公开(公告)号：US5980703A

公开(公告)日：1999-11-09

申请号：US53781

申请日：1998-04-02

申请人： Kuniaki Yamada ,  Seiichi Anzai ,  Masashi Tanaka ,  Takayuki Shimamune ,  Yoshinori Nishiki ,  Naoaki Sakurai ,  Naoya Hayamizu ,  Hiroshi Fujita

发明人： Kuniaki Yamada ,  Seiichi Anzai ,  Masashi Tanaka ,  Takayuki Shimamune ,  Yoshinori Nishiki ,  Naoaki Sakurai ,  Naoya Hayamizu ,  Hiroshi Fujita

IPC分类号： C02F1/46 ,  C02F1/42 ,  C02F1/461 ,  C02F1/469 ,  C02F9/00 ,  C25B9/00 ,  C25B9/08 ,  C25B9/18

CPC分类号： C02F1/469 ,  C02F1/4618 ,  C02F1/42 ,  C02F2001/46133 ,  C02F2001/46142 ,  C02F2001/46161 ,  C02F2103/04 ,  C02F2201/46115 ,  C02F2201/46125 ,  C02F2201/46195 ,  C02F9/00

摘要： An electrolytic cell for producing acidic water and alkaline water is disclosed. High-purity acidic water and high-purity alkaline water can be produced in a well balanced proportion from ultrapure water which is supplied in the minimum amount necessary for producing the desired acidic and alkaline waters using the minimum amount of electricity. The electrolytic cell includes an electrolytic acidic-water production unit 3 comprising an anode chamber 6 and an auxiliary cathode chamber 7 separated therefrom by a first ion-exchange membrane 5, and an electrolytic alkaline-water production unit 4 comprising a cathode chamber 10 and an auxiliary anode chamber 9 separated therefrom by a second ion-exchange membrane 8. Separately controllable power supplies are also provided for supplying power to each of the two units. The supply amount of pure water and the amount of electricity used can be fixed according to the desired amounts of acidic and alkaline waters. Thus, wasteful use of ultrapure water and electric power can be avoided.

摘要翻译： 公开了一种用于生产酸性水和碱性水的电解池。 高纯度酸性水和高纯度碱性水可以以超纯水的平衡比例生产，以最少的电量生产所需的酸性和碱性水所需的最小量。 电解池包括电解酸性水生产单元3，其包括由第一离子交换膜5与其隔开的阳极室6和辅助阴极室7;以及电解碱水生产单元4，其包括阴极室10和 辅助阳极室9由第二离子交换膜8分离。也提供了单独可控的电源，用于向两个单元中的每一个供电。 纯水的供给量和使用的电量可以根据所需量的酸性和碱性水而固定。 因此，可以避免浪费使用超纯水和电力。

公开(公告)号：US6082373A

公开(公告)日：2000-07-04

申请号：US109066

申请日：1998-07-02

申请人： Naoaki Sakurai ,  Hisashi Nishigaki ,  Naoya Hayamizu ,  Hiroshi Fujita

发明人： Naoaki Sakurai ,  Hisashi Nishigaki ,  Naoya Hayamizu ,  Hiroshi Fujita

IPC分类号： B08B3/10 ,  B08B3/12 ,  C02F1/46 ,  C11D7/00 ,  H01L21/00 ,  H01L21/02 ,  H01L21/304 ,  B08B3/00 ,  B08B5/00 ,  B03C23/00

CPC分类号： H01L21/02074 ,  B08B3/12 ,  H01L21/67051

摘要： Provided is a cleaning method for effectively removing particles on the surface of an object to be cleaned. This cleaning method includes dissolving oxygen into deaerated pure water to prepare a cleaning fluid, and cleaning an object to be cleaned by bringing the object into contact with the cleaning fluid to which ultrasonic vibration is being applied.

摘要翻译： 提供了一种有效去除待清洁物体表面上的微粒的清洗方法。 这种清洁方法包括将氧气溶解在脱气的纯水中以制备清洁液，并且通过使物体与被施加超声波振动的清洁流体接触来清洁待清洁的物体。

公开(公告)号：US08141567B2

公开(公告)日：2012-03-27

申请号：US11625081

申请日：2007-01-19

申请人： Takahiko Wakatsuki ,  Naoya Hayamizu ,  Hiroshi Fujita ,  Akiko Saito ,  Toshihide Hayashi ,  Yukinobu Nishibe ,  Tsutomu Makino

发明人： Takahiko Wakatsuki ,  Naoya Hayamizu ,  Hiroshi Fujita ,  Akiko Saito ,  Toshihide Hayashi ,  Yukinobu Nishibe ,  Tsutomu Makino

IPC分类号： B08B3/04

CPC分类号： B08B3/00 ,  B08B7/00 ,  B08B2230/01 ,  G03F7/427

摘要： A processing apparatus includes: a tank configured to store water; vapor generating unit configured to turn the water supplied from the tank into vapor; a processing chamber in which vapor supplied from the vapor generating unit is used to remove residues from a workpiece; cooling unit; and filtering unit. The cooling unit cools waste liquid ejected from the processing chamber. The filtering unit is provided between the cooling unit and the tank, and the filtering unit filters the waste liquid cooled in the cooling unit. A processing method includes: supplying vapor into a processing chamber; removing residues from a workpiece using the vapor; cooling waste liquid containing the removed residues to precipitate the residues as solids; and filtering the waste liquid containing the precipitates.

摘要翻译： 一种处理装置，包括：储存器，用于储存水; 蒸汽发生单元，其构造成将从所述罐供给的水转化为蒸气; 处理室，其中从蒸汽发生单元供应的蒸汽用于从工件中除去残余物; 冷却单元 和过滤单元。 冷却单元冷却从处理室喷出的废液。 过滤单元设置在冷却单元和水箱之间，过滤单元对冷却单元中冷却的废液进行过滤。 一种处理方法包括：将蒸气供应到处理室中; 使用蒸气从工件去除残留物; 冷却含有去除的残余物的废液以将残留物沉淀为固体; 并过滤含有沉淀物的废液。

公开(公告)号：US20090165819A1

公开(公告)日：2009-07-02

申请号：US12342619

申请日：2008-12-23

申请人： Naoya HAYAMIZU ,  Hiroshi Fujita

发明人： Naoya HAYAMIZU ,  Hiroshi Fujita

IPC分类号： B08B3/04

CPC分类号： B08B3/08 ,  B08B3/12 ,  H01L21/67023 ,  H01L21/67051

摘要： A method for treating a fine structure, includes supplying a liquid to a surface of the fine structure having protrusions on the surface thereof; and thereby treating the surface of the fine structure. The liquid has a smaller surface tension than that of water and is not substantially compatible with water.

摘要翻译： 一种处理精细结构的方法，包括向其表面上具有突起的精细结构的表面供给液体; 从而处理精细结构的表面。 液体的表面张力比水的表面张力小，基本上与水不相容。

公开(公告)号：US20070246097A1

公开(公告)日：2007-10-25

申请号：US11625592

申请日：2007-01-22

申请人： Takahiko Wakatsuki ,  Naoya Hayamizu ,  Hiroshi Fujita ,  Akiko Saito ,  Toshihide Hayashi ,  Yukinobu Nishibe

发明人： Takahiko Wakatsuki ,  Naoya Hayamizu ,  Hiroshi Fujita ,  Akiko Saito ,  Toshihide Hayashi ,  Yukinobu Nishibe

IPC分类号： F17D3/00

CPC分类号： B08B3/022 ,  B08B7/00 ,  H01L21/67028 ,  H01L21/67051 ,  Y10T137/0318

摘要： A processing apparatus includes: a processing chamber configured to contain a workpiece; a first nozzle provided in the processing chamber, the first nozzle discharging vapor onto the workpiece; a wall enclosing the processing chamber; a fluid channel provided inside the wall; a fluid inlet; and a fluid outlet. The fluid inlet is provided in communication with the fluid channel. The fluid outlet is provided in communication with the fluid channel, where a fluid flows into the fluid inlet, passes through the fluid channel, and flows out of the fluid outlet. A processing method for processing a workpiece moving in a processing chamber, the processing method includes: discharging a vapor from a first nozzle toward the workpiece while flowing a fluid through a fluid channel which is provided inside a wall, the wall enclosing the processing chamber.

摘要翻译： 一种处理装置，包括：处理室，被配置为容纳工件; 设置在所述处理室中的第一喷嘴，所述第一喷嘴将蒸气喷射到所述工件上; 封闭处理室的墙壁; 设置在壁内的流体通道; 流体入口; 和流体出口。 流体入口设置成与流体通道连通。 流体出口设置成与流体通道连通，流体流入流体入口，通过流体通道并从流体出口流出。 一种用于处理在处理室中移动的工件的处理方法，所述处理方法包括：使流体从第一喷嘴朝向工件排出，同时使流体流过设置在壁内部的流体通道，所述流体通道围绕处理室。

公开(公告)号：US06230738B1

公开(公告)日：2001-05-15

申请号：US09558785

申请日：2000-04-26

申请人： Yasushi Watanabe ,  Keiichiro Senda ,  Hiroshi Fujita ,  Naoya Hayamizu ,  Hideaki Hirabayashi

发明人： Yasushi Watanabe ,  Keiichiro Senda ,  Hiroshi Fujita ,  Naoya Hayamizu ,  Hideaki Hirabayashi

IPC分类号： F16K3102

CPC分类号： F16K31/004 ,  Y10T137/7759

摘要： A flow rate control valve comprises a driver in which a rotary shaft is rotated to adjust the opening degree of a valve body. The driver is an ultrasonic motor comprising a stator having piezoelectric elements mounted thereto and a rotor mounted to the rotary shaft and resiliently pressed against the stator.

摘要翻译： 流量控制阀包括旋转轴旋转以调节阀体的开度的驱动器。 驱动器是包括具有安装在其上的压电元件的定子和安装在旋转轴上并且弹性地压靠定子的转子的超声波马达。

公开(公告)号：US20070256711A1

公开(公告)日：2007-11-08

申请号：US11683582

申请日：2007-03-08

申请人： Toshihide HAYASHI ,  Tsutomu Makino ,  Takahiko Wakatsuki ,  Naoya Hayamizu ,  Hiroshi Fujita ,  Akiko Saito

发明人： Toshihide HAYASHI ,  Tsutomu Makino ,  Takahiko Wakatsuki ,  Naoya Hayamizu ,  Hiroshi Fujita ,  Akiko Saito

IPC分类号： B08B3/00

CPC分类号： B08B1/02 ,  B08B3/022 ,  G03F7/422 ,  G03F7/427 ,  H01L21/67046 ,  H01L21/67051

摘要： A cleaning apparatus to remove organic substances deposited onto a substrate, the apparatus includes a transport unit configured to transport the substrate, a water steam ejection unit configured to eject a heated water steam to a face of the substrate to be transported deposited with the organic substances, and a physical force applying unit configured to apply a physical force to the organic substances deposited onto the substrate to be transported.

摘要翻译： 一种用于去除沉积在基底上的有机物质的清洁装置，该装置包括构造成输送基底的输送单元，水蒸汽喷射单元，其构造成将被加热的水蒸汽喷射到待运输的基底的面上，沉积有机物质 以及物理力施加单元，其构造成对被运送的基板上沉积的有机物质施加物理力。

公开(公告)号：US08517035B2

公开(公告)日：2013-08-27

申请号：US11625592

申请日：2007-01-22

申请人： Takahiko Wakatsuki ,  Naoya Hayamizu ,  Hiroshi Fujita ,  Akiko Saito ,  Toshihide Hayashi ,  Yukinobu Nishibe

发明人： Takahiko Wakatsuki ,  Naoya Hayamizu ,  Hiroshi Fujita ,  Akiko Saito ,  Toshihide Hayashi ,  Yukinobu Nishibe

IPC分类号： B08B3/00

CPC分类号： B08B3/022 ,  B08B7/00 ,  H01L21/67028 ,  H01L21/67051 ,  Y10T137/0318

摘要： A processing apparatus includes: a processing chamber configured to contain a workpiece; a first nozzle provided in the processing chamber, the first nozzle discharging vapor onto the workpiece; a wall enclosing the processing chamber; a fluid channel provided inside the wall; a fluid inlet; and a fluid outlet.The fluid inlet is provided in communication with the fluid channel. The fluid outlet is provided in communication with the fluid channel, where a fluid flows into the fluid inlet, passes through the fluid channel, and flows out of the fluid outlet. A processing method for processing a workpiece moving in a processing chamber, the processing method includes: discharging a vapor from a first nozzle toward the workpiece while flowing a fluid through a fluid channel which is provided inside a wall, the wall enclosing the processing chamber.

摘要翻译： 一种处理装置，包括：处理室，被配置为容纳工件; 设置在所述处理室中的第一喷嘴，所述第一喷嘴将蒸气喷射到所述工件上; 封闭处理室的墙壁; 设置在壁内的流体通道; 流体入口; 和流体出口。 流体入口设置成与流体通道连通。 流体出口设置成与流体通道连通，流体流入流体入口，通过流体通道并从流体出口流出。 一种用于处理在处理室中移动的工件的处理方法，所述处理方法包括：使流体从第一喷嘴朝向工件排出，同时使流体流过设置在壁内部的流体通道，所述流体通道围绕处理室。

公开(公告)号：US20090084754A1

公开(公告)日：2009-04-02

申请号：US12238647

申请日：2008-09-26

申请人： Naoya HAYAMIZU ,  Hiroshi Fujita

发明人： Naoya HAYAMIZU ,  Hiroshi Fujita

IPC分类号： B44C1/22 ,  C23F1/08

CPC分类号： H01L21/02057 ,  B08B3/10 ,  B81C1/00111 ,  H01L21/67034 ,  H01L21/67051

摘要： A method for manufacturing a microstructure includes treating a surface of the microstructure having a wall body with a liquid, supplying a material activating the surface of the liquid to the surface of the microstructure, and drying the surface of the microstructure.

摘要翻译： 微结构的制造方法包括用液体处理具有壁体的微细结构的表面，向液晶的表面供给活化表面的材料，并干燥微观结构的表面。

公开(公告)号：US20070246085A1

公开(公告)日：2007-10-25

申请号：US11625026

申请日：2007-01-19

申请人： Takahiko Wakatsuki ,  Naoya Hayamizu ,  Hiroshi Fujita ,  Akiko Saito ,  Toshihide Hayashi ,  Yukinobu Nishibe

发明人： Takahiko Wakatsuki ,  Naoya Hayamizu ,  Hiroshi Fujita ,  Akiko Saito ,  Toshihide Hayashi ,  Yukinobu Nishibe

IPC分类号： B08B3/00

CPC分类号： B08B3/022 ,  B08B5/023 ,  C03C17/32 ,  C03C2218/33 ,  H01L21/6708 ,  H05K3/26 ,  H05K2203/075 ,  H05K2203/1509

摘要： A processing apparatus includes: a processing chamber configured to process a workpiece; a moving unit configured to move the workpiece in the processing chamber; a first nozzle; a partition member; an inlet provided in communication with the downstream space; and an outlet provided in communication with the upstream space. The first nozzle has a discharge port configured to discharge a processing liquid or a processing gas. The discharge port is opposed to a moving path of the workpiece and the processing liquid or the processing gas is discharged from the discharge port in a discharge direction directed to an upstream side of a moving direction of the workpiece relative to a direction perpendicular to the moving direction. The partition member partitions a space above the moving path in the processing chamber, and the space is partitioned at a position of the first nozzle into an upstream space on the upstream side of the moving direction and a downstream space on a downstream side of the moving direction.

摘要翻译： 一种处理装置，包括：处理室，被配置为处理工件; 移动单元，构造成在处理室中移动工件; 第一个喷嘴; 分隔构件; 与下游空间连通的入口; 以及与上游空间连通的出口。 第一喷嘴具有排出处理液或处理气体的排出口。 排出口与工件的移动路径相对，并且处理气体或处理气体沿着与工件的移动方向的上游侧相对于垂直于移动的方向的排放方向从排出口排出 方向。 分隔构件分隔处理室中的移动路径上方的空间，并且将空间在第一喷嘴的位置分隔成在移动方向的上游侧的上游空间和移动的下游侧的下游空间 方向。