公开(公告)号：US07528057B2

公开(公告)日：2009-05-05

申请号：US11382079

申请日：2006-05-08

申请人： Naoto Kusumoto ,  Toru Takayama ,  Masato Yonezawa

发明人： Naoto Kusumoto ,  Toru Takayama ,  Masato Yonezawa

IPC分类号： H01L21/20

CPC分类号： H01L21/67167 ,  H01L21/02068 ,  H01L21/02422 ,  H01L21/02488 ,  H01L21/02532 ,  H01L21/02672 ,  H01L21/02686 ,  H01L21/67207 ,  H01L21/67213 ,  H01L27/1296 ,  H01L29/66757 ,  Y10S438/905 ,  Y10S438/906

摘要： A laser-annealing method includes the steps of a first step of cleaning a non-monocrystal silicon film formed on a substrate, and a second step of laser-annealing the non-monocrystal silicon film in an atmosphere containing oxygen therein, wherein the first and second steps are conducted continuously without being exposed to the air. Also, a laser-annealing device includes a cleaning chamber, and a laser irradiation chamber, wherein a substrate to be processed is transported between the cleaning chamber and the laser irradiation chamber without being exposed to the air.

摘要翻译： 激光退火方法包括清洗形成在基板上的非单晶硅膜的第一步骤和在其中含有氧的气氛中对非单晶硅膜进行激光退火的第二步骤，其中第一和 连续地进行第二步骤而不暴露于空气。 此外，激光退火装置包括清洁室和激光照射室，其中待处理的基板在清洁室和激光照射室之间传送而不暴露于空气。

公开(公告)号：US06444506B1

公开(公告)日：2002-09-03

申请号：US08735680

申请日：1996-10-23

申请人： Naoto Kusumoto ,  Toru Takayama ,  Masato Yonezawa

发明人： Naoto Kusumoto ,  Toru Takayama ,  Masato Yonezawa

IPC分类号： H01L2184

CPC分类号： H01L21/02686 ,  H01L21/02532 ,  H01L21/02672 ,  H01L21/02691 ,  H01L21/2026 ,  H01L21/67739 ,  H01L29/4908 ,  H01L29/66757 ,  H01L29/78696

摘要： A crystalline silicon film is obtained by laser-annealing a non-single-crystal silicon film by illuminating it with a laser beam in a hydrogen-inclusive atmosphere. Further, the above laser annealing step and a step of forming an insulating film to become a gate insulating film are performed consecutively. As a result, hydrogen is effectively confined in a channel forming region and the boundary between the channel forming region and the gate insulating film is given superior characteristics, which lead to proper threshold voltage control, a reduction in S-value, and an increase in mobility. The hydrogen confinement can be made more effective by employing a silicon nitride film or a multi-layer film including a silicon nitride film as the insulating film to become the gate insulating film.

摘要翻译： 通过在包含氢的气氛中用激光束照射非单晶硅膜来获得晶体硅膜。 此外，连续执行上述激光退火步骤和形成绝缘膜以成为栅极绝缘膜的步骤。 结果，氢被有效地限制在沟道形成区域中，并且沟道形成区域和栅极绝缘膜之间的边界被赋予优异的特性，这导致适当的阈值电压控制，S值的降低和增加 流动性 通过使用氮化硅膜或包含氮化硅膜作为绝缘膜的多层膜来形成栅极绝缘膜，可以使氢限制更有效。

公开(公告)号：US06348369B1

公开(公告)日：2002-02-19

申请号：US09390513

申请日：1999-09-03

申请人： Naoto Kusumoto ,  Toru Takayama ,  Masato Yonezawa

发明人： Naoto Kusumoto ,  Toru Takayama ,  Masato Yonezawa

IPC分类号： H01L2100

CPC分类号： H01L21/67167 ,  H01L21/02068 ,  H01L21/02422 ,  H01L21/02488 ,  H01L21/02532 ,  H01L21/02672 ,  H01L21/02686 ,  H01L21/67207 ,  H01L21/67213 ,  H01L27/1296 ,  H01L29/66757 ,  Y10S438/905 ,  Y10S438/906

摘要： A laser-annealing method includes the steps of a first step of cleaning a non-monocrystal silicon film formed on a substrate, and a second step of laser-annealing the non-monocrystal silicon film in an atmosphere containing oxygen therein, wherein the first and second steps are conducted continuously without being exposed to the air. Also, a laser-annealing device includes a cleaning chamber, and a laser irradiation chamber, wherein a substrate to be processed is transported between the cleaning chamber and the laser irradiation chamber without being exposed to the air.

摘要翻译： 激光退火方法包括清洗形成在基板上的非单晶硅膜的第一步骤和在其中含有氧的气氛中对非单晶硅膜进行激光退火的第二步骤，其中第一和 连续地进行第二步骤而不暴露于空气。 此外，激光退火装置包括清洁室和激光照射室，其中待处理的基板在清洁室和激光照射室之间传送而不暴露于空气。

公开(公告)号：US20060211182A1

公开(公告)日：2006-09-21

申请号：US11382079

申请日：2006-05-08

申请人： Naoto Kusumoto ,  Toru Takayama ,  Masato Yonezawa

发明人： Naoto Kusumoto ,  Toru Takayama ,  Masato Yonezawa

IPC分类号： H01L21/84 ,  H01L21/302 ,  H01L21/00 ,  H01L21/461

CPC分类号： H01L21/67167 ,  H01L21/02068 ,  H01L21/02422 ,  H01L21/02488 ,  H01L21/02532 ,  H01L21/02672 ,  H01L21/02686 ,  H01L21/67207 ,  H01L21/67213 ,  H01L27/1296 ,  H01L29/66757 ,  Y10S438/905 ,  Y10S438/906

摘要： A laser-annealing method includes the steps of a first step of cleaning a non-monocrystal silicon film formed on a substrate, and a second step of laser-annealing the non-monocrystal silicon film in an atmosphere containing oxygen therein, wherein the first and second steps are conducted continuously without being exposed to the air. Also, a laser-annealing device includes a cleaning chamber, and a laser irradiation chamber, wherein a substrate to be processed is transported between the cleaning chamber and the laser irradiation chamber without being exposed to the air.

摘要翻译： 激光退火方法包括清洗形成在基板上的非单晶硅膜的第一步骤和在其中含有氧的气氛中对非单晶硅膜进行激光退火的第二步骤，其中第一和 连续地进行第二步骤而不暴露于空气。 此外，激光退火装置包括清洁室和激光照射室，其中待处理的基板在清洁室和激光照射室之间传送而不暴露于空气。

公开(公告)号：US6027960A

公开(公告)日：2000-02-22

申请号：US735554

申请日：1996-10-23

申请人： Naoto Kusumoto ,  Toru Takayama ,  Masato Yonezawa

发明人： Naoto Kusumoto ,  Toru Takayama ,  Masato Yonezawa

IPC分类号： H01L29/786 ,  H01L21/00 ,  H01L21/20 ,  H01L21/336 ,  H01L21/84

CPC分类号： H01L21/67167 ,  H01L21/02068 ,  H01L21/02422 ,  H01L21/02488 ,  H01L21/02532 ,  H01L21/02672 ,  H01L21/02686 ,  H01L21/67207 ,  H01L21/67213 ,  H01L29/66757 ,  H01L27/1296 ,  Y10S438/905 ,  Y10S438/906

摘要： A laser-annealing method includes the steps of a first step of cleaning a non-monocrystal silicon film formed on a substrate, and a second step of laser-annealing the non-monocrystal silicon film in an atmosphere containing oxygen therein, wherein the first and second steps are conducted continuously without being exposed to the air. Also, a laser-annealing device includes a cleaning chamber, and a laser irradiation chamber, wherein a substrate to be processed is transported between the cleaning chamber and the laser irradiation chamber without being exposed to the air.

公开(公告)号：US07041580B2

公开(公告)日：2006-05-09

申请号：US10025322

申请日：2001-12-18

申请人： Naoto Kusumoto ,  Toru Takayama ,  Masato Yonezawa

发明人： Naoto Kusumoto ,  Toru Takayama ,  Masato Yonezawa

IPC分类号： H01L21/20

CPC分类号： H01L21/67167 ,  H01L21/02068 ,  H01L21/02422 ,  H01L21/02488 ,  H01L21/02532 ,  H01L21/02672 ,  H01L21/02686 ,  H01L21/67207 ,  H01L21/67213 ,  H01L27/1296 ,  H01L29/66757 ,  Y10S438/905 ,  Y10S438/906

摘要： A laser-annealing method includes the steps of a first step of cleaning a non-monocrystal silicon film formed on a substrate, and a second step of laser-annealing the non-monocrystal silicon film in an atmosphere containing oxygen therein, wherein the first and second steps are conducted continuously without being exposed to the air. Also, a laser-annealing device includes a cleaning chamber, and a laser irradiation chamber, wherein a substrate to be processed is transported between the cleaning chamber and the laser irradiation chamber without being exposed to the air.

公开(公告)号：US06827787B2

公开(公告)日：2004-12-07

申请号：US09777280

申请日：2001-02-05

申请人： Masato Yonezawa ,  Naoto Kusumoto ,  Hisato Shinohara

发明人： Masato Yonezawa ,  Naoto Kusumoto ,  Hisato Shinohara

IPC分类号： C23C1600

CPC分类号： C23C16/545

摘要： With a conventional cylindrical can method, a region used as a film formation ground electrode is a portion of the cylindrical can, and an apparatus becomes larger in size in proportion to the surface area of the electrode. A conveyor device and a film formation apparatus having the conveyor device are provided, which have a unit for continuously conveying a flexible substrate from one end to the other end, and which are characterized in that a plurality of cylindrical rollers are provided between the one end and the other end along an arc with a radius R, the cylindrical rollers being arranged such that their center axes run parallel to each other, and that a mechanism for conveying the flexible substrate while the substrate is in contact with each of the plurality of cylindrical rollers is provided.

摘要翻译： 采用常规的圆筒罐法，用作成膜接地电极的区域是圆筒形罐的一部分，并且设备的尺寸与电极的表面积成比例变大。 本发明提供一种具有输送装置的输送装置和成膜装置，其具有从一端向另一端连续输送柔性基板的单元，其特征在于，在一端 并且另一端沿着具有半径R的圆弧，所述圆柱滚子被布置成使得它们的中心轴彼此平行地延伸;以及用于在所述基板与所述多个圆柱体中的每一个接触的同时传送所述柔性基板的机构 提供滚筒。

公开(公告)号：US20050061246A1

公开(公告)日：2005-03-24

申请号：US10981582

申请日：2004-11-05

申请人： Masato Yonezawa ,  Naoto Kusumoto ,  Hisato Shinohara

发明人： Masato Yonezawa ,  Naoto Kusumoto ,  Hisato Shinohara

IPC分类号： C23C16/505 ,  C23C16/00 ,  C23C16/54 ,  H01L21/205 ,  H01L21/677 ,  H01L31/04

CPC分类号： C23C16/545

摘要： With a conventional cylindrical can method, a region used as a film formation ground electrode is a portion of the cylindrical can, and an apparatus becomes larger in size in proportion to the surface area of the electrode. A conveyor device and a film formation apparatus having the conveyor device are provided, which have a unit for continuously conveying a flexible substrate from one end to the other end, and which are characterized in that a plurality of cylindrical rollers are provided between the one end and the other end along an arc with a radius R, the cylindrical rollers being arranged such that their center axes run parallel to each other, and that a mechanism for conveying the flexible substrate while the substrate is in contact with each of the plurality of cylindrical rollers is provided.

公开(公告)号：US07510901B2

公开(公告)日：2009-03-31

申请号：US11157925

申请日：2005-06-22

申请人： Masato Yonezawa ,  Naoto Kusumoto ,  Hisato Shinohara

发明人： Masato Yonezawa ,  Naoto Kusumoto ,  Hisato Shinohara

IPC分类号： H01L21/00

CPC分类号： C23C16/545

摘要： With a conventional cylindrical can method, a region used as a film formation ground electrode is a portion of the cylindrical can, and an apparatus becomes larger in size in proportion to the surface area of the electrode. A conveyor device and a film formation apparatus having the conveyor device are provided, which have a unit for continuously conveying a flexible substrate from one end to the other end, and which are characterized in that a plurality of cylindrical rollers are provided between the one end and the other end along an arc with a radius R, the cylindrical rollers being arranged such that their center axes run parallel to each other, and that a mechanism for conveying the flexible substrate while the substrate is in contact with each of the plurality of cylindrical rollers is provided.

摘要翻译： 采用常规的圆筒罐法，用作成膜接地电极的区域是圆筒形罐的一部分，并且设备的尺寸与电极的表面积成比例变大。 本发明提供一种具有输送装置的输送装置和成膜装置，其具有从一端向另一端连续输送柔性基板的单元，其特征在于，在一端 并且另一端沿着具有半径R的圆弧，所述圆柱滚子被布置成使得它们的中心轴彼此平行地延伸;以及用于在所述基板与所述多个圆柱体中的每一个接触的同时传送所述柔性基板的机构 提供滚筒。

公开(公告)号：US06620288B2

公开(公告)日：2003-09-16

申请号：US09812327

申请日：2001-03-19

申请人： Hisato Shinohara ,  Naoto Kusumoto ,  Masato Yonezawa

发明人： Hisato Shinohara ,  Naoto Kusumoto ,  Masato Yonezawa

IPC分类号： H01L21306

CPC分类号： H01L21/67017 ,  C23C14/562 ,  C23C16/545 ,  H01J37/32458 ,  H01J37/34

摘要： In the substrate treatment apparatus including substrate treatment chambers (301 and 303) and a buffer chamber (302) having an exhaust system (306b) independent of the substrate treatment chambers, connection tubes (304a and 304b) are provided between the substrate treatment chambers and the buffer chamber, and gas inlets are respectively provided for the connection tubes. A gas (308) for treating a substrate flows from the connection tube (304a) into the substrate treatment chamber (301) and the buffer chamber (302), while a gas (309) for treating a substrate flows from the connection tube (304b) into the substrate treatment chamber (303) and the buffer chamber (302). Accordingly, the gas does not move from the substrate treatment chamber to the buffer chamber against a gas flow, thereby allowing the separation between ambiences.