anzai ,  Masashi Tanaka ,  Takayuki Shimamune ,  Yoshinori Nishiki ,  Naoaki Sakurai ,  Naoya Hayamizu ,  Hiroshi Fujita

发明人： Kuniaki Yamada ,  Seiichi Anzai ,  Masashi Tanaka ,  Takayuki Shimamune ,  Yoshinori Nishiki ,  Naoaki Sakurai ,  Naoya Hayamizu ,  Hiroshi Fujita

IPC分类号： C02F1/46 ,  C02F1/42 ,  C02F1/461 ,  C02F1/469 ,  C02F9/00 ,  C25B9/00 ,  C25B9/08 ,  C25B9/18

CPC分类号： C02F1/469 ,  C02F1/4618 ,  C02F1/42 ,  C02F2001/46133 ,  C02F2001/46142 ,  C02F2001/46161 ,  C02F2103/04 ,  C02F2201/46115 ,  C02F2201/46125 ,  C02F2201/46195 ,  C02F9/00

摘要： An electrolytic cell for producing acidic water and alkaline water is disclosed. High-purity acidic water and high-purity alkaline water can be produced in a well balanced proportion from ultrapure water which is supplied in the minimum amount necessary for producing the desired acidic and alkaline waters using the minimum amount of electricity. The electrolytic cell includes an electrolytic acidic-water production unit 3 comprising an anode chamber 6 and an auxiliary cathode chamber 7 separated therefrom by a first ion-exchange membrane 5, and an electrolytic alkaline-water production unit 4 comprising a cathode chamber 10 and an auxiliary anode chamber 9 separated therefrom by a second ion-exchange membrane 8. Separately controllable power supplies are also provided for supplying power to each of the two units. The supply amount of pure water and the amount of electricity used can be fixed according to the desired amounts of acidic and alkaline waters. Thus, wasteful use of ultrapure water and electric power can be avoided.

摘要翻译： 公开了一种用于生产酸性水和碱性水的电解池。 高纯度酸性水和高纯度碱性水可以以超纯水的平衡比例生产，以最少的电量生产所需的酸性和碱性水所需的最小量。 电解池包括电解酸性水生产单元3，其包括由第一离子交换膜5与其隔开的阳极室6和辅助阴极室7;以及电解碱水生产单元4，其包括阴极室10和 辅助阳极室9由第二离子交换膜8分离。也提供了单独可控的电源，用于向两个单元中的每一个供电。 纯水的供给量和使用的电量可以根据所需量的酸性和碱性水而固定。 因此，可以避免浪费使用超纯水和电力。

公开(公告)号：US20080029132A1

公开(公告)日：2008-02-07

申请号：US11870272

申请日：2007-10-10

申请人： Naoaki Sakurai ,  Hiroshi Fujita

发明人： Naoaki Sakurai ,  Hiroshi Fujita

IPC分类号： B08B3/12 ,  H01L41/09

CPC分类号： H01L21/67051 ,  B08B3/12 ,  Y10S134/902

摘要： An ultrasonic cleaning apparatus which cleans a material at a surface by supplying an ultrasonic wave from an ultrasonic wave application head to a cleaning liquid on the surface, and cleans the surface, wherein the ultrasonic wave application head has an ultrasonic wave transmission member which is provided opposite the surface, and has a curved portion on a first plane placed close to the surface, an ultrasonic transducer which is provided on a second plane placed opposite the first plane of the ultrasonic wave transmission member, and generates and applies an ultrasonic wave to a cleaning liquid on the surface through the ultrasonic wave transmission member, and a preventive portion which is provided in the ultrasonic wave transmission member, and prevents the ultrasonic wave applied to the cleaning liquid and reflected on the surface from entering the ultrasonic transducer through the ultrasonic wave transmission member.

摘要翻译： 一种超声波清洗装置，其通过从超声波施加头向表面上的清洗液提供超声波来清洗表面的材料，并且清洁表面，其中超声波施加头具有设置有超声波传递部件 在与表面相邻的第一平面上具有弯曲部分，设置在与超声波传播部件的第一平面相对的第二平面上的超声波换能器，并且产生并施加超声波到 通过超声波传递部件在表面上清洗液体，以及设置在超声波传递部件中的防止部，防止施加到清洗液上并在表面上反射的超声波通过超声波进入超声波换能器 传输部件。

公开(公告)号：US06875696B2

公开(公告)日：2005-04-05

申请号：US10443012

申请日：2003-05-22

申请人： Naoaki Sakurai ,  Hiroshi Fujita

发明人： Naoaki Sakurai ,  Hiroshi Fujita

IPC分类号： B05B17/06 ,  B05D3/12 ,  B08B3/12 ,  H01L21/00 ,  H01L21/304 ,  H01L21/68 ,  H01L21/302 ,  H01L21/26 ,  H01L21/324 ,  H01L21/461 ,  H01L21/477

CPC分类号： H01L21/67259 ,  B08B3/12 ,  H01L21/67051 ,  H01L21/67253 ,  H01L21/68

摘要： An ultrasonic-wave washing unit comprising an ultrasonic-wave vibrating plate to which an ultrasonic-wave vibrator is fixed by adhesive bonding, an ultrasonic-wave transmission plate opposed to the vibrating plate, a liquid supply means which supplies a liquid to a space defined between the vibrating plate and the transmission plate, and a liquid discharge means for discharging the liquid from the space.

公开(公告)号：US07814919B2

公开(公告)日：2010-10-19

申请号：US12248514

申请日：2008-10-09

申请人： Naoaki Sakurai ,  Hiroshi Fujita

发明人： Naoaki Sakurai ,  Hiroshi Fujita

IPC分类号： B08B3/12 ,  B08B6/00

CPC分类号： H01L21/67051 ,  B08B3/12 ,  Y10S134/902

摘要： An ultrasonic cleaning apparatus which cleans a material at a surface by supplying an ultrasonic wave from an ultrasonic wave application head to a cleaning liquid on the surface, and cleans the surface, wherein the ultrasonic wave application head has an ultrasonic wave transmission member which is provided opposite the surface, and has a curved portion on a first plane placed close to the surface, an ultrasonic transducer which is provided on a second plane placed opposite the first plane of the ultrasonic wave transmission member, and generates and applies an ultrasonic wave to a cleaning liquid on the surface through the ultrasonic wave transmission member, and a preventive portion which is provided in the ultrasonic wave transmission member, and prevents the ultrasonic wave applied to the cleaning liquid and reflected on the surface from entering the ultrasonic transducer through the ultrasonic wave transmission member.

摘要翻译： 一种超声波清洗装置，其通过从超声波施加头向表面上的清洗液提供超声波来清洗表面的材料，并且清洁表面，其中超声波施加头具有设置有超声波传递部件 在与表面相邻的第一平面上具有弯曲部分，设置在与超声波传播部件的第一平面相对的第二平面上的超声波换能器，并且产生并施加超声波到 通过超声波传递部件在表面上清洗液体，以及设置在超声波传递部件中的防止部，防止施加到清洗液上并在表面上反射的超声波通过超声波进入超声波换能器 传输部件。

公开(公告)号：US20050284509A1

公开(公告)日：2005-12-29

申请号：US11159199

申请日：2005-06-23

申请人： Naoaki Sakurai ,  Hiroshi Fujita

发明人： Naoaki Sakurai ,  Hiroshi Fujita

IPC分类号： B08B3/12 ,  H01L21/00

CPC分类号： H01L21/67051 ,  B08B3/12 ,  Y10S134/902

摘要： An ultrasonic cleaning apparatus which cleans a material at a surface by supplying an ultrasonic wave from an ultrasonic wave application head to a cleaning liquid on the surface, and cleans the surface, wherein the ultrasonic wave application head has an ultrasonic wave transmission member which is provided opposite the surface, and has a curved portion on a first plane placed close to the surface, an ultrasonic transducer which is provided on a second plane placed opposite the first plane of the ultrasonic wave transmission member, and generates and applies an ultrasonic wave to a cleaning liquid on the surface through the ultrasonic wave transmission member, and a preventive portion which is provided in the ultrasonic wave transmission member, and prevents the ultrasonic wave applied to the cleaning liquid and reflected on the surface from entering the ultrasonic transducer through the ultrasonic wave transmission member.

摘要翻译： 一种超声波清洗装置，其通过从超声波施加头向表面上的清洗液提供超声波来清洗表面的材料，并且清洁表面，其中超声波施加头具有设置有超声波传递部件 在与表面相邻的第一平面上具有弯曲部分，设置在与超声波传播部件的第一平面相对的第二平面上的超声波换能器，并且产生并施加超声波到 通过超声波传递部件在表面上清洗液体，以及设置在超声波传递部件中的防止部，防止施加到清洗液上并在表面上反射的超声波通过超声波进入超声波换能器 传输部件。

公开(公告)号：US6082373A

公开(公告)日：2000-07-04

申请号：US109066

申请日：1998-07-02

申请人： Naoaki Sakurai ,  Hisashi Nishigaki ,  Naoya Hayamizu ,  Hiroshi Fujita

发明人： Naoaki Sakurai ,  Hisashi Nishigaki ,  Naoya Hayamizu ,  Hiroshi Fujita

IPC分类号： B08B3/10 ,  B08B3/12 ,  C02F1/46 ,  C11D7/00 ,  H01L21/00 ,  H01L21/02 ,  H01L21/304 ,  B08B3/00 ,  B08B5/00 ,  B03C23/00

CPC分类号： H01L21/02074 ,  B08B3/12 ,  H01L21/67051

摘要： Provided is a cleaning method for effectively removing particles on the surface of an object to be cleaned. This cleaning method includes dissolving oxygen into deaerated pure water to prepare a cleaning fluid, and cleaning an object to be cleaned by bringing the object into contact with the cleaning fluid to which ultrasonic vibration is being applied.

摘要翻译： 提供了一种有效去除待清洁物体表面上的微粒的清洗方法。 这种清洁方法包括将氧气溶解在脱气的纯水中以制备清洁液，并且通过使物体与被施加超声波振动的清洁流体接触来清洁待清洁的物体。

公开(公告)号：US08614500B2

公开(公告)日：2013-12-24

申请号：US13048612

申请日：2011-03-15

申请人： Tsuyoshi Sato ,  Hiroyasu Kondo ,  Naoaki Sakurai ,  Katsuyuki Soeda ,  Kenichi Ooshiro ,  Shuichi Kimura

发明人： Tsuyoshi Sato ,  Hiroyasu Kondo ,  Naoaki Sakurai ,  Katsuyuki Soeda ,  Kenichi Ooshiro ,  Shuichi Kimura

IPC分类号： H01L23/58

CPC分类号： H01L21/6715 ,  B05D1/005 ,  B05D3/0486 ,  G03F7/162 ,  H01L21/67253

摘要： According one embodiment, a film forming apparatus includes a stage, a coating section, a vapor supply section, a blower section, and a controller. On the stage, an coating target is placed. The coating section applies a material to a predetermined region on the coating target placed on the stage to form a coating film. The vapor supply section generates solvent vapor capable of dissolving the coating film. The blower section blows the solvent vapor generated by the vapor supply section onto the coating film on the coating target placed on the stage. The controller controls an amount of the solvent vapor to be blown by the blower section so that: the coating film is dissolved; viscosity in a part of the coating film on a surface layer side is lower than that in a part thereof on the coating target side; and the viscosity in the part on the surface layer side and the viscosity of the coating target side take such values that prevent the coating film on the coating target from spreading.

摘要翻译： 根据一个实施例，一种成膜装置包括载物台，涂布部分，蒸气供应部分，鼓风机部分和控制器。 在舞台上放置涂层目标。 涂布部分将材料施加到放置在载物台上的涂布靶上的预定区域上以形成涂膜。 蒸气供给部产生能够溶解涂膜的溶剂蒸气。 鼓风机部分将由蒸汽供应部分产生的溶剂蒸气吹到放置在载物台上的涂覆靶上的涂膜上。 控制器控制由鼓风机部分吹送的溶剂蒸气的量，使得涂膜溶解; 表面层侧的一部分涂膜的粘度比涂布目标侧的一部分的粘度低; 并且表面层侧的部分中的粘度和涂布目标侧的粘度取得防止涂布靶上的涂膜扩散的值。

公开(公告)号：US20120067847A1

公开(公告)日：2012-03-22

申请号：US13223555

申请日：2011-09-01

申请人： Naoaki Sakurai ,  Hideaki Hirabayashi

发明人： Naoaki Sakurai ,  Hideaki Hirabayashi

IPC分类号： C23F1/00 ,  C23F1/08

CPC分类号： H01L21/67248 ,  H01L21/31111 ,  H01L21/6708 ,  H01L21/67109

摘要： According to one embodiment, an apparatus of processing a substrate includes a treatment chamber, a holder, a feed device, and a temperature control device. The holder is provided in the treatment chamber and is configured to rotatably hold the substrate. The feed device includes a nozzle configured to eject an etching solution to a surface of the substrate held by the holder. The temperature control device includes first and second devices, and a controller. The first device is configured to heat and/or cool an atmosphere inside the treatment chamber. The second device is configured to heat and/or cool the etching solution. The controller is configured to control operation of the first and second devices such that a temperature of the atmosphere is higher than that of the etching solution in the nozzle and that difference between the temperature of the atmosphere and that of the etching solution is maintained constant.

摘要翻译： 根据一个实施例，处理基板的装置包括处理室，保持器，进给装置和温度控制装置。 保持器设置在处理室中并且构造成可旋转地保持基板。 进料装置包括喷嘴，该喷嘴构造成将蚀刻溶液喷射到由保持器保持的基板的表面上。 温度控制装置包括第一和第二装置以及控制器。 第一装置被配置为加热和/或冷却处理室内的气氛。 第二装置被配置为加热和/或冷却蚀刻溶液。 控制器被配置为控制第一和第二装置的操作，使得气氛的温度高于喷嘴中的蚀刻溶液的温度，并且气氛的温度与蚀刻溶液的温度之间的差保持恒定。