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公开(公告)号：US20110133742A1
公开(公告)日：2011-06-09
申请号：US13025065
申请日：2011-02-10
IPC分类号： G01R31/44
CPC分类号： H05B37/038
摘要： An apparatus and method for detecting lamp failure is described for an array of lamps used in a rapid thermal processing system. The lamp failure detection system enables identification of a failed lamp among a plurality of lamps, and also provides identification of the failure type. The apparatus applies a lamp failure detection method to the voltage drop values measured across each lamp to determine if a lamp is in a failure state. In one embodiment, a field programmable gate array is used to apply a failure detection method to the lamp voltage values.
摘要翻译： 描述了用于快速热处理系统中使用的灯阵列的用于检测灯故障的装置和方法。 灯故障检测系统能够识别多个灯中的故障灯，并且还提供故障类型的识别。 该装置将灯故障检测方法应用于跨每个灯测量的电压降值，以确定灯是否处于故障状态。 在一个实施例中，使用现场可编程门阵列将故障检测方法应用于灯电压值。
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公开(公告)号：US20080164822A1
公开(公告)日：2008-07-10
申请号：US11619962
申请日：2007-01-04
IPC分类号： H05B37/03
CPC分类号： H05B37/038
摘要： An apparatus and method for detecting lamp failure is described for an array of lamps used in a rapid thermal processing system. The lamp failure detection system enables identification of a failed lamp among a plurality of lamps, and also provides identification of the failure type. The apparatus applies a lamp failure detection method to the voltage drop values measured across each lamp to determine if a lamp is in a failure state. In one embodiment, a field programmable gate array is used to apply a failure detection method to the lamp voltage values.
摘要翻译： 描述了用于快速热处理系统中使用的灯阵列的用于检测灯故障的装置和方法。 灯故障检测系统能够识别多个灯中的故障灯，并且还提供故障类型的识别。 该装置将灯故障检测方法应用于跨每个灯测量的电压降值，以确定灯是否处于故障状态。 在一个实施例中，使用现场可编程门阵列将故障检测方法应用于灯电压值。
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公开(公告)号：US07923933B2
公开(公告)日：2011-04-12
申请号：US11619962
申请日：2007-01-04
CPC分类号： H05B37/038
摘要： An apparatus and method for detecting lamp failure is described for an array of lamps used in a rapid thermal processing system. The lamp failure detection system enables identification of a failed lamp among a plurality of lamps, and also provides identification of the failure type. The apparatus applies a lamp failure detection method to the voltage drop values measured across each lamp to determine if a lamp is in a failure state. In one embodiment, a field programmable gate array is used to apply a failure detection method to the lamp voltage values.
摘要翻译： 描述了用于快速热处理系统中使用的灯阵列的用于检测灯故障的装置和方法。 灯故障检测系统能够识别多个灯中的故障灯，并且还提供故障类型的识别。 该装置将灯故障检测方法应用于跨每个灯测量的电压降值，以确定灯是否处于故障状态。 在一个实施例中，使用现场可编程门阵列将故障检测方法应用于灯电压值。
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公开(公告)号：US08106591B2
公开(公告)日：2012-01-31
申请号：US13025065
申请日：2011-02-10
IPC分类号： H05B39/10
CPC分类号： H05B37/038
摘要： An apparatus and method for detecting lamp failure is described for an array of lamps used in a rapid thermal processing system. The lamp failure detection system enables identification of a failed lamp among a plurality of lamps, and also provides identification of the failure type. The apparatus applies a lamp failure detection method to the voltage drop values measured across each lamp to determine if a lamp is in a failure state. In one embodiment, a field programmable gate array is used to apply a failure detection method to the lamp voltage values.
摘要翻译： 描述了用于快速热处理系统中使用的灯阵列的用于检测灯故障的装置和方法。 灯故障检测系统能够识别多个灯中的故障灯，并且还提供故障类型的识别。 该装置将灯故障检测方法应用于跨每个灯测量的电压降值，以确定灯是否处于故障状态。 在一个实施例中，使用现场可编程门阵列将故障检测方法应用于灯电压值。
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5.发明授权公开(公告)号：US08653408B2
公开(公告)日：2014-02-18
申请号：US13485666
申请日：2012-05-31
申请人： Dean Jennings , Haifan Liang , Mark Yam , Vijay Parihar , Abhilash J. Mayur , Aaron Hunter , Bruce Adams , Joseph Michael Ranish
发明人： Dean Jennings , Haifan Liang , Mark Yam , Vijay Parihar , Abhilash J. Mayur , Aaron Hunter , Bruce Adams , Joseph Michael Ranish
IPC分类号： B23K26/067
CPC分类号： B23K26/0608 , B23K26/0604 , B23K26/0613 , B23K26/073 , B23K26/0732 , B23K26/0736 , B23K26/0738 , B23K26/352 , H01L21/02675 , H01L21/2026 , H01L21/268 , H01L21/324
摘要： A thermal processing apparatus and method in which a first laser source, for example, a CO2 emitting at 10.6 μm is focused onto a silicon wafer as a line beam and a second laser source, for example, a GaAs laser bar emitting at 808 nm is focused onto the wafer as a larger beam surrounding the line beam. The two beams are scanned in synchronism in the direction of the narrow dimension of the line beam to create a narrow heating pulse from the line beam when activated by the larger beam. The energy of GaAs radiation is greater than the silicon bandgap energy and creates free carriers. The energy of the CO2 radiation is less than the silicon bandgap energy so silicon is otherwise transparent to it, but the long wavelength radiation is absorbed by the free carriers.
摘要翻译： 例如，将发射为10.6μm的CO 2的第一激光源聚焦在作为线束的硅晶片上的第一激光源和例如在808nm发射的GaAs激光棒的第二激光源的热处理装置和方法是 作为围绕线束的较大波束聚焦在晶片上。 沿着线束的窄尺寸的方向同步地扫描两个光束，以在由较大的光束激活时从线束产生窄的加热脉冲。 GaAs辐射的能量大于硅带隙能量，并产生自由载流子。 CO2辐射的能量小于硅带隙能量，因此硅对其透明度不变，但长波长辐射被自由载流子吸收。
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6.发明授权Method and apparatus for reducing patterning effects on a substrate during radiation-based heating 有权用于在基于辐射的加热期间减少对基板的图案化影响的方法和装置公开(公告)号：US08513626B2
公开(公告)日：2013-08-20
申请号：US11622908
申请日：2007-01-12
IPC分类号： G02B5/00
CPC分类号： H01L21/67248 , H01L21/67115
摘要： Patterning effects on a substrate are reduced during radiation-based heating by filtering the radiation source or configuring the radiation source to produce radiation having different spectral characteristics. For the filtering, an optical filter may be used to truncate specific wavelengths of the radiation. The different configurations of the radiation source include a combination of one or more continuum radiation sources with one or more discrete spectrum sources, a combination of multiple discrete spectrum sources, or a combination of multiple continuum radiation sources. Furthermore, one or more of the radiation sources may be configured to have a substantially non-normal angle of incidence or polarized to reduce patterning effects on a substrate during radiation-based heating.
摘要翻译： 通过过滤辐射源或配置辐射源产生具有不同光谱特性的辐射，在基于辐射的加热过程中，对衬底的图案化效果降低。 为了滤波，可以使用滤光器来截断辐射的特定波长。 辐射源的不同配置包括一个或多个连续辐射源与一个或多个离散光谱源，多个离散光谱源的组合或多个连续辐射源的组合的组合。 此外，一个或多个辐射源可以被配置为具有基本上非正常的入射角或极化，以减少基于辐射的加热期间对衬底的图案化效应。
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公开(公告)号：US20120238111A1
公开(公告)日：2012-09-20
申请号：US13485699
申请日：2012-05-31
申请人： Dean Jennings , Haifan Liang , Mark Yam , Vijay Parihar , Abhilash J. Mayur , Aaron Hunter , Bruce Adams , Joseph Michael Ranish
发明人： Dean Jennings , Haifan Liang , Mark Yam , Vijay Parihar , Abhilash J. Mayur , Aaron Hunter , Bruce Adams , Joseph Michael Ranish
IPC分类号： H01L21/268
CPC分类号： B23K26/0608 , B23K26/0604 , B23K26/0613 , B23K26/073 , B23K26/0732 , B23K26/0736 , B23K26/0738 , B23K26/352 , H01L21/02675 , H01L21/2026 , H01L21/268 , H01L21/324
摘要： A thermal processing apparatus and method in which a first laser source, for example, a CO2 emitting at 10.6 μm is focused onto a silicon wafer as a line beam and a second laser source, for example, a GaAs laser bar emitting at 808 nm is focused onto the wafer as a larger beam surrounding the line beam. The two beams are scanned in synchronism in the direction of the narrow dimension of the line beam to create a narrow heating pulse from the line beam when activated by the larger beam. The energy of GaAs radiation is greater than the silicon bandgap energy and creates free carriers. The energy of the CO2 radiation is less than the silicon bandgap energy so silicon is otherwise transparent to it, but the long wavelength radiation is absorbed by the free carriers.
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8.发明申请公开(公告)号：US20110263138A1
公开(公告)日：2011-10-27
申请号：US13175452
申请日：2011-07-01
IPC分类号： H01L21/26
CPC分类号： H01L21/67115 , H01J65/00 , H01J65/046
摘要： A thermal processing chamber with a dielectric barrier discharge (DBD) lamp assembly and a method for using the same are provided. In one embodiment, a thermal processing chamber includes a chamber body and a dielectric barrier discharge lamp assembly. The dielectric barrier discharge lamp assembly further comprises a first electrode, a second electrode and a dielectric barrier. The dielectric barrier discharge lamp assembly is positioned between the first electrode and the second electrode. The dielectric barrier defines a discharge space between the dielectric barrier and the second electrode. A circuit arrangement is coupled to the first and second electrodes, and is adapted to operate the dielectric barrier discharge lamp assembly.
摘要翻译： 提供具有介电阻挡放电（DBD）灯组件的热处理室及其使用方法。 在一个实施例中，热处理室包括室主体和电介质阻挡放电灯组件。 电介质阻挡放电灯组件还包括第一电极，第二电极和电介质阻挡层。 电介质阻挡放电灯组件位于第一电极和第二电极之间。 电介质阻挡层限定介电阻挡层和第二电极之间的放电空间。 电路布置耦合到第一和第二电极，并且适于操作电介质阻挡放电灯组件。
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9.发明申请METHOD FOR REDUCING STRAY LIGHT IN A RAPID THERMAL PROCESSING CHAMBER BY POLARIZATION 有权用于通过极化减少快速热处理室中的轻质光的方法公开(公告)号：US20090277894A1
公开(公告)日：2009-11-12
申请号：US12118497
申请日：2008-05-09
IPC分类号： A21B1/00
CPC分类号： H01L21/67115 , H01L21/67248
摘要： Embodiments of the present invention provide apparatus and method for reducing noises in temperature measurement during thermal processing. One embodiment of the present invention provides a chamber for processing a substrate comprising a chamber enclosure defining a processing volume, an energy source configured to direct radiant energy toward the processing volume, a spectral device configured to treat the radiant energy directed from the energy source towards the processing volume, a substrate support disposed in the processing volume and configured to support the substrate during processing, and a sensor assembly configured to measure temperature of the substrate being processed by sensing radiation from the substrate within a selected spectrum.
摘要翻译： 本发明的实施例提供了用于在热处理期间降低温度测量中的噪声的装置和方法。 本发明的一个实施例提供了一种用于处理衬底的腔室，其包括限定处理体积的室室，被配置为将辐射能量引向处理体积的能量源，被配置为将从能量源引导的辐射能量 处理体积，设置在处理体积中并被配置为在处理期间支撑衬底的衬底支撑件;以及传感器组件，其被配置为通过在所选择的光谱内感测来自衬底的辐射来测量被处理的衬底的温度。
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公开(公告)号：US20080067416A1
公开(公告)日：2008-03-20
申请号：US11414869
申请日：2006-05-01
IPC分类号： H01J37/20
CPC分类号： H01L21/67115
摘要： The present invention provides methods and apparatus for performing thermal processes to a semiconductor substrate. Thermal processing chambers of the present invention comprise two different energy sources, such as an infrared radiation source and a UV radiation source. The UV radiation source and the infrared radiation source may be used alone or in combination to supply heat, activate electronic, or create active species inside the thermal processing chamber.
摘要翻译： 本发明提供了对半导体衬底进行热处理的方法和装置。 本发明的热处理室包括两种不同的能量源，例如红外辐射源和UV辐射源。 UV辐射源和红外辐射源可以单独使用或组合使用以在热处理室内提供热量，激活电子或产生活性物质。
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