公开(公告)号：US20160064188A1

公开(公告)日：2016-03-03

申请号：US14818415

申请日：2015-08-05

Applicant: Panasonic Intellectual Property Management Co., Ltd.

Inventor： Shogo OKITA ,  Hiromi ASAKURA ,  Syouzou WATANABE ,  Noriyuki MATSUBARA ,  Mitsuru HIROSHIMA ,  Toshihiro WADA

IPC: H01J37/32

CPC classification number: H01J37/32715 ,  H01J37/32366 ,  H01J37/32733 ,  H01L21/681

Abstract: A plasma processing apparatus that performs plasma processing to a substrate held on a transport carrier including a frame and a holding sheet that covers an opening of the frame includes: a transport mechanism that transports the transport carrier; a position measuring section that measures a position of the substrate to the frame; a plasma processing section that includes a plasma processing stage on which the transport carrier is loaded and a cover that covers the frame and a part of the holding sheet loaded on the plasma processing stage, and has a window section for exposing a part of the substrate; and a control section that controls the transport mechanism such that the transport carrier is loaded on the plasma processing stage to satisfy a positional relationship between the window section and the substrate based on the position information of the substrate to the frame.

Abstract translation: 对保持在包括框架的运送载体上的基板和覆盖框架的开口的保持片进行等离子体处理的等离子体处理装置包括：运送运送托架的运送机构; 位置测量部，其测量所述基板与所述框架的位置; 等离子体处理部，其包括装载有运送载体的等离子体处理台和覆盖框架的盖和负载在等离子体处理台上的保持片的一部分，并具有用于使基板的一部分露出的窗口部 ; 以及控制部，其控制所述输送机构，使得所述输送载体基于所述基板到所述框架的位置信息而被载载在所述等离子体处理台上以满足所述窗口部和所述基板之间的位置关系。