公开(公告)号：US09783911B2

公开(公告)日：2017-10-10

申请号：US14410969

申请日：2013-07-15

申请人： Nobuyoshi Yashiro ,  Kazuhito Kamei ,  Kazuhiko Kusunoki ,  Nobuhiro Okada ,  Koji Moriguchi ,  Hironori Daikoku ,  Hidemitsu Sakamoto ,  Motohisa Kado

发明人： Nobuyoshi Yashiro ,  Kazuhito Kamei ,  Kazuhiko Kusunoki ,  Nobuhiro Okada ,  Koji Moriguchi ,  Hironori Daikoku ,  Hidemitsu Sakamoto ,  Motohisa Kado

IPC分类号： C30B19/02 ,  C30B15/10 ,  C30B19/04 ,  C30B19/06 ,  C30B29/36 ,  C30B15/32

CPC分类号： C30B15/10 ,  C30B15/32 ,  C30B19/04 ,  C30B19/067 ,  C30B29/36 ,  Y10T117/1032

摘要： A production apparatus is used for a solution growth method. The production apparatus includes a seed shaft and a crucible. The seed shaft has a lower end surface to which an SiC seed crystal is attached. The crucible contains an SiC solution. The crucible includes a cylindrical portion, a bottom portion, and an inner lid. The bottom portion is disposed at a lower end of the cylindrical portion. The inner lid is disposed in the cylindrical portion. The inner lid has a through hole and is positioned below a liquid surface of the SiC solution when the SiC solution is contained in the crucible.

公开(公告)号：US09702056B2

公开(公告)日：2017-07-11

申请号：US14126942

申请日：2012-06-11

申请人： Kazuhito Kamei ,  Kazuhiko Kusunoki ,  Nobuyoshi Yashiro ,  Nobuhiro Okada ,  Hironori Daikoku ,  Motohisa Kado ,  Hidemitsu Sakamoto

发明人： Kazuhito Kamei ,  Kazuhiko Kusunoki ,  Nobuyoshi Yashiro ,  Nobuhiro Okada ,  Hironori Daikoku ,  Motohisa Kado ,  Hidemitsu Sakamoto

IPC分类号： C30B15/10 ,  C30B35/00 ,  C30B19/02 ,  C30B29/36 ,  C30B17/00 ,  C30B19/08

CPC分类号： C30B15/10 ,  C30B17/00 ,  C30B19/02 ,  C30B19/08 ,  C30B29/36 ,  C30B35/00 ,  Y10T117/1032

摘要： A region of an SiC solution in the vicinity of an SiC seed crystal is cooled while suppressing the temperature variation in a peripheral region of the SiC solution. An apparatus includes a seed shaft and a crucible for an SiC solution. The seed shaft has a lower end surface for attachment to an SiC seed crystal. The crucible comprises a main body, an intermediate cover, and a top cover. The main body includes a first cylindrical portion and a bottom portion at a lower end portion of the first cylindrical portion. The intermediate cover is within the first cylindrical portion and above the liquid level of the SiC solution in the main body. The intermediate cover has a first through hole for the seed shaft. The top cover is disposed above the intermediate cover and has a second through hole for the seed shaft to pass through.

公开(公告)号：US09388508B2

公开(公告)日：2016-07-12

申请号：US13997766

申请日：2011-12-26

申请人： Kazuhito Kamei ,  Kazuhiko Kusunoki ,  Nobuyoshi Yashiro ,  Nobuhiro Okada ,  Motohisa Kado ,  Hidemitsu Sakamoto ,  Hironori Daikoku

发明人： Kazuhito Kamei ,  Kazuhiko Kusunoki ,  Nobuyoshi Yashiro ,  Nobuhiro Okada ,  Motohisa Kado ,  Hidemitsu Sakamoto ,  Hironori Daikoku

IPC分类号： C30B11/04 ,  C30B15/32 ,  C30B19/06 ,  C30B29/36

CPC分类号： C30B15/32 ,  C30B19/06 ,  C30B29/36 ,  Y10T117/1032 ,  Y10T117/1072

摘要： A manufacturing apparatus of a SiC single crystal which can suppress the generation of a polycrystal is provided. A jig (41) and a crucible (6) are accommodated in a chamber (1). A SiC solution (8) is housed in the crucible (6). The jig (41) includes a seed shaft (411) and a cover member (412). The seed shaft (411) can move up and down, and a SiC seed crystal (9) is attached to the lower surface thereof. The cover member (412) is attached to the lower end portion of the seed shaft (411). The cover member (412) is a housing which has an opening at its lower end, wherein the lower end portion of the seed shaft (411) is disposed in the cover member (412).

摘要翻译： 提供了可以抑制多晶体的产生的SiC单晶的制造装置。 夹具（41）和坩埚（6）容纳在腔室（1）中。 将SiC溶液（8）容纳在坩埚（6）中。 夹具（41）包括种子轴（411）和盖构件（412）。 种子轴（411）可以上下移动，并且其SiC晶种（9）附着到其下表面。 盖构件（412）附接到种子轴（411）的下端部。 盖构件（412）是在其下端具有开口的壳体，其中种子轴（411）的下端部设置在盖构件（412）中。

公开(公告)号：US20130305981A1

公开(公告)日：2013-11-21

申请号：US13997766

申请日：2011-12-26

申请人： Kazuhito Kamei ,  Kazuhiko Kusunoki ,  Nobuyoshi Yashiro ,  Nobuhiro Okada ,  Motohisa Kado ,  Hidemitsu Sakamoto ,  Hironori Daikoku

发明人： Kazuhito Kamei ,  Kazuhiko Kusunoki ,  Nobuyoshi Yashiro ,  Nobuhiro Okada ,  Motohisa Kado ,  Hidemitsu Sakamoto ,  Hironori Daikoku

IPC分类号： C30B15/32

CPC分类号： C30B15/32 ,  C30B19/06 ,  C30B29/36 ,  Y10T117/1032 ,  Y10T117/1072

摘要： A manufacturing apparatus of a SiC single crystal which can suppress the generation of a polycrystal is provided. A jig (41) and a crucible (6) are accommodated in a chamber (1). A SiC solution (8) is housed in the crucible (6). The jig (41) includes a seed shaft (411) and a cover member (412). The seed shaft (411) can move up and down, and a SiC seed crystal (9) is attached to the lower surface thereof. The cover member (412) is attached to the lower end portion of the seed shaft (411). The cover member (412) is a housing which has an opening at its lower end, wherein the lower end portion of the seed shaft (411) is disposed in the cover member (412).

摘要翻译： 提供了可以抑制多晶体的产生的SiC单晶的制造装置。 夹具（41）和坩埚（6）容纳在腔室（1）中。 将SiC溶液（8）容纳在坩埚（6）中。 夹具（41）包括种子轴（411）和盖构件（412）。 种子轴（411）可以上下移动，并且其SiC晶种（9）附着到其下表面。 盖构件（412）附接到种子轴（411）的下端部。 盖构件（412）是在其下端具有开口的壳体，其中种子轴（411）的下端部设置在盖构件（412）中。

公开(公告)号：US09732441B2

公开(公告)日：2017-08-15

申请号：US14125625

申请日：2012-06-15

申请人： Kazuhiko Kusunoki ,  Kazuhito Kamei ,  Nobuyoshi Yashiro ,  Nobuhiro Okada ,  Hironori Daikoku ,  Motohisa Kado ,  Hidemitsu Sakamoto

发明人： Kazuhiko Kusunoki ,  Kazuhito Kamei ,  Nobuyoshi Yashiro ,  Nobuhiro Okada ,  Hironori Daikoku ,  Motohisa Kado ,  Hidemitsu Sakamoto

IPC分类号： C30B9/00 ,  C30B35/00 ,  C30B9/10 ,  C30B29/36 ,  C30B15/32 ,  C30B17/00 ,  C30B11/00 ,  C30B19/06 ,  C30B19/08

CPC分类号： C30B35/00 ,  C30B9/10 ,  C30B11/003 ,  C30B15/32 ,  C30B17/00 ,  C30B19/068 ,  C30B19/08 ,  C30B29/36 ,  Y10T117/1068 ,  Y10T117/1092

摘要： An apparatus for producing an SiC single crystal includes a crucible for accommodating an Si—C solution and a seed shaft having a lower end surface where an SiC seed crystal (36) would be attached. The seed shaft includes an inner pipe that extends in a height direction of the crucible and has a first passage. An outer pipe accommodates the inner pipe and constitutes a second passage between itself and the inner pipe and has a bottom portion whose lower end surface covers a lower end opening of the outer pipe. One passage of the first and second passages serves as an introduction passage where coolant gas flows downward, and the other passage serves as a discharge passage where coolant gas flows upward. A region inside the pipe that constitutes the introduction passage is to be overlapped by a region of not less than 60% of the SiC seed crystal.

公开(公告)号：US09617655B2

公开(公告)日：2017-04-11

申请号：US13997722

申请日：2011-12-26

申请人： Nobuhiro Okada ,  Kazuhito Kamei ,  Kazuhiko Kusunoki ,  Nobuyoshi Yashiro ,  Kouji Moriguchi ,  Hironori Daikoku ,  Hiroshi Suzuki ,  Tomokazu Ishii ,  Hidemitsu Sakamoto ,  Motohisa Kado ,  Yoichiro Kawai

发明人： Nobuhiro Okada ,  Kazuhito Kamei ,  Kazuhiko Kusunoki ,  Nobuyoshi Yashiro ,  Kouji Moriguchi ,  Hironori Daikoku ,  Hiroshi Suzuki ,  Tomokazu Ishii ,  Hidemitsu Sakamoto ,  Motohisa Kado ,  Yoichiro Kawai

IPC分类号： C30B15/20 ,  C30B29/36 ,  C30B15/14 ,  C30B17/00 ,  C30B15/30

CPC分类号： C30B15/20 ,  C30B15/14 ,  C30B15/30 ,  C30B15/305 ,  C30B17/00 ,  C30B29/36 ,  Y10T117/1068

摘要： An apparatus for SIC single crystal has an induction heating control unit such that frequency f (Hz) of alternating current to the induction heating unit satisfies Formula (1); D1 (mm) is permeation depth of electromagnetic waves into a crucible side wall by the heating unit, D2 (mm) is permeation depth of electromagnetic waves into a SIC solution, T (mm) is thickness of the crucible side wall of the crucible, and R (mm) is crucible inner radius: (D1−T)×D2/R>1.5  (1) where, D1 is defined by Formula (2) and D2 by Formula (3): D1=503292×(1/(f×σc×μc))1/2  (2) D2=503292×(1/(f×σs×μs))1/2  (3); σc is electric conductivity (S/m) of the sidewall, σs is electric conductivity (S/m) of the SiC solution; μc is relative permeability of the sidewall, and μs is relative permeability of the SIC solution.

公开(公告)号：US20140116324A1

公开(公告)日：2014-05-01

申请号：US14125625

申请日：2012-06-15

申请人： Kazuhiko Kusunoki ,  Kazuhito Kamei ,  Nobuyoshi Yashiro ,  Nobuhiro Okada ,  Hironori Daikoku ,  Motohisa Kado ,  Hidemitsu Sakamoto

发明人： Kazuhiko Kusunoki ,  Kazuhito Kamei ,  Nobuyoshi Yashiro ,  Nobuhiro Okada ,  Hironori Daikoku ,  Motohisa Kado ,  Hidemitsu Sakamoto

IPC分类号： C30B35/00 ,  C30B11/00 ,  C30B15/32

CPC分类号： C30B35/00 ,  C30B9/10 ,  C30B11/003 ,  C30B15/32 ,  C30B17/00 ,  C30B19/068 ,  C30B19/08 ,  C30B29/36 ,  Y10T117/1068 ,  Y10T117/1092

摘要： An apparatus for producing an SiC single crystal includes a crucible for accommodating an Si—C solution and a seed shaft having a lower end surface where an SiC seed crystal (36) would be attached. The seed shaft includes an inner pipe that extends in a height direction of the crucible and has a first passage. An outer pipe accommodates the inner pipe and constitutes a second passage between itself and the inner pipe and has a bottom portion whose lower end surface covers a lower end opening of the outer pipe. One passage of the first and second passages serves as an introduction passage where coolant gas flows downward, and the other passage serves as a discharge passage where coolant gas flows upward. A region inside the pipe that constitutes the introduction passage is to be overlapped by a region of not less than 60% of the SiC seed crystal.

摘要翻译： 一种用于制造SiC单晶的装置包括用于容纳Si-C溶液的坩埚和具有附接有SiC晶种（36）的下端面的种子轴。 种子轴包括在坩埚的高度方向上延伸并具有第一通道的内管。 外管容纳内管，构成内管之间的第二通道，下端面覆盖外管下端开口的底部。 第一通道和第二通道的一个通道用作冷却剂气体向下流动的引入通道，另一个通道用作冷却剂气体向上流动的排出通道。 构成引入通道的管内的区域与SiC晶种不小于60％的区域重叠。

公开(公告)号：US20130284083A1

公开(公告)日：2013-10-31

申请号：US13997722

申请日：2011-12-26

申请人： Nobuhiro Okada ,  Kazuhito Kamei ,  Kazuhiko Kasunoki ,  Nobuyoshi Yashiro ,  Kouji Moriguchi ,  Hironori Daikoku ,  Hiroshi Suzuki ,  Tomokazu Ishii ,  Hidemitsu Sakamoto ,  Motohisa Kado ,  Yoichiro Kawai

发明人： Nobuhiro Okada ,  Kazuhito Kamei ,  Kazuhiko Kasunoki ,  Nobuyoshi Yashiro ,  Kouji Moriguchi ,  Hironori Daikoku ,  Hiroshi Suzuki ,  Tomokazu Ishii ,  Hidemitsu Sakamoto ,  Motohisa Kado ,  Yoichiro Kawai

IPC分类号： C30B15/20 ,  C30B15/14 ,  C30B15/30

CPC分类号： C30B15/20 ,  C30B15/14 ,  C30B15/30 ,  C30B15/305 ,  C30B17/00 ,  C30B29/36 ,  Y10T117/1068

摘要： A manufacturing apparatus for SiC single crystal has a control unit to control induction heating such that frequency f (Hz) of alternating current to be passed to the induction heating unit satisfies Formula (1); D1 (mm) is permeation depth of electromagnetic waves into a side wall of a crucible by the heating unit, D2 (mm) is permeation depth of electromagnetic waves into a SiC solution, T (mm) is thickness of the crucible side wall of the crucible, and R (mm) is crucible inner radius: (D1−T)×D2/R>1  (1) where, D1 is defined by Formula (2), and D2 by Formula (3): D1=503292×(1/(f×σc×μc))1/2  (2) D2=503292×(1/(f×σs×μs))1/2  (3); σc is electric conductivity (S/m) of the sidewall, σs is electric conductivity (S/m) of the SiC solution; μc is relative permeability of the sidewall, and μs relative permeability of the SiC solution.

摘要翻译： SiC单晶的制造装置具有用于控制感应加热的控制单元，使得要传递到感应加热单元的交流电流的频率f（Hz）满足公式（1）; D1（mm）是电磁波通过加热单元进入坩埚侧壁的渗透深度，D2（mm）是电磁波向SiC溶液的渗透深度，T（mm）是坩埚侧壁的厚度 坩埚和R（mm）是坩埚内半径：（D1-T）×D2 / R> 1（1）其中，D1由式（2）定义，D2由式（3）定义：D1 = 503292×（ 1 /（f×sigmac×muc））1/2（2）D2 = 503292×（1 /（f×sigmas×mus））1/2（3） sigmac是侧壁的导电率（S / m），sigmas是SiC溶液的导电率（S / m）; 粘液是侧壁的相对渗透率，并且是SiC溶液的相对磁导率。

公开(公告)号：US20140116325A1

公开(公告)日：2014-05-01

申请号：US14126942

申请日：2012-06-11

申请人： Kazuhito Kamei ,  Kazuhiko Kusunoki ,  Nobuyoshi Yashiro ,  Nobuhiro Okada ,  Hironori Daikoku ,  Motohisa Kado ,  Hidamisu Kasamoto

发明人： Kazuhito Kamei ,  Kazuhiko Kusunoki ,  Nobuyoshi Yashiro ,  Nobuhiro Okada ,  Hironori Daikoku ,  Motohisa Kado ,  Hidamisu Kasamoto

IPC分类号： C30B15/10

CPC分类号： C30B15/10 ,  C30B17/00 ,  C30B19/02 ,  C30B19/08 ,  C30B29/36 ,  C30B35/00 ,  Y10T117/1032

摘要： A region of an SiC solution in the vicinity of an SiC seed crystal is cooled while suppressing the temperature variation in a peripheral region of the SiC solution. An apparatus includes a seed shaft and a crucible for an SiC solution. The seed shaft has a lower end surface for attachment to an SiC seed crystal. The crucible comprises a main body, an intermediate cover, and a top cover. The main body includes a first cylindrical portion and a bottom portion at a lower end portion of the first cylindrical portion. The intermediate cover is within the first cylindrical portion and above the liquid level of the SiC solution in the main body. The intermediate cover has a first through hole for the seed shaft. The top cover is disposed above the intermediate cover and has a second through hole for the seed shaft to pass through.

摘要翻译： 在SiC晶种附近的SiC溶液的区域被冷却，同时抑制SiC溶液的周边区域的温度变化。 一种装置包括种子轴和用于SiC溶液的坩埚。 种子轴具有用于连接到SiC晶种的下端表面。 坩埚包括主体，中间盖和顶盖。 主体包括在第一圆筒部的下端部的第一圆筒部和底部。 中间盖在主体内的第一圆柱形部分内和SiC溶液的液面之上。 中间盖具有用于种子轴的第一通孔。 顶盖设置在中间盖的上方，并且具有用于种子轴穿过的第二通孔。

公开(公告)号：US09512540B2

公开(公告)日：2016-12-06

申请号：US13883350

申请日：2011-11-04

申请人： Kazuhiko Kusunoki ,  Kazuhito Kamei ,  Nobuyoshi Yashiro ,  Kouji Moriguchi ,  Nobuhiro Okada ,  Katsunori Danno ,  Hironori Daikoku

发明人： Kazuhiko Kusunoki ,  Kazuhito Kamei ,  Nobuyoshi Yashiro ,  Kouji Moriguchi ,  Nobuhiro Okada ,  Katsunori Danno ,  Hironori Daikoku

IPC分类号： C30B15/20 ,  C30B17/00 ,  C30B19/02 ,  C30B29/36 ,  C30B15/10 ,  C30B15/30 ,  C30B15/36

CPC分类号： C30B15/20 ,  C30B15/10 ,  C30B15/30 ,  C30B15/36 ,  C30B17/00 ,  C30B19/02 ,  C30B29/36

摘要： A method for manufacturing an n-type SiC single crystal, enables the suppression of the variation in nitrogen concentration among a plurality of n-type SiC single crystal ingots manufactured. A method includes the steps of: providing a manufacturing apparatus (100) including a chamber (1) having an area in which a crucible (7) is to be disposed; heating the area in which the crucible (7) is to be disposed and evacuating the gas in the chamber (1); filling, after the evacuation, the chamber (1) with a mixed gas containing a noble gas and nitrogen gas; heating and melting a starting material housed in the crucible (7) disposed in the area to produce a SiC solution (8) containing silicon and carbon; and immersing a SiC seed crystal into the SiC solution under the mixed gas atmosphere to grow an n-type SiC single crystal on the SiC seed crystal.

摘要翻译： 制造n型SiC单晶的方法能够抑制制造的多个n型SiC单晶锭中的氮浓度的变化。 一种方法包括以下步骤：提供一种制造装置（100），该制造装置（100）包括具有坩埚（7）将被设置的区域的腔室（1） 加热要安置坩埚（7）的区域并抽空腔室（1）中的气体; 在排气之后用包含惰性气体和氮气的混合气体填充室（1）; 加热和熔化容纳在所述区域中的坩埚（7）中的原料以产生含有硅和碳的SiC溶液（8）; 并在混合气体气氛下将SiC晶种浸入SiC溶液中，以在SiC晶种上生长n型SiC单晶。