公开(公告)号：US08051322B2

公开(公告)日：2011-11-01

申请号：US12435679

申请日：2009-05-05

申请人： Norihisa Matsumoto ,  Nodoka Mimura ,  Hidetoshi Nishiyama ,  Makoto Watanabe

发明人： Norihisa Matsumoto ,  Nodoka Mimura ,  Hidetoshi Nishiyama ,  Makoto Watanabe

IPC分类号： G06F11/00

CPC分类号： H04L12/4633

摘要： In a communication system using an IP tunnel for communication between application processing apparatuses (hereinafter, processing apparatuses), an application can be moved to an arbitrary processing apparatus, update of tunnel tables included in the respective processing apparatuses is quickly performed, and a buffer for waiting for packets during the table update is made small. A redundancy managing apparatus manages a correspondence between a virtual IP address (VIP) of an application in a communication system and an IP address (RIP) of an processing apparatus to execute the application. The processing apparatus notifies the VIP of the communication partner application of the application to the redundancy managing apparatus. The redundancy managing apparatus notifies the VIP of the communication partner application of the moved application and the RIP of the processing apparatus to execute the communication partner application to the processing apparatus of the movement destination (failover destination) of the application.

摘要翻译： 在使用IP隧道进行应用处理装置（以下称为处理装置）之间的通信的通信系统中，可以将应用移动到任意的处理装置，快速地进行各处理装置中包含的隧道表的更新， 在表更新期间等待数据包变小。 冗余管理装置管理通信系统中的应用的虚拟IP地址（VIP）与执行应用的处理装置的IP地址（RIP）之间的对应关系。 处理装置将应用的通信对方应用的VIP通知给冗余管理装置。 冗余管理装置将移动的应用的通信对方应用的VIP和处理装置的RIP通知给应用的移动目的地（故障切换目的地）的处理装置的通信对方应用。

公开(公告)号：US20090287955A1

公开(公告)日：2009-11-19

申请号：US12435679

申请日：2009-05-05

申请人： Norihisa Matsumoto ,  Nodoka Mimura ,  Hidetoshi Nishiyama ,  Makoto Watanabe

发明人： Norihisa Matsumoto ,  Nodoka Mimura ,  Hidetoshi Nishiyama ,  Makoto Watanabe

IPC分类号： G06F15/177 ,  G06F11/14

CPC分类号： H04L12/4633

摘要： In a communication system using an IP tunnel for communication between application processing apparatuses (hereinafter, processing apparatuses), an application can be moved to an arbitrary processing apparatus, update of tunnel tables included in the respective processing apparatuses is quickly performed, and a buffer for waiting for packets during the table update is made small. A redundancy managing apparatus manages a correspondence between a virtual IP address (VIP) of an application in a communication system and an IP address (RIP) of an processing apparatus to execute the application. The processing apparatus notifies the VIP of the communication partner application of the application to the redundancy managing apparatus. The redundancy managing apparatus notifies the VIP of the communication partner application of the moved application and the RIP of the processing apparatus to execute the communication partner application to the processing apparatus of the movement destination (failover destination) of the application.

摘要翻译： 在使用IP隧道进行应用处理装置（以下称为处理装置）之间的通信的通信系统中，可以将应用移动到任意的处理装置，快速地进行各处理装置中包含的隧道表的更新， 在表更新期间等待数据包变小。 冗余管理装置管理通信系统中的应用的虚拟IP地址（VIP）与执行应用的处理装置的IP地址（RIP）之间的对应关系。 处理装置将应用的通信对方应用的VIP通知给冗余管理装置。 冗余管理装置将移动的应用的通信对方应用的VIP和处理装置的RIP通知给应用的移动目的地（故障切换目的地）的处理装置的通信对方应用。

公开(公告)号：US09602780B2

公开(公告)日：2017-03-21

申请号：US13997496

申请日：2011-11-02

申请人： Masaaki Ito ,  Hidetoshi Nishiyama ,  Takahiro Jingu

发明人： Masaaki Ito ,  Hidetoshi Nishiyama ,  Takahiro Jingu

IPC分类号： H04N7/18 ,  G01N21/47 ,  G01N21/956 ,  H01L21/66 ,  G01N21/95

CPC分类号： H04N7/18 ,  G01N21/47 ,  G01N21/9501 ,  G01N21/956 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

摘要： In a defect inspecting apparatus, the strength of a fatal defect signal decreases due to miniaturization. Thus, in order to assure a high SN ratio, it is necessary to reduce noises caused by scattered light from a wafer. Roughness of a pattern edge and surface roughness which serve as a scattered-light source are spread over the entire wafer. The present invention has discovered the fact that reduction of an illuminated area is a technique effective for decreasing noises. That is to say, the present invention has discovered the fact that creation of an illuminated area having a spot shape and reduction of the dimension of a spot beam are effective. A plurality of temporally and spatially divided spot beams are radiated to the wafer serving as a sample.

公开(公告)号：US08508727B2

公开(公告)日：2013-08-13

申请号：US13529363

申请日：2012-06-21

申请人： Sachio Uto ,  Minori Noguchi ,  Hidetoshi Nishiyama ,  Yoshimasa Ohshima ,  Akira Hamamatsu ,  Takahiro Jingu ,  Toshihiko Nakata ,  Masahiro Watanabe

发明人： Sachio Uto ,  Minori Noguchi ,  Hidetoshi Nishiyama ,  Yoshimasa Ohshima ,  Akira Hamamatsu ,  Takahiro Jingu ,  Toshihiko Nakata ,  Masahiro Watanabe

IPC分类号： G01N21/00

CPC分类号： G01N21/00 ,  G01N21/9501 ,  G06T7/0004 ,  G06T2207/30148

摘要： An inspecting apparatus and method including first and second illuminating units for illuminating a surface of a specimen to be inspected with different incident angles and first and second detecting optical units arranged at different elevation angle directions to the surface of the specimen for detecting images of the specimen illuminated by the first and second illuminating units.

摘要翻译： 一种检查装置和方法，包括：第一和第二照明单元，用于以不同的入射角照射待检查样本的表面;以及第一和第二检测光学单元，其以不同的仰角方向布置在样本的表面上，用于检测样本的图像 由第一和第二照明单元照亮。

公开(公告)号：US08467048B2

公开(公告)日：2013-06-18

申请号：US13535955

申请日：2012-06-28

申请人： Hidetoshi Nishiyama ,  Kei Shimura ,  Sachio Uto ,  Minori Noguchi

发明人： Hidetoshi Nishiyama ,  Kei Shimura ,  Sachio Uto ,  Minori Noguchi

IPC分类号： G01N21/00

CPC分类号： G01N21/95607 ,  G01N21/94 ,  G01N21/9501 ,  G01N2021/4711

摘要： A pattern defect inspection apparatus capable of detecting minute defects on a sample with high sensitivity without generating speckle noise in signals is realized. Substantially the same region on a surface of a wafer is detected by using two detectors at mutually different timings. Output signals from the two detectors are summed and averaged to eliminate noise. Since a large number of rays of illumination light are not simultaneously irradiated to the same region on the wafer, a pattern defect inspection apparatus capable of suppressing noise resulting from interference of a large number of rays, eliminating noise owing to other causes and detecting with high sensitivity minute defects on the sample without the occurrence of speckle noise in the signal can be accomplished.

摘要翻译： 实现能够以高灵敏度检测样品上的微小缺陷而不产生信号中的斑点噪声的图案缺陷检查装置。 通过在相互不同的定时使用两个检测器来检测晶片表面上的基本上相同的区域。 来自两个检测器的输出信号被相加和平均以消除噪声。 由于大量的照明光线不能同时照射到晶片上的相同区域，所以能够抑制由于大量光线的干扰而产生的噪声的图案缺陷检查装置，消除由于其它原因引起的噪声和高检测 可以实现样品上的灵敏度微小缺陷，而不会在信号中发生斑点噪声。

公开(公告)号：US08435594B2

公开(公告)日：2013-05-07

申请号：US12197731

申请日：2008-08-25

申请人： Isamu Konishiike ,  Chisato Okina ,  Keisuke Tanabe ,  Atsuhiro Abe ,  Hidetoshi Nishiyama ,  Kenichi Kawase ,  Shunsuke Kurasawa ,  Koichi Matsumoto

发明人： Isamu Konishiike ,  Chisato Okina ,  Keisuke Tanabe ,  Atsuhiro Abe ,  Hidetoshi Nishiyama ,  Kenichi Kawase ,  Shunsuke Kurasawa ,  Koichi Matsumoto

IPC分类号： B05D5/12 ,  C23C14/00

CPC分类号： C23C14/562 ,  H01M4/0421 ,  H01M4/131 ,  H01M4/1395 ,  H01M4/661 ,  H01M10/052 ,  H01M2200/106

摘要： An evaporation apparatus that is capable of stably forming a good quality thin film and is highly suitable for mass production is provided. The evaporation apparatus include an evaporation source discharging an evaporation material by heating, a retention member retaining an evaporation object, and a heat shield member that is located between the evaporation source and the evaporation object retained by the retention member, has an opening for passing the evaporation material in a state of vapor phase from the evaporation source to the evaporation object, and shields the evaporation object from part of radiation heat of the evaporation source. The heat shield member is located closer to the evaporation source than to the retention member.

摘要翻译： 提供能够稳定地形成优质薄膜并且高度适合批量生产的蒸发装置。 蒸发装置包括通过加热排出蒸发材料的蒸发源，保持蒸发物体的保持构件和位于蒸发源和由保持构件保留的蒸发物体之间的隔热构件，具有用于使蒸发物质通过的开口 从蒸发源到蒸发物体处于气相状态的蒸发材料，并且将蒸发物体与蒸发源的辐射热屏蔽。 隔热构件位于比保持构件更靠近蒸发源的位置。

公开(公告)号：US08269959B2

公开(公告)日：2012-09-18

申请号：US13347245

申请日：2012-01-10

申请人： Akira Hamamatsu ,  Minori Noguchi ,  Hidetoshi Nishiyama ,  Yoshimasa Ohshima ,  Takahiro Jingu ,  Sachio Uto

发明人： Akira Hamamatsu ,  Minori Noguchi ,  Hidetoshi Nishiyama ,  Yoshimasa Ohshima ,  Takahiro Jingu ,  Sachio Uto

IPC分类号： G01N21/00

CPC分类号： G01N21/8806 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/95623

摘要： The present invention provides an inspection apparatus and inspection method. The inspection apparatus includes a stage mechanism for supporting an object under inspection. A spatial filter is provided in the detection optical system to inspect the object. A printer is used to print the results of the spatial filter. The spatial filter can be provided in the form of a Fourier transformed image.

摘要翻译： 本发明提供一种检查装置和检查方法。 检查装置包括用于支撑被检查物体的台架机构。 在检测光学系统中设置空间滤波器来检查物体。 打印机用于打印空间滤镜的结果。 空间滤波器可以以傅里叶变换图像的形式提供。

公开(公告)号：US08254662B2

公开(公告)日：2012-08-28

申请号：US13231418

申请日：2011-09-13

申请人： Hidetoshi Nishiyama ,  Minori Noguchi ,  Tetsuya Watanabe ,  Takuaki Sekiguchi

发明人： Hidetoshi Nishiyama ,  Minori Noguchi ,  Tetsuya Watanabe ,  Takuaki Sekiguchi

IPC分类号： G06K9/00

CPC分类号： G01N21/94 ,  G01N21/9501 ,  Y02P90/04 ,  Y02P90/14 ,  Y02P90/18 ,  Y02P90/265

摘要： A system for monitoring foreign matter includes a manufacturing line having plural process processing apparatuses, a production management system which manages the processing of workpieces in the manufacturing line, plural optical heads which monitor foreign matter in relation to at least one of the workpieces, and which provide an output signal indicative thereof, and at least one image signal processing unit provided in a lesser number than a number of the plural optical heads for processing the output signal therefrom.

摘要翻译： 用于监测异物的系统包括具有多个处理处理装置的生产线，管理制造线中的工件的处理的生产管理系统，与至少一个工件相关地监视异物的多个光学头，以及 提供指示其的输出信号，以及至少一个图像信号处理单元，其以比用于处理其输出信号的多个光学头的数量少的数量提供。

公开(公告)号：US08228495B2

公开(公告)日：2012-07-24

申请号：US13221935

申请日：2011-08-31

申请人： Sachio Uto ,  Minori Noguchi ,  Hidetoshi Nishiyama ,  Yoshimasa Ohshima ,  Akira Hamamatsu ,  Takahiro Jingu ,  Toshihiko Nakata ,  Masahiro Watanabe

发明人： Sachio Uto ,  Minori Noguchi ,  Hidetoshi Nishiyama ,  Yoshimasa Ohshima ,  Akira Hamamatsu ,  Takahiro Jingu ,  Toshihiko Nakata ,  Masahiro Watanabe

IPC分类号： G01N21/00

CPC分类号： G01N21/00 ,  G01N21/9501 ,  G06T7/0004 ,  G06T2207/30148

摘要： An inspecting apparatus and method including first and second illuminating units for illuminating a surface of a specimen to be inspected with different incident angles and first and second detecting optical units arranged at different elevation angle directions to the surface of the specimen for detecting images of the specimen illuminated by the first and second illuminating units.

摘要翻译： 一种检查装置和方法，包括：第一和第二照明单元，用于以不同的入射角照射待检查样本的表面;以及第一和第二检测光学单元，其以不同的仰角方向布置在样本的表面上，用于检测样本的图像 由第一和第二照明单元照亮。

公开(公告)号：US08045146B2

公开(公告)日：2011-10-25

申请号：US12141955

申请日：2008-06-19

申请人： Keiya Saito ,  Yasuhiro Yoshitake ,  Shunichi Matsumoto ,  Hidetoshi Nishiyama

发明人： Keiya Saito ,  Yasuhiro Yoshitake ,  Shunichi Matsumoto ,  Hidetoshi Nishiyama

IPC分类号： G01N21/00 ,  G01J4/00

CPC分类号： G01N21/8806 ,  G01N21/9501 ,  G01N2021/8822 ,  G01N2021/8861 ,  G02B21/0032 ,  G02B21/0072

摘要： The present invention provides an apparatus and a method for reviewing a defect with high throughput by detecting the defect to be reviewed with high sensitivity, comprising: an optical microscope; a correction means; and a scanning electron microscope which reviews the existing defect on the sample; wherein the optical microscope has: an optical height detection system which optically detects a vertical position of an upper surface of the sample placed on the stage; an illumination optical system which illuminates the defect with light; an image detection optical system which converges and detects reflected light or scattered light generated from the defect illuminated by the illumination optical system to obtain an image signal; and a focus adjusting means which adjusts a focus position of the optical microscope based on the vertical position of the upper surface of the sample, which is detected by the optical height detection system.

摘要翻译： 本发明提供一种通过以高灵敏度检测待检查的缺陷来检查具有高通量的缺陷的装置和方法，包括：光学显微镜; 修正手段; 和扫描电子显微镜，用于回顾样品上现有的缺陷; 其中所述光学显微镜具有：光学高度检测系统，其光学地检测放置在所述台上的样品的上表面的垂直位置; 用光照亮缺陷的照明光学系统; 会聚和检测由照明光学系统照射的缺陷产生的反射光或散射光以获得图像信号的图像检测光学系统; 以及焦点调节装置，其基于由光学高度检测系统检测到的样本的上表面的垂直位置来调整光学显微镜的对焦位置。