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1.发明申请CHEMICAL VAPOR DEPOSITION PROCESS FOR DEPOSITING A SILICA COATING ON A GLASS SUBSTRATE 审中-公开在玻璃基板上沉积二氧化硅涂层的化学气相沉积工艺公开(公告)号：US20160305021A1
公开(公告)日：2016-10-20
申请号：US15197425
申请日：2016-06-29
IPC分类号： C23C16/455 , C03C17/00
CPC分类号： C23C16/455 , C03C17/001 , C03C17/245 , C03C17/3417 , C03C2217/213 , C03C2217/241 , C03C2218/1525 , C23C16/401 , C23C16/42
摘要： A CVD process for depositing a silica coating is provided. The process includes providing a float glass ribbon in a float glass manufacturing process. The process also includes forming a gaseous mixture including a silane compound, oxygen, a fluorine-containing compound, and a radical scavenger. The gaseous mixture is directed toward and along the float glass ribbon and is reacted over the float glass ribbon to form the silica coating thereon. The silica coating comprises silicon dioxide.
摘要翻译： 提供了沉积二氧化硅涂层的CVD工艺。 该方法包括在浮法玻璃制造工艺中提供浮法玻璃带。 该方法还包括形成包含硅烷化合物，氧，含氟化合物和自由基清除剂的气体混合物。 气体混合物指向并沿着浮法玻璃带并且在浮法玻璃带上反应以在其上形成二氧化硅涂层。 二氧化硅涂层包括二氧化硅。
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公开(公告)号：US11542194B2
公开(公告)日：2023-01-03
申请号：US16640156
申请日：2018-08-31
摘要： A coated glass article includes a glass substrate. A coating is formed on the glass substrate. The coating includes a first coating layer. The first coating layer includes fluorine doped tin oxide. A second coating layer is provided between the glass substrate and the first coating layer. The second coating layer includes silicon dioxide and at least one of phosphorus and boron. The coated glass article exhibits a haze of 2.0% or less.
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公开(公告)号：US11485678B2
公开(公告)日：2022-11-01
申请号：US16640118
申请日：2018-08-31
IPC分类号： C23C16/40 , C03C17/245 , C23C16/453 , C23C16/54
摘要： A chemical vapor deposition process for forming a silicon oxide coating includes providing a moving glass substrate. A gaseous mixture is formed and includes a silane compound, a first oxygen-containing molecule, a radical scavenger, and at least one of a phosphorus-containing compound and a boron-containing compound. The gaseous mixture is directed toward and along the glass substrate. The gaseous mixture is reacted over the glass substrate to form a silicon oxide coating on the glass substrate at a deposition rate of 150 nm*m/min or more.
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公开(公告)号：US20180291506A1
公开(公告)日：2018-10-11
申请号：US16010223
申请日：2018-06-15
IPC分类号： C23C16/455 , C23C16/54 , C03C17/00 , C23C16/10
摘要： Apparatus is described for coating of three dimensional objects such as glass jars or bottles, during a continuous manufacturing process, by Chemical Vapour Deposition (CVD). The objects pass through tunnel having one or more vertical arrays of nozzles located in the sidewalls. The nozzles deliver CVD precursors and, being independently variable, allow for variation of the precursor concentration along the height of the object. Thus, the thickness of the resultant coating may be so varied. Preferred embodiments include corresponding exhaust arrays, aligned with the nozzles and one or more air curtains which isolate the interior of the tunnel from the external environment.
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5.发明授权Chemical vapor deposition process for depositing a silica coating on a glass substrate 有权用于在二氧化硅涂层上沉积玻璃基板的化学气相沉积工艺公开(公告)号：US09404179B2
公开(公告)日：2016-08-02
申请号：US13261943
申请日：2013-02-18
IPC分类号： C23C16/00 , C23C16/24 , B05D5/06 , C23C16/455 , C23C16/40 , C23C16/42 , C03C17/245 , C03C17/34
CPC分类号： C23C16/455 , C03C17/001 , C03C17/245 , C03C17/3417 , C03C2217/213 , C03C2217/241 , C03C2218/1525 , C23C16/401 , C23C16/42
摘要： A CVD process for depositing a silica coating is provided. The process includes providing a glass substrate. The process also includes forming a gaseous mixture including a silane compound, oxygen, a fluorine-containing compound, and a radical scavenger such as ethylene or propylene. The gaseous mixture is directed toward and along the glass substrate and is reacted over the glass substrate to form the silica coating thereon.
摘要翻译： 提供了沉积二氧化硅涂层的CVD工艺。 该方法包括提供玻璃基底。 该方法还包括形成包含硅烷化合物，氧，含氟化合物和自由基清除剂如乙烯或丙烯的气体混合物。 气体混合物被引向玻璃基底并沿着玻璃基底并在玻璃基底上反应以在其上形成二氧化硅涂层。
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