X-ray fluorescence apparatus
    1.
    发明授权
    X-ray fluorescence apparatus 有权
    X射线荧光装置

    公开(公告)号:US06711234B1

    公开(公告)日:2004-03-23

    申请号:US10130586

    申请日:2002-05-16

    IPC分类号: G21K106

    CPC分类号: G01N23/223 G01N2223/076

    摘要: This invention relates to a portable apparatus for carrying out X-ray fluorescence spectrometry on specimen materials at a distance from the apparatus. The apparatus comprises an X-ray generating tube, such as a microfocus tube, and two paraboloidal X-ray reflecting mirrors. The first collecting mirror is positioned in close coupled arrangement adjacent to the exit window of the tube, such that it emits parallel X-ray radiation to the second focusing mirror, which is aligned on the axis of and spaced apart from the first mirror (11). The second mirror (12) collects the parallel X-ray radiation at its end closest to the first mirror and emits X-ray radiation in a focused beam onto the specimen. The distance between the first and second mirrors is adjusted to suit the distance from the X-ray tube to the specimen. Focal spots on the specimen of diameter less than 15 microns (590.55 microinches) are possible, enabling precise analysis of small areas of the specimen.

    摘要翻译: 本发明涉及一种便携式设备,用于在远离设备的样本材料上进行X射线荧光光谱测定。 该装置包括诸如微焦点管的X射线产生管和两个抛物面X射线反射镜。 第一收集镜被定位成与管的出射窗口相邻的紧密耦合布置,使得它将平行的X射线辐射发射到第二聚焦镜,第二聚焦镜在第一反射镜(11)的轴线上并与之隔开 )。 第二反射镜(12)在最靠近第一反射镜的端部收集平行X射线辐射,并将聚焦光束中的X射线辐射发射到样品上。 调整第一和第二反射镜之间的距离以适应从X射线管到样本的距离。 直径小于15微米(590.55微英寸)的样品上的焦点是可能的,可以精确分析样品的小面积。

    Soller slit using low density materials
    2.
    发明授权
    Soller slit using low density materials 有权
    Soller狭缝使用低密度材料

    公开(公告)号:US07127037B2

    公开(公告)日:2006-10-24

    申请号:US10626630

    申请日:2003-07-25

    IPC分类号: G21K1/02 G01N23/20

    CPC分类号: G21K1/025

    摘要: A Soller slit device is provided for collimation of high energy radiation, such as X-ray or EUV radiation, and has a low angle of divergence (less than 0.1°) and a high transmission efficiency (60 to 80% or greater). The Soller slit is made up of multiple, parallel blades of low-density material, such as glass, mica, or the like, which can be treated to reduce reflectivity. The Soller slit device of the invention advantageously provides an increased peak intensity and decreased peak width in diffraction patterns produced in high energy diffractometry applications, such as X-ray diffractometry.

    摘要翻译: 提供了Soller狭缝装置,用于准直诸如X射线或EUV辐射的高能量辐射,并且具有低的发散角(小于0.1°)和高的透射效率(60-80%或更大)。 索勒狭缝由多个平行的低密度材料叶片组成,例如玻璃,云母等,可被处理以降低反射率。 本发明的Soller狭缝装置有利地提供了在高能量衍射应用(例如X射线衍射)中产生的衍射图中增加的峰强度和降低的峰宽。

    X-ray topographic system
    3.
    发明授权
    X-ray topographic system 有权
    X光地形系统

    公开(公告)号:US06782076B2

    公开(公告)日:2004-08-24

    申请号:US10004785

    申请日:2001-12-07

    IPC分类号: G01N23207

    CPC分类号: G01N23/207

    摘要: An X-ray topographic system comprises an X-ray generator producing a beam of X-rays impinging on a limited area of a sample such as a silicon wafer. A solid state detector is positioned to intercept the beam after transmission through or reflection from the sample. The detector has an array of pixels matching the beam area to produce a digital image of said limited area. Relative stepping motion between the X-ray generator and the sample produces a series of digital images which are combined together. In optional embodiments, an X-ray optic is interposed to produce a parallel beam to avoid image doubling, or the effect of image doubling is removed by software.

    摘要翻译: X射线地形系统包括产生一个X射线束的X射线发生器,该X射线发射器照射在例如硅晶片的样品的有限区域上。 固态检测器被定位成在通过样品或从样品反射之后拦截光束。 检测器具有与波束区域匹配的像素阵列,以产生所述有限区域的数字图像。 X射线发生器和样品之间的相对步进运动产生一系列数字图像,它们组合在一起。 在可选实施例中,插入X射线光学器件以产生平行光束以避免图像加倍,或者通过软件去除图像倍增的影响。

    Multi-foil optic
    4.
    发明授权
    Multi-foil optic 有权
    多箔光学

    公开(公告)号:US06881965B2

    公开(公告)日:2005-04-19

    申请号:US10627863

    申请日:2003-07-28

    摘要: The invention provides a miniaturized multi-foil object for use in a laboratory environment and other practical applications that require small or portable and/or disposable high energy radiation optics. Specifically, the invention finds utility in high energy lithographic systems, such as X-ray or EUV lithography, as a condenser optic or in topographic systems. In lithographic systems, the present invention exhibits square symmetry, a relatively large aperture size, and disposability. Additionally, the multi-foil optic of the invention provides a high throughput efficiency.

    摘要翻译: 本发明提供了一种在实验室环境中使用的小型化多箔物体和需要小型或便携式和/或一次性高能辐射光学器件的其它实际应用。 具体地说,本发明可用于诸如X射线或EUV光刻的高能光刻系统中,作为聚光镜或地形系统。 在平版印刷系统中,本发明具有方形对称性,相对较大的孔径尺寸和可处理性。 另外,本发明的多箔光学器件提供高通量效率。

    Slotted support for x-ray focusing mirrors
    5.
    发明授权
    Slotted support for x-ray focusing mirrors 失效
    针对X射线聚焦镜的开槽支撑

    公开(公告)号:US5893549A

    公开(公告)日:1999-04-13

    申请号:US754195

    申请日:1996-11-27

    IPC分类号: G02B7/182 G21K5/08 G02B5/30

    摘要: Mirror support means having a metal block machined with a first pair of slots shaped to receive a first pair of curved mirrors and a second pair of slots shaped to receive a second pair of curved mirrors. The block is sufficiently resiliently deformable to enable the slots to be widened to receive the mirrors and then for the mirrors to be clamped in position, the slots being accurately machined so that the mirrors are bent into their required forms of curvature. The use of a unitary block simplifies the construction and setting up of the support means for the mirrors.

    摘要翻译: 镜支撑装置具有加工有第一对槽的金属块,该第一对槽成形为接收第一对曲面镜和成形为接收第二对曲面镜的第二对槽。 该块具有足够的可弹性变形以使狭槽能够加宽以接收反射镜,然后为了使镜子被夹紧就位,槽被精确加工,使得镜子被弯曲成其所需的曲率形式。 使用单一块可简化镜子支撑装置的结构和设置。

    Optical device
    6.
    发明申请
    Optical device 审中-公开
    光学装置

    公开(公告)号:US20060056597A1

    公开(公告)日:2006-03-16

    申请号:US10522496

    申请日:2003-07-28

    IPC分类号: G21K1/00

    摘要: A pipe coupling flange (16) comprising a central bore and having first and second ports for receiving valves and a plurality of channels, wherein a take-off channel links the first port with the central bore, a feed channel links the first port directly or indirectly with the second port; and wherein the second port links directly or indirectly with the exterior of the flange. Across two pipe flanges (16), and fixed directly to the periphery of each flange there may be a Bridge (30). The bridge (30) may be capable of having process media (24) monitoring devices fixed directly to it.

    摘要翻译: 一种管接头法兰(16),其包括中心孔并具有用于接收阀和多个通道的第一和第二端口,其中,引出通道将第一端口与中心孔连接,进料通道将第一端口直接连接或 间接与第二个港口; 并且其中所述第二端口直接或间接地连接到所述凸缘的外部。 横跨两个管道法兰(16),并直接固定在每个法兰的周边,可能有一个桥(30)。 桥(30)可能能够具有直接固定到其上的监控装置的处理介质(24)。

    X-ray focusing apparatus
    7.
    发明授权
    X-ray focusing apparatus 有权
    X射线聚焦装置

    公开(公告)号:US06504901B1

    公开(公告)日:2003-01-07

    申请号:US09744367

    申请日:2001-03-16

    IPC分类号: G21K106

    CPC分类号: G21K1/06

    摘要: An X-ray focusing apparatus comprises a waveguide (3) closely coupled to an X-ray focusing mirror (5). The mirror comprises an interior reflecting surface having a rotational axis of symmetry. The waveguide may comprise a tapered polycapillary lens.

    摘要翻译: X射线聚焦装置包括紧密耦合到X射线聚焦镜(5)的波导(3)。 反射镜包括具有旋转对称轴线的内部反射表面。 波导可以包括锥形多毛细透镜。

    Soller slit using low density materials
    8.
    发明申请
    Soller slit using low density materials 审中-公开
    Soller狭缝使用低密度材料

    公开(公告)号:US20050281382A1

    公开(公告)日:2005-12-22

    申请号:US10522495

    申请日:2003-07-28

    IPC分类号: G01N23/20 G21K1/02

    CPC分类号: G21K1/025

    摘要: A Soller slit device is provided for collimation of high energy radiation, such as X-ray or EUV radiation, and has a low angle of divergence (less than 0.1°) and a high transmission efficiency (60 to 80% or greater). The Soller slit is made up of multiple blades of low-density material, such as glass, mica, or the like, which are treated to reduce reflectivity. The Soller slit device of the invention advantageously provides an increased peak intensity and decreased peak width in diffraction patterns produced in high energy diffractometry applications, such as X-ray diffractometry.

    摘要翻译: 提供了Soller狭缝装置,用于准直诸如X射线或EUV辐射的高能量辐射,并且具有低的发散角(小于0.1°)和高的透射效率(60-80%或更大)。 Soller狭缝由多个低密度材料叶片组成,例如玻璃,云母等,经过处理以降低反射率。 本发明的Soller狭缝装置有利地提供了在高能量衍射应用(例如X射线衍射)中产生的衍射图中增加的峰强度和降低的峰宽。