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12 条记录 (耗时 0.028 秒)

    Photoresist composition
    1.
    发明授权
    Photoresist composition 失效
    光刻胶组成

    公开(公告)号：US5846688A

    公开(公告)日：1998-12-08

    申请号：US644203

    申请日：1996-05-10

    申请人： Nobuhito Fukui ,  Yuji Ueda ,  Naoki Takeyama ,  Takehiro Kusumoto ,  Yuko Yako ,  Shigeki Yamamoto

    发明人： Nobuhito Fukui ,  Yuji Ueda ,  Naoki Takeyama ,  Takehiro Kusumoto ,  Yuko Yako ,  Shigeki Yamamoto

    IPC分类号： G03F7/004 ,  G03F7/039

    CPC分类号： G03F7/0045 ,  G03F7/039 ,  Y10S430/121

    摘要： A positive-working photoresist composition which exhibits a high sensitivity and a high resolution in addition to excellent characteristics such as heat resistance, film retention ratio, coatability and profile; which comprises an alkali-soluble resin comprising a polyvinylphenol resin which is polyvinylphenol and/or its partially hydrogenated product in which the phenolic hydroxyl groups are partially alkyletherified and partially protected; and a sulfonate of a N-hydroxyimide compound as an acid generator.

    摘要翻译： 除了耐热性，保持率，涂布性和轮廓等优异特性外，还具有高灵敏度和高分辨率的正性光致抗蚀剂组合物。 其包含碱溶性树脂，其包含聚乙烯基苯酚树脂，其是聚乙烯基苯酚和/或其部分氢化的产物，其中酚羟基部分被烷基醚化并部分保护; 和作为酸发生剂的N-羟基酰亚胺化合物的磺酸盐。

    Positive photoresist composition
    4.
    发明授权
    Positive photoresist composition 失效
    正光致抗蚀剂组合物

    公开(公告)号：US5800966A

    公开(公告)日：1998-09-01

    申请号：US44487

    申请日：1993-04-09

    申请人： Yuji Ueda ,  Naoki Takeyama ,  Hiromi Ueki ,  Takehiro Kusumoto

    发明人： Yuji Ueda ,  Naoki Takeyama ,  Hiromi Ueki ,  Takehiro Kusumoto

    IPC分类号： G03F7/004 ,  G03F7/023 ,  G03C1/725

    CPC分类号： G03F7/0045 ,  G03F7/0236

    摘要： This invention provides a positive photoresist composition comprising an alkali-soluble resin, a dissolution inhibitor and a photo-induced acid precursor, wherein said alkali-soluble resin is obtainable through a condensation reaction of a compound represented by the general formula (I): ##STR1## wherein R.sub.1 to R.sub.9 each represent hydrogen atom, halogen atom, alkyl group, alkenyl group, --OH group or the like, provided that at least one of R.sub.1 to R.sub.9 is --OH group and at least two hydrogen atoms are attached to the o- or p-position of the --OH group, and an aldehyde. This positive photoresist composition is excellent in performances such as resolution, profile, sensitivity, etc.

    摘要翻译： 本发明提供一种正型光致抗蚀剂组合物，其包含碱溶性树脂，溶解抑制剂和光诱导酸前体，其中所述碱溶性树脂可通过通式（I）表示的化合物的缩合反应获得： 其中，R 1〜R 9分别表示氢原子，卤素原子，烷基，链烯基，-OH基等，但如果R 1〜R 9中的至少一个为-OH基且至少2个氢原子为 连接到-OH基团的邻位或对位，和醛。 该正性光致抗蚀剂组合物的分辨率，外形，灵敏度等性能优异。

    Photoresist composition containing alkyletherified polyvinylphenol
    5.
    发明授权
    Photoresist composition containing alkyletherified polyvinylphenol 失效
    含有烷基醚化聚乙烯基苯酚的光刻胶组合物

    公开(公告)号：US5585218A

    公开(公告)日：1996-12-17

    申请号：US249237

    申请日：1994-05-25

    申请人： Yuko Nakano ,  Naoki Takeyama ,  Yuji Ueda ,  Takehiro Kusumoto ,  Hiromi Oka

    发明人： Yuko Nakano ,  Naoki Takeyama ,  Yuji Ueda ,  Takehiro Kusumoto ,  Hiromi Oka

    IPC分类号： G03F7/004 ,  G03C1/73

    CPC分类号： G03F7/0045 ,  Y10S430/121 ,  Y10S430/122 ,  Y10S430/125

    摘要： A negative or positive photoresist composition which comprises an alkali soluble resin containing at least one resin selected from the group consisting of a partially alkyletherified polyvinylphenol and a partially alkyletherified hydrogenated polyvinylphenol, a photo-induced acid precursor containing at least a kind of sulfonic acid ester of N-hydroxyimide compounds and crosslinking agent or dissolution inhibitor, and this photoresist composition is excellent in various properties such as heat resistance, film thickness retention, coating property, profile and the like, and further exhibits high sensitivity and high resolution when far ultraviolet rays including excimer laser is used as the light source. It also hardly cause a scam during the developing process.

    摘要翻译： 一种负性或正性光致抗蚀剂组合物，其包含含有至少一种选自部分烷基醚化的聚乙烯基苯酚和部分烷基醚化的氢化聚乙烯基苯酚的碱溶性树脂，光致酸性前体，其含有至少一种磺酸酯 N-羟基酰亚胺化合物和交联剂或溶解抑制剂，该光致抗蚀剂组合物在耐热性，膜厚保持性，涂布性，轮廓等各种性能方面优异，并且当远紫外线包括 准分子激光器被用作光源。 在开发过程中也不会造成骗局。

    Negative photoresist composition
    6.
    发明授权
    Negative photoresist composition 失效
    负光致抗蚀剂组合物

    公开(公告)号：US5304456A

    公开(公告)日：1994-04-19

    申请号：US827423

    申请日：1992-01-29

    申请人： Yuji Ueda ,  Hiromi Ueki ,  Naoki Takeyama ,  Takehiro Kusumoto

    发明人： Yuji Ueda ,  Hiromi Ueki ,  Naoki Takeyama ,  Takehiro Kusumoto

    IPC分类号： G03F7/004 ,  G03F7/038 ,  C08L61/10 ,  C08L61/28 ,  C08L61/34

    CPC分类号： G03F7/038 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/115 ,  Y10S430/122

    摘要： A negative photoresist composition containing an alkali-soluble resin which is obtainable through a condensation reaction of an aldehyde with a phenol compound containing a compound of the general formula: ##STR1## wherein R.sup.1 to R.sup.9 are independently a hydrogen atom, an alkyl group, an alkenyl group, an alkylcarbonyl group, a halogen atom or a hydroxyl group, provided that at least one of R.sup.1 to R.sup.9 is a hydroxyl group and, at the ortho- or para-position to the hydroxyl group, at least two hydrogen atoms are present; a cross linking agent; and a photo-acid generator, and a negative photoresist composition comprising an alkali-soluble resin, a cross linking agent and a photo-acid generator having a trifluoromethanesulfonic acid ester group, which can increase resolution and contrast of a photoresist pattern.

    摘要翻译： 含有碱溶性树脂的负性光致抗蚀剂组合物，其通过醛与含有下列通式化合物的酚化合物的缩合反应获得：（*化学结构*）（1）其中R1至R9独立地为氢原子 ，烷基，烯基，烷基羰基，卤素原子或羟基，条件是R 1至R 9中的至少一个是羟基，并且在羟基的邻位或对位，在 存在至少两个氢原子; 交联剂; 和光酸产生剂，以及含有碱溶性树脂，交联剂和具有三氟甲磺酸酯基的光酸发生剂的负性光致抗蚀剂组合物，其可以增加光致抗蚀剂图案的分辨率和对比度。

    Negative type resist composition
    9.
    发明授权
    Negative type resist composition 有权
    负型抗蚀剂组合物

    公开(公告)号：US06329119B1

    公开(公告)日：2001-12-11

    申请号：US09559646

    申请日：2000-04-28

    申请人： Masumi Suetsugu ,  Takehiro Kusumoto ,  Naoki Takeyama ,  Masanori Shinada

    发明人： Masumi Suetsugu ,  Takehiro Kusumoto ,  Naoki Takeyama ,  Masanori Shinada

    IPC分类号： G03F7004

    CPC分类号： G03F7/038 ,  C08F8/30 ,  C08F12/26 ,  C08F293/005 ,  C08F297/02 ,  C08F297/026 ,  C08L53/00 ,  G03F7/0045 ,  Y10S430/122 ,  C08F12/24 ,  C08L2666/02

    摘要： A negative type resist composition is provided, which provides excellent resolution, satisfactory profile and outstanding process stability: is suitable for exposure using deep ultra violet ray; and comprises alkali soluble resin, acid generator, crosslinking agent, and a basic compound represented by the following formula (I) wherein, A represents bivalent aliphatic hydrocarbon residue which may be optionally interrupted by imino group, sulfide group, or disulfide group, X represents nitrogen atom or C(NH2), and R1 and R2 independently represent hydrogen or alkyl.

    摘要翻译： 提供负型抗蚀剂组合物，提供优异的分辨率，令人满意的轮廓和出色的工艺稳定性：适用于使用深紫外线的曝光; 并且包含碱溶性树脂，酸产生剂，交联剂和由下式（I）表示的碱性化合物，其中A表示可以任选地被亚氨基，硫醚基或二硫键中断的二价脂族烃残基，X表示 氮原子或C（NH 2），并且R 1和R 2独立地表示氢或烷基。