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公开(公告)号:US20240240302A1
公开(公告)日:2024-07-18
申请号:US18393396
申请日:2023-12-21
Applicant: Olum Material Corporation
Inventor: Taek Yong JANG , Young Ho LEE , Jong Il KIM
CPC classification number: C23C14/042 , H10K71/166
Abstract: The present invention relates to a producing method of a mask-support assembly. The producing method of a mask-support assembly for use in a process of forming OLED pixels on a semiconductor wafer may include the steps of: (a) preparing a support; (b) forming a mask metal film on a first surface of the support; and (c) forming a mask including a mask pattern by etching the mask metal film.
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公开(公告)号:US20230220534A1
公开(公告)日:2023-07-13
申请号:US17842335
申请日:2022-06-16
Applicant: Olum Material Corporation
Inventor: Taek Yong JANG , Byung Il LEE , Young Ho LEE
CPC classification number: C23C14/042 , H01L51/56
Abstract: Proposed are a mask-integrated frame and a method of manufacturing the same. The mask-integrated frame used to deposit organic light-emitting diode (OLED) pixels on a semiconductor wafer includes a frame including an opening, a grid sheet connected onto the frame, having a circular edge, and including grids provided on at least the opening of the frame, and a mask connected onto the grid sheet, having a circular shape, and including mask patterns.
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公开(公告)号:US20240244941A1
公开(公告)日:2024-07-18
申请号:US18392401
申请日:2023-12-21
Applicant: Olum Material Corporation
Inventor: Taek Yong JANG , Young Ho LEE , Hwi Su KIM
CPC classification number: H10K71/166 , C23C14/042
Abstract: The present invention relates to a mask-support assembly, a producing method thereof, and a mask-frame assembly. The producing method of a mask-support assembly according to the present invention may include the steps of: (a) preparing a conductive substrate; (b) forming a mask including a mask pattern on a first surface of the conductive substrate; (c) reducing a thickness of the conductive substrate on a second surface opposite to the first surface of the conductive substrate; and (d) forming a support including an edge portion and a grid portion by etching the conductive substrate on the second surface thereof.
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公开(公告)号:US20240026517A1
公开(公告)日:2024-01-25
申请号:US18135937
申请日:2023-04-18
Applicant: Olum Material Corporation
Inventor: Taek Yong JANG , Young Ho LEE , Hwi Su KIM , Dong Jin LEE , Byung Il LEE
CPC classification number: C23C14/042 , H10K99/00 , C25D1/10 , C23C14/12 , H10K71/166
Abstract: A mask-support assembly and a producing method thereof are provided. The mask-support assembly, which is used in a process of forming organic light-emitting diode (OLED) pixels on a semiconductor wafer, includes: a support comprising an edge portion and a grid portion; and a mask connected onto the support and comprising a plurality of cell portions in each of which a mask pattern is formed.
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公开(公告)号:US20250063931A1
公开(公告)日:2025-02-20
申请号:US18393508
申请日:2023-12-21
Applicant: Olum Material Corporation
Inventor: Taek Yong JANG , Young Ho LEE
Abstract: The present invention relates to a mask-support assembly and a producing method thereof. The mask-support assembly according to the present invention is used in a process of forming organic light emitting diode (OLED) pixels on a semiconductor wafer, and may include a support including an edge portion and a grid portion; and a mask connected onto the support and including a plurality of cell portions with mask patterns formed therein, wherein at least a part of the mask is disposed in a trench portion recessed in the support.
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公开(公告)号:US20240049506A1
公开(公告)日:2024-02-08
申请号:US18229626
申请日:2023-08-02
Applicant: Olum Material Corporation
Inventor: Young Ho LEE , Hwi Su KIM , Dong Jin LEE , Byung Il LEE , Taek Yong JANG , Jong Il KIM
IPC: H10K59/12 , G03F7/00 , G03F7/09 , G03F1/60 , H10K59/131
CPC classification number: H10K59/1201 , G03F7/70683 , G03F7/09 , G03F7/70833 , G03F1/60 , H10K59/131
Abstract: The present invention relates to a mask-support assembly and a producing method thereof. The mask-support assembly according to the present invention may include: a support comprising an edge portion and a grid portion; and a mask connected onto the support and comprising a plurality of cell portions in each of which a mask pattern is formed, wherein at least a partial region of the support is exposed on one surface of the support except for a region where the cell portions of the mask are disposed.
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